会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Semiconductor device having steady substrate potential
    • 半导体器件具有稳定的衬底电位
    • US06677676B1
    • 2004-01-13
    • US09433382
    • 1999-11-03
    • Yoshiki WadaKimio Ueda
    • Yoshiki WadaKimio Ueda
    • H01L2348
    • H01L27/1203H01L21/743H01L21/76256H01L2924/0002H01L2924/00
    • A semiconductor device having an SOI structure having a contact for making steady the potential of a semiconductor substrate without involvement of an increase in the surface of the semiconductor device. In a semiconductor chip, an integrated circuit is fabricated within an internal circuit region, and a plurality of buffer circuits are fabricated within buffer regions. Wiring layers for supplying steady potential are formed in the area of the semiconductor chip other than the internal circuit region and the buffer regions; for example, at four corners of the semiconductor chip, and contacts for connecting the wiring layers and the semiconductor substrate are formed in the area of the integrated circuit which is not assigned for fabrication of integrated circuits, thus eliminating a necessity for ensuring a location specifically allocated for formation of the contacts.
    • 一种具有SOI结构的半导体器件,具有用于使半导体衬底的电位稳定的接点,而不会增加半导体器件的表面。 在半导体芯片中,在内部电路区域内制造集成电路,并且在缓冲区域内制造多个缓冲电路。 在除了内部电路区域和缓冲区域之外的半导体芯片的区域中形成用于提供稳定电位的布线层; 例如在半导体芯片的四个角部,并且在不用于集成电路的制造的集成电路的区域中形成用于连接布线层和半导体基板的触点,因此不需要特别地确保位置 分配用于形成联系人。
    • 7. 发明授权
    • Gate array semiconductor device
    • 门阵列半导体器件
    • US6084255A
    • 2000-07-04
    • US126092
    • 1998-07-30
    • Kimio UedaTakanori HirotaYoshiki WadaKoichiro Mashiko
    • Kimio UedaTakanori HirotaYoshiki WadaKoichiro Mashiko
    • H01L21/82H01L27/02H01L27/118H01L27/12H01L27/10
    • H01L27/0207H01L27/11807H01L27/1203
    • In each of basic cells (BC) arranged in array in an SOI layer, PMOS and NMOS transistors are symmetrically formed. Body regions (11) and (12) are formed to divide source/drain layers (1) and (2), respectively, and gate electrodes (3) and (4) are formed on the body regions (11) and (12) respectively to sandwich gate insulating films therebetween. The gate electrodes (3) and (4) are connected at their both ends to gate contact regions (5) to (8), respectively, and the body regions (11) and (12) are connected at their one ends to body contact regions (9) and (10), respectively. The body contact regions (9) and (10) are so arranged as to sandwich the gate contact regions (5) and (7) together with the gate electrodes (3) and (4), respectively. Being of a SOI type, the device achieves high-speed operation and low power consumption. Further, with positional relation between the body contact regions (9), (10) and the gate contact regions (5), (7), the device is capable of freely setting the transistors to be of either a gate control type or a gate fixed type. As a result, the gate array type semiconductor device achieves high-speed operation and low power consumption.
    • 在以SOI阵列排列的每个基本单元(BC)中,对称地形成PMOS和NMOS晶体管。 主体区域(11)和(12)分别形成为分隔源极/漏极层(1)和(2),并且在主体区域(11)和(12)上形成栅电极(3)和(4) 分别在其间夹着栅极绝缘膜。 栅电极(3)和(4)的两端分别连接到栅极接触区域(5)至(8),并且主体区域(11)和(12)在其一端连接到主体接触 区域(9)和(10)。 主体接触区域(9)和(10)被布置成分别将栅极接触区域(5)和(7)与栅极电极(3)和(4)夹在一起。 作为SOI型,该器件实现了高速操作和低功耗。 此外,通过体接触区域(9),(10)和栅极接触区域(5),(7)之间的位置关系,该器件能够自由地将晶体管设置为栅极控制型或栅极 固定式。 结果,门阵列型半导体器件实现了高速操作和低功耗。
    • 9. 发明授权
    • Silicon-on-insulator circuit having series connected PMOS transistors each having connected body and gate
    • 具有串联连接的PMOS晶体管的绝缘体上硅电路,每个具有连接体和栅极
    • US06177826B1
    • 2001-01-23
    • US09053700
    • 1998-04-02
    • Koichiro MashikoKimio UedaYoshiki Wada
    • Koichiro MashikoKimio UedaYoshiki Wada
    • H03K190948
    • H03K19/0027H03K19/01707H03K2217/0018
    • A Silicon-On-Insulator (SOI) CMOS circuit comprises a plurality of PMOS transistors connected in series to each other, each of the plurality of PMOS transistors having its body and gate connected to each other, and at least an NMOS transistor connected to one of the plurality of PMOS transistors, the NMOS transistor having its body connected to a low reference potential having a value of ground. The SOI CMOS circuit can further comprise a plurality of potential limiting circuits each connected between the body and gate of each of the plurality of PMOS transistors, for setting a lower limit of the potential of the body of each of the plurality of PMOS transistors to a voltage between a high reference potential and a potential obtained by subtracting a built-in potential from the high reference potential.
    • 绝缘体上硅绝缘体(SOI)CMOS电路包括彼此串联连接的多个PMOS晶体管,多个PMOS晶体管中的每一个具有彼此连接的主体和栅极,以及连接到一个的至少一个NMOS晶体管 的NMOS晶体管,其NMOS晶体管的主体连接到具有接地值的低参考电位。 SOI CMOS电路还可以包括多个限制电路,每个电位限制电路连接在多个PMOS晶体管中的每一个的主体和栅极之间,用于将多个PMOS晶体管的每个的主体的电位的下限设置为 通过从高参考电位减去内置电位而获得的高参考电位和电位之间的电压。