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    • 1. 发明申请
    • NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE
    • 非挥发性半导体存储器件
    • US20110233652A1
    • 2011-09-29
    • US13156727
    • 2011-06-09
    • Yasuhiro ShinoAtsuhiro SatoTakeshi KamigaichiFumitaka Arai
    • Yasuhiro ShinoAtsuhiro SatoTakeshi KamigaichiFumitaka Arai
    • H01L27/115
    • H01L27/11578H01L27/11573H01L27/11582
    • A non-volatile semiconductor storage device includes: a memory cell area in which a plurality of electrically rewritable memory cells are formed; and a peripheral circuit area in which transistors that configure peripheral circuits to control the memory cells are formed. The memory cell area has formed therein: a semiconductor layer formed to extend in a vertical direction to a semiconductor substrate; a plurality of conductive layers extending in a parallel direction to, and laminated in a vertical direction to the semiconductor substrate; and a property-varying layer formed between the semiconductor layer and the conductive layers and having properties varying depending on a voltage applied to the conductive layers. The peripheral circuit area has formed therein a plurality of dummy wiring layers that are formed on the same plane as each of the plurality of conductive layers and that are electrically separated from the conductive layers.
    • 非易失性半导体存储装置包括:形成有多个电可重写存储单元的存储单元区域; 以及外围电路区域,其中形成配置外围电路以控制存储单元的晶体管。 在其中形成存储单元区域:形成为在垂直方向上延伸到半导体衬底的半导体层; 多个导电层,沿着与半导体基板的垂直方向平行的方向延伸并层叠; 以及形成在所述半导体层和所述导电层之间的性质变化层,并且具有根据施加到所述导电层的电压而变化的特性。 外围电路区域中形成有多个虚拟布线层,其形成在与多个导电层中的每一个相同的平面上,并且与导电层电分离。