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    • 3. 发明申请
    • POLYIMIDE CONTAINING SILICATE GROUPS
    • 含聚硅氧烷的聚酰亚胺
    • WO1995033000A1
    • 1995-12-07
    • PCT/JP1995001039
    • 1995-05-30
    • NIPPON STEEL CHEMICAL CO., LTD.FURUKAWA, NobuyukiFUJIYAMA, TakeshiYUASA, Masatoshi
    • NIPPON STEEL CHEMICAL CO., LTD.
    • C08G73/10
    • C08G77/54C08G73/106C08G77/455C08G77/50
    • The invention provides a novel polyimide containing silicate groups, which is excellent in mechanical and electrical properties, heat resistance and also the formability into film, and a film-forming heat-resistant material excellent in solvent and bending resistances and bondability. The polyimide has repeating units each represented by general formula (1) and is produced from a tetracarboxylic acid anhydride and a diamine having at least one alkyl silicate group as the side-chain substituent. In said formula (1) Ar1 represents a tetravalent organic group; R1 and R2 are absent or each represents C1-C4 alkylene or phenylene; R3 to R7, R9 and R10 represent each C1-C6 hydrocarbyl; R8 represents ethylene or C3-C6 alkylene; m and n represent each independently an integer of 1 to 10; and k represents an integer of 0 to 2.
    • 本发明提供一种包含硅酸盐基团的新型聚酰亚胺,其机械和电学性质,耐热性以及成膜性优异,以及溶剂和耐弯曲性和粘合性优异的成膜耐热材料。 聚酰亚胺具有各自由通式(1)表示的重复单元,由四羧酸酐和具有至少一个烷基硅酸酯基的二胺作为侧链取代基制备。 在所述式(1)中,Ar 1表示四价有机基团; R1和R2不存在,或各自表示C1-C4亚烷基或亚苯基; R 3至R 7,R 9和R 10表示每个C 1 -C 6烃基; R8代表乙烯或C3-C6亚烷基; m和n各自独立地表示1〜10的整数, k表示0〜2的整数。