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1. 发明授权

US08276291B2 Systems and methods for drying a rotating substrate 有权
标题翻译：用于干燥旋转底物的系统和方法
公开(公告)号：US08276291B2
公开(公告)日：2012-10-02
申请号：US13296760
申请日：2011-11-15
申请人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
发明人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
IPC分类号： F26B11/02
CPC分类号： H01L21/67034 , C11D11/0041 , C11D11/0047 , C11D11/0064 , H01L21/67028 , H01L21/67051 , Y10T428/24802 , Y10T428/28
摘要： A method of drying a surface of a substrate is provided. The method includes supporting a substrate; rotating the substrate about a rotational center point; applying a liquid to the substrate via a liquid dispenser; applying a drying fluid to the substrate via a drying fluid dispenser; moving the drying fluid dispenser and the liquid dispenser in a direction toward an edge region of the substrate, the drying fluid being applied closer to the rotational center point than the fluid; upon the liquid being applied to the edge region of the substrate, discontinuing application of the liquid while continuing the manipulation of the drying fluid dispenser; and upon the drying fluid being applied to the edge region of the substrate, continuing to apply the drying fluid for a predetermined period of time.
摘要翻译：提供了干燥基材表面的方法。该方法包括支撑基板; 围绕旋转中心点旋转基底; 通过液体分配器将液体施加到基底; 通过干燥流体分配器将干燥流体施加到基底; 使干燥流体分配器和液体分配器朝向基板的边缘区域的方向移动，干燥流体被施加到比流体更接近旋转中心点; 当液体被施加到基板的边缘区域时，在继续对干燥流体分配器进行操作的同时停止施加液体; 并且在干燥流体被施加到基板的边缘区域上时，继续将干燥流体施加预定时间段。

2. 发明申请

US20120061806A1 SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE 有权
标题翻译：用于干燥旋转基板的系统和方法
公开(公告)号：US20120061806A1
公开(公告)日：2012-03-15
申请号：US13296760
申请日：2011-11-15
申请人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
发明人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
IPC分类号： H01L21/306 , H01L29/30
CPC分类号： H01L21/67034 , C11D11/0041 , C11D11/0047 , C11D11/0064 , H01L21/67028 , H01L21/67051 , Y10T428/24802 , Y10T428/28
摘要： A method of drying a surface of a substrate is provided. The method includes supporting a substrate; rotating the substrate about a rotational center point; applying a liquid to the substrate via a liquid dispenser; applying a drying fluid to the substrate via a drying fluid dispenser; moving the drying fluid dispenser and the liquid dispenser in a direction toward an edge region of the substrate, the drying fluid being applied closer to the rotational center point than the fluid; upon the liquid being applied to the edge region of the substrate, discontinuing application of the liquid while continuing the manipulation of the drying fluid dispenser; and upon the drying fluid being applied to the edge region of the substrate, continuing to apply the drying fluid for a predetermined period of time.
摘要翻译：提供了干燥基材表面的方法。该方法包括支撑基板; 围绕旋转中心点旋转基底; 通过液体分配器将液体施加到基底; 通过干燥流体分配器将干燥流体施加到基底; 使干燥流体分配器和液体分配器朝向基板的边缘区域的方向移动，干燥流体被施加到比流体更接近旋转中心点; 当液体被施加到基板的边缘区域时，在继续对干燥流体分配器进行操作的同时停止施加液体; 并且在干燥流体被施加到基板的边缘区域上时，继续将干燥流体施加预定时间段。

3. 发明授权

US08056253B2 Systems and methods for drying a rotating substrate 有权
标题翻译：用于干燥旋转底物的系统和方法
公开(公告)号：US08056253B2
公开(公告)日：2011-11-15
申请号：US12685935
申请日：2010-01-12
申请人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
发明人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
IPC分类号： F26B19/00
CPC分类号： H01L21/67034 , C11D11/0041 , C11D11/0047 , C11D11/0064 , H01L21/67028 , H01L21/67051 , Y10T428/24802 , Y10T428/28
摘要： A system of drying a surface of a substrate is provided. The system includes a rotary support for supporting a substrate; and an assembly comprising a first dispenser, a second dispenser, and a third dispenser, the assembly positioned above the surface of the substrate, the second and third dispensers positioned on the assembly adjacent to and in contact with one another and spaced from the first dispenser, the second dispenser having an opening that is larger than an opening of the third dispenser, and the second dispenser being located between the first and third dispensers; and means for translating the assembly generally parallel to the surface of the substrate.
摘要翻译：提供了干燥基板表面的系统。该系统包括用于支撑衬底的旋转支撑件; 以及包括第一分配器，第二分配器和第三分配器的组件，所述组件位于所述基板的表面上方，所述第二和第三分配器位于所述组件上，所述第二分配器和所述第三分配器彼此相邻并且彼此接触并与所述第一分配器间隔开所述第二分配器具有大于所述第三分配器的开口的开口，并且所述第二分配器位于所述第一和第三分配器之间; 以及用于平行于基底表面平移的组件的平移装置。

4. 发明申请

US20100293806A1 SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE 有权
标题翻译：用于干燥旋转基板的系统和方法
公开(公告)号：US20100293806A1
公开(公告)日：2010-11-25
申请号：US12685935
申请日：2010-01-12
申请人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
发明人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
IPC分类号： F26B25/00
CPC分类号： H01L21/67034 , C11D11/0041 , C11D11/0047 , C11D11/0064 , H01L21/67028 , H01L21/67051 , Y10T428/24802 , Y10T428/28
摘要： A system of drying a surface of a substrate is provided. The system includes a rotary support for supporting a substrate; and an assembly comprising a first dispenser, a second dispenser, and a third dispenser, the assembly positioned above the surface of the substrate, the second and third dispensers positioned on the assembly adjacent to and in contact with one another and spaced from the first dispenser, the second dispenser having an opening that is larger than an opening of the third dispenser, and the second dispenser being located between the first and third dispensers; and means for translating the assembly generally parallel to the surface of the substrate.
摘要翻译：提供了干燥基板表面的系统。该系统包括用于支撑衬底的旋转支撑件; 以及包括第一分配器，第二分配器和第三分配器的组件，所述组件位于所述基板的表面上方，所述第二和第三分配器位于所述组件上，所述第二分配器和所述第三分配器彼此相邻并且彼此接触并与所述第一分配器间隔开所述第二分配器具有大于所述第三分配器的开口的开口，并且所述第二分配器位于所述第一和第三分配器之间; 以及用于平行于基底表面平移的组件的平移装置。

5. 发明申请

US20130167393A1 SYSTEMS AND METHODS FOR DRYING A ROTATING SUBSTRATE 有权
标题翻译：用于干燥旋转基板的系统和方法
公开(公告)号：US20130167393A1
公开(公告)日：2013-07-04
申请号：US13633843
申请日：2012-10-02
申请人： Zhi Lewis Liu , Ismail Kashkoush , Hanjoo Lee
发明人： Zhi Lewis Liu , Ismail Kashkoush , Hanjoo Lee
IPC分类号： F26B19/00
CPC分类号： H01L21/67034 , C11D11/0041 , C11D11/0047 , C11D11/0064 , H01L21/67028 , H01L21/67051 , Y10T428/24802 , Y10T428/28
摘要： A system for drying a surface of a substrate is provided. The system for drying a surface of a substrate comprising: a rotary support; a first dispenser fluidly coupled to a source of liquid, the first dispenser positioned above the surface of the substrate so as to be capable of applying a film of the liquid to the surface of the substrate; a second dispenser fluidly coupled to a source of drying fluid with a supply line, the second dispenser positioned above the surface of the substrate so as to be capable of applying the drying fluid to the surface of the substrate; and a proportional valve operably coupled to the supply line between the second dispenser and the source of drying fluid, the proportional valve capable of being incrementally adjusted from a closed position to an open position.
摘要翻译：提供了用于干燥基板表面的系统。用于干燥衬底表面的系统，包括：旋转支撑件; 第一分配器流体地耦合到液体源，第一分配器位于基板的表面上方，以便能够将液体膜施加到基板的表面; 第二分配器，其利用供应管线流体地耦合到干燥流体源，所述第二分配器位于所述基板的表面上方，以便能够将所述干燥流体施加到所述基板的表面; 以及可操作地联接到第二分配器和干燥流体源之间的供应管线的比例阀，该比例阀能够从关闭位置向打开位置递增地调节。

6. 发明授权

US07644512B1 Systems and methods for drying a rotating substrate 有权
标题翻译：用于干燥旋转底物的系统和方法
公开(公告)号：US07644512B1
公开(公告)日：2010-01-12
申请号：US11624445
申请日：2007-01-18
申请人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
发明人： Zhi (Lewis) Liu , Ismail Kashkoush , Hanjoo Lee
IPC分类号： F26B11/02
CPC分类号： H01L21/67034 , C11D11/0041 , C11D11/0047 , C11D11/0064 , H01L21/67028 , H01L21/67051 , Y10T428/24802 , Y10T428/28
摘要： A method of drying a surface of a substrate is provided. The method includes supporting and rotating a substrate; applying a liquid to the substrate surface at or near a rotational center point via a liquid dispenser (so that a film of the liquid is formed on the surface); applying a drying fluid to the substrate surface at a predetermined distance from the rotational center point via one or more drying fluid dispensers; and manipulating the drying fluid dispenser(s) so that the location at which the drying fluid is applied to the substrate is moved in a direction toward the rotational center point, while at the same time manipulating the liquid dispenser so that the location at which the liquid is applied to the substrate is moved in a direction outward from the rotational center point. The liquid dispenser and drying fluid dispenser(s) noted above can be located on and/or within an assembly. The assembly can include a first dispenser, a second dispenser, and a third dispenser. The first dispenser supplies liquid while the second and third dispensers supply drying fluid, where the second dispenser has a larger opening than the third dispenser. The second and third dispensers are positioned on the assembly next to one another and spaced from the first dispenser. Further, the second dispenser is located between the third dispenser and the first dispenser, such that the first dispenser is capable of linearly leading the second and third dispensers during movement.
摘要翻译：提供了干燥基材表面的方法。该方法包括支撑和旋转衬底; 通过液体分配器将液体施加到旋转中心点处或附近的基底表面（从而在表面上形成液体膜）; 通过一个或多个干燥流体分配器将干燥流体施加到距离旋转中心点预定距离的基底表面; 并且操作干燥流体分配器，使得将干燥流体施加到基底的位置沿着朝向旋转中心点的方向移动，同时操纵液体分配器，使得在该位置处液体被施加到基板上，从旋转中心点向外的方向移动。上述液体分配器和干燥流体分配器可以位于组件内和/或组件内。组件可以包括第一分配器，第二分配器和第三分配器。第一分配器供应液体，而第二和第三分配器供应干燥流体，其中第二分配器具有比第三分配器更大的开口。第二和第三分配器彼此相邻定位在组件上并且与第一分配器间隔开。此外，第二分配器位于第三分配器和第一分配器之间，使得第一分配器能够在运动期间线性地引导第二和第三分配器。

7. 发明申请

US20060021634A1 Method and apparatus for creating ozonated process solutions having high ozone concentration 审中-公开
标题翻译：用于产生具有高臭氧浓度的臭氧处理溶液的方法和装置
公开(公告)号：US20060021634A1
公开(公告)日：2006-02-02
申请号：US11177147
申请日：2005-07-08
申请人： Zhi (Lewis) Liu , Richard Novak , Alan Walter , Nick Yialamas
发明人： Zhi (Lewis) Liu , Richard Novak , Alan Walter , Nick Yialamas
IPC分类号： B08B6/00
CPC分类号： B01F3/04503 , B01F3/04985 , B01F5/106 , B01F15/00207 , B01F2003/04886 , C01B13/10 , C02F1/008 , C02F1/78 , C02F2301/046 , C02F2301/066
摘要： A method and system for creating an ozonated process solution, such as ozonated deionized water, having high ozone concentration. The system comprises, a static mixer coupled to a recirculation loop of an auxiliary tank. The system and method are designed so that during the initial feed of process liquid and ozone gas to the system, the process liquid and ozone gas pass through the static mixer prior to ever reaching the auxiliary. The static mixer mixes the ozone gas into the process liquid to form the ozonated process solution. Thus, the auxiliary tank is initially filled with an ozonated process solution. The ozonated process solution can be recirculated from the auxiliary tank and back through the static mixer while additional ozone gas is dissolved therein. This recirculation can be performed until a desired concentration of ozone is detected in the ozonated process solution.
摘要翻译：用于产生具有高臭氧浓度的臭氧化处理溶液（例如臭氧化去离子水）的方法和系统。该系统包括耦合到辅助罐的再循环回路的静态混合器。该系统和方法被设计成使得在工艺液体和臭氧气体向系统的初始进料期间，工艺液体和臭氧气体在达到辅助剂之前通过静态混合器。静态混合器将臭氧气体混合到工艺液体中以形成臭氧化处理溶液。因此，辅助罐最初填充有臭氧处理液。臭氧化处理液可以从辅助罐再循环并通过静态混合器回流，而另外的臭氧气体溶解在其中。可以进行这种再循环，直到在臭氧化处理溶液中检测到所需浓度的臭氧。

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