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    • 2. 发明授权
    • Method of forming photomask using calibration pattern, and photomask having calibration pattern
    • 使用校准图案形成光掩模的方法,以及具有校准图案的光掩模
    • US08522172B2
    • 2013-08-27
    • US13240732
    • 2011-09-22
    • Young-keun YoonHee-bom KimMyoung-soo LeeChan-uk JeonHak-seung Han
    • Young-keun YoonHee-bom KimMyoung-soo LeeChan-uk JeonHak-seung Han
    • G06F17/50
    • G03F1/70
    • A method of forming a photomask using a calibration pattern that may exactly transfer a desired pattern to a substrate. The method includes providing one-dimensional calibration design patterns each having first design measures and providing two-dimensional calibration design patterns each having second design measures; obtaining one-dimensional calibration measured patterns using the one-dimensional calibration design patterns and obtaining two-dimensional calibration measured patterns using the two-dimensional calibration design patterns; obtaining first measured measures of the one-dimensional calibration measured patterns and obtaining second measured measures of the two-dimensional calibration measured patterns; establishing a correlation between the first measured measures and the second measured measures; and converting a main measured measure of a main pattern into a corresponding one of the first measured measures using the correlation.
    • 使用可以将期望图案精确地转印到基板的校准图案形成光掩模的方法。 该方法包括提供一维校准设计图案,每个具有第一设计措施并提供每个具有第二设计措施的二维校准设计图案; 使用一维校准设计图案获得一维校准测量图案,并使用二维校准设计图案获得二维校准测量图案; 获得一维校准测量图案的第一测量度量,并获得二维校准测量图案的第二测量度量; 建立第一测量措施与第二测量措施之间的相关性; 以及使用所述相关性将主模式的主测量度量转换为相应的第一测量度量。
    • 3. 发明申请
    • APPARATUS AND METHOD FOR DOWNSIZING SURFACE ELEVATION DATA
    • 用于渗透表面高度数据的装置和方法
    • US20130027388A1
    • 2013-01-31
    • US13438378
    • 2012-04-03
    • Young Keun YOON
    • Young Keun YOON
    • G06T15/00
    • G06T17/05
    • Provided is an apparatus and method for downsizing surface elevation data. The method includes receiving surface elevation data consisting of a plurality of cells, sequentially searching all the cells in a predetermined direction, comparing data of a cell having a predetermined reference elevation value or more with data of nearby cells, setting the cell as a boundary region when there is a nearby cell having different elevation data than the cell, grouping cells having the same data centered on the cell set as the boundary region, and performing triangulation on the basis of the grouping results. Since pieces of the same elevation data among pieces of high-resolution surface elevation data used in an outdoor environment are grouped as one, it is possible to carry out efficient analysis and improve analysis speed.
    • 提供了一种用于减小表面高程数据的装置和方法。 该方法包括接收由多个单元组成的表面高程数据,按预定方向顺序地搜索所有单元格,将具有预定参考高程值或更多的单元的数据与附近单元格的数据进行比较,将该单元设置为边界区域 当存在具有与小区不同的高程数据的附近小区时,将具有以设置为边界区域的小区为中心的相同数据的小区分组,并且基于分组结果执行三角测量。 由于在室外环境中使用的高分辨率地面高程数据之间的相同高程数据被分组为一个,因此可以进行有效的分析并提高分析速度。
    • 5. 发明申请
    • APPARATUS FOR MEASURING PATTERNS ON A REFLECTIVE PHOTOMASK
    • 用于测量反光镜的图案的装置
    • US20130250286A1
    • 2013-09-26
    • US13619072
    • 2012-09-14
    • Hak-Seung HANIn-Kyun SHINYoung-Keun YOON
    • Hak-Seung HANIn-Kyun SHINYoung-Keun YOON
    • G01N21/01
    • G01N21/956G01N21/21G01N2021/95676
    • An apparatus for inspecting, measuring, or inspecting and measuring a reflective photomask may comprise a light illuminating part including a light source and beam shaping part; a stage configured to cause the light generated to be incident at an angle through the beam shaping part; and/or a light detector configured to receive optical image information of the photomask mounted on the stage. An apparatus for inspecting, measuring, or inspecting and measuring a reflective photomask may comprise a light illuminating part including a light source and configured to adjust a progress direction of light from the light source at an angle; a stage in a direction at which the light is irradiated from the light illuminating part at the angle and configured to mount the photomask; a slit plate between the light illuminating part and the stage; and/or a light detector configured to receive image information of the photomask.
    • 用于检查,测量或检查和测量反射光掩模的装置可以包括包括光源和光束成形部分的光照射部分; 被配置为使所产生的光以一定角度通过所述光束成形部而入射的台阶; 和/或光检测器,被配置为接收安装在台上的光掩模的光学图像信息。 用于检查,测量或检查和测量反射光掩模的装置可以包括光照射部分,其包括光源并且被配置为以一定角度调整来自光源的光的进行方向; 从光照射部照射光的方向的台阶,并配置为安装光掩模; 光照射部和台之间的狭缝板; 和/或配置成接收光掩模的图像信息的光检测器。
    • 7. 发明申请
    • METHOD OF FORMING PHOTOMASK USING CALIBRATION PATTERN, AND PHOTOMASK HAVING CALIBRATION PATTERN
    • 使用校准图形成光电子的方法和具有校准图案的光电子
    • US20120159405A1
    • 2012-06-21
    • US13240732
    • 2011-09-22
    • Young-keun YOONHee-bom KimMyoung-soo LeeChan-uk JeonHak-seung Han
    • Young-keun YOONHee-bom KimMyoung-soo LeeChan-uk JeonHak-seung Han
    • G06F17/50
    • G03F1/70
    • A method of forming a photomask using a calibration pattern that may exactly transfer a desired pattern to a substrate. The method includes providing one-dimensional calibration design patterns each having first design measures and providing two-dimensional calibration design patterns each having second design measures; obtaining one-dimensional calibration measured patterns using the one-dimensional calibration design patterns and obtaining two-dimensional calibration measured patterns using the two-dimensional calibration design patterns; obtaining first measured measures of the one-dimensional calibration measured patterns and obtaining second measured measures of the two-dimensional calibration measured patterns; establishing a correlation between the first measured measures and the second measured measures; and converting a main measured measure of a main pattern into a corresponding one of the first measured measures using the correlation.
    • 使用可以将期望图案精确地转印到基板的校准图案形成光掩模的方法。 该方法包括提供一维校准设计图案,每个具有第一设计措施并提供每个具有第二设计措施的二维校准设计图案; 使用一维校准设计图案获得一维校准测量图案,并使用二维校准设计图案获得二维校准测量图案; 获得一维校准测量图案的第一测量度量,并获得二维校准测量图案的第二测量度量; 建立第一测量措施与第二测量措施之间的相关性; 以及使用所述相关性将主模式的主测量度量转换为相应的第一测量度量。
    • 9. 发明申请
    • TRANCEIVER AND TRANSCEIVING METHOD IN UWB SYSTEM FOR FREQUENCY SHARING
    • 用于频率共享的UWB系统中的TRANCEIVER和收发方法
    • US20100069125A1
    • 2010-03-18
    • US12447281
    • 2007-06-13
    • Young-Keun YoonHeon-Jin HongChang-Joo Kim
    • Young-Keun YoonHeon-Jin HongChang-Joo Kim
    • H04B1/40
    • H04B1/719
    • Provided are a transceiver and a transceiving method for use in an ultra wide band system for frequency sharing. The transceiver for use in an ultra wide band system for reducing interference that can be generated by an external system includes an external signal detector which detects an external signal generated from the external system, and a transmission signal controller which determines a power level of a transmission signal to be transmitted by the transceiver based on a power level of the detected external signal, in the case where an external signal using the same frequency channel as the ultra band system is detected, wherein the ultra wide band system and the external system are in a frequency sharing environment.
    • 提供了一种在超宽带系统中用于频率共享的收发机和收发方法。 用于在超宽带系统中用于减少可由外部系统产生的干扰的收发器包括检测从外部系统产生的外部信号的外部信号检测器和确定传输的功率电平的传输信号控制器 在检测到使用与超频带系统相同的频道的外部信号的情况下,基于检测到的外部信号的功率电平,由收发器发送的信号,其中超宽带系统和外部系统处于 频率共享环境。
    • 10. 发明授权
    • Method for 3D preprocessing for ray tracing
    • 用于光线跟踪的3D预处理方法
    • US08358305B2
    • 2013-01-22
    • US12834995
    • 2010-07-13
    • Young-Keun YoonJong-Ho KimHeon-Jin Hong
    • Young-Keun YoonJong-Ho KimHeon-Jin Hong
    • G06T15/50
    • G06T15/06
    • A method for 3D preprocessing for ray tracing includes: selecting and storing visible surfaces by designating one of a plurality of structures as a reference structure and remaining structures as relative structures, searching for the relative structures from the reference structure, storing relative structures having a surface visible from the reference structure, and removing relative structures having an invisible surface; conducting selection and storage based on distance measurement by measuring the distance from the reference structure to each of the stored relative structures and removing relative structures positioned beyond a reference spot predetermined with reference to the reference structure; and calculating a ray propagation path by calculating the propagation path of the ray between the reference structure and each of the relative structures stored in said conducting selection and storage based on distance measurement.
    • 一种用于光线跟踪的3D预处理的方法包括:通过将多个结构中的一个指定为参考结构并将剩余结构指定为相对结构来选择和存储可视表面,从参考结构搜索相对结构,存储具有表面的相对结构 从参考结构可见,并去除具有不可见表面的相对结构; 通过测量从参考结构到每个存储的相对结构的距离来进行基于距离测量的选择和存储,并且移除位于参考参考结构预定的参考点之外的相对结构; 以及通过基于距离测量计算参考结构和存储在所述导电选择和存储中的每个相对结构之间的射线的传播路径来计算射线传播路径。