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    • 5. 发明申请
    • ESD PROTECTION CIRCUIT AND METHOD
    • ESD保护电路和方法
    • US20090067105A1
    • 2009-03-12
    • US11852799
    • 2007-09-10
    • Shu-Huei LinChong-Gim GanYi-Hsun WuYu-Chang Lin
    • Shu-Huei LinChong-Gim GanYi-Hsun WuYu-Chang Lin
    • H02H9/04
    • H01L27/0266
    • A system includes a driving device operating at first supply voltage Vdd1 and having a CMOS output. A driven devise operates at a second supply voltage Vdd2 lower than the first supply voltage Vdd1, and has a CMOS input with an NMOS pull-down transistor. A protection circuit includes a first resistor coupled to the CMOS output of the driving device and a gate of the NMOS pull-down transistor. A parasitic NPN bipolar junction transistor has a drain connected to the gate of the NMOS pull-down transistor sad a source coupled to a lower-voltage supply rail VSS. A second resistor connects a gate of the parasitic NPN bipolar junction transistor to Vss. The second resistor has a resistance sized for controlling a trigger voltage of the parasitic NPN bipolar junction transistor for protecting a gate oxide layer of the NMOS pull-down transistor from an electrostatic discharge.
    • 系统包括以第一电源电压Vdd1操作并具有CMOS输出的驱动装置。 驱动装置在低于第一电源电压Vdd1的第二电源电压Vdd2下工作,并具有带NMOS下拉晶体管的CMOS输入。 保护电路包括耦合到驱动装置的CMOS输出的第一电阻器和NMOS下拉晶体管的栅极。 寄生NPN双极结晶体管具有连接到NMOS下拉晶体管的栅极的漏极和耦合到较低电压电源轨VSS的源极。 第二个电阻将寄生NPN双极结晶体管的栅极连接到Vss。 第二电阻器的电阻大小用于控制寄生NPN双极结晶体管的触发电压,用于保护NMOS下拉晶体管的栅氧化层免受静电放电。
    • 7. 发明申请
    • Devices and methods for detecting current leakage between deep trench capacitors in DRAM devices
    • 用于检测DRAM器件中深沟槽电容器之间的电流泄漏的装置和方法
    • US20070111341A1
    • 2007-05-17
    • US11619313
    • 2007-01-03
    • Yu-Chang Lin
    • Yu-Chang Lin
    • H01L21/66H01L23/58H01L21/8242
    • H01L27/0207G11C11/401G11C29/006G11C29/50G11C2029/5006H01L22/34H01L27/10861
    • A test device for detecting current leakage between deep trench capacitors in DRAM devices. The test device is disposed in a scribe line region of a wafer. In the test device, a first trench capacitor pair has a first deep trench capacitor and a second deep trench capacitor connected in parallel. A first transistor has a first terminal electrically coupled to the first deep trench capacitor and a control terminal electrically coupled to a first word line. A second transistor has a first terminal electrically coupled to the second deep trench capacitor and a control terminal electrically coupled to a second word line. First and second bit lines are electrically coupled to the first and second transistors respectively. The first and second bit lines are separated and the first and second word lines are perpendicular to the bit line regions.
    • 一种用于检测DRAM器件中深沟槽电容器之间的电流泄漏的测试装置。 测试装置设置在晶片的划线区域中。 在测试装置中,第一沟槽电容器对具有并联连接的第一深沟槽电容器和第二深沟槽电容器。 第一晶体管具有电耦合到第一深沟槽电容器的第一端子和电耦合到第一字线的控制端子。 第二晶体管具有电耦合到第二深沟槽电容器的第一端子和电耦合到第二字线的控制端子。 第一和第二位线分别电耦合到第一和第二晶体管。 第一和第二位线被分离,第一和第二字线垂直于位线区域。