专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08122179B2 Memory apparatus and method of evenly using the blocks of a flash memory 有权
标题翻译：使用闪存块的内存装置和方法
公开(公告)号：US08122179B2
公开(公告)日：2012-02-21
申请号：US11956485
申请日：2007-12-14
申请人： Chien-Cheng Lin , Wen-Chung Chang
发明人： Chien-Cheng Lin , Wen-Chung Chang
IPC分类号： G06F13/00
CPC分类号： G11C16/349 , G06F12/0246 , G06F2212/7211 , G11C16/3495
摘要： A memory apparatus and a method of evenly using the blocks of a flash memory are provided. The memory apparatus comprises a flash memory and a controller. The flash memory comprises a data region with a plurality of data blocks and a spare region with a plurality of spare blocks. The controller is configured to receive data corresponding to the first data block, select a spare block, program data into the spare block when the erase count corresponding to the spare block is less than the predetermined value or to select a second data block and program data stored in the second data block into the spare block when the erased count corresponding to the spare block reaches the predetermined value. As a result, the blocks of the flash memory are used evenly.
摘要翻译：提供了一种均匀地使用闪速存储器块的存储装置和方法。存储装置包括闪速存储器和控制器。闪速存储器包括具有多个数据块的数据区域和具有多个备用块的备用区域。控制器被配置为当与备用块相对应的擦除计数小于预定值时，接收对应于第一数据块的数据，选择备用块，将程序数据写入备用块中，或者选择第二数据块和程序数据当与备用块相对应的擦除计数达到预定值时，将第二数据块中存储在备用块中。结果，闪存的块被均匀地使用。

2. 发明授权

US07683487B2 Structure applied to a photolithographic process 有权
标题翻译：结构应用于光刻工艺
公开(公告)号：US07683487B2
公开(公告)日：2010-03-23
申请号：US11307006
申请日：2006-01-19
申请人： Shun-Li Lin , Yun-Chu Lin , Wen-Chung Chang , Ching-Yi Lee
发明人： Shun-Li Lin , Yun-Chu Lin , Wen-Chung Chang , Ching-Yi Lee
IPC分类号： H01L23/48
CPC分类号： H01L21/0276 , H01L21/31144 , H01L21/76802
摘要： A structure applied to a photolithographic process is provided. The structure includes at least a film layer, an optical isolation layer, an anti-reflection coating and a photoresist layer sequentially formed over a substrate. In the photolithographic process, the optical isolation layer stops light from penetrating down to the film layer. Since the optical isolation layer is set up underneath the photoresist layer, light emitted from a light source during photo-exposure is prevented from reflecting from the substrate surface after passing through the film layer. Thus, the critical dimensions of the photolithographic process are unaffected by any change in the thickness of the film layer.
摘要翻译：提供了应用于光刻工艺的结构。该结构至少包括在衬底上顺序形成的膜层，光隔离层，抗反射涂层和光刻胶层。在光刻工艺中，光隔离层阻止光穿透到膜层。由于光隔离层被设置在光致抗蚀剂层的下方，因此防止了在曝光期间从光源发出的光在通过膜层之后从基板表面反射。因此，光刻工艺的临界尺寸不受膜层厚度的任何变化的影响。

3. 发明授权

US07270549B2 Electrical connector 有权
公开(公告)号：US07270549B2
公开(公告)日：2007-09-18
申请号：US11333411
申请日：2006-01-18
申请人： Ted Ju , Wen-Chung Chang
发明人： Ted Ju , Wen-Chung Chang
IPC分类号： H01R12/00
CPC分类号： H01R13/2492 , H01R33/765 , H01R33/7685 , H01R2201/20
摘要： This invention is about providing a kind of electrical connection design comprising insulator body and conductive terminal; the insulator body is designed with several receptor holes, where each receptor hole is designed with the first conductive terminal and the second conductive terminal; the outer side of the two conductive terminals are designed with conductive connecting section, the inner side is designed with elastic structure. As the first conductive terminal moves downward under pressure, the elastic structure generates elastic deformation. When not under pressure, the elastic structure will move the first conductive terminal upward due to the elasticity, returning to the original state. In addition, the said electrical structure is designed with a shifting structure. As the two conductive terminals are moving relative to each other, at least one conductive terminal will generate shifting along level direction, enabling the scratching action between the conductive terminal and the corresponding electronic component, thus realizing the better electrical connectivity between electronic component and PCB.

4. 发明申请

US20050148166A1 [STRUCTURE APPLIED TO A PHOTOLITHOGRAPHIC PROCESS AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE] 有权
标题翻译： [应用于光刻方法的结构和用于制造半导体器件的方法]
公开(公告)号：US20050148166A1
公开(公告)日：2005-07-07
申请号：US10707632
申请日：2003-12-26
申请人： SHUN-LI LIN , YUN CHU LIN , WEN CHUNG CHANG , CHING YI LEE
发明人： SHUN-LI LIN , YUN CHU LIN , WEN CHUNG CHANG , CHING YI LEE
IPC分类号： H01L21/027 , H01L21/311 , H01L21/4763 , H01L21/768
CPC分类号： H01L21/0276 , H01L21/31144 , H01L21/76802
摘要： A structure applied to a photolithographic process is provided. The structure comprises at least a film layer, an optical isolation layer, an anti-reflection coating and a photoresist layer sequentially formed over a substrate. In the photolithographic process, the optical isolation layer stops light from penetrating down to the film layer. Since the optical isolation layer is set up underneath the photoresist layer, light emitted from a light source during photo-exposure is prevented from reflecting from the substrate surface after passing through the film layer. Thus, the critical dimensions of the photolithographic process are unaffected by any change in the thickness of the film layer.
摘要翻译：提供了应用于光刻工艺的结构。该结构至少包括在衬底上顺序形成的膜层，光学隔离层，抗反射涂层和光致抗蚀剂层。在光刻工艺中，光隔离层阻止光穿透到膜层。由于光隔离层被设置在光致抗蚀剂层的下方，因此防止了在曝光期间从光源发出的光在通过膜层之后从基板表面反射。因此，光刻工艺的临界尺寸不受膜层厚度的任何变化的影响。

5. 发明申请

US20090314318A1 FLOOR WASHING ROBOT 有权
标题翻译：地板洗手机
公开(公告)号：US20090314318A1
公开(公告)日：2009-12-24
申请号：US12142088
申请日：2008-06-19
申请人： Wen-Chung Chang
发明人： Wen-Chung Chang
IPC分类号： A47L11/00
CPC分类号： A47L11/305 , A47L11/40 , A47L2201/00
摘要： A floor washing robot is disclosed. The robot includes: a control unit for controlling a power source to drive at least three omnidirectional wheels and at least one washing disc to rotate to wash a floor; a water spray device for spraying water; and a vacuum device for vacuuming waste water or dirt. The floor washing robot can be moved freely in any direction to improve the cleaning effect.
摘要翻译：公开了一种地板清洗机器人。所述机器人包括：控制单元，用于控制电源以驱动至少三个全向轮和至少一个洗涤盘旋转以洗涤地板; 用于喷水的喷水装置; 以及用于抽真空废水或污垢的真空装置。地板洗涤机器人可以在任何方向自由移动，以提高清洁效果。

6. 发明授权

US07201584B1 Electrical connector for a chip module 失效
标题翻译：芯片模块用电连接器
公开(公告)号：US07201584B1
公开(公告)日：2007-04-10
申请号：US11333445
申请日：2006-01-18
申请人： Ted Ju , Wen-Chung Chang
发明人： Ted Ju , Wen-Chung Chang
IPC分类号： H01R12/00
CPC分类号： H01R13/2407 , H05K7/1069
摘要： An electrical connector for a chip module including an insulator body and a conductive terminal. The insulator body has a plurality of receptor holes. Each of the plurality of receptor holes has a first conductive terminal and a second receptor hole. A first end of the first conductive terminal forms a first conductive connecting section connected to a terminal of the chip module and a second end forming a press-on section. A first end of the second conductive terminal forms a second conductive connecting section that could be electrically connected to an external electronic terminal and a second end forms an elastic section that presses against the press-on section of the first conductive terminal. At least one part of the first conductive connecting section is located at an oblique angle relative to an outer edge of the insulator body.
摘要翻译：一种用于芯片模块的电连接器，包括绝缘体和导电端子。绝缘体具有多个接收孔。多个接收孔中的每一个具有第一导电端子和第二接收孔。第一导电端子的第一端形成连接到芯片模块的端子的第一导电连接部分和形成压接部分的第二端。第二导电端子的第一端形成可以电连接到外部电子端子的第二导电连接部分，并且第二端形成压靠第一导电端子的压接部分的弹性部分。第一导电连接部的至少一部分相对于绝缘体的外缘以倾斜角定位。

7. 发明授权

US07008870B2 Structure applied to a photolithographic process and method for fabricating a semiconductor device 有权
标题翻译：应用于光刻工艺的结构和用于制造半导体器件的方法
公开(公告)号：US07008870B2
公开(公告)日：2006-03-07
申请号：US10707632
申请日：2003-12-26
申请人： Shun-Li Lin , Yun Chu Lin , Wen Chung Chang , Ching Yi Lee
发明人： Shun-Li Lin , Yun Chu Lin , Wen Chung Chang , Ching Yi Lee
IPC分类号： H01L21/4763
CPC分类号： H01L21/0276 , H01L21/31144 , H01L21/76802
摘要： A structure applied to a photolithographic process is provided. The structure comprises at least a film layer, an optical isolation layer, an anti-reflection coating and a photoresist layer sequentially formed over a substrate. In the photolithographic process, the optical isolation layer stops light from penetrating down to the film layer. Since the optical isolation layer is set up underneath the photoresist layer, light emitted from a light source during photo-exposure is prevented from reflecting from the substrate surface after passing through the film layer. Thus, the critical dimensions of the photolithographic process are unaffected by any change in the thickness of the film layer.
摘要翻译：提供了应用于光刻工艺的结构。该结构至少包括在衬底上顺序形成的膜层，光学隔离层，抗反射涂层和光致抗蚀剂层。在光刻工艺中，光隔离层阻止光穿透到膜层。由于光隔离层被设置在光致抗蚀剂层的下方，因此防止了在曝光期间从光源发出的光在通过膜层之后从基板表面反射。因此，光刻工艺的临界尺寸不受膜层厚度的任何变化的影响。

8. 发明授权

US06376643B1 Method of polymerization of lactide and polylactide homopolymer thereof 失效
标题翻译：丙交酯和聚丙交酯均聚物的聚合方法
公开(公告)号：US06376643B1
公开(公告)日：2002-04-23
申请号：US09710038
申请日：2000-11-08
申请人： Wen Chung Chang , Wei-Hsiang Sun
发明人： Wen Chung Chang , Wei-Hsiang Sun
IPC分类号： C08G6308
CPC分类号： C08G63/823 , C08G63/08
摘要： This invention relates to a method of polymerization of lactide or glycolide (GA) monomers and in particular to a method of polymerizing one type of the monomers or two types of the monomers using alkyl aluminum catalyst to proceed with bulk or solution polymerization to prepare biodegradable homopolymers or copolymers, and high-molecular-weight homopolymers of polylactide (PLA), polyglycolide (PGA), or copolymers of lactide/glycolide prepared thereof.
摘要翻译：本发明涉及丙交酯或乙交酯（GA）单体的聚合方法，特别涉及一种使用烷基铝催化剂聚合一种单体或两种单体的方法，以进行本体或溶液聚合以制备可生物降解的均聚物或共聚物，以及聚丙交酯（PLA），聚乙交酯（PGA）的高分子量均聚物或其制备的丙交酯/乙交酯的共聚物。

9. 发明授权

US09572545B2 Radiotherapy system adapted to monitor a target location in real time 有权
标题翻译：适用于实时监控目标位置的放射治疗系统
公开(公告)号：US09572545B2
公开(公告)日：2017-02-21
申请号：US13466142
申请日：2012-05-08
申请人： Yu-Jen Chen , Chia-Yuan Liu , Wen-Chung Chang , Chin-Sheng Chen
发明人： Yu-Jen Chen , Chia-Yuan Liu , Wen-Chung Chang , Chin-Sheng Chen
IPC分类号： A61B8/08 , A61B8/00 , A61N5/10
CPC分类号： A61B8/085 , A61B8/4218 , A61B8/4263 , A61B8/523 , A61B8/5261 , A61B8/565 , A61B8/587 , A61N5/1037 , A61N5/1067 , A61N2005/1058 , G06T7/187 , G06T7/33 , G06T2207/10081 , G06T2207/10132 , G06T2207/20032 , G06T2207/20061 , G06T2207/30056
摘要： The present invention provides a radiotherapy system that can monitor a target location in real time. The radiotherapy system includes a remote control system operable to actuate a real-time image capturing device to acquire images in real time for monitoring the target location. The system also includes an image registration system that can register the acquired image with an image previously captured for the treatment plan, whereby it can be determined whether the patient's tumor is in the beam's eye view of the treatment plan. By confirming that the tumor is in the range of the beam's eye view, the accuracy of the treatment can be improved, and the irradiated area can be reduced, which makes the radiation treatment safer.
摘要翻译：本发明提供了可以实时监视目标位置的放射治疗系统。放射治疗系统包括可操作以致动实时图像捕获装置以实时获取图像的遥控系统，用于监视目标位置。该系统还包括一个图像配准系统，其可以用先前为治疗计划拍摄的图像来注册所获取的图像，从而可以确定患者的肿瘤是否处于治疗计划的眼睛视图中。通过确认肿瘤在眼睛的视野范围内，可以提高治疗的准确性，并且可以减少照射面积，这使得放射治疗更安全。

10. 发明授权

US07261568B2 Electrical connector 有权
标题翻译：电连接器
公开(公告)号：US07261568B2
公开(公告)日：2007-08-28
申请号：US11333410
申请日：2006-01-18
申请人： Ted Ju , Wen-Chung Chang
发明人： Ted Ju , Wen-Chung Chang
IPC分类号： H01R12/00
CPC分类号： H01R13/2435 , H05K7/1069
摘要： A kind of electrical connector comprising insulator body and conductive terminal; the insulator body is installed with several terminal receptor holes; each receptor hole is installed with the first conductive terminal and the second and third conductive terminal located at the two ends of the first conductive terminal; the second and third conductive terminal could move relative to the first conductive terminal and electrically connect to each other in order to form press on contact type electrical connector. Comparing to the present art, the electrical connector of this invention prevents the two ends of the one-body conductive terminal from compression by PCB and chip module at the same time that makes the conductive terminal easily yield and deformed, making the elasticity of the terminal to become poorer and present contact problem, in order to guarantee good electrical conductivity.
摘要翻译：一种电连接器，包括绝缘体和导电端子; 绝缘体安装有多个端子接收孔; 每个接收孔安装有第一导电端子，第二和第三导电端子位于第一导电端子的两端; 第二和第三导电端子可以相对于第一导电端子移动并且彼此电连接，以便在接触型电连接器上形成压力。与现有技术相比，本发明的电连接器同时防止单体导电端子的两端受到PCB和芯片模块的压缩，使导电端子容易屈服变形，从而使端子的弹性变得越来越贫穷和存在接触问题，以保证良好的导电性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式