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1. 发明专利

JP2014008692A Method of manufacturing polishing pad molding die, polishing pad molding die manufactured by the same method, and polishing pad manufactured by the same die 有权
标题翻译：制造抛光板模具的方法，由相同方法制造的抛光垫模具和由相同模具制造的抛光垫
公开(公告)号：JP2014008692A
公开(公告)日：2014-01-20
申请号：JP2012147422
申请日：2012-06-29
申请人： Mishima Kosan Co Ltd , 三島光産株式会社 , Kyushu Institute Of Technology , 国立大学法人九州工業大学
发明人： TASHIRO YASUNORI , TAKADA MASATO , NAKA TOSHIAKI , MATSUO MASAAKI , ITO TAKAHIRO , SUZUKI YOSHITOMO , KIMURA KEIICHI , KHAJORNRUNGRUANG PANART
IPC分类号： B29C33/38 , B24B37/26 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a polishing pad molding die in which a polishing pad that performs a flattening work highly accurately and highly efficiently is manufactured, a polishing pad molding die manufactured by the method, and a polishing pad manufactured by the die.SOLUTION: A method of manufacturing a polishing pad molding die 10 for a polishing pad 13 on which a micro pattern A having fine protrusions 12 arranged thereon has: a positive die fabrication process of forming fine reaction protrusions having the same dimensions as the fine protrusions 12 in accordance with arrangement of the fine protrusions 12 on one surface side of a substrate to fabricate a positive die having a micro pattern B on which the fine reaction protrusions are arrayed; a negative die fabrication process of fabricating a negative die on which a micro pattern C, in which fine recesses having the same dimensions as the fine reaction protrusions and an inverted concavo-convex relationship are arrayed, is formed, from the positive die at a position corresponding to the fine reaction protrusions; and an assembly process of closely arranging the negative die 18 on a base 17 while setting the surface on which the micro pattern C is formed to a front side to fabricate the polishing pad molding die 10.
摘要翻译：要解决的问题：提供一种制造抛光垫成型模具的方法，其中制造高精度高效地进行压平加工的抛光垫，通过该方法制造的抛光垫成型模具和由该方法制造的抛光垫，该抛光垫成型模具10用于抛光垫13，在其上具有布置有微细突起12的微图案A具有：正模制造工艺，其形成具有相同尺寸的精细反应突起根据在基板的一个表面侧上的细微突起12的布置的细突起12，以制造具有微细图案B的正模具，精细反应突起排列在其上; 制造负模具的负模制造工艺，在其上排列具有与微细反应突起具有相同尺寸的微细凹槽和倒置凹凸关系的微图案C，其中，从正模具在位置对应于微细反应突起; 以及将负模具18紧密地布置在基座17上，同时将形成有微图案C的表面设置在前侧以制造抛光垫成型模具10的组装过程。

2. 发明专利

JP2014008693A Method of manufacturing polishing pad molding die, polishing pad molding die manufactured by the same method, and polishing pad manufactured by the same die 有权
标题翻译：制造抛光板模具的方法，由相同方法制造的抛光垫模具和由相同模具制造的抛光垫
公开(公告)号：JP2014008693A
公开(公告)日：2014-01-20
申请号：JP2012147442
申请日：2012-06-29
申请人： Mishima Kosan Co Ltd , 三島光産株式会社 , Kyushu Institute Of Technology , 国立大学法人九州工業大学
发明人： TASHIRO YASUNORI , TAKADA MASATO , NAKA TOSHIAKI , MATSUO MASAAKI , ITO TAKAHIRO , SUZUKI YOSHITOMO , KIMURA KEIICHI , KHAJORNRUNGRUANG PANART
IPC分类号： B29C33/38 , B24B37/26 , C23F1/00 , C25D1/00 , C25D1/10 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a polishing pad molding die in which a polishing pad that performs a flattening work highly accurately and highly efficiently is manufactured, a polishing pad molding die manufactured by the method, and a polishing pad manufactured by the die.SOLUTION: A method of manufacturing a polishing pad molding die 10 for a polishing pad 13 on which a micro pattern α having fine protrusions 12 arranged thereon has: a master die fabrication process of fabricating a master die 26, on which a micro pattern β having an inverted concavo-convex relationship with the micro pattern α is formed, on one side of a substrate 21; a positive slave die fabrication process of fabricating a positive slave die 27, on the surface layer of which a micro pattern γ is formed, by using the master die 26; a negative slave die fabrication process of fabricating a negative slave die 18, on the surface layer of which a micro pattern δ is formed, by using the positive slave die 27; and an assembly process of arraying and fixing the negative slave die 18 on a base 17 while facing the surface layer on which the micro pattern δ is formed upward to constitute the polishing pad molding die 10.
摘要翻译：要解决的问题：提供一种制造抛光垫成型模具的方法，其中制造高精度，高效率地进行压平加工的抛光垫，通过该方法制造的抛光垫成型模具和由该方法制造的抛光垫，该模具制造用于抛光垫13的抛光垫成型模具10，其上具有布置在其上的具有细突起12的微图案α具有：制造主模具26的主模制造工艺，模式＆bgr 在基板21的一侧形成与微图案α具有倒置的凹凸关系; 通过使用主模26，在其形成有微图案γ的表面层上制造正的从模具27的正的从模制造工艺; 通过使用正的从模具27，在其形成微图案δ的表面层上制造负的从属裸片18的负的从属裸片制造工艺; 以及将负型副模具18排列并固定在基座17上同时朝向其上形成微图案δ的表面层构成抛光垫成型模具10的组装工艺。

3. 发明专利

JP2015013325A 精密研磨方法有权
标题翻译：精密抛光方法
公开(公告)号：JP2015013325A
公开(公告)日：2015-01-22
申请号：JP2013139863
申请日：2013-07-03
申请人：三島光産株式会社 , Mishima Kosan Co Ltd , 国立大学法人九州工業大学 , Kyushu Institute Of Technology
发明人： NAKA TOSHIAKI , TASHIRO YASUNORI , ONIKI TAKAHIRO , TAKADA MASATO , SUZUKI YOSHITOMO , ITO TAKAHIRO , KHAJORNRUNGRUANG PANART
IPC分类号： B24B37/24 , B24B37/00 , H01L21/304
CPC分类号： B24B37/26 , C09G1/00
摘要：【課題】半導体基板等の平坦性が高度に要求される部材の平坦加工を安定して、かつ高効率に行うことが可能な精密研磨方法及び研磨機を提供する。【解決手段】研磨パッド10を上面に取付けた研磨定盤11を回転させ、研磨パッド10の表面に水酸化フラーレン又は水酸化フラーレン会合体が分散した研磨スラリー12を滴下しながら、被加工物14の被研磨面を研磨パッド10の表面に押圧して被研磨面の研磨を行う精密研磨方法において、研磨パッド10の表面に、高さHが0.1〜20μmの微細突起15が、隣り合う微細突起15の頂部の間隔Dを1.1〜60μm、隣り合う微細突起15の底部間の間隔Gを1〜50μmとして分散配置されたマイクロパターンを形成する。【選択図】図1
摘要翻译：要解决的问题：为了提供精密抛光方法和抛光机，能够使需要平坦度的半导体基板等构件能够进行稳定高效的平坦化处理。解决方案：在精密抛光方法中，具有抛光的研磨面板11 旋转安装在上表面的垫10，在抛光垫10的表面上滴下羟基化富勒烯或羟基化富勒烯缔合物的分散在其上的研磨浆料12，将工件14的被研磨面按压抛光垫10的表面以抛光待抛光的表面。在抛光垫10的表面上形成微型图案，其中高度H为0.1-20μm的微型突起15被分散和布置，间隔D为1.1-60μm，相邻的微型突起15的顶部被定义为相邻的微型突起15的底部之间的间隔G定义为1-50μm。

4. 发明专利

JP2014136262A Three-dimensional micromechanical element including a functional thin film and a method of forming the film 审中-公开
标题翻译：三维微电子元件，包括功能薄膜和形成薄膜的方法
公开(公告)号：JP2014136262A
公开(公告)日：2014-07-28
申请号：JP2013004393
申请日：2013-01-15
申请人： Kyushu Institute Of Technology , 国立大学法人九州工業大学
发明人： MURAKAMI SUNAO , ITO TAKAHIRO
IPC分类号： B81B7/02 , B81C1/00
摘要： PROBLEM TO BE SOLVED: To make it possible to produce two or more functional thin films having no overlap regions on the surface of a movable structure portion of a three-dimensional microstructure in a desired shape and a desired pattern according to an intended purpose using a general-purpose solution applicator.SOLUTION: A groove structure pattern 11 surrounding at least a part of micro-regions 12 in which thin films are to be formed is produced on a surface of a three-dimensional microstructure 10 including a movable structure portion in advance. A solution containing a material to become the thin films is applied and extended to outer edges of the three-dimensional microstructure 10 and into each of the micro-regions 12 surrounded by the groove structure pattern 11, and a solvent of the solution is evaporated, thereby making it possible to produce functional thin films 13 such as gas sensitive films only in the micro-regions 12. This method uses a mechanism in which the regions over which the solution spreads is restricted inside the micro-regions 12 since an outer edge of a liquid droplet of the applied solution can have a larger contact angle on edges of the groove structure pattern 11 than on a flat surface thereof by as much as a groove bending angle.
摘要翻译：要解决的问题：为了可以根据预期目的在使用期望的形状的三维微结构的可移动结构部分的表面上产生两个或更多个不具有重叠区域的功能薄膜和期望的图案，使用通用溶液涂布器。解决方案：在预先包括可移动结构部分的三维微结构10的表面上产生围绕要在其中形成薄膜的微区12的至少一部分的凹槽结构图案11 。将包含成为薄膜的材料的溶液施加并延伸到三维微结构10的外边缘并且被凹槽结构图案11包围的每个微区域12中，溶液的溶剂蒸发，从而使得可以仅在微区域12中产生诸如气体敏感膜的功能性薄膜13.该方法使用这样的机构，其中溶液扩散的区域被限制在微区域12内，因为外部边缘所施加的溶液的液滴可以在槽结构图案11的边缘上具有比其平坦表面上更大的沟槽弯曲角度的更大的接触角。

5. 发明专利

JP2011098130A Method of manufacturing microneedle for transdermal drug delivery 审中-公开
标题翻译：制造用于转管药物递送的微生物的方法
公开(公告)号：JP2011098130A
公开(公告)日：2011-05-19
申请号：JP2009255659
申请日：2009-11-09
申请人： Kyushu Institute Of Technology , 国立大学法人九州工業大学
发明人： ITO TAKAHIRO , BABA AKIYOSHI , SHIGETOME YU , TANIGUCHI YUTAKA , ISHIMORI SHOHEI
IPC分类号： A61M37/00 , B81C1/00
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing microneedles for transdermal drug delivery for obtaining microneedles for transdermal drug delivery by dry-etching by using a biodegradable material as an article to be processed. SOLUTION: A polylactic acid film 12 is formed on an Si wafer 10 (STEP1). An Al film 14 is formed on the polylactic acid film 12 (STEP2). A processed mask 20 which is patterned by processing the Al film 14 is obtained (STEP5). The microneedle 22 is obtained by processing the polylactic acid film 12 by dry-etching (STEP6). COPYRIGHT: (C)2011,JPO&INPIT

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