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    • 2. 发明申请
    • OUT-OF-PLANE TRAVEL RESTRICTION STRUCTURES
    • 超平面旅行限制结构
    • WO2013002767A1
    • 2013-01-03
    • PCT/US2011/042175
    • 2011-06-28
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.MILLIGAN, Donald, J.ALLEY, Rodney L.HARTWELL, Peter, G.WALMSLEY, Robert, G.
    • MILLIGAN, Donald, J.ALLEY, Rodney L.HARTWELL, Peter, G.WALMSLEY, Robert, G.
    • B81C1/00B81B7/02
    • H02N1/00B81B3/0051B81B3/0054B81B2201/0235B81B2203/053B81C1/00388G01P2015/0871H01H3/60H01L29/84
    • The present disclosure includes structures and methods of forming structures for restricting out-of-plane travel. One example of forming such structures includes providing a first wafer (100, 220) comprising a bond layer of a particular thickness (101, 221) on a surface of a substrate material (105, 225), removing the bond layer (101, 221) in a first area (103-1, 103-2, 223) to expose the surface of the substrate material (105, 225), applying a mask to at least a portion of a remaining bond layer (109-1, 109-4, 229-1, 229-3) and a portion of the exposed surface of the substrate material in the first area (109-2, 109-3, 229-2) to form a second area exposed on the surface of the substrate material (105, 225), etching the second area to form a cavity (110, 230) in the substrate material (105, 225) and the bond layer (101, 221), and forming by the etching, in the cavity (110, 230), a structure (113-1, 113-2, 233 for restricting out-of-plane travel, where the structure (113-1, 113-2, 233) has a particular height from a bottom of the cavity (115, 235) determined by the particular thickness of the bond layer (101, 221).
    • 本公开包括形成用于限制飞机外行进的结构的结构和方法。 形成这种结构的一个实例包括在衬底材料(105,225)的表面上提供包括特定厚度(101,221)的接合层的第一晶片(100,220),去除接合层(101,221) )在第一区域(103-1,103-2,223)中以暴露所述衬底材料(105,225)的表面,将掩模施加到剩余接合层(109-1,109-和223)的至少一部分上, 4,229-1,229-3)和第一区域(109-2,103-3,229-2)中的基板材料的暴露表面的一部分,以形成暴露在基板表面上的第二区域 蚀刻所述第二区域以在所述基底材料(105,225)和所述接合层(101,221)中形成空腔(110,230),并且通过所述蚀刻在所述空腔(110)中形成 ,230),用于限制平面外行进的结构(113-1,113-2,233),其中结构(113-1,113-2,233)具有距腔的底部的特定高度( 115,235)由粘合剂l的特定厚度确定 ayer(101,221)。
    • 6. 发明申请
    • THREE PHASE CAPACITANCE-BASED SENSING
    • 三相电容传感器
    • WO2010107436A1
    • 2010-09-23
    • PCT/US2009/037648
    • 2009-03-19
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.WALMSLEY, Robert, G.
    • WALMSLEY, Robert, G.
    • G01P15/08B81B7/02B81C3/00
    • G01P15/125B81B3/0086B81B7/008B81B2201/0235B81B2203/0136G01P15/131G01P15/18G01P2015/0814G01P2015/082
    • Various systems and methods for sensing are provided. In one embodiment, a sensing system is provided that includes a first electrode array disposed on a proof mass, and a second electrode array disposed on a planar surface of a support structure. The proof mass is attached to the support structure via a compliant coupling such that the first electrode array is positioned substantially parallel to and faces the second electrode array and the proof mass is capable of displacement relative to the support structure. The first electrode array includes a plurality of first patterns of electrodes and the second electrode array includes a plurality of second patterns of electrodes. The sensing system further includes circuitry configured to provide an input voltage to each of the second patterns of electrodes to produce an electrical null position for the first electrode array.
    • 提供了用于感测的各种系统和方法。 在一个实施例中,提供了一种感测系统,其包括设置在检测质量块上的第一电极阵列和设置在支撑结构的平坦表面上的第二电极阵列。 检测质量通过柔性联接件附接到支撑结构,使得第一电极阵列基本上平行于第二电极阵列并面对第二电极阵列,并且检测质量块能够相对于支撑结构移位。 第一电极阵列包括多个电极的第一图案,第二电极阵列包括多个第二图案的电极。 感测系统还包括被配置为向每个第二电极图形提供输入电压以产生第一电极阵列的电零位置的电路​​。
    • 10. 发明申请
    • COMPENSATING FREQUENCY MISMATCH IN GYROSCOPES
    • 补偿频率误差在晶体中
    • WO2010050967A1
    • 2010-05-06
    • PCT/US2008/081985
    • 2008-10-31
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.ZHANG, WenhuaWALMSLEY, Robert G.
    • ZHANG, WenhuaWALMSLEY, Robert G.
    • G01C19/00G01P9/04
    • G01C19/5755G01C19/574
    • Gyroscopes that can compensate frequency mismatch are provided. In this regard, a representative gyroscope, among others, includes a top substrate comprising an outermost structure, a first driving structure and a first sensing structure. The first driving structure and the first sensing structure are disposed within the outermost structure. The first driving structure and the first sensing structure include a first driving electrode and a first sensing electrode that are disposed on a bottom surface of the first driving structure and first sensing structure, respectively. A portion of the mass on the top surface of the first sensing structure is removed. The gyroscope further includes a bottom substrate that is disposed below the top substrate. The bottom substrate includes a second driving electrode and a second sensing electrode that are disposed on a top surface of the bottom substrate and below the first driving electrode and the first sensing electrode.
    • 提供可以补偿频率不匹配的陀螺仪。 在这方面,代表性陀螺仪其中包括包括最外面结构的顶部基底,第一驱动结构和第一感测结构。 第一驱动结构和第一感测结构设置在最外面的结构内。 第一驱动结构和第一感测结构包括分别设置在第一驱动结构和第一感测结构的底表面上的第一驱动电极和第一感测电极。 去除第一感测结构的顶表面上的质量的一部分。 陀螺仪还包括设置在顶部基板下方的底部基板。 底部基板包括设置在底部基板的顶表面上并且在第一驱动电极和第一感测电极下方的第二驱动电极和第二感测电极。