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1. 发明专利

JP2011011183A Activated gas generator and remote plasma coating device 有权
标题翻译：激活气体发生器和远程等离子体涂层设备
公开(公告)号：JP2011011183A
公开(公告)日：2011-01-20
申请号：JP2009159642
申请日：2009-07-06
申请人： Mitsubishi Electric Corp , Toshiba Mitsubishi-Electric Industrial System Corp , 三菱電機株式会社 , 東芝三菱電機産業システム株式会社
发明人： TABATA YOICHIRO , WATANABE KENSHI , YOSHIDA AKIO , OINUMA MANABU , INANAGA YASUTAKA
IPC分类号： B01J19/08 , H01L21/31 , H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide an activated gas generator which can completely eliminate damage to be inflicted to a material to be treated and efficiently extract activated gas under a simple structure.SOLUTION: This activated gas generator 700 comprises at least, not less than one electrode cell 1 and 2, a power supply part for applying alternating current to the electrode cells 1 and 2, enclosures 16 and 161 surrounding the electrode cells 1 and 2, and a feedstock gas supply part 20 for supplying a feedstock gas into the enclosures 16 and 161 from outside. In addition, the electrode cells 1 and 2 are equipped with a first electrode 1 and a second electrode 2 with a dielectric respectively. Further, the first electrode 1 stands opposite to the second electrode 2 across the dielectric and a space gap (discharge space) 100. A gas extraction part 1d is formed in the center region of the electrode cells 1 and 2 viewed from above.
摘要翻译：要解决的问题：提供一种活性气体发生器，其可以完全消除对被处理材料造成的损害并且在简单的结构下有效地提取活性气体。解决方案：该活化气体发生器700包括至少不少于一个电极单元1和2，用于向电极单元1和2施加交流电的电源部分，围绕电极单元1和2的外壳16和161以及用于将原料气体供应到外壳16中的原料气体供应部件20 和161从外面。此外，电极单元1和2分别配备有第一电极1和具有电介质的第二电极2。此外，第一电极1跨过电介质和空间间隙（放电空间）100与第二电极2相对。在从上方观察的电极单元1和2的中心区域中形成气体提取部分1d。

2. 发明专利

JP2013004474A Plasma generator and cvd device 有权
标题翻译：等离子体发生器和CVD装置
公开(公告)号：JP2013004474A
公开(公告)日：2013-01-07
申请号：JP2011137661
申请日：2011-06-21
申请人： Toshiba Mitsubishi-Electric Industrial System Corp , 東芝三菱電機産業システム株式会社 , Mitsubishi Electric Corp , 三菱電機株式会社
发明人： TABATA YOICHIRO , WATANABE KENSHI , OINUMA MANABU , INANAGA YASUTAKA
IPC分类号： H05H1/24 , C23C16/503 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To provide a plasma generator of a simple configuration capable of efficiently taking out generated plasma excitation gas.SOLUTION: A plasma generator comprises an electrode cell, a power supply 17 which applies an AC voltage to the electrode cell, a housing which surrounds the electrode cell, and a material gas supply section which supplies a material gas from the outside of the housing to the outer periphery of the electrode cell. The electrode cell includes a low voltage electrode 1, a high voltage electrode 3, and dielectrics 2a, 2b, has a dielectric barrier discharge space 6, and is a doughnut shape with a penetration hole PH. The plasma generator further comprises an insulation cylinder 21 disposed in the penetration hole PH and having a jet hole 21x in a cylindrical side surface, and a pressure reduction unit which reduces the pressure in the cavity 21A of the insulation cylinder 21.
摘要翻译：要解决的问题：提供能够有效地取出产生的等离子体激发气体的简单配置的等离子体发生器。解决方案：等离子体发生器包括电极单元，向电极单元施加AC电压的电源17，围绕电极单元的壳体和从外部供应材料气体的材料气体供应部分壳体到电极单元的外周。电极单元包括低电压电极1，高电压电极3和电介质2a，2b，具有介质阻挡放电空间6，并且是具有穿透孔PH的环形形状。等离子体发生器还包括设置在穿透孔PH中并且具有在圆柱形侧表面中的喷射孔21x的绝缘筒21和减小绝缘筒21的空腔21A中的压力的减压单元。（C）2013，JPO＆INPIT

3. 发明专利

JP2010272355A Apparatus for generating active particle 有权
标题翻译：用于生成活性颗粒的装置
公开(公告)号：JP2010272355A
公开(公告)日：2010-12-02
申请号：JP2009123251
申请日：2009-05-21
申请人： Mitsubishi Electric Corp , Toshiba Mitsubishi-Electric Industrial System Corp , 三菱電機株式会社 , 東芝三菱電機産業システム株式会社
发明人： OINUMA MANABU , INANAGA YASUTAKA , TANIMURA YASUHIRO , KUZUMOTO MASAKI , WATANABE KENSHI
IPC分类号： H05H1/24 , B01J19/08 , B08B7/00 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for generating an active particle by which the generation density and generation efficiency of the active particle having a predetermined service life shorter than a life of ozone can be improved.
SOLUTION: The apparatus for generating the active particle applies a high voltage between a ground electrode 1 and a high voltage electrode 2 which is opposite to the ground electrode 1 via an air gap and of which the surface on the air gap side is covered with a dielectric 4 to generate dielectric barrier discharge therebetween, and supplies a raw material gas 8 to the air gap to generate the active particle by the dielectric barrier discharge. A value obtained by dividing the service life of the active particle by the average time when the raw material gas 8 stays in the air gap is not smaller than 0.1 or not larger 10, and discharge power supplied to a unit area of the ground electrode 1 and the high voltage electrode 2 is increased from an upstream side of the raw material gas flow toward a downstream side thereof.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种生成活性粒子的装置，通过该装置可以提高具有比臭氧寿命短的预定寿命的活性粒子的发生密度和发电效率。解决方案：用于产生有源粒子的装置经由气隙在接地电极1和与接地电极1相对的高压电极2之间施加高电压，其中气隙侧的表面为覆盖有电介质4以在其间产生电介质阻挡放电，并且将原料气体8供应到气隙，以通过电介质阻挡放电产生活性粒子。通过将活性粒子的使用寿命除以原料气体8停留在气隙中的平均时间而得到的值为0.1以上10以上，供给到接地电极1的单位面积的放电电力并且高压电极2从原料气流的上游侧向其下游侧增加。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2010232280A Manufacturing method of semiconductor device and oxidation treatment device 有权
标题翻译：半导体器件和氧化处理器件的制造方法
公开(公告)号：JP2010232280A
公开(公告)日：2010-10-14
申请号：JP2009076054
申请日：2009-03-26
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： KAWASE KAZUMASA , OINUMA MANABU , MIURA NARIHISA
IPC分类号： H01L21/31 , H01L21/316
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device, along with an oxidation treatment device, capable of suppressing degradation of performance due to substrate damage during oxide film formation. SOLUTION: A substrate 6a, which includes one surface, is prepared. Oxidation treatment is performed on one surface. At oxidation treatment, low-temperature thermal decomposition of O3 gas introduced generates O( 3 P) radicals. The O( 3 P) radicals are irradiated and excited, with a reddish orange light emitted from a light source 4a, to generate O( 1 D) radical. An oxide film is formed on one surface of the substrate 6a by O( 1 D) radical, at a low temperature, without damages. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供能够抑制氧化膜形成期间由于基板损伤导致的性能劣化的半导体装置的制造方法以及氧化处理装置。
解决方案：制备包括一个表面的基板6a。在一个表面进行氧化处理。在氧化处理时，引入的O 3气体的低温热分解会产生O（ 3 P）自由基。用从光源4a发出的红橙色光照射和激发O（ 3 P）基团，以产生O（SP）1 / SP> D）基团。在低温下，通过O（SP> 1 SP）基团在基板6a的一个表面上形成氧化膜，而不损坏。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2014154248A Plasma processing device 有权
标题翻译：等离子体加工装置
公开(公告)号：JP2014154248A
公开(公告)日：2014-08-25
申请号：JP2013020492
申请日：2013-02-05
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： OINUMA MANABU , NAKAMURA YASUHIRO , INANAGA YASUTAKA
IPC分类号： H05H1/24
摘要： PROBLEM TO BE SOLVED: To provide a plasma processing device capable of efficiently processing a surface of a processed body.SOLUTION: A plasma processing device includes a ground electrode 2; and a high-pressure electrode 3 which is disposed so as to oppose to the ground electrode 2 through a cavity 7, and has a conductive layer. By supplying discharging gas into the cavity 7 and applying high voltage on the high-pressure electrode 3, discharge is generated near atmospheric pressure in the cavity 7. The discharging gas including atomic oxygen generated by the discharge is jetted out from slits 11a and 11b formed on the ground electrode 2, and the atomic oxygen is contacted with a honeycombs structure 13, thereby processing a surface of the honeycombs structure 13. One pair of the slits 11a and 11b is oriented so as to make the discharging gas intersect each other between the ground electrode 2 and the honeycomb structure 13.
摘要翻译：要解决的问题：提供能够有效地处理加工体的表面的等离子体处理装置。解决方案：等离子体处理装置包括接地电极2; 以及高压电极3，其通过空腔7配置成与接地电极2相对，并且具有导电层。通过向空腔7内供给排出气体并在高压电极3上施加高电压，在空腔7附近大气压附近产生放电。包括由放电产生的原子氧的放电气体从形成的狭缝11a和11b喷出在接地电极2上，并且原子氧与蜂窝结构13接触，从而处理蜂窝结构13的表面。一对狭缝11a和11b被定向成使排出气体彼此相交接地电极2和蜂窝结构体13。

6. 发明专利

JP2013004405A Surface treatment apparatus and surface treatment method 有权
标题翻译：表面处理装置和表面处理方法
公开(公告)号：JP2013004405A
公开(公告)日：2013-01-07
申请号：JP2011136348
申请日：2011-06-20
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： INANAGA YASUTAKA , OINUMA MANABU , TANIMURA YASUHIRO , NAKAMURA YASUHIRO
IPC分类号： H05H1/24 , B08B7/00 , C23C16/505
摘要： PROBLEM TO BE SOLVED: To achieve a surface treatment with high energy efficiency by allowing a short-life radical generated by discharge to be ejected toward a workpiece before the radical is subject to attenuation.SOLUTION: A discharge is generated between a conductive electrode 6 having a fine through hole 15 and a high-voltage conductor 11 coated with a dielectric coating 12. The high-voltage conductor 11 is displaced toward an upstream side in a gas velocity direction in the vicinity of the fine through hole 15. Thereby, discharge regions 40 correspond to the position of the high-voltage conductor 11, and are limited to the upstream side in the gas velocity direction in the vicinity of the fine through hole 15. Thus, a surface treatment of a workpiece (not shown) is performed by efficiently extracting active particles generated by the discharge by allowing the active particles to join a gas flow before they are subject to attenuation, and by ejecting the active particles from an outlet of the fine through hole 15 toward the workpiece placed oppositely to the outlet.
摘要翻译：要解决的问题：通过在自由基被衰减之前通过允许通过排出产生的短寿命的自由基朝向工件喷射来实现具有高能量效率的表面处理。解决方案：在具有细通孔15的导电电极6和涂覆有电介质涂层12的高压导体11之间产生放电。高电压导体11以气体速度向上游侧位移由此，放电区域40对应于高压导体11的位置，并被限制在细通孔15附近的气体速度方向的上游侧。因此，工件（未图示）的表面处理通过有效地提取由放电产生的活性粒子，通过使活性粒子在经受衰减之前接合气体流动，并且将活性粒子从细孔15朝向与出口相对设置的工件。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2009066502A Discharge electrode and air cleaning apparatus using the same 审中-公开
标题翻译：放电电极和空气清洁装置使用它
公开(公告)号：JP2009066502A
公开(公告)日：2009-04-02
申请号：JP2007236540
申请日：2007-09-12
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： INANAGA YASUTAKA , OINUMA MANABU , NAKAI TAKAFUMI
IPC分类号： B01D53/44 , B01D53/81 , B01J19/08
CPC分类号： Y02A50/235
摘要： PROBLEM TO BE SOLVED: To provide a discharge electrode preventing uneven discharge due to the influence of moisture adsorbed in an adsorption material and causing no lowering of decomposition performance, and an air cleaning apparatus using the same. SOLUTION: In the discharge electrode 1, tubular high voltage electrodes 3 are concentrically disposed in the tube of a tubular grounding electrode 2 with given intervals, a tubular dielectric 4 is disposed in the high voltage electrode 3 side so as to cover the high voltage electrodes 3, both end faces of the grounding electrode 2 and high voltage electrodes 3 are shielded with an insulation plate 5, the adsorption material 6 is filled in the space formed by the grounding electrode 2, high voltage electrodes 3 and insulation plate 5. The introduction port 7 of treating object gas is provided to the side face of the grounding electrode 2, and a gas distributor 8 is attached, and the discharge port 9 of the treated gas is provided to the opposite face of the introduction port 7. This configuration actualizes the stable discharge and efficient treatment of volatile organic compounds. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种防止由吸附材料吸附的水分的影响引起的不均匀放电并且不会降低分解性能的放电电极，以及使用该放电电极的空气净化装置。解决方案：在放电电极1中，管状高压电极3以给定的间隔同心地设置在管状接地电极2的管中，管状电介质4设置在高压电极3侧，以覆盖高压电极3，接地电极2的两端面和高压电极3被绝缘板5屏蔽，吸附材料6填充在由接地电极2，高压电极3和绝缘板5形成的空间中处理对象气体的引入口7设置在接地电极2的侧面，并且安装有气体分配器8，并且处理气体的排出口9设置在引入口7的相对面上。该配置实现了挥发性有机化合物的稳定排放和有效处理。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2015032486A プラズマ処理装置、プラズマ処理方法、接着方法および複合構造体有权
标题翻译：等离子体加工设备，等离子体处理方法，接合方法和复合结构
公开(公告)号：JP2015032486A
公开(公告)日：2015-02-16
申请号：JP2013161776
申请日：2013-08-02
申请人：三菱電機株式会社 , Mitsubishi Electric Corp
发明人： OINUMA MANABU , NAKAMURA YASUHIRO , INANAGA YASUTAKA
IPC分类号： H05H1/24 , B08B7/00
摘要：【課題】表面処理性能の低下および表面処理の不均一化を抑制するとともに、ランニングコストを低減させることができるプラズマ処理装置を得る。【解決手段】処理体1に対する大気圧プラズマユニット2の移動方向についてスリット211よりも前方に設けられた吐出口411、この移動方向についてスリット211よりも後方に設けられた吸引口412および吐出口411と吸引口412とを連通する還流風路413が形成された還流配管41と、吸引口412から還流風路413に放電ガスが吸引され、吸引された放電ガスが吐出口411から放電ガスが吐出されるように還流風路413に放電ガスの流れを発生させるファン42とを備えている。【選択図】図1
摘要翻译：要解决的问题：为了获得在降低运行成本的同时降低表面处理性能和不均匀表面处理的劣化的等离子体处理装置。解决方案：等离子体处理装置包括再循环管道41，其中提供排出口411 在处理体1的大气压等离子体单元2的移动方向上的狭缝211的前方，设置在狭缝211的移动方向的后方的吸入口412和将排出口411 形成吸入口412，以及用于在再循环空气导管413中产生排出气体流的风扇42，使得排出气体从吸入口412被吸入空气导管413，从排出口411排出。

9. 发明专利

JP2014228127A ガス回収再充填システム审中-公开
标题翻译：气体回收再充电系统
公开(公告)号：JP2014228127A
公开(公告)日：2014-12-08
申请号：JP2013110887
申请日：2013-05-27
申请人：三菱電機株式会社 , Mitsubishi Electric Corp
发明人： CHIKAISHI MASAHIRO , WADA NOBORU , OINUMA MANABU , INANAGA YASUTAKA
IPC分类号： F17C5/02 , F17C13/00
摘要：【課題】対象タンクから回収したSF6のうち、再充填できずに残るSF6の割合を低減することが可能なガス回収再充填システムを提供する。【解決手段】対象タンク(1)内のガスを分離濃縮する分離装置(2)と、分離装置で分離濃縮されたガスを液化する液化部(5)と、液化部に直結された気液分離器(6)と、気液分離器で分離された気相流体を回収する気相回収容器(7)と、気液分離器で分離された液相流体を回収する液相回収容器(8)と、気相回収容器に回収された気相流体と液相回収容器に回収された液相流体を対象タンクに還流することで再充填する制御部(20)とを備える。【選択図】図1
摘要翻译：要解决的问题：提供一种气体回收再充电系统，其能够降低SF6的速率，而不从目标罐回收的SF6中用SF6对目标罐进行再充电。解决方案：气体回收再充电系统包括：分离装置（2）在目标罐（1）中分离和冷凝气体; 液化单元（5），液化由分离装置（2）分离和冷凝的气体; 直接连接到液化单元（5）的气液分离器（6）; 回收由气液分离器（6）分离的气相流体的气相回收容器（7）; 回收由气液分离器（6）分离的液相流体的液相回收容器（8）; 以及将由气相回收容器（7）回收的气相流体和由液相回收容器（8）回收的液相流体回流到目标罐（1）的控制器（20），由此用气体对目标罐（1）进行再充电。

10. 发明专利

JP2013145719A Plasma processing apparatus and plasma processing method 有权
标题翻译：等离子体加工设备和等离子体处理方法
公开(公告)号：JP2013145719A
公开(公告)日：2013-07-25
申请号：JP2012006409
申请日：2012-01-16
申请人： Mitsubishi Electric Corp , 三菱電機株式会社
发明人： NAKAMURA YASUHIRO , OINUMA MANABU , INANAGA YASUTAKA , KAMIYAMA YUKITSUGU , SAWAI AKIYOSHI
IPC分类号： H05H1/24 , C23C16/509
摘要： PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which achieves processing to various objects having different shapes and dimensions by conducting easy operations without remaking an entire apparatus, which may be applied to a special shape such as a cylindrical inner surface.SOLUTION: A plasma processing apparatus includes: an internal electrode 3; an external electrode 1 which is disposed so as to cover an outer periphery of the internal electrode; and a support medium 110. An electric discharge gap 9 is formed between the internal electrode and the external electrode. A jet port 7 used for radiating plasma to a processed body is formed at the external electrode. The support medium has an internal conductor 4, an external conductor 2, and an insulator 5. The internal electrode is supported by the internal conductor maintaining electrical conduction with the internal conductor. The external electrode is supported by the external conductor maintaining electrical conduction with the external conductor.
摘要翻译：要解决的问题：提供一种等离子体处理装置，其通过进行容易的操作来实现对具有不同形状和尺寸的各种物体的加工，而不会重新制造可以应用于诸如圆柱形内表面的特殊形状的整个装置。解决方案：A 等离子体处理装置包括：内部电极3; 外部电极1，其设置成覆盖内部电极的外周; 和支撑介质110.在内部电极和外部电极之间形成放电间隙9。在外部电极上形成用于将等离子体发射到加工体的喷射口7。支撑介质具有内部导体4，外部导体2和绝缘体5.内部电极由内部导体支撑，保持与内部导体的导电。外部电极由外部导体支撑，保持与外部导体的导通。

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