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1. 发明授权

US07249823B2 Fluid ejection device 有权
标题翻译：流体喷射装置
公开(公告)号：US07249823B2
公开(公告)日：2007-07-31
申请号：US10709717
申请日：2004-05-24
申请人： Daniel Man-Tung Wong , Yen-Hui Ku
发明人： Daniel Man-Tung Wong , Yen-Hui Ku
IPC分类号： B41J2/04 , B41J2/05
CPC分类号： B41J2/14427
摘要： A fluid ejection device, a method and an operation method thereof are disclosed. The fluid ejection device includes a substrate, a beam and an activation pad. The substrate has an orifice, and the beam includes a fixed portion and a cantilever portion and is disposed over the substrate, wherein the cantilever portion is disposed over the orifice. Furthermore, the activation pad is disposed between the cantilever portion of the beam and the substrate. Because the fluid ejection device of the present invention is fabricated by using micro-electromechanical technology, and therefore it possible to obtain a fluid ejection device capable of ejecting the fluid from the orifice at a high-speed and also the quantity fluid ejected can be very small.
摘要翻译：公开了一种流体喷射装置，其方法和操作方法。流体喷射装置包括基板，梁和启动垫。衬底具有孔口，并且梁包括固定部分和悬臂部分，并且设置在衬底上，其中悬臂部分设置在孔的上方。此外，激活垫设置在梁的悬臂部分和基板之间。因为本发明的流体喷射装置是通过使用微机电技术来制造的，因此可以获得能够高速地从孔口排出流体的流体喷射装置，并且喷射的液体量可以非常大小。

2. 发明申请

US20060054963A1 Non-volatile and non-uniform trapped-charge memory cell structure and method of fabrication 审中-公开
标题翻译：非易失性和非均匀俘获电荷记忆单元结构及其制造方法
公开(公告)号：US20060054963A1
公开(公告)日：2006-03-16
申请号：US10938325
申请日：2004-09-10
申请人： Rong Qian , Yen-Hui Ku
发明人： Rong Qian , Yen-Hui Ku
IPC分类号： H01L29/76
CPC分类号： B82Y10/00 , H01L29/40114 , H01L29/42332 , H01L29/7887
摘要： A memory cell having a charge-trapping structure in the form of a layer of conductive clusters disposed between upper and lower insulator layers is disclosed. The memory cell can otherwise be constructed and operated similarly to a nitride read-only memory cell.
摘要翻译：公开了一种具有设置在上绝缘体层和下绝缘体层之间的导电簇形式的电荷捕获结构的存储单元。否则，存储单元可以类似于氮化物只读存储单元来构造和操作。

3. 发明授权

US5002630A Method for high temperature thermal processing with reduced convective heat loss 失效
标题翻译：降低对流热损失的高温热处理方法
公开(公告)号：US5002630A
公开(公告)日：1991-03-26
申请号：US361986
申请日：1989-06-06
申请人： Ahmad Kermani , Mike F. Robertson , Yen-Hui Ku , Fred Wong
发明人： Ahmad Kermani , Mike F. Robertson , Yen-Hui Ku , Fred Wong
IPC分类号： C30B25/10 , C30B25/14
CPC分类号： C30B25/14 , C30B25/10
摘要： A method for inducing a reaction in a reaction chamber of a reactive carrier having a first specific heat, on a reaction surface of a substrate. The method comprises the steps of supporting the substrate in the reaction chamber. Next, the substrate is heated to a reaction temperature, so that the reaction surface has an essentially balanced temperature distribution. The reactive carrier is mixed with an inert gas having a second specific heat to form a reaction mixture, wherein the second specific heat is lower than the first specific heat. Finally, the reaction mixture is supplied into the chamber so that it flows over the surface of the substrate. Because the inert gas has a lower specific heat than the carrier, the overall specific heat of the reaction mixture is reduced. With a lower specific heat, less heat is transferred from the wafer into the reaction mixture. This reduces convective heat loss and thermal gradients in the substrate. The technique is particularly applicable to rapid thermal processing of semiconductor wafers for epitaxial growth of silicon. According to this aspect, hydrogen is the reactive carrier, mixed with a chlorinated silicon source. The inert gas may be argon.
摘要翻译：在基板的反应面上，在具有第一比热的反应性载体的反应室中进行反应的方法。该方法包括在反应室中支撑基底的步骤。接下来，将基板加热至反应温度，使得反应表面具有基本平衡的温度分布。将反应性载体与具有第二比热的惰性气体混合以形成反应混合物，其中第二比热低于第一比热。最后，将反应混合物供给到室中，使其流过衬底的表面。由于惰性气体的比热比载体低，所以反应混合物的总体比热降低。具有较低的比热，较少的热从晶片转移到反应混合物中。这降低了衬底中的对流热损失和热梯度。该技术特别适用于用于硅的外延生长的半导体晶片的快速热处理。根据该方面，氢是与氯化硅源混合的反应性载体。惰性气体可以是氩气。

4. 发明申请

US20050259131A1 [FLUID EJECTION DEVICE, FABRICATION METHOD AND OPERATIING METHOD THEREOF] 有权
标题翻译： [流体喷射装置，制造方法及其操作方法]
公开(公告)号：US20050259131A1
公开(公告)日：2005-11-24
申请号：US10709717
申请日：2004-05-24
申请人： Daniel Wong , Yen-Hui Ku
发明人： Daniel Wong , Yen-Hui Ku
IPC分类号： B41J2/04 , B41J2/14
CPC分类号： B41J2/14427
摘要： A fluid ejection device, a method and an operation method thereof are disclosed. The fluid ejection device comprises a substrate, a beam and an activation pad. The substrate has an orifice, and the beam comprises a fixed portion and a cantilever portion and is disposed over the substrate, wherein the cantilever portion is disposed over the orifice. Furthermore, the activation pad is disposed between the cantilever portion of the beam and the substrate. Because the fluid ejection device of the present invention is fabricated by using micro-electromechanical technology, and therefore it possible to obtain a fluid ejection device capable of ejecting the fluid from the orifice at a high-speed and also the quantity fluid ejected can be very small.
摘要翻译：公开了一种流体喷射装置，其方法和操作方法。流体喷射装置包括基板，梁和激活垫。衬底具有孔口，并且梁包括固定部分和悬臂部分并且设置在衬底上，其中悬臂部分设置在孔的上方。此外，激活垫设置在梁的悬臂部分和基板之间。因为本发明的流体喷射装置是通过使用微机电技术来制造的，因此可以获得能够高速地从孔口排出流体的流体喷射装置，并且喷射的液体量可以非常大小。

5. 发明授权

US5682047A Input-output (I/O) structure with capacitively triggered thyristor for electrostatic discharge (ESD) protection 失效
标题翻译：具有静电放电（ESD）保护的电容式触发晶闸管的输入输出（I / O）结构
公开(公告)号：US5682047A
公开(公告)日：1997-10-28
申请号：US484003
申请日：1995-06-07
申请人： Rosario Consiglio , Yen-Hui Ku
发明人： Rosario Consiglio , Yen-Hui Ku
IPC分类号： H01L27/02 , H01L23/63 , H01L29/76 , H02H3/22 , H02H9/00
CPC分类号： H01L27/0262 , H01L27/0251
摘要： An input/output structure includes a microelectronic device connected in circuit between a contact pad and a reference potential, and a thyristor device for protecting the microelectronic device from electrostatic discharge. The thyristor device includes first and second terminals connected to the contact pad and to the reference potential respectively, a PNPN thyristor structure including a first P-region, a first N-region, a second P-region and a second N-region disposed in series between the first and second terminals, and an electrode for inducing an electric field into the second P-region. The induced electric field increases the number of charge carriers in the second P-region, and enables the device to be triggered at a lower voltage applied between the first and second terminals. The electrode includes an insulated gate, and can be connected to either the first or second terminal. The gate can include a thick field oxide layer, or a thin oxide layer to further reduce the triggering voltage. A differentiator including a capacitor connected between the first terminal and the electrode and a resistor connected between the second terminal and the electrode prevents false triggering during normal operation. A metal interconnection layer includes an anode section which is connected to the N-region and to the second terminal, and a cathode section which is connected to the P-region, the first terminal and the electrode, such that the cathode section laterally surrounds the anode section.
摘要翻译：输入/输出结构包括连接在接触焊盘和参考电位之间的电路中的微电子器件，以及用于保护微电子器件免受静电放电的晶闸管器件。晶闸管器件包括分别连接到接触焊盘和参考电位的第一和第二端子，PNPN晶闸管结构包括第一P区，第一N区，第二P区和第二N区，串联在第一和第二端子之间，以及用于将电场引入第二P区域的电极。感应电场增加了第二P区中的电荷载流子的数量，并且使得能够以施加在第一和第二端子之间的较低电压来触发装置。电极包括绝缘栅极，并且可以连接到第一端子或第二端子。栅极可以包括厚场氧化物层或薄氧化物层，以进一步降低触发电压。包括连接在第一端子和电极之间的电容器的微分器和连接在第二端子和电极之间的电阻器防止正常操作期间的错误触发。金属互连层包括连接到N区和第二端的阳极部分和连接到P区域，第一端子和电极的阴极部分，使得阴极部分横向围绕阳极部分。

6. 发明授权

US5156820A Reaction chamber with controlled radiant energy heating and distributed reactant flow 失效
标题翻译：具有控制辐射能量加热和分布式反应器流量的反应室
公开(公告)号：US5156820A
公开(公告)日：1992-10-20
申请号：US351829
申请日：1989-05-15
申请人： Fred Wong , Yen-Hui Ku
发明人： Fred Wong , Yen-Hui Ku
IPC分类号： B01J19/00 , B01J19/12 , C23C16/48 , C30B25/10 , C30B31/12 , H01L21/205
CPC分类号： C30B25/105 , B01J19/0013 , B01J19/122 , C23C16/481 , C30B31/12 , B01J2219/00058 , Y10S438/935
摘要： A reaction chamber for a controlled reaction on a reaction surface of a sample provides for controlled distribution of radiant energy over the reaction surface to offset radiant heat loss of the sample, and establishes uniform distribution of reactant flow on the sample. A lamp housing supplies radiant energy over the sample, which absorbs at least a component of the radiant energy. A support member which supports the sample within the reaction chamber is formed of a material which is essentially transparent to the radiant energy so that it does not behave as a susceptor. An array of lamps, is mounted with the reaction chamber so that direct radiant energy is transmitted through a window to the reaction surface of the sample. A reflecting surface on the housing includes a lamp seat for each lamp in the array with an individually specified position, curvature and tilt with respect to the reaction surface. A source of reactant gas is coupled through a gas port to the reaction chamber between the window and the reaction surface. A reactant distribution plate is mounted between the gas port and the reaction surface, and causes distributed flow of reactant gas over the reaction surface. The distribution plate includes a plurality of perforations having a pattern which determines the distribution of reactant gas flow.
摘要翻译：用于在样品的反应表面上的受控反应的反应室提供在反应表面上的辐射能的受控分布以抵消样品的辐射热损失，并且建立样品上反应物流的均匀分布。灯壳在样品上提供辐射能，其吸收辐射能的至少一部分。在反应室内支撑样品的支撑构件由对辐射能基本上透明的材料形成，使得其不作为感受器。灯具阵列安装有反应室，使得直接辐射能量通过窗口传输到样品的反应表面。壳体上的反射表面包括用于阵列中每个灯的灯座，其具有单独指定的位置，相对于反作用表面的曲率和倾斜。反应气体源通过气体端口连接到窗口和反应表面之间的反应室。反应物分配板安装在气体端口和反应表面之间，并使反应物气体在反应表面上分布流动。分配板包括具有确定反应物气体流量分布的图案的多个穿孔。

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