会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明申请
    • METHOD AND SYSTEM FOR MANAGING WAFER PROCESSING
    • 管理流程处理的方法和系统
    • US20080077269A1
    • 2008-03-27
    • US11851008
    • 2007-09-06
    • Nam-young LeePil-woong BangYeong-lyeol Park
    • Nam-young LeePil-woong BangYeong-lyeol Park
    • G06F19/00
    • G05B19/4184G05B2219/32225G05B2219/34048G05B2219/45031Y02P90/14Y02P90/22
    • Disclosed are a method of managing a process and a process managing system in which a failure-generating process step can be quickly detected. The method of managing a process includes sequentially performing first to n-th (n is a natural number) process steps with respect to a plurality of wafers, the order that the plurality of wafers are processed in each of the n process steps are different from one another. Calculating characteristic parameter values for the plurality of wafers, calculating first to n-th relations that indicate relationships between the first to n-th process orders and the characteristic parameter values, performing a Fourier transform on the first to n-th relations so as to calculate first to n-th conversion relations, and determining the existence of patterns among the first to n-th relations using the first to n-th conversion relations.
    • 公开了一种管理过程和方法管理系统的方法,其中可以快速检测故障生成处理步骤。 管理处理的方法包括相对于多个晶片顺序地执行第一至第n(n是自然数)处理步骤,在n个处理步骤中的每一个处理多个晶片的顺序不同于 另一个。 计算多个晶片的特性参数值,计算表示第一至第n处理阶数之间的关系的特征参数值的第一至第n关系,对第一至第n关系进行傅里叶变换,以便 计算第一至第n转换关系,并且使用第一至第n转换关系确定第一至第n关系中的模式的存在。