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    • 2. 发明公开
    • 연마패드 및 그 제조방법
    • 抛光垫及其制造方法
    • KR1020130095430A
    • 2013-08-28
    • KR1020120016845
    • 2012-02-20
    • 케이피엑스케미칼 주식회사삼성전자주식회사
    • 안봉수장영준이상목정휘국송기천김승근서장원추정선
    • B24D3/10C09K3/14C09C1/68
    • B24D3/32B24B37/24B24D3/34B24D11/003
    • PURPOSE: A polishing pad and a manufacturing method thereof are provided to maximize a polishing performance and a flattening performance with collecting and using polishing slurry in a chemical mechanical planarization/chemical mechanical polishing (CMP) process. CONSTITUTION: A manufacturing method of a polishing pad (100) includes: a step (a) of forming a mixture of materials for forming a polishing layer; a step (b) of forming at least two kinds of porous pores with mixing the mixture with at least two of inert gas, a capsule type foaming agent, a chemical foaming agent, and a liquid microelement which are capable of respectively controlling pore sizes; a step (c) of manufacturing the polishing layer (120) having the porous pores with gelling and curing a mixture from the step of forming the porous pores; and a step (d) of processing the polishing layer, and then distributing pores due to opening the porous pores on the surface of the polishing layer.
    • 目的:提供抛光垫及其制造方法,以通过在化学机械平面化/机械抛光(CMP)工艺中收集和使用抛光浆料来最大化抛光性能和平坦化性能。 构成:抛光垫(100)的制造方法包括:形成用于形成研磨层的材料的混合物的工序(a) 将混合物与能够分别控制孔径的惰性气体,胶囊型发泡剂,化学发泡剂和液体微量元素中的至少两种混合形成至少两种多孔孔的步骤(b) 制造具有多孔孔的抛光层(120)的步骤(c),其从形成多孔孔的步骤凝胶化和固化混合物; 以及处理抛光层的步骤(d),然后由于在抛光层的表面上打开多孔孔而分配孔。
    • 9. 发明公开
    • 연마패드 및 그 제조방법
    • 抛光垫及其制造方法
    • KR1020130130893A
    • 2013-12-03
    • KR1020120054523
    • 2012-05-23
    • 케이피엑스케미칼 주식회사삼성전자주식회사
    • 안봉수장영준정진수이상목송기천김승근서장원추정선강학수공경표
    • B24D11/00B24D3/16
    • B24B37/24B24B37/26B24D11/001B24D11/003B24D18/00
    • The present invention relates to a polishing pad and a method of manufacturing the same. The polishing pad manufacturing method according to the present invention mixes polishing layer forming materials and solidifies the layer by a chemical reaction, comprising the following steps of: pulverizing organic materials in a physical method and forming the organic materials as fine organic particles; mixing the fine organic particles formed in the previous step with the polishing layer forming materials; forming vapor pores by mixing the mixture with at least one among an inert gas, which can control the size of the pores, a capsule type foaming agent, and a chemical foaming agent; manufacturing a polishing layer by gelatinizing and hardening the mixture generated through the previous steps; and distributing the pores by processing the polishing layer and opening the vapor pours on the surface.
    • 抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。 根据本发明的抛光垫制造方法将抛光层形成材料混合并通过化学反应固化该层,包括以下步骤:以物理方法粉碎有机材料并形成有机材料作为有机微粒; 将上一步形成的微细有机颗粒与抛光层形成材料混合; 通过将混合物与能够控制孔的大小的惰性气体,胶囊型发泡剂和化学发泡剂中的至少一种混合来形成蒸气孔; 通过使通过前述步骤产生的混合物凝胶化和硬化来制造抛光层; 并通过处理抛光层并在表面上打开蒸汽倾倒来分配孔。