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1. 发明申请

US20170179149A1 THREE-DIMENSIONAL SEMICONDUCTOR DEVICE 有权
公开(公告)号：US20170179149A1
公开(公告)日：2017-06-22
申请号：US15241781
申请日：2016-08-19
申请人： JOYOUNG PARK , YONG-HYUN KWON , JEONGSOO KIM , SEOK-WON LEE , JINWOO PARK , OIK KWON , SEUNGPIL CHUNG
发明人： JOYOUNG PARK , YONG-HYUN KWON , JEONGSOO KIM , SEOK-WON LEE , JINWOO PARK , OIK KWON , SEUNGPIL CHUNG
IPC分类号： H01L27/115
CPC分类号： H01L27/11582 , H01L27/11565 , H01L27/11568 , H01L27/1157 , H01L27/11575
摘要： A semiconductor device includes a substrate including a cell region and a connection region. A stack is disposed on the substrate. A vertical channel structure penetrates the stack in the cell region. The stack includes electrode patterns and insulating patterns which are alternatingly and repeatedly stacked on the substrate. Each of the electrode patterns may extend in a first direction and include a pad portion. The pad portion is positioned in the connection region. The pad portion includes a first sidewall and a second sidewall that extend in the first direction on opposite sides of the pad portion. The first sidewall has a recessed portion that is recessed in a second direction crossing the first direction toward the second sidewall.

2. 发明申请

US20100294752A1 Method of controlling cooking apparatus with temperature display unit 审中-公开
标题翻译：用温度显示单元控制烹饪设备的方法
公开(公告)号：US20100294752A1
公开(公告)日：2010-11-25
申请号：US12662400
申请日：2010-04-15
申请人： Han Jun Sung , Dae Sung Han , Yong Hyun Kwon , Seok Weon Hong , Tae Uk Lee , Pung Yeun Cho , Han Seong Kang , Sung Soo Park , Sung Kwang Kim , Tae Hun Kim
发明人： Han Jun Sung , Dae Sung Han , Yong Hyun Kwon , Seok Weon Hong , Tae Uk Lee , Pung Yeun Cho , Han Seong Kang , Sung Soo Park , Sung Kwang Kim , Tae Hun Kim
IPC分类号： H05B1/00
CPC分类号： F24C7/082
摘要： A method of controlling a cooking apparatus which includes a main body having at least one heating unit, a control panel installed on the main body, and a temperature display unit that is provided on the control panel, displaying a temperature of the heating unit through change in color, and having a plurality of light emitting elements, includes determining whether or not the heating unit is in operation; detecting a current temperature of the heating unit when the heating unit is in operation; and displaying a temperature section, to which the detected current temperature of the heating unit belongs, among a plurality of preset temperature sections through the change in the color of the temperature display unit.
摘要翻译：一种烹调装置的控制方法，其特征在于，包括具有至少一个加热单元的主体，安装在所述主体上的控制面板和设置在所述控制面板上的温度显示单元，通过变更显示所述加热单元的温度并且具有多个发光元件，包括确定加热单元是否在操作中; 当加热单元运行时，检测加热单元的当前温度; 并且通过温度显示单元的颜色的变化，在多个预设温度段中显示加热单元所属的检测到的当前温度的温度区域。

3. 发明授权

US07531449B2 Method of forming fine patterns using double patterning process 有权
标题翻译：使用双重图案化工艺形成精细图案的方法
公开(公告)号：US07531449B2
公开(公告)日：2009-05-12
申请号：US11730264
申请日：2007-03-30
申请人： Sang-joon Park , Yong-hyun Kwon , Jun Seo , Sung-il Cho , Chang-jin Kang , Jae-kyu Ha
发明人： Sang-joon Park , Yong-hyun Kwon , Jun Seo , Sung-il Cho , Chang-jin Kang , Jae-kyu Ha
IPC分类号： H01L21/4763
CPC分类号： H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/76816 , H01L21/76897
摘要： A double pattern method of forming a plurality of contact holes in a material layer formed on a substrate is disclosed. The method forms a parallel plurality of first hard mask patterns separated by a first pitch in a first direction on the material layer, a self-aligned parallel plurality of second hard mask patterns interleaved with the first hard mask patterns and separated from the first hard mask patterns by a buffer layer to form composite mask patterns, and a plurality of upper mask patterns in a second direction intersecting the first direction to mask selected portions of the buffer layer in conjunction with the composite mask patterns. The method then etches non-selected portions of the buffer layer using the composite hard mask patterns and the upper mask patterns as an etch mask to form a plurality of hard mask holes exposing selected portions of the material layer, and then etches the selected portions of the material layer to form the plurality of contact holes.
摘要翻译：公开了一种在形成在基板上的材料层中形成多个接触孔的双重图案方法。该方法形成在材料层上沿第一方向以第一间距分开的平行多个第一硬掩模图案，与第一硬掩模图案交错并与第一硬掩模分离的自对准并行多个第二硬掩模图案通过缓冲层形成图案以形成复合掩模图案，以及与第一方向相交的第二方向的多个上掩模图案，以与复合掩模图案一起掩蔽缓冲层的选定部分。然后，该方法使用复合硬掩模图案和上掩模图案作为蚀刻掩模蚀刻缓冲层的未选择部分，以形成暴露材料层的选定部分的多个硬掩模孔，然后蚀刻所选择的部分所述材料层形成所述多个接触孔。

4. 发明申请

US20090078244A1 Metal panel, manufacturing method thereof and cooking device using the metal panel 有权
标题翻译：金属面板及其制造方法以及使用金属面板的烹调装置
公开(公告)号：US20090078244A1
公开(公告)日：2009-03-26
申请号：US12216633
申请日：2008-07-08
申请人： Hyung Jin Kim , Yong Hyun Kwon , Seok Weon Hong , Tae Uk Lee , Pung Yeun Cho , Han Seong Kang , Sung Soo Park , Han Jun Sung , Sung Kwang Kim , Tae Hun Kim , Min Jae Kang
发明人： Hyung Jin Kim , Yong Hyun Kwon , Seok Weon Hong , Tae Uk Lee , Pung Yeun Cho , Han Seong Kang , Sung Soo Park , Han Jun Sung , Sung Kwang Kim , Tae Hun Kim , Min Jae Kang
IPC分类号： F24C15/02 , B23P11/00
CPC分类号： F24C15/02 , E06B3/827 , Y10T29/49826
摘要： A metal panel, a manufacturing method thereof and a cooking device using the metal panel capable of improving an external appearance of edges, enhancing efficiency of a manufacturing process and reducing the manufacturing cost. The manufacturing method of a metal panel includes cutting a metal plate to form a cutaway portion at a specified area of a border, bending the border on opposite sides of the cutaway portion, and coupling a bracket to a cutaway groove formed at the border by the bending.
摘要翻译：金属面板及其制造方法以及使用能够改善边缘外观的金属面板的烹饪装置，提高制造工序的效率，降低制造成本。金属板的制造方法包括切割金属板以在边界的特定区域处形成切口部分，在切口部分的相对侧上弯曲边界，并将托架连接到形成在边界处的切口槽弯曲。

5. 发明申请

US20080202354A1 Cooking apparatus and method of controlling the same 审中-公开
标题翻译：烹饪设备及其控制方法
公开(公告)号：US20080202354A1
公开(公告)日：2008-08-28
申请号：US12007690
申请日：2008-01-14
申请人： Tae Uk Lee , Dae Sung Han , Yong Hyun Kwon , Seok Weon Hong , Pung Yeun Cho , Han Seong Kang , Sung Soo Park , Han Jun Sung , Sung Kwang Kim , Hyung Jin Kim , Tae Hun Kim , Min Jae Kang
发明人： Tae Uk Lee , Dae Sung Han , Yong Hyun Kwon , Seok Weon Hong , Pung Yeun Cho , Han Seong Kang , Sung Soo Park , Han Jun Sung , Sung Kwang Kim , Hyung Jin Kim , Tae Hun Kim , Min Jae Kang
IPC分类号： B60H3/00
CPC分类号： F24C15/325 , F24C7/082
摘要： A cooking apparatus and a method of controlling the same utilize the operations of measuring a temperature of a cooking chamber, and periodically turning on and off a convection fan, which circulates air in the cooking chamber, when the temperature of the cooking chamber reaches a target temperature.
摘要翻译：烹饪设备及其控制方法利用烹饪室的温度测量的操作，并且当烹饪室的温度达到目标时，周期性地打开和关闭使烹饪室中的空气循环的对流风扇温度。

6. 发明申请

US20080194108A1 Methods of manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US20080194108A1
公开(公告)日：2008-08-14
申请号：US11825272
申请日：2007-06-05
申请人： Hyun-chul Kim , Sung-il Cho , Jae-seung Hwang , Jun Sen , Yong-hyun Kwon
发明人： Hyun-chul Kim , Sung-il Cho , Jae-seung Hwang , Jun Sen , Yong-hyun Kwon
IPC分类号： H01L21/311
CPC分类号： H01L21/31144 , H01L21/0337 , H01L21/0338 , Y10S438/942 , Y10S438/946 , Y10S438/947
摘要： Provided is a method of manufacturing a semiconductor device using double patterning. The method includes: forming a first material layer pattern having recesses in a first direction on an object layer and a second material layer pattern formed on the first material layer pattern; selectively etching the second material layer pattern and the first material layer pattern in a direction perpendicular to the first direction to form an etching mask; and etching the object layer to form minute patterns.
摘要翻译：提供了使用双重图案化制造半导体器件的方法。该方法包括：在物体层上形成具有沿第一方向的凹陷的第一材料层图案和形成在第一材料层图案上的第二材料层图案; 在与第一方向垂直的方向上选择性蚀刻第二材料层图案和第一材料层图案以形成蚀刻掩模; 并蚀刻目标层以形成微小的图案。

7. 发明申请

US20080191288A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：US20080191288A1
公开(公告)日：2008-08-14
申请号：US12030118
申请日：2008-02-12
申请人： Yong-Hyun KWON , Jae-Seung HWANG , Jun SEO , Sung-Il CHO , Sang-Joon PARK , Eun-Young KANG , Hyun-Chul KIM , Jung-Hoon CHAE
发明人： Yong-Hyun KWON , Jae-Seung HWANG , Jun SEO , Sung-Il CHO , Sang-Joon PARK , Eun-Young KANG , Hyun-Chul KIM , Jung-Hoon CHAE
IPC分类号： H01L21/336
CPC分类号： H01L27/10894 , H01L27/10876 , H01L29/4236
摘要： In a semiconductor device including a transistor having an embedded gate, and methods of manufacturing the same, a substrate is divided into first and second regions. A gate trench is formed in the first region, a first gate structure partially fills the gate trench and a passivation layer pattern is provided inside the gate trench and positioned on the first gate structure. A first source/drain is provided adjacent to sidewalls of the first gate structure. A second gate structure is provided in the second region and has a silicon oxide layer, a conductive layer pattern and a metal silicide layer pattern stacked on the conductive layer pattern. A second source/drain is provided adjacent to sidewalls of the second gate structure. Defects due to formation of reactants may be reduced in a formation process of the above-described semiconductor device, improving reliability and operating characteristics.
摘要翻译：在包括具有嵌入栅极的晶体管的半导体器件及其制造方法中，衬底被分成第一和第二区域。栅极沟槽形成在第一区域中，第一栅极结构部分地填充栅极沟槽，并且钝化层图案设置在栅极沟槽内并且位于第一栅极结构上。在第一栅极结构的侧壁附近提供第一源极/漏极。第二栅极结构设置在第二区域中，并且具有堆叠在导电层图案上的氧化硅层，导电层图案和金属硅化物层图案。在第二栅极结构的侧壁附近提供第二源极/漏极。在上述半导体器件的形成过程中可能会减少由于反应物的形成而导致的缺陷，提高了可靠性和操作特性。

8. 发明申请

US20080113515A1 Methods of Forming Semiconductor Devices 审中-公开
标题翻译：形成半导体器件的方法
公开(公告)号：US20080113515A1
公开(公告)日：2008-05-15
申请号：US11874267
申请日：2007-10-18
申请人： Hyun-Chul Kim , Sung-Il Cho , Eun-Young Kang , Yong-Hyun Kwon , Jae-Seung Hwang
发明人： Hyun-Chul Kim , Sung-Il Cho , Eun-Young Kang , Yong-Hyun Kwon , Jae-Seung Hwang
IPC分类号： H01L21/302
CPC分类号： H01L21/3086 , H01L21/3088 , H01L21/823437 , H01L27/105 , H01L29/66621
摘要： A method of forming a semiconductor device is provided. The method includes preparing a semiconductor substrate to include a cell region and a peripheral region and forming a first mask layer on the semiconductor substrate. First hard mask patterns that are configured to expose the first mask layer are formed on the first mask layer in the cell region. A second mask layer that is configured to conformably cover the first hard mask patterns is formed. A second hard mask pattern is formed between the first hard mask patterns, wherein the second hard mask pattern is configured to contact a lateral surface of the second mask layer. The second mask layer interposed between the first hard mask patterns and the second hard mask pattern is removed. A plurality of trenches are etched in the semiconductor substrate of the cell region using the first hard mask patterns and the second hard mask pattern as a mask.
摘要翻译：提供一种形成半导体器件的方法。该方法包括制备半导体衬底以包括单元区域和外围区域，并在半导体衬底上形成第一掩模层。配置为暴露第一掩模层的第一硬掩模图案形成在单元区域中的第一掩模层上。形成被构造为顺应地覆盖第一硬掩模图案的第二掩模层。在第一硬掩模图案之间形成第二硬掩模图案，其中第二硬掩模图案被配置为接触第二掩模层的侧表面。插入在第一硬掩模图案和第二硬掩模图案之间的第二掩模层被去除。使用第一硬掩模图案和第二硬掩模图案作为掩模，在单元区域的半导体衬底中蚀刻多个沟槽。

9. 发明授权

US07360480B2 Bread maker 失效
标题翻译：面包机
公开(公告)号：US07360480B2
公开(公告)日：2008-04-22
申请号：US10805352
申请日：2004-03-22
申请人： Jae-ryong Park , Yong-hyun Kwon , Chul Kim , Tae-uk Lee , Han-jun Sung , Jang-woo Lee , Dong-bin Lim
发明人： Jae-ryong Park , Yong-hyun Kwon , Chul Kim , Tae-uk Lee , Han-jun Sung , Jang-woo Lee , Dong-bin Lim
IPC分类号： A47J37/01 , A21B1/00
CPC分类号： A21B7/005
摘要： A bread maker comprising: a main body; an oven having a surface coated with a ceramic material, and being accommodated in the main body; a door provided in a front of the main body to open and close the oven; and upper heaters and lower heaters respectively disposed in upper and lower parts of the oven and the door. The oven is coated with a ceramic material so that an inner surface of the oven does not become deformed due to a high temperatures, and so that an inner surface of the oven that is stained or coated with bread ingredients can be easily cleaned. The upper heaters are inclined downward, thereby enhancing heating efficiency. Further, the oven components are detachable so that a damaged part of the oven can be separately replaced.
摘要翻译：一种面包机，包括：主体; 具有涂覆有陶瓷材料的表面的烤箱，并且容纳在主体中; 设置在主体前部以打开和关闭烤箱的门; 以及分别设置在烤箱和门的上部和下部的上部加热器和下部加热器。烘箱用陶瓷材料涂覆，使得烘箱的内表面不会由于高温而变形，并且可以容易地清洁被烘烤或涂覆有面包成分的烤箱的内表面。上部加热器向下倾斜，从而提高加热效率。此外，烤箱部件是可拆卸的，使得烤箱的损坏部分可以分开更换。

10. 发明申请

US20080078373A1 Heating cooker with hinged door 有权
标题翻译：带铰链门的加热炊具
公开(公告)号：US20080078373A1
公开(公告)日：2008-04-03
申请号：US11905109
申请日：2007-09-27
申请人： Sung Kwang Kim , Dea Sung Han , Yong Hyun Kwon , Seok Weon Hong , Tae Uk Lee , Pung Yeun Cho , Han Seong Kang , Sung Soo Park , Han Jun Sung , Tae Hun Kim
发明人： Sung Kwang Kim , Dea Sung Han , Yong Hyun Kwon , Seok Weon Hong , Tae Uk Lee , Pung Yeun Cho , Han Seong Kang , Sung Soo Park , Han Jun Sung , Tae Hun Kim
IPC分类号： F24C15/02
CPC分类号： F24C15/022 , E05F1/1276 , E05F5/02 , E05F5/08 , E05Y2201/21 , E05Y2201/22 , E05Y2201/408 , E05Y2201/47 , E05Y2900/308 , F24C7/085 , Y10T16/2796 , Y10T16/287 , Y10T16/304 , Y10T16/585
摘要： Provided is a heating cooker which allows a door on a cooking chamber to be opened without direct handling of the door by a user. The heating cooker includes a body having a cooking chamber defined therein, a door hingably mounted to the body to open and close the cooking chamber, a door holder positioned in the body to hold the door and keep the cooking chamber closed by the door, and a hinge part connected between the door and the body to guide rotation of the door such that when the door is released from the door holder, the door is automatically opened.
摘要翻译：提供一种加热烹调器，其允许烹饪室上的门打开，而不需要用户直接处理门。所述加热烹调器包括具有限定在其中的烹饪室的主体，门铰接地安装到所述主体以打开和关闭所述烹饪室的门;位于所述主体中的门保持器，用于保持所述门并将所述烹饪室保持在所述门的状态;以及铰链部分连接在门和主体之间以引导门的旋转，使得当门从门保持器释放时，门被自动打开。

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