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1. 发明授权

US06959823B2 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US06959823B2
公开(公告)日：2005-11-01
申请号：US10619999
申请日：2003-07-14
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： H01L21/304 , B65D25/10 , H01L21/00 , H01L21/673 , A47G19/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.
摘要翻译：晶片引导件包括水平支撑板和附接在支撑板的一个表面上的至少三个垂直板。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。

2. 发明授权

US06939410B2 Apparatus and method for collecting impurities on a semiconductor wafer 有权
标题翻译：用于在半导体晶片上收集杂质的装置和方法
公开(公告)号：US06939410B2
公开(公告)日：2005-09-06
申请号：US10779642
申请日：2004-02-18
申请人： Yong-Kyun Ko , Byung-Woo Son , Jong-Cheol Jeong
发明人： Yong-Kyun Ko , Byung-Woo Son , Jong-Cheol Jeong
IPC分类号： H01L21/02 , G01N1/02 , G01N1/40 , G01N33/00 , G01N35/00 , H01L21/00 , B08B3/04
CPC分类号： H01L21/6715 , G01N1/02 , G01N1/4044 , G01N35/0099 , G01N2001/028 , G01N2033/0095 , G01N2035/00059 , Y10S134/902
摘要： An apparatus for collecting impurities on a semiconductor wafer includes an airtight process chamber, a rotary chuck disposed in the process chamber for rotating and horizontally supporting the semiconductor wafer, a first scanning unit for forming a droplet of a first scanning solution and for scanning an upper surface of the semiconductor wafer rotated by the rotary chuck with the droplet to collect first impurities, a driving unit for tilting the rotary chuck and the semiconductor wafer supported on the rotary chuck, and a second scanning unit for receiving a second scanning solution for collecting second impurities from an edge portion of the semiconductor wafer, the second scanning solution being in contact with the edge portion of the semiconductor wafer tilted by the driving unit and rotated by the rotary chuck so that the second scanning solution scans the edge portion of the semiconductor wafer.
摘要翻译：用于在半导体晶片上收集杂质的装置包括：气密处理室;设置在处理室中的旋转卡盘，用于旋转和水平支撑半导体晶片;第一扫描单元，用于形成第一扫描溶液的液滴并扫描上部通过旋转卡盘与液滴一起旋转的半导体晶片的表面收集第一杂质，用于使旋转卡盘和支撑在旋转卡盘上的半导体晶片倾斜的驱动单元和用于接收用于收集第二杂质的第二扫描溶液的第二扫描单元来自半导体晶片的边缘部分的杂质，第二扫描溶液与由驱动单元倾斜并被旋转卡盘旋转的半导体晶片的边缘部分接触，使得第二扫描溶液扫描半导体晶片的边缘部分。

3. 发明申请

US20070181160A1 SUPPORTER AND APPARATUS FOR CLEANING SUBSTRATES WITH THE SUPPORTER, AND METHOD FOR CLEANING SUBSTRATES 审中-公开
标题翻译：用于支撑器清洁基板的支撑器和装置，以及用于清洁基板的方法
公开(公告)号：US20070181160A1
公开(公告)日：2007-08-09
申请号：US11671978
申请日：2007-02-06
申请人： Hun-Jung YI , Yong-Kyun KO
发明人： Hun-Jung YI , Yong-Kyun KO
IPC分类号： B08B9/20 , B08B3/00
CPC分类号： H01L21/67326 , B08B3/048 , H01L21/67313
摘要： Provided are a supporter and a substrate cleaning apparatus including the supporter, and a method for cleaning substrates. In the apparatus, a guide plate is provided close to an outer surface of an outermost substrate among substrates arranged in a cleaning process. The guide plate is shaped such that cleaning liquid injected toward a lower edge of the outermost substrate flows to an upper edge of the outermost substrate in a substantially vertical direction.
摘要翻译：提供了一种支撑体和包括该支撑体的基板清洁装置，以及一种用于清洁基板的方法。在该装置中，在布置在清洁过程中的基板之间，靠近最外侧基板的外表面设置有引导板。引导板成形为使得朝向最外侧基板的下边缘注入的清洗液体沿大致垂直的方向流到最外侧基板的上边缘。

4. 发明申请

US20060027513A1 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US20060027513A1
公开(公告)日：2006-02-09
申请号：US11234033
申请日：2005-09-24
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： A47G19/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide used in cleaning and/or drying processes of semiconductor wafers is provided. The wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels. Accordingly, contact areas between the wafers and the wafer guide are reduced to improve a drying efficiency of the wafers.
摘要翻译：提供了用于半导体晶片的清洁和/或干燥处理的晶片引导件。晶片引导件包括水平支撑面板和至少三个垂直面板，其附接在支撑面板的一个表面上。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。因此，晶片和晶片引导件之间的接触面积减小，以提高晶片的干燥效率。

5. 发明授权

US6137018A Chemical refining method and reuse system for semiconductor device manufacturing 失效
标题翻译：半导体器件制造的化学精炼方法和再利用系统
公开(公告)号：US6137018A
公开(公告)日：2000-10-24
申请号：US115827
申请日：1998-07-15
申请人： Yong-kyun Ko , June-ing Gil , Sang-mun Chon
发明人： Yong-kyun Ko , June-ing Gil , Sang-mun Chon
IPC分类号： B01D15/04 , B01D12/00 , C07B63/00 , C07B63/02 , C07C29/76 , H01L21/304 , C07C29/74
CPC分类号： C07C29/76
摘要： A chemical refining and reuse method and apparatus efficiently remove water from a waste chemical used in a semiconductor device fabrication process. The method is superior to conventional refining methods, in that water is removed at the end of the refining process, followed only by particle removal, so that water is not reintroduced into the waste chemical during metallic impurity removal. Therefore, the refined waste chemical has a percentage of water therein which is equal to that of the chemical in an initial raw state. The method includes: a) removing ionic impurities contained in the waste chemical; b) removing metallic impurities contained in the waste chemical after removing the ionic impurities; c) removing water contained in the waste chemical after removing the metallic impurities; and d) removing particles contained in the waste chemical after removing the water.
摘要翻译：化学精炼和再利用方法和设备有效地从用于半导体器件制造过程的废化学品中除去水。该方法优于常规精炼方法，因为在精炼过程结束时除去水，其后仅通过除去颗粒，使得在金属杂质去除期间水不再被引入废化学品中。因此，精炼废弃化学品中的水的百分比等于初始原始状态下的化学物质。该方法包括：a）除去废化学物中所含的离子杂质; b）去除离子杂质后除去废化学物中所含的金属杂质; c）除去金属杂质后，除去废物中含有的水; 以及d）去除水后除去废化学物中所含的颗粒。

6. 发明授权

US5948690A Pretreatment system for analyzing impurities contained in flat sample 失效
标题翻译：用于分析平板样品中杂质的预处理系统
公开(公告)号：US5948690A
公开(公告)日：1999-09-07
申请号：US768704
申请日：1996-12-18
申请人： Jin-Ho Ju , Sung-Chul Kang , Yong-Kyun Ko
发明人： Jin-Ho Ju , Sung-Chul Kang , Yong-Kyun Ko
IPC分类号： G01N1/28 , G01N1/34 , H01L21/00 , H01L21/304 , H01L21/673 , H01L21/687 , G01N1/00 , B65D85/00 , G01N31/00
CPC分类号： H01L21/67353 , G01N1/34 , H01L21/67386 , Y10T436/25
摘要： A pretreatment system for analyzing impurities contained in a flat sample contains a cylindrical lower case having a stepped portion on which the flat sample is seated. The stepped portion is formed in an circumferential inner surface of the cylindrical lower case. A cylindrical upper case is detachably attached to an upper surface of the lower case, and has a supply passage through which a predetermined amount of pretreatment solution can be supplied to the flat sample. A cover closes off the upper surface of the upper case.
摘要翻译：用于分析平坦样品中包含的杂质的预处理系统包含具有台阶部分的扁平样品的圆筒形下壳体。台阶部形成在圆筒状的下壳体的圆周内表面上。圆筒形的上壳体可拆卸地附接到下壳体的上表面，并且具有供给通道，预定量的预处理溶液可以通过该供给通道供给到平坦的样品。盖子封闭上壳体的上表面。

7. 发明申请

US20090117499A1 Cleaning solution for immersion photolithography system and immersion photolithograph process using the cleaning solution 审中-公开
标题翻译：用于浸没光刻系统的清洁溶液和使用清洁溶液的浸渍光刻工艺
公开(公告)号：US20090117499A1
公开(公告)日：2009-05-07
申请号：US12232594
申请日：2008-09-19
申请人： Se-yeon Kim , Yong-kyun Ko , Sang-mi Lee , Yang-koo Lee , Hun-jung Yi , Kun-tack Lee
发明人： Se-yeon Kim , Yong-kyun Ko , Sang-mi Lee , Yang-koo Lee , Hun-jung Yi , Kun-tack Lee
IPC分类号： G03F7/20 , C11D3/20
CPC分类号： G03F7/70925 , G03F7/70341
摘要： A cleaning solution for an immersion photolithography system according to example embodiments may include an ether-based solvent, an alcohol-based solvent, and a semi-aqueous-based solvent. In the immersion photolithography system, a plurality of wafers coated with photoresist films may be exposed pursuant to an immersion photolithography process using an immersion fluid. The area contacted by the immersion fluid during the exposure process may accumulate contaminants. Accordingly, the area contacted by the immersion fluid during the exposure process may be washed with the cleaning solution according to example embodiments so as to reduce or prevent defects in the immersion photolithography system.
摘要翻译：根据示例性实施方式的用于浸没式光刻系统的清洁溶液可以包括醚类溶剂，醇类溶剂和半水性溶剂。在浸没式光刻系统中，可以使用浸没流体根据浸没光刻工艺来曝光涂覆有光致抗蚀剂膜的多个晶片。在曝光过程中浸入液接触的区域可能会积聚污染物。因此，可以利用根据示例性实施例的清洗溶液洗涤曝光过程中浸入液接触的区域，以便减少或防止浸没光刻系统中的缺陷。

8. 发明申请

US20070000523A1 Cleaning composition and related methods 审中-公开
标题翻译：清洗组合物及相关方法
公开(公告)号：US20070000523A1
公开(公告)日：2007-01-04
申请号：US11454829
申请日：2006-06-19
申请人： Se-Yeon Kim , Pil-Kwon Jun , Jung-Dae Park , Myoung-Ok Han , Jea-Wook Kim , Seung-Ki Chae , Kook-Joo Kim , Jae-Seok Lee , Yong-Kyun Ko , Kwang-Shin Lim , Yang-Koo Lee
发明人： Se-Yeon Kim , Pil-Kwon Jun , Jung-Dae Park , Myoung-Ok Han , Jea-Wook Kim , Seung-Ki Chae , Kook-Joo Kim , Jae-Seok Lee , Yong-Kyun Ko , Kwang-Shin Lim , Yang-Koo Lee
IPC分类号： B08B3/04
CPC分类号： H01L21/02071 , C11D3/0073 , C11D7/10 , C11D7/3209 , C11D11/0023 , H01L27/10885
摘要： A cleaning composition is disclosed. The cleaning composition comprises about 80 to 99.8999 percent by weight of an ammonium fluoride aqueous solution, about 0.1 to 5 percent by weight of a buffering agent, and about 0.0001 to 15 percent by weight of a corrosion-inhibiting agent. A method of preparing the cleaning composition, a method of cleaning a substrate using the cleaning composition, and a method of manufacturing a semiconductor device using the cleaning composition are also disclosed.
摘要翻译：公开了一种清洁组合物。该清洗组合物含有约80-99.8999重量％的氟化铵水溶液，约0.1-5重量％的缓冲剂和约0.0001-15重量％的腐蚀抑制剂。还公开了一种制备清洁组合物的方法，使用清洁组合物清洁基材的方法，以及使用该清洁组合物制造半导体器件的方法。

9. 发明授权

US07100306B2 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US07100306B2
公开(公告)日：2006-09-05
申请号：US11234033
申请日：2005-09-24
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： F26B3/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.
摘要翻译：晶片引导件包括水平支撑板和附接在支撑板的一个表面上的至少三个垂直板。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。

10. 发明授权

US6149731A Valve cleaning method 失效
标题翻译：阀门清洗方法
公开(公告)号：US6149731A
公开(公告)日：2000-11-21
申请号：US172139
申请日：1998-10-14
申请人： Yong-kyun Ko
发明人： Yong-kyun Ko
IPC分类号： B08B9/027 , B08B9/00 , H01L21/304 , C23G1/02
CPC分类号： B08B9/00 , Y10T137/4259 , Y10T436/25375
摘要： A valve cleaning apparatus and method provide for cleaning of heat resistant, scratch resistant coated valves using deionized water and at least one chemical mixture. The cleaning method includes sampling and analysis of the chemical mixture for the presence of metal impurities to within 0.5 to 1.5 ppb. Valves cleaned using this method and apparatus can then be transferred for use in semiconductor device fabrication equipment without the danger of metal impurities from the valves entering and damaging the fabrication equipment and the semiconductor devices being fabricated. The apparatus uses a single pumping device and a single return line, which are provided with selection devices to alternatively supply to or return from the valves either the deionized water or the chemical mixture. A plurality of same-sized or different-sized valves can be cleaned simultaneously.
摘要翻译：阀清洁装置和方法提供使用去离子水和至少一种化学混合物清洁耐热，耐划伤涂层的阀。清洁方法包括将金属杂质的存在的化学混合物取样和分析至0.5至1.5ppb。然后可以将使用这种方法和设备清洗的阀门转移到半导体器件制造设备中，而不会有来自阀门进入和损坏制造设备和所制造的半导体器件的金属杂质的危险。该设备使用单个泵送装置和单个返回管线，其具有选择装置，以交替地向阀提供去离子水或化学混合物。可以同时清洁多个相同尺寸或不同尺寸的阀。

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