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    • 1. 发明授权
    • Defect analysis in magnetic thin films
    • 磁性薄膜缺陷分析
    • US06201390B1
    • 2001-03-13
    • US09377828
    • 1999-08-20
    • Jian-Ping WangLea Peng TanThomas Yun Fook Liew
    • Jian-Ping WangLea Peng TanThomas Yun Fook Liew
    • G01R3312
    • G01R33/1207G01N27/82
    • A method of analyzing defects in a magnetic thin film is provided. A magnetic field is applied to the magnetic thin film. The magnetization of the magnetic thin film is measured over a range of different field strengths. A value representative of a magnetic hardness coefficient is calculated for the magnetic thin film from the magnetizations measured. The calculated value is compared with a reference value. Defect information is determined in dependence upon the comparison made. The defect information determined may relate to: (a) the relative levels of defects, if the reference value is representative of the magnetic hardness coefficient of a control specimen having a predetermined defect level; (b) the predominant type of defects, if the reference value is representative of the magnetic hardness coefficient obtained when the magnetic field is applied in a different direction; and (c) the distribution of defects, if the magnetizations are measured for a selected part of the magnetic thin film and compared with a reference value which is representative of a magnetic hardness coefficient calculated from magnetizations measured for a part other than the selected part of the magnetic thin film.
    • 提供了一种分析磁性薄膜中的缺陷的方法。 对磁性薄膜施加磁场。 在不同场强的范围内测量磁性薄膜的磁化。 从测量的磁化计算磁性薄膜的磁性硬度系数的值。 将计算值与参考值进行比较。 缺陷信息取决于所做的比较。 确定的缺陷信息可以涉及:(a)如果参考值代表具有预定缺陷水平的对照样本的磁性硬度系数,则缺陷的相对水平; (b)如果参考值代表当在不同方向施加磁场时获得的磁性硬度系数,则主要类型的缺陷; 和(c)缺陷的分布,如果对磁性薄膜的所选部分测量磁化,并与代表根据对所选择的部分以外的部分测量的磁化计算的磁性硬度系数的参考值进行比较 磁性薄膜。