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1. 发明专利

JPS5932243B2 JPS5932243B2 - 失效
公开(公告)号：JPS5932243B2
公开(公告)日：1984-08-07
申请号：JP10590082
申请日：1982-06-18
申请人： Motohiro Sekine , Yasuhiro Sekine
发明人： SEKINE MOTOHIRO , SEKINE YASUHIRO
IPC分类号： B23D19/06 , B23D35/00
CPC分类号： B23D35/008

2. 发明专利

JPS58223517A Device for replacing slitter cutter 失效
标题翻译：更换切片机的装置
公开(公告)号：JPS58223517A
公开(公告)日：1983-12-26
申请号：JP10590082
申请日：1982-06-18
申请人： Motohiro Sekine , Yasuhiro Sekine
发明人： SEKINE MOTOHIRO , SEKINE YASUHIRO
IPC分类号： B23D19/06 , B23D35/00
CPC分类号： B23D35/008
摘要： PURPOSE:To save labour in replacing a slitter cutter, by enabling the cutter or the like to easily move along an arbor, under the switching operation of the inclined condition of a cam plate and the reciprocating drive operation of a movable bed and an arm. CONSTITUTION:A cutter or the like may be easily moved along an arbor 4 under the switching operation of the inclined condition of a cam plate 31 and the reciprocating drive operation of a movable bed 16 and an arm 14 by means of a push button switch, a foot-operated switch or the like. The arm 14 is directly fitted into a guide 12 in a round rod-like shape so that the arm 14 is slidable and as well swingable. With this arrangement, the device is simple in its construction and may be incorporated in a narrow space.
摘要翻译：目的：为了节省更换分切刀的能力，通过使刀具等能够容易地沿心轴移动，在凸轮板的倾斜状态的切换操作和可动床和臂的往复驱动操作下。构成：在凸轮板31的倾斜状态的切换操作和通过按钮开关的可动床16和臂14的往复驱动操作下，刀具等可以容易地沿心轴4移动，脚踏开关等。臂14以圆棒形状直接装配到导向件12中，使得臂14可滑动并且可摆动。通过这种布置，该装置的结构简单，并且可以并入狭窄的空间。

3. 发明授权

US08817144B2 Photoelectric conversion apparatus 有权
标题翻译：光电转换装置
公开(公告)号：US08817144B2
公开(公告)日：2014-08-26
申请号：US13365146
申请日：2012-02-02
申请人： Taro Kato , Mineo Shimotsusa , Hiroaki Sano , Takeshi Ichikawa , Yasuhiro Sekine , Mahito Shinohara , Genzo Momma
发明人： Taro Kato , Mineo Shimotsusa , Hiroaki Sano , Takeshi Ichikawa , Yasuhiro Sekine , Mahito Shinohara , Genzo Momma
IPC分类号： H01L21/00
CPC分类号： H01L27/14627 , H01L27/14621 , H01L27/14629 , H01L27/1463
摘要： A photoelectric conversion apparatus includes a semiconductor substrate having a photoelectric conversion portion. An insulator is provided on the semiconductor substrate. The insulator has a hole corresponding to the photoelectric conversion portion. A waveguide member is provided in the hole. An in-layer lens is provided on a side of the waveguide member farther from the semiconductor substrate. A first intermediate member is provided between the waveguide member and the in-layer lens. The first intermediate member has a lower refractive index than the in-layer lens.
摘要翻译：光电转换装置包括具有光电转换部分的半导体衬底。绝缘体设置在半导体衬底上。绝缘体具有与光电转换部对应的孔。波导构件设置在孔中。在距离半导体衬底更远的波导构件的一侧设置有层内透镜。第一中间构件设置在波导构件和内层透镜之间。第一中间构件具有比层内透镜低的折射率。

4. 发明授权

US08105765B2 Method of manufacturing a semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US08105765B2
公开(公告)日：2012-01-31
申请号：US12709571
申请日：2010-02-22
申请人： Yasuhiro Sekine
发明人： Yasuhiro Sekine
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F7/70475 , G03F1/00
摘要： A method of manufacturing a semiconductor device by performing divisional exposure on a predetermined area on a wafer, through two or more reticles, on each of which a mask pattern region is formed. The method includes arranging the reticles such that an outer most periphery of a field circle of exposure light incident on the wafer aligns with at least one side of the mask pattern region formed in the reticle, and exposing, to exposure light, the wafer, through the reticles so arranged.
摘要翻译：通过在其上形成有掩模图案区域的两个或更多个掩模版上对晶片上的预定区域进行分割曝光来制造半导体器件的方法。所述方法包括：布置所述掩模版，使得入射到所述晶片上的曝光光场的外圆的最外边缘与形成在所述标线板中的所述掩模图案区域的至少一侧对准，并将所述晶片曝光于曝光这样安排了掩模版。

5. 发明申请

US20110242388A1 IMAGE SENSING DEVICE AND CAMERA 有权
标题翻译：图像传感装置和摄像机
公开(公告)号：US20110242388A1
公开(公告)日：2011-10-06
申请号：US13139558
申请日：2010-01-20
申请人： Takanori Watanabe , Mineo Shimotsusa , Takeshi Ichikawa , Hajime Ikeda , Yasuhiro Sekine , Akira Ohtani , Takeshi Kojima
发明人： Takanori Watanabe , Mineo Shimotsusa , Takeshi Ichikawa , Hajime Ikeda , Yasuhiro Sekine , Akira Ohtani , Takeshi Kojima
IPC分类号： H04N5/335 , H01L27/146
CPC分类号： H01L27/1463 , H01L27/14609 , H01L27/1464 , H01L27/14641 , H01L27/14689 , H01L29/7833
摘要： An image sensing device comprises a pixel array, and a peripheral circuit, a column selecting circuit, and a readout, wherein each pixel includes a photodiode, a floating diffusion, a transfer PMOS transistor to the floating diffusion, an amplifier PMOS transistor, and a reset PMOS transistor, the amplifier PMOS transistor has a gate which is formed by an n-type conductive pattern, and is isolated by a first element isolation region and an n-type impurity region which covers at least a lower portion of the first element isolation region, and each PMOS transistor included in the column selecting circuit has a gate which is formed by a p-type conductive pattern and is isolated by a second element isolation region, and an n-type impurity concentration in a region adjacent to a lower portion of the second element isolation region is lower than that in the n-type impurity region.
摘要翻译：图像感测装置包括像素阵列，外围电路，列选择电路和读出器，其中每个像素包括光电二极管，浮动扩散，到浮动扩散的转移PMOS晶体管，放大器PMOS晶体管和复位PMOS晶体管，放大器PMOS晶体管具有由n型导电图案形成的栅极，并且被第一元件隔离区域和覆盖至少第一元件隔离的下部的n型杂质区隔离区域，并且列选择电路中包括的每个PMOS晶体管具有由p型导电图案形成并由第二元件隔离区域隔离的栅极，并且与下部分相邻的区域中的n型杂质浓度的第二元件隔离区域低于n型杂质区域。

6. 发明授权

US07749691B2 Method of manufacturing a photoelectric conversion device using a plurality of reticles 失效
标题翻译：使用多个掩模版制造光电转换装置的方法
公开(公告)号：US07749691B2
公开(公告)日：2010-07-06
申请号：US11212649
申请日：2005-08-29
申请人： Yasuhiro Sekine
发明人： Yasuhiro Sekine
IPC分类号： G03C5/00
CPC分类号： G03F7/70475 , G03F1/00
摘要： A method of manufacturing a photoelectric conversion device. The method includes the steps of arranging a plurality of reticles, on each of which a mask pattern region is formed, in an arrangement direction and using at least two of the plurality of reticles in the method, such that, in at least one of the reticles being used, (i) a center of the at least one reticle, which is aligned with an optical axis of light for exposure, is shifted from (ii) a center of the mask pattern region formed on the at least one reticle, in a direction parallel to the arrangement direction of the plurality of reticles, and performing the exposure of a predetermined region on a wafer using the at least two of the plurality of reticles, in order to manufacture the photoelectric conversion device.
摘要翻译：一种制造光电转换装置的方法。该方法包括以下步骤：在所述方法中，在布置方向上布置多个掩模版，每个在其上形成有掩模图案区域，并且在所述方法中使用所述多个掩模版中的至少两个，使得在至少一个使用标线片，（i）与用于曝光的光的光轴对准的至少一个掩模版的中心从（ii）形成在至少一个掩模版上的掩模图案区域的中心偏移，与所述多个标线板的排列方向平行的方向，并使用所述多个光栅中的所述至少两个，进行所述晶片上的预定区域的曝光，以制造所述光电转换装置。

7. 发明授权

US07202103B2 Overlapped color filter fabrication technique 有权
标题翻译：重叠滤色镜制作技术
公开(公告)号：US07202103B2
公开(公告)日：2007-04-10
申请号：US11280323
申请日：2005-11-17
申请人： Yasuhiro Sekine , Shigeki Mori
发明人： Yasuhiro Sekine , Shigeki Mori
IPC分类号： H01L21/00 , G03F7/00
CPC分类号： H01L31/02162 , H01L27/14621 , H01L27/14623 , H01L27/14627 , H01L27/14685
摘要： A solid state image pickup element which can exponentially reduce the in-plane photoelectric conversion portion characteristic distribution created in forming color filters by a common photolithography technique and which, when color filters are formed by split exposure, can reduce image non-uniformity between exposure regions in a picked-up image, and a method of manufacturing the same. The method includes: applying negative type color resist for forming first color filters onto an entire surface of a given film; forming the first color filters by irradiation of given portions with exposure light and subsequent development; applying negative type color resist for forming second color filters onto the entire surface of the first color filters while covering the first color filters; and forming the second color filters by irradiating an area smaller than a region that is surrounded by the first color filters with exposure light and subsequent development.
摘要翻译：一种固态摄像元件，其可以通过通常的光刻技术指数地降低在形成滤色器时产生的面内光电转换部分特性分布，并且当通过分割曝光形成滤色器时，可以降低曝光区域之间的图像不均匀性在拾取图像中，以及其制造方法。该方法包括：在给定膜的整个表面上施加用于形成第一滤色器的负型彩色抗蚀剂; 通过用曝光光照射给定部分并随后显影来形成第一滤色器; 在覆盖第一滤色器的同时，在第一滤色片的整个表面上施加用于形成第二滤色器的负型彩色抗蚀剂; 以及通过用曝光光照射小于由第一滤色器包围的区域的区域并随后显影来形成第二滤色器。

8. 发明申请

US20060076591A1 Solid state image pickup element and method of manufacturing solid state image pickup element 有权
标题翻译：固体摄像元件及固态摄像元件的制造方法
公开(公告)号：US20060076591A1
公开(公告)日：2006-04-13
申请号：US11280323
申请日：2005-11-17
申请人： Yasuhiro Sekine , Shigeki Mori
发明人： Yasuhiro Sekine , Shigeki Mori
IPC分类号： H01L31/062 , H01L21/00
CPC分类号： H01L31/02162 , H01L27/14621 , H01L27/14623 , H01L27/14627 , H01L27/14685
摘要： Provided is a solid state image pickup element which can exponentially reduce the in-plane photoelectric conversion portion characteristic distribution that is created in forming color filters by a common photolithography technique and which, when color filters are formed by split exposure, can reduce image non-uniformity between exposure regions in a picked-up image, and a method of manufacturing the same. The method includes: applying negative type color resist for forming first color filters onto an entire surface of a given film; forming the first color filters by irradiation of given portions with exposure light and by subsequent development; applying negative type color resist for forming second color filters onto the entire surface of the first color filters while covering the first color filters; and forming the second color filters by irradiating an area smaller than a region that is surrounded by the first color filters with exposure light and by subsequent development. Further, in the solid state image pickup element with color filters of plural colors, one of adjacent color filters is tapered at the edges while the other color filter is reversely tapered at the edges, allowing the adjacent color filters to fit to each other. Furthermore, adjacent color filters are wedged at the edges, allowing the adjacent color filters to fit to each other.
摘要翻译：提供了一种固态摄像元件，其能够通过通常的光刻技术指数地降低在形成滤色器时产生的面内光电转换部分特性分布，并且当通过分割曝光形成滤色器时，拾取图像中的曝光区域之间的均匀性及其制造方法。该方法包括：在给定膜的整个表面上施加用于形成第一滤色器的负型彩色抗蚀剂; 通过用曝光光照射给定部分并随后显影来形成第一滤色器; 在覆盖第一滤色器的同时，在第一滤色片的整个表面上施加用于形成第二滤色器的负型彩色抗蚀剂; 以及通过用曝光灯照射小于由第一滤色器包围的区域的区域并随后显影来形成第二滤色器。此外，在具有多种颜色的滤色片的固态图像拾取元件中，相邻滤色器之一在边缘处是渐缩的，而另一个滤色器在边缘处是倒锥形的，允许相邻的滤色器彼此配合。此外，相邻的滤色器楔入边缘，允许相邻的滤色器彼此配合。

9. 发明授权

US06586811B2 Microlens, solid state imaging device, and production process thereof 失效
标题翻译：微透镜，固态成像装置及其制造方法
公开(公告)号：US06586811B2
公开(公告)日：2003-07-01
申请号：US09825839
申请日：2001-04-05
申请人： Yasuhiro Sekine
发明人： Yasuhiro Sekine
IPC分类号： H01L310232
CPC分类号： H01L27/14685 , H01L27/14621 , H01L27/14627
摘要： A microlens of which surface is a conductive surface, or a solid state imaging device equipped with the microlens, in which the conductive surface can be given by a metal oxide film, a film containing carbon as a main component, a surface-modified film or the like.
摘要翻译：其表面是导电表面的微透镜，或配备有微透镜的固态成像装置，其中导电表面可以由金属氧化物膜，含碳作为主要成分的膜，表面改性膜或类似。

10. 发明授权

US06476887B1 Preparation of liquid crystal display using multiple light beam scanning speeds 失效
标题翻译：使用多个光束扫描速度制备液晶显示器
公开(公告)号：US06476887B1
公开(公告)日：2002-11-05
申请号：US09929036
申请日：2001-08-15
申请人： Yasuhiro Sekine , Shunsuke Inoue , Hiroshi Mizuno
发明人： Yasuhiro Sekine , Shunsuke Inoue , Hiroshi Mizuno
IPC分类号： G02F11333
CPC分类号： G02F1/1334 , G02F2001/13345
摘要： This invention provides a liquid crystal display which comprises a first region including a display region, and a second region being outside the first region, wherein the first and second regions both contain liquid crystal in a polymer network, and a part of the polymer network of the second region is different in structure from the polymer network of the first region, and the part is present in the second region asymmetrically with respect to the first region, and a production method for a liquid crystal display, which comprises providing a liquid crystal material and a prepolymer material in a space between a pair of substrates at least one of which is transparent, and polymerizing the prepolymer material by scanning a first region including a display region and a second region outside the first region with a light beam which causes polymerization.
摘要翻译：本发明提供了一种液晶显示器，其包括包括显示区域的第一区域和位于第一区域外部的第二区域，其中第一和第二区域均包含聚合物网络中的液晶，以及聚合物网络的一部分所述第二区域的结构与所述第一区域的聚合物网络不同，并且所述部分相对于所述第一区域不对称地存在于所述第二区域中，以及液晶显示器的制造方法，其包括提供液晶材料以及预聚物材料，在一对基板之间的空间中，其中至少一个是透明的，并且通过用引起聚合的光束扫描包括显示区域和第一区域外的第二区域的第一区域来聚合预聚物材料。

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