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1. 发明申请

US20120211677A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20120211677A1
公开(公告)日：2012-08-23
申请号：US13461594
申请日：2012-05-01
申请人： Pieter Kruit , Yanxia Zhang , Matijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Matijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G21K5/10
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

2. 发明授权

US09208989B2 Lithography system and method of refracting 有权
$Lithography system and method of refracting$
标题翻译：光刻系统和折射方法
公开(公告)号：US09208989B2
公开(公告)日：2015-12-08
申请号：US13295243
申请日：2011-11-14
申请人： Alexander Hendrik Vincent Van Veen , Yanxia Zhang , Gun Sari Mari Berglund , Pieter Kruit
发明人： Alexander Hendrik Vincent Van Veen , Yanxia Zhang , Gun Sari Mari Berglund , Pieter Kruit
IPC分类号： H01J3/26 , H01J37/09
CPC分类号： H01J37/09 , H01J2237/002 , H01J2237/0453 , H01J2237/1534 , H01J2237/31774
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.
摘要翻译：一种用于将图案转印到诸如晶片的靶的表面上的带电粒子光刻系统，包括适于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置，所述会聚装置包括第一电极和包括多个孔的孔阵列元件，所述孔阵列元件形成第二电极，其中所述系统适于在所述第一电极和所述第二电极之间产生电场。

3. 发明授权

US08648318B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08648318B2
公开(公告)日：2014-02-11
申请号：US13071225
申请日：2011-03-24
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J37/317 , H01J37/147 , H01J37/26
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

4. 发明申请

US20120145915A1 Lithography system and method of refracting 有权
$Lithography system and method of refracting$
标题翻译：光刻系统和折射方法
公开(公告)号：US20120145915A1
公开(公告)日：2012-06-14
申请号：US13295243
申请日：2011-11-14
申请人： Alexander Hendrik Vincent VAN VEEN , Yanxia ZHANG , Gun Sari Mari BERGLUND , Pieter KRUIT
发明人： Alexander Hendrik Vincent VAN VEEN , Yanxia ZHANG , Gun Sari Mari BERGLUND , Pieter KRUIT
IPC分类号： H01J3/14
CPC分类号： H01J37/09 , H01J2237/002 , H01J2237/0453 , H01J2237/1534 , H01J2237/31774
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.
摘要翻译：一种用于将图案转印到诸如晶片的靶的表面上的带电粒子光刻系统，包括适于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置，所述会聚装置包括第一电极和包括多个孔的孔阵列元件，所述孔阵列元件形成第二电极，其中所述系统适于在所述第一电极和所述第二电极之间产生电场。

5. 发明授权

US08134135B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08134135B2
公开(公告)日：2012-03-13
申请号：US11880872
申请日：2007-07-23
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J37/302 , H01J37/04
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

6. 发明申请

US20110163244A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20110163244A1
公开(公告)日：2011-07-07
申请号：US13050875
申请日：2011-03-17
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J3/14
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。进一步阐述，透镜与限流孔结合，相对于所述结构的透镜对准，使得由所述透镜中的所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

7. 发明申请

US20060142536A1 Biodegradable linear random copolyster and process for preparing it and use of the same 有权
标题翻译：可生物降解的线性随机共聚物及其制备方法及其应用
公开(公告)号：US20060142536A1
公开(公告)日：2006-06-29
申请号：US11312373
申请日：2005-12-21
申请人： Wei Chen , Guixiang Zhu , Xirong Chen , Wei Zhang , Yifan Yan , Yanxia Zhang , Jinglan Lu
发明人： Wei Chen , Guixiang Zhu , Xirong Chen , Wei Zhang , Yifan Yan , Yanxia Zhang , Jinglan Lu
IPC分类号： C08G63/02
CPC分类号： C08G63/84 , C08G63/183 , Y10T428/2913 , Y10T428/31786
摘要： The present invention relates to a biodegradable, random and linear copolyester of high molecular weight and narrow molecular weight distribution, and to process for preparing it and use of the same. The present copolyester has a weight-average molecular weight Mw of 100,000-600,000 g/mol, and a molecular weight distribution of 1.2-3. The copolyester is widely used in the fields of profiles, films, fibers and coatings. The process for synthesizing the polyester described herein comprises the steps of: 1) adding the following monomers and an optional catalyst component Cat1 to a reactor to carry out interesterification and/or esterification: (a) aromatic dicarboxylic acid, ester thereof, anhydride thereof, or mixture thereof, (b) aliphatic diol, alicyclic diol or mixture thereof, and (c) aliphatic dicarboxylic acid, alicyclic dicarboxylic acid, ester thereof, anhydrides thereof, or mixture thereof; 2) prepolymerizing the reaction system obtained in step 1) under vacuum; and 3) adding a catalyst component Cat2 to the prepolymerized product obtained in step 2) to carry out polycondensation under vacuum, thereby obtaining the desired polyester; wherein the catalyst component Cat1 is selected from the group consisting of the compounds of Ti, Sb and Zn, and mixtures thereof; and the catalyst component Cat2 is selected from the compounds of RE and mixtures thereof.
摘要翻译：本发明涉及高分子量和窄分子量分布的可生物降解的无规和线性共聚酯，并且涉及其制备和使用方法。本发明的共聚酯的重均分子量M≤100000〜100,000g / mol，分子量分布为1.2-3。共聚酯广泛用于型材，薄膜，纤维和涂料领域。本文所述的合成聚酯的方法包括以下步骤：1）将下列单体和任选的催化剂组分Cat1加入到反应器中以进行酯交换和/或酯化：（a）芳族二羧酸，其酯，其酸酐，或其混合物，（b）脂族二醇，脂环族二醇或其混合物，和（c）脂族二羧酸，脂环族二羧酸，其酯，其酸酐或其混合物; 2）在真空中预聚合步骤1）中得到的反应体系; 和3）在步骤2）中得到的预聚合产物中加入催化剂组分Cat2进行真空缩聚反应，从而获得所需的聚酯; 其中催化剂组分Cat1选自Ti，Sb和Zn的化合物及其混合物; 催化剂组分Cat2选自RE化合物及其混合物。

8. 发明授权

US08598545B2 Multiple beam charged particle optical system 有权
标题翻译：多光束带电粒子光学系统
公开(公告)号：US08598545B2
公开(公告)日：2013-12-03
申请号：US13461594
申请日：2012-05-01
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

9. 发明授权

US08533346B2 SIP-based network video surveillance system and method 有权
标题翻译：基于SIP的网络视频监控系统及方法
公开(公告)号：US08533346B2
公开(公告)日：2013-09-10
申请号：US12884477
申请日：2010-09-17
申请人： Ning Cao , Ming Feng , Duguo Liang , Yanxia Zhang , Zemin Zheng
发明人： Ning Cao , Ming Feng , Duguo Liang , Yanxia Zhang , Zemin Zheng
IPC分类号： G06F15/16 , H04N7/18
CPC分类号： H04N21/643 , H04L65/1006
摘要： The present invention provides a SIP-based network video surveillance system and method, which relates to the application field of network video surveillance. The network video surveillance method comprises the steps of: receiving a request message from a client by a call control server (CCS), the request message comprising an ID of a Premises Unit (PU) and a channel ID; forwarding the request message to a center management server (CMS) by the CCS for access authentication; transmitting the request message to the PU by the CCS after the request message passes the access authentication; responding by the PU an acknowledgement message containing video codec information to the CMS via the CCS; forwarding the acknowledgement message containing the video codec information and an access path to the client by the CMS, then establishing, by the client, a video stream connection with a network element directed by the access path on the basis of the acknowledge message. The present invention uses SIP in conjunction with other protocols to build a complete video surveillance architecture, improving the extensibility of a platform and makes the whole system more stable and reliable.
摘要翻译：本发明提供了一种基于SIP的网络视频监控系统和方法，涉及网络视频监控的应用领域。网络视频监控方法包括以下步骤：由呼叫控制服务器（CCS）从客户端接收请求消息，所述请求消息包括房屋单元（ID）的ID和信道ID; 由CCS对中心管理服务器（CMS）转发请求消息进行认证; 在请求消息通过接入认证后，由CCS发送请求消息给PU; 通过CCS向CMS响应包含视频编解码器信息的确认消息给CMS; 将包含视频编解码器信息的确认消息和存取路径发送给客户端，然后由客户端根据确认消息建立由接入路径指导的网络元件的视频流连接。本发明结合其他协议使用SIP构建完整的视频监控架构，提高平台的可扩展性，使整个系统更加稳定可靠。

10. 发明申请

US20110168910A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20110168910A1
公开(公告)日：2011-07-14
申请号：US13071225
申请日：2011-03-24
申请人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Martijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G21K1/08
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

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