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    • 1. 发明授权
    • Memory device and CBRAM memory with improved reliability
    • 内存设备和CBRAM内存,可靠性提高
    • US09082965B2
    • 2015-07-14
    • US13055146
    • 2009-07-27
    • Cyril DresslerVeronique Sousa
    • Cyril DresslerVeronique Sousa
    • H01L45/00G11C13/00
    • H01L45/1233G11C13/0011H01L45/085H01L45/1266H01L45/142H01L45/143H01L45/144H01L45/1658H01L45/1675
    • A memory device including: one inert electrode including an electrically conductive material, a part of at least one material of resistivity higher than that of the material of the inert electrode, positioned around the inert electrode, a solid electrolyte positioned on at least one part of the inert electrode and of the part of electrically insulating material, and including metal ions originating from an ionizable metal part positioned on the solid electrolyte. The ratio between the coefficient of electrical resistivity of the material of resistivity higher than that of the material of the inert electrode and the coefficient of electrical resistivity of the material of the inert electrode is equal to or higher than approximately 100, and the coefficient of thermal conductivity of the electrically insulating material is equal to or higher than approximately 10 W·m−1·K−1.
    • 一种存储装置,包括:一个惰性电极,包括导电材料,至少一种电阻率高于惰性电极材料的电阻的一部分,位于惰性电极周围,固定电解质位于至少一部分 惰性电极和电绝缘材料的一部分,并且包括源自位于固体电解质上的可电离金属部件的金属离子。 电阻率高于惰性电极材料的电阻系数与惰性电极材料的电阻系数之比等于或大于约100,而热系数 电绝缘材料的导电率等于或大于约10W·m-1·K-1。
    • 2. 发明授权
    • Method for making PMC type memory cells
    • 制作PMC型存储单元的方法
    • US08021953B2
    • 2011-09-20
    • US12790024
    • 2010-05-28
    • Cyril DresslerVeronique Sousa
    • Cyril DresslerVeronique Sousa
    • H01L21/20
    • G11C13/0011G11C2213/55H01L45/085H01L45/1233H01L45/141H01L45/1641
    • A microelectronic device includes: at least one cell or element including at least one first electrode, at least one second electrode, and at least one stack of thin layers between the first electrode and the second electrode. The stack includes at least one doped chalcogenide layer capable of forming a solid electrolyte, the doped chalcogenide layer being provided on and in contact with the first electrode; at least one interface layer provided on and in contact with the doped chalcogenide layer, the interface layer being based on a material different from the chalcogenide, the material being carbon or carbon comprising a metallic additive or a semiconducting additive; and at least one metallic ion donor layer provided on and in contact with the interface layer, the metallic ion donor layer being an ion source for the solid electrolyte.
    • 微电子器件包括:在第一电极和第二电极之间的至少一个电池或元件,其包括至少一个第一电极,至少一个第二电极和至少一个薄层堆叠。 所述堆叠包括能够形成固体电解质的至少一个掺杂的硫族化物层,所述掺杂的硫族化物层设置在所述第一电极上并与所述第一电极接触; 至少一个界面层,其设置在掺杂的硫族化物层上并与掺杂的硫族化物层接触,所述界面层基于不同于硫族化物的材料,所述材料是包含金属添加剂或半导体添加剂的碳或碳; 以及设置在所述界面层上并与所述界面层接触的至少一个金属离子供体层,所述金属离子供体层是用于固体电解质的离子源。
    • 6. 发明授权
    • Plastically deformable irreversible storage medium and method of producing one such medium
    • 塑性变形不可逆存储介质及其制造方法
    • US07279418B2
    • 2007-10-09
    • US10579623
    • 2004-12-02
    • Bernard BechevetPierre GaudVeronique Sousa
    • Bernard BechevetPierre GaudVeronique Sousa
    • H01L21/44
    • H01L27/101H01L23/5252H01L2924/0002H01L2924/00
    • The storage medium comprises an array of memory cells (3) which can be addressed by first (1) and second (2) conductors. Each memory cell (3) comprises one zone (10) of an active layer (8) which is initially electrically insulating and which can be made electrically conductive by means of localized plastic deformation (4), such as to selectively connect the first (1) and second (2) associated conductors. Binary information stored in the memory cell (3) is determined by the electrical conducting state of the corresponding zone (10) of the active layer (8). The active layer (8) can be formed using a charged resin. The medium production method comprises assembly of a blank storage medium having an active layer (8) which is in the initial insulating state, production of a stamping die having a stamping pattern that corresponds to the information to be stored, and stamping of the storage medium using the stamping die.
    • 存储介质包括可由第一(1)和第二(2)导体寻址的存储器单元阵列(3)。 每个存储单元(3)包括有源层(8)的一个区域(10),其最初是电绝缘的并且可以通过局部塑性变形(4)制成导电的,例如选择性地将第一(1) )和第二(2)个相关导体。 存储在存储单元(3)中的二进制信息由有源层(8)的相应区域(10)的导电状态确定。 活性层(8)可以使用带电树脂形成。 介质制备方法包括组装具有处于初始绝缘状态的活性层(8)的空白存储介质,制造具有对应于要存储的信息的冲压图案的冲压模具以及存储介质的冲压 使用冲压模具。