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1. 发明授权

US07945873B2 Mask pattern data generating method, information processing apparatus, photomask fabrication system, and image sensing apparatus 有权
标题翻译：掩模图案数据生成方法，信息处理装置，光掩模制造系统和图像感测装置
公开(公告)号：US07945873B2
公开(公告)日：2011-05-17
申请号：US12048691
申请日：2008-03-14
申请人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
发明人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
IPC分类号： G06F17/50
CPC分类号： G03F1/68 , G03F1/50 , G03F7/0005 , Y10T29/49
摘要： A method of generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data that represent a transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method, to acquire the transmitted light distribution, and generates mask pattern data that represent an arrangement of the shields, based on the determination.
摘要翻译：产生用于形成微透镜的光掩模的掩模图案数据的方法将用于光掩模的掩模图案的图案形成表面划分成多个网格单元，获取表示掩模图案的透射光分布的数据为用于光掩模的方法，通过使用误差扩散法从图案形成面的中心的距离增加或减小的次数二次化多个网格单元，确定是否对多个网格单元中的每一个放置屏蔽，以获取透射光分布，并且基于该确定生成表示屏蔽的布置的掩模图案数据。

2. 发明申请

US20080029693A1 SOLID-STATE IMAGE PICKUP DEVICE 有权
标题翻译：固态图像拾取器件
公开(公告)号：US20080029693A1
公开(公告)日：2008-02-07
申请号：US11867131
申请日：2007-10-04
申请人： Satoshi Hirayama , Yasuhiro Sekine
发明人： Satoshi Hirayama , Yasuhiro Sekine
IPC分类号： G01J3/50
CPC分类号： H01L31/02162 , H01L27/14621 , H01L27/14623 , H01L27/14625 , H01L31/02327
摘要： A solid-state image pickup device includes a photoelectric conversion portion for generating signal electric charges in accordance with an amount of incident light, a plurality of color filters, and a flattening layer formed on the plurality of color filters. A thickness of a projection or a recess on a surface of the flattening layer, provided on a region where color filters are adjacent to each other, is equal to or less than 0.2 μm.
摘要翻译：固态图像拾取装置包括：用于根据入射光量产生信号电荷的光电转换部分，多个滤色器以及形成在多个滤色器上的平坦化层。设置在滤色器彼此相邻的区域上的平坦化层的表面上的突起或凹部的厚度等于或小于0.2μm。

3. 发明授权

US06884154B2 Method for apparatus for polishing outer peripheral chamfered part of wafer 失效
标题翻译：抛光晶片外周倒角部件的方法
公开(公告)号：US06884154B2
公开(公告)日：2005-04-26
申请号：US09959315
申请日：2001-02-21
申请人： Kazutoshi Mizushima , Nakaji Miura , Yasuhiro Sekine , Makoto Suzuki , Kazuya Tomii
发明人： Kazutoshi Mizushima , Nakaji Miura , Yasuhiro Sekine , Makoto Suzuki , Kazuya Tomii
IPC分类号： B24B9/06 , B24B37/00 , B24B37/20 , B24B37/24 , B24B51/00 , B24D5/14 , B24D9/04 , H01L21/304 , B24B1/00
CPC分类号： H01L21/02021 , B24B9/065 , B24B51/00 , B24D5/14 , B24D9/04
摘要： In a process for polishing the chamfered peripheral part of a wafer using a polishing cloth while supplying a polishing slurry in order to improve productivity of the process by reducing a polishing time, at least two steps of polishing processes are performed in sequence. The process comprises a first polishing process to polish a particular part, e.g. the part corresponding to the {110} plane of a peripheral part of the wafer and a second polishing process in which the whole part of a peripheral part of the wafer is polished for finishing by means of varying a hardness of the polishing clothes and/or a particle size of abrasives in the slurry such as the hardness of the polishing cloth in the second polishing process being softer than that of in the first polishing process and a particle size of abrasives in the slurry in the second polishing process being finer than that of in the first polishing process.
摘要翻译：在提供抛光浆料的同时使用抛光布抛光晶片的倒角周边部分的方法中，为了通过减少抛光时间来提高工艺的生产率，至少依次进行两个抛光处理步骤。该方法包括用于抛光特定部分的第一抛光工艺，例如。对应于晶片周边部分的{110}面的部分和第二抛光工艺，其中通过改变抛光衣服的硬度和/或抛光来抛光晶圆的周边部分的整个部分以进行精加工浆料中的研磨剂的粒径例如在第二研磨工序中的研磨布的硬度比第一研磨工序中的研磨布的硬度柔软，并且第二研磨工序中的研磨剂的粒子的粒径比在第一次抛光过程中。

4. 发明授权

US06175397B1 Liquid crystal display apparatus, a liquid crystal projector using same, and a method of manufacturing the liquid crystal display apparatus 失效
标题翻译：液晶显示装置，使用该液晶显示装置的液晶投影仪及液晶显示装置的制造方法
公开(公告)号：US06175397B1
公开(公告)日：2001-01-16
申请号：US09038473
申请日：1998-03-09
申请人： Shunsuke Inoue , Yasuhiro Sekine , Hiroshi Mizuno
发明人： Shunsuke Inoue , Yasuhiro Sekine , Hiroshi Mizuno
IPC分类号： G02F11333
CPC分类号： G02F1/1334 , G02F2001/13345
摘要： A liquid crystal display apparatus comprises a first polymer-containing liquid crystal area forming a first area including a display area, and a second polymer-containing liquid crystal area including a second area other than the first area, and is characterized in that polymer of the first polymer-containing liquid crystal area and polymer of the second polymer-containing liquid crystal area respectively have network structures different from each other.
摘要翻译：液晶显示装置包括形成包括显示区域的第一区域的第一含聚合物液晶区域和包括除第一区域之外的第二区域的第二含聚合物液晶区域，其特征在于，第一含聚合物的液晶区域和第二含聚合物的液晶区域的聚合物分别具有彼此不同的网络结构。

5. 发明授权

US5776255A Chemical vapor deposition apparatus 失效
标题翻译：化学气相沉积装置
公开(公告)号：US5776255A
公开(公告)日：1998-07-07
申请号：US675843
申请日：1996-07-05
申请人： Tetsuo Asaba , Yasushi Kawasumi , Kazuaki Ohmi , Yasuhiro Sekine , Yukihiro Hayakawa
发明人： Tetsuo Asaba , Yasushi Kawasumi , Kazuaki Ohmi , Yasuhiro Sekine , Yukihiro Hayakawa
IPC分类号： H01L21/205 , C23C16/04 , C23C16/20 , C23C16/448 , H01L21/20 , H01L21/28 , H01L21/285 , H01L21/31 , H01L21/3205 , H01L23/52 , C23C16/00
CPC分类号： C23C16/4487 , C23C16/045 , C23C16/20 , C23C16/4482 , H01L21/02381 , H01L21/02532 , H01L21/0262 , H01L21/02639 , H01L21/28562 , Y10S261/65
摘要： A chemical vapor deposition apparatus comprises a starting material container holding a starting material in a liquid state, a starting gas generating container into which the liquid starting material is fed from the starting material container, a means for keeping constant the liquid level of the liquid starting material held in the starting gas generating container, a means for injecting a bubbling gas from the outside into the liquid starting material held in the starting gas generating container, thereby bubbling the starting gas, and a reaction chamber into which a mixed gas of the starting gas and the bubbling gas are fed.
摘要翻译：一种化学气相沉积装置，包括：保持液态原料的原料容器，从原料容器供给液体原料的起始气体发生容器，起始液体的液面保持恒定的装置; 保持在起动气体发生容器中的材料，用于将起泡气体从外部喷射到保持在起始气体发生容器中的液体起始材料中，从而使起始气体起泡的装置，以及起动气体的混合气体的反应室气体和鼓泡气体进料。

6. 发明授权

US4446391A Rotating electric machinery 失效
标题翻译：旋转电机
公开(公告)号：US4446391A
公开(公告)日：1984-05-01
申请号：US314029
申请日：1981-10-22
申请人： Yasuhiro Sekine , Masayuki Kuwayama , Hiroshi Harada
发明人： Yasuhiro Sekine , Masayuki Kuwayama , Hiroshi Harada
IPC分类号： F04D25/02 , H02K7/11 , H02K9/06
CPC分类号： H02K9/06 , F04D25/026 , H02K7/11 , H02K2213/09
摘要： A rotating electric machinery comprises a stator; a rotor which is fixed to a rotor shaft and is driven by said motor; a fan which is rotatably connected through a bearing to said rotor to feed air in a predetermined direction; and at least one pair of magnets having a predetermined magnetic force which are fixed on either said rotor or said fan and a magnetic substance having a predetermined coercive force which is fixed on said fan or on said rotor to face said magnet with a desired gap.
摘要翻译：旋转电机包括定子; 固定在转子轴上并由所述电动机驱动的转子; 风扇，其通过轴承可旋转地连接到所述转子以沿预定方向进给空气; 以及固定在所述转子或所述风扇上的具有预定磁力的至少一对磁体和固定在所述风扇或所述转子上的具有预定矫顽力的磁性物质，以面对所述磁体以期望的间隙。

7. 发明申请

US20120199725A1 PHOTOELECTRIC CONVERSION ELEMENT, AND PHOTOELECTRIC CONVERSION APPARATUS AND IMAGING SYSTEM USING THE SAME 有权
标题翻译：光电转换元件和使用该光电转换元件的光电转换装置和成像系统
公开(公告)号：US20120199725A1
公开(公告)日：2012-08-09
申请号：US13364041
申请日：2012-02-01
申请人： Mineo Shimotsusa , Taro Kato , Yasuhiro Sekine , Mahito Shinohara , Takeshi Ichikawa , Genzo Momma
发明人： Mineo Shimotsusa , Taro Kato , Yasuhiro Sekine , Mahito Shinohara , Takeshi Ichikawa , Genzo Momma
IPC分类号： H01L27/146 , G01J1/42
CPC分类号： H01L27/14629 , H01L27/14627
摘要： A light condensing member focuses light, which is incident upon a first area of the light condensing member corresponding to an opening portion of an insulation film, in an upper portion region of a light path member arranged within the opening portion, the insulation film having an upper face extending from the opening portion, and the light path member having a lower face in a region corresponding to a light receiving face of an photoelectric conversion portion.
摘要翻译：聚光部件将布置在开口部内的光路部件的上部区域中入射到聚光部件的与绝缘膜的开口部对应的第一区域的光聚焦，该绝缘膜具有上表面从开口部分延伸，并且光路部件在与光电转换部分的光接收面对应的区域中具有下表面。

8. 发明授权

US08209641B2 Method of fabricating a photomask used to form a lens 有权
标题翻译：制造用于形成透镜的光掩模的方法
公开(公告)号：US08209641B2
公开(公告)日：2012-06-26
申请号：US13076511
申请日：2011-03-31
申请人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
发明人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
IPC分类号： G06F17/50
CPC分类号： G03F1/68 , G03F1/50 , G03F7/0005 , Y10T29/49
摘要： A method of fabricating a photomask used to form a lens. The method includes the steps of generating mask pattern data for each of a plurality of grid cells constituting a mask pattern for the lens, and fabricating the photomask based on the mask pattern data. The step of generating the mask pattern data includes acquiring data which represents a transmitted light distribution required for the photomask to fabricate the lens, in which the transmitted light distribution includes a quantity of transmitted light in each of the plurality of grid cells, and determining whether to place a shield on each of the plurality of grid cells by binarizing the quantity of transmitted light in each of the plurality of grid cells in order of increasing or decreasing distance from a center of the mask pattern using an error diffusion method.
摘要翻译：一种制造用于形成透镜的光掩模的方法。该方法包括以下步骤：为构成透镜的掩模图案的多个网格单元中的每一个生成掩模图案数据，以及基于掩模图案数据来制造光掩模。生成掩模图案数据的步骤包括获取表示光掩模所需的透射光分布以制造透镜的数据，其中透射光分布包括多个格栅单元中的每一个中的透射光量，以及确定是否通过使用误差扩散法从掩模图案的中心的距离的增加或减小的顺序二值化多个网格单元中的每一个网格单元中的透射光的量来将屏蔽放置在多个网格单元中的每一个上。

9. 发明申请

US20080263502A1 MASK PATTERN DATA GENERATING METHOD, INFORMATION PROCESSING APPARATUS, PHOTOMASK FABRICATION SYSTEM, AND IMAGE SENSING APPARATUS 有权
标题翻译：掩模图形数据生成方法，信息处理装置，光电装置制造系统和图像感测装置
公开(公告)号：US20080263502A1
公开(公告)日：2008-10-23
申请号：US12048691
申请日：2008-03-14
申请人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
发明人： Kyouhei Watanabe , Masaki Kurihara , Hitoshi Shindo , Nobuhiko Sato , Yasuhiro Sekine , Masataka Ito
IPC分类号： G06F17/50
CPC分类号： G03F1/68 , G03F1/50 , G03F7/0005 , Y10T29/49
摘要： A method for generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data which represents transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method to acquire the transmitted light distribution, and generates mask pattern data which represents an arrangement of the shields based on results from the determining step.
摘要翻译：用于生成用于形成微透镜的光掩模的掩模图案数据的方法将用于光掩模的掩模图案的图案形成表面划分成多个网格单元，获取表示要使用的掩模图案的透射光分布的数据对于光掩模，通过使用误差扩散方法使用误差扩散方法来依次增加或减小距离图案形成表面的中心的距离来二进制化多个网格单元，来确定是否将多个网格单元中的每一个放置屏蔽，以获取透射光分配，并且基于来自确定步骤的结果生成表示屏蔽的布置的掩模图案数据。

10. 发明授权

US06313894B1 Liquid crystal display 失效
标题翻译：液晶显示器
公开(公告)号：US06313894B1
公开(公告)日：2001-11-06
申请号：US09038687
申请日：1998-03-09
申请人： Yasuhiro Sekine , Shunsuke Inoue , Hiroshi Mizuno
发明人： Yasuhiro Sekine , Shunsuke Inoue , Hiroshi Mizuno
IPC分类号： G02F11333
CPC分类号： G02F1/1334 , G02F2001/13345
摘要： This invention provides a liquid crystal display which comprises a first region including a display region, and a second region being outside the first region, wherein the first and second regions both contain liquid crystal in a polymer network, and a part of the polymer network of the second region is different in structure from the polymer network of the first region, and the part is present in the second region asymmetrically with respect to the first region, and a production method for a liquid crystal display, which comprises providing a liquid crystal material and a prepolymer material in a space between a pair of substrates at least one of which is transparent, and polymerizing the prepolymer material by scanning a first region including a display region and a second region outside the first region with a light beam which causes polymerization.
摘要翻译：本发明提供了一种液晶显示器，其包括包括显示区域的第一区域和位于第一区域外部的第二区域，其中第一和第二区域均包含聚合物网络中的液晶，以及聚合物网络的一部分所述第二区域的结构与所述第一区域的聚合物网络不同，并且所述部分相对于所述第一区域不对称地存在于所述第二区域中，以及液晶显示器的制造方法，其包括提供液晶材料以及预聚物材料，在一对基板之间的空间中，其中至少一个是透明的，并且通过用引起聚合的光束扫描包括显示区域和第一区域外的第二区域的第一区域来聚合预聚物材料。

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