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1. 发明授权

US08921758B2 Modulation device and charged particle multi-beamlet lithography system using the same 有权
标题翻译：调制装置和带电粒子的多光束光刻系统使用相同
公开(公告)号：US08921758B2
公开(公告)日：2014-12-30
申请号：US13281559
申请日：2011-10-26
申请人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
发明人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
IPC分类号： H01J3/14 , H01J5/16 , H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/3174 , H01J37/3177 , H01J2237/0437
摘要： The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.
摘要翻译：本发明涉及带电粒子多子束光刻系统。该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。子束消除器阵列包括设置有包括一个或多个调制器的第一区域和不含调制器的第二区域的衬底。子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。

2. 发明授权

US08492731B2 Charged particle multi-beamlet lithography system with modulation device 有权
标题翻译：带调制装置的带电粒子多光束光刻系统
公开(公告)号：US08492731B2
公开(公告)日：2013-07-23
申请号：US12911911
申请日：2010-10-26
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G21K5/04
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array.
摘要翻译：一种用于将图案转印到目标表面上的带电粒子光刻系统。该系统包括用于产生多个带电粒子子束的束发生器，多个子束限定列，具有用于阻挡子束到达目标表面的表面的光束停止阵列和该表面中的孔阵列，用于允许子束到达目标表面，以及调制装置，用于调制子束以防止一个或多个子束到达目标表面或允许一个或多个子束到达目标表面，通过偏转或不偏转子束，使得子束被阻挡或不被阻挡束阻挡。

3. 发明申请

US20120091318A1 BEAMLET BLANKER ARRANGEMENT 有权
标题翻译：波纹棉布布置
公开(公告)号：US20120091318A1
公开(公告)日：2012-04-19
申请号：US12905131
申请日：2010-10-15
申请人： Marco Jan Jaco WIELAND , Alexander Hendrik Vincent VAN VEEN
发明人： Marco Jan Jaco WIELAND , Alexander Hendrik Vincent VAN VEEN
IPC分类号： H01J3/26 , G01J1/44
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J2237/0437 , H01J2237/0492 , H01J2237/1504 , H01J2237/2485 , H01J2237/31762
摘要： The invention relates to a charged particle multi-beamlet lithography system for exposing a target using a plurality of beamlets. The system has a beam generator, a beamlet blanker, and a beamlet projector. The beam generator is configured to generate a plurality of charged particle beamlets. The beamlet blanker is configured to pattern the beamlets. The beamlet projector is configured to project the patterned beamlets onto the target surface. The system further has a deflection device. The deflection device has a plurality of memory cells. Each memory cell is provided with a storage element and is connected to a switching electrode of a deflector.
摘要翻译：本发明涉及一种用于使用多个子束曝光靶的带电粒子多子束光刻系统。该系统具有光束发生器，子束遮挡器和小射束投影仪。束发生器被配置为产生多个带电粒子子束。子束消除器被配置为对子束进行图案化。子束投影仪被配置为将图案化的子束投影到目标表面上。该系统还具有偏转装置。偏转装置具有多个存储单元。每个存储单元设置有存储元件，并连接到偏转器的开关电极。

4. 发明申请

US20110261340A1 Modulation device and charged particle multi-beamlet lithography system using the same 有权
标题翻译：调制装置和带电粒子的多光束光刻系统使用相同
公开(公告)号：US20110261340A1
公开(公告)日：2011-10-27
申请号：US12911859
申请日：2010-10-26
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G03B27/54 , G01J1/42
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the plurality of beamlets in accordance with a pattern. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements, a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals. The light sensitive elements are electrically connected to one or more modulators for providing the received pattern data. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators, wherein the shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.
摘要翻译：本发明涉及一种使用多个带电粒子子束将图案转印到目标表面上的带电粒子多子束光刻系统。该系统包括光束发生器，子束遮挡器阵列，屏蔽结构和投影系统。束发生器被布置用于产生多个带电粒子子束。子束阻挡器阵列被布置成根据图案图案化多个子束。子束遮蔽器阵列包括多个调制器和多个光敏元件，光敏元件被布置成接收携带光束的图案数据并将光束转换成电信号。光敏元件电连接到一个或多个调制器以提供接收到的图案数据。屏蔽结构是用于基本上屏蔽在光敏元件附近与调制器产生的电场的导电材料，其中屏蔽结构被设置成预定电位。投影系统布置成将图案化的子束投影到目标表面上。

5. 发明授权

US11728123B2 Charged particle blocking element, exposure apparatus comprising such an element, and method for using such an exposure apparatus 有权
公开(公告)号：US11728123B2
公开(公告)日：2023-08-15
申请号：US17409726
申请日：2021-08-23
申请人： Alexander Hendrik Vincent Van Veen , Derk Ferdinand Walvoort
发明人： Alexander Hendrik Vincent Van Veen , Derk Ferdinand Walvoort
IPC分类号： H01J37/04 , H01J37/317
CPC分类号： H01J37/045 , H01J37/3177 , H01J2237/002 , H01J2237/0437
摘要： The invention relates to an exposure apparatus and a method for projecting a charged particle beam onto a target. The exposure apparatus comprises a charged particle optical arrangement comprising a charged particle source for generating a charged particle beam and a charged particle blocking element and/or a current limiting element for blocking at least a part of a charged particle beam from a charged particle source. The charged particle blocking element and the current limiting element comprise a substantially flat substrate provided with an absorbing layer comprising Boron, Carbon or Beryllium. The substrate further preferably comprises one or more apertures for transmitting charged particles. The absorbing layer is arranged spaced apart from the at least one aperture.

6. 发明授权

US08653485B2 Projection lens arrangement 有权
标题翻译：投影镜头布置
公开(公告)号：US08653485B2
公开(公告)日：2014-02-18
申请号：US13397814
申请日：2012-02-16
申请人： Marco Jan-Jaco Wieland , Alexander Hendrik Vincent Van Veen
发明人： Marco Jan-Jaco Wieland , Alexander Hendrik Vincent Van Veen
IPC分类号： H01J37/10 , H01J37/147 , H01J37/30
CPC分类号： H01J37/10 , B82Y10/00 , B82Y40/00 , H01J37/147 , H01J37/1471 , H01J37/1478 , H01J37/30 , H01J37/3007 , H01J37/3177 , H01J2237/0437 , H01J2237/0492
摘要： The invention relates to a charged particle multi-beamlet lithographic system for exposing a target using a plurality of beamlets. The system comprises a beamlet generator for generating a plurality of beamlets, a beamlet blanker for controllably blanking beamlets, and an array of projection lens systems for projecting unblanked beamlets on to the surface of the target. The beamlet generator comprises at least one charged particle source for generating a charged particle beam, a sub-beam generator for defining a plurality of sub-beams from the charged particle beam, a sub-beam manipulator array for influencing the sub-beams, and an aperture array for defining beamlets from the sub-beams.
摘要翻译：本发明涉及一种用于使用多个子束曝光目标的带电粒子多子束光刻系统。该系统包括用于产生多个子束的子波发生器，用于可控制地遮挡子束的子束消除器，以及用于将未平坦化的子束投影到目标表面上的投影透镜系统的阵列。小波发生器包括用于产生带电粒子束的至少一个带电粒子源，用于从带电粒子束定义多个子光束的子光束发生器，用于影响子光束的子光束操纵器阵列，以及用于从子光束定义子束的孔径阵列。

7. 发明授权

US08604411B2 Charged particle beam modulator 有权
标题翻译：带电粒子束调制器
公开(公告)号：US08604411B2
公开(公告)日：2013-12-10
申请号：US13295252
申请日：2011-11-14
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis van de Peut , Henk Derks
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis van de Peut , Henk Derks
IPC分类号： H01J37/147 , G21K5/00
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/241 , H01J37/3177 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.
摘要翻译：本发明涉及一种带电粒子光刻系统，其包括用于产生多个带电粒子子束的束发生器，束阻止阵列和调制装置。光束停止阵列具有用于阻挡子束到达目标表面的表面和表面中的孔径阵列，以允许子束到达目标表面。调制装置被布置用于通过偏转或不偏转子束来调制子束，使得子束被阻挡或不被阻挡阵列阻挡。调制装置的表面区域包括细长的波束区域，其包括孔阵列和相关联的调制器，以及用于容纳为调制装置内的元件供电的功率装置的电源接口区域。电源接口区域位于细长波束区域的长边旁边并沿与其大致平行的方向延伸。

8. 发明授权

US08502176B2 Imaging system 有权
标题翻译：成像系统
公开(公告)号：US08502176B2
公开(公告)日：2013-08-06
申请号：US12994230
申请日：2009-05-22
申请人： Marco Jan-Jaco Wieland , Alexander Hendrik Vincent Van Veen
发明人： Marco Jan-Jaco Wieland , Alexander Hendrik Vincent Van Veen
IPC分类号： G21K5/00
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J2237/0435 , H01J2237/0492
摘要： A charged particle multi-beamlet system for exposing a target (11) using a plurality of beamlets. The system comprises a charged particle source (1) for generating a charged particle beam (20), a beamlet aperture array (4D) for defining groups of beamlets (23) from the generated beam, a beamlet blanker array (6) comprising an array of blankers for controllably blanking the beamlets (23), a beam stop array (8) for blanking beamlets (23) deflected by the blankers, the beam stop array (8) comprising an array of apertures, each beam stop aperture corresponding to one or more of the blankers, and an array of projection lens systems (10) for projecting beamlets on to the surface of the target. The system images the source (1) onto a plane at the beam stop array (8), at the effective lens plane of the projection lens systems (10), or between the beam stop array (8) and the effective lens plane of the projection lens systems (10), and the system images the beamlet aperture array (4D) onto the target (11).
摘要翻译：一种用于使用多个子束曝光目标（11）的带电粒子多子束系统。该系统包括用于产生带电粒子束（20）的带电粒子源（1），用于从产生的束限定子束组23的子束孔阵列（4D），包括阵列的子束消隐器阵列（6）用于可控地消隐子束（23）的阻挡阵列（8），用于冲裁由阻挡物偏转的小束（23）的射束停止阵列（8），包括孔阵列的射束停止阵列（8），每个光束停止孔对应于一个或更多的阻挡物，以及用于将子束投影到靶的表面上的投影透镜系统（10）的阵列。系统将光源（1）成像到光束停止阵列（8）的平面上，在投影透镜系统（10）的有效透镜平面处，或在光束停止阵列（8）和有效透镜平面投影透镜系统（10），并且系统将子束孔径阵列（4D）成像到目标（11）上。

9. 再颁专利

USRE44240E1 Electron beam exposure system 有权
标题翻译：电子束曝光系统
公开(公告)号：USRE44240E1
公开(公告)日：2013-05-28
申请号：US12189817
申请日：2008-08-12
申请人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent Van Veen , Pieter Kruit
发明人： Marco Jan-Jaco Wieland , Bert Jan Kampherbeek , Alexander Hendrik Vincent Van Veen , Pieter Kruit
IPC分类号： H01J37/30 , H01J37/304
CPC分类号： H01J3/02 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3177 , H01J2237/0435 , H01J2237/06308 , H01J2237/06375 , H01J2237/3045
摘要： The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.
摘要翻译：本发明涉及一种用于将图案转印到目标表面上的电子束曝光装置，包括：用于产生多个电子束的小波发生器; 用于接收所述多个电子子束的调制阵列，包括用于调制电子束的强度的多个调制器; 连接到用于单独控制调制器的调制阵列的控制器，可操作地连接到每个调制器的调节器，用于单独调整每个调制器的控制信号; 一种聚焦电子光学系统，包括静电透镜阵列，其中每个透镜将由所述调制阵列传输的相应单独的子束聚焦成小于300nm的横截面，以及用于将其曝光表面保持在其上的靶保持器其图案将在聚焦电子光学系统的第一焦平面中转印。

10. 发明申请

US20110042579A1 CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER 审中-公开
标题翻译：充气颗粒沉积装置和在真空室中产生真空的方法
公开(公告)号：US20110042579A1
公开(公告)日：2011-02-24
申请号：US12708544
申请日：2010-02-19
申请人： Guido DE BOER , Sander BALTUSSEN , Remco JAGER , Jerry Johannes Martinus PEIJSTER , Tijs Frans TEEPEN , Joris Anne Henri VAN NIEUWSTADT , Willem Maurits WEEDA , Alexander Hendrik Vincent VAN VEEN
发明人： Guido DE BOER , Sander BALTUSSEN , Remco JAGER , Jerry Johannes Martinus PEIJSTER , Tijs Frans TEEPEN , Joris Anne Henri VAN NIEUWSTADT , Willem Maurits WEEDA , Alexander Hendrik Vincent VAN VEEN
IPC分类号： H01J37/20
CPC分类号： H01J37/16 , B82Y10/00 , B82Y40/00 , H01J37/165 , H01J37/18 , H01J37/20 , H01J37/305 , H01J37/317 , H01J37/3174 , H01J2237/16
摘要： The invention relates to a charged particle lithography apparatus with a charged particle source for creating one or more charged particle beams, a charged particle projector for projecting the beams onto a wafer; and a moveable wafer stage for carrying the wafer. The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.
摘要翻译：本发明涉及具有用于产生一个或多个带电粒子束的带电粒子源的带电粒子光刻设备，用于将光束投射到晶片上的带电粒子投影仪; 以及用于承载晶片的可移动晶片台。带电粒子源，带电粒子投影仪和可移动晶片台设置在形成真空环境的公共真空室中。真空室还具有用于将晶片装载到室中的开口和门。

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