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    • 2. 发明申请
    • METHOD FOR PRODUCING MULTILAYERED WIRING SUBSTRATE, MULTILAYERED WIRING SUBSTRATE, AND ELECTRONIC APPARATUS
    • 生产多层配线基板,多层布线基板和电子设备的方法
    • US20090071706A1
    • 2009-03-19
    • US12191358
    • 2008-08-14
    • Tsuyoshi SHINTATEToshimitsu HIRAIJun YAMADA
    • Tsuyoshi SHINTATEToshimitsu HIRAIJun YAMADA
    • H05K1/11B32B37/14
    • H05K3/4664H05K1/185H05K3/125H05K2201/015H05K2203/013H05K2203/0759H05K2203/1173
    • A method for producing a multilayered wiring substrate includes forming a lyophobic area on a first conductive layer, forming an insulating layer with an opening portion on the first conductive layer by applying a functional liquid containing an insulating layer forming material on a periphery of the lyophobic area, laminating the first conductive layer and a second conductive layer via the insulating layer, and electrically connecting the first and the second conductive layers to each other via the opening portion formed in the insulating layer. In the method, when forming the insulating layer, the functional liquid is applied such that an angle of a portion of the functional liquid in contact with the lyophobic area becomes larger than a forward contact angle of the functional liquid, thereby allowing a position of the portion of the functional liquid in contact with the lyophobic area to move inside the lyophobic area to form the opening portion having an opening size smaller than a size of the lyophobic area.
    • 一种多层布线基板的制造方法,其特征在于,在第一导电层上形成疏液区域,在所述疏液性区域的周围涂布含有绝缘层形成材料的功能性液体,在所述第一导电层上形成具有开口部的绝缘层 经由所述绝缘层层压所述第一导电层和第二导电层,并且经由形成在所述绝缘层中的所述开口部将所述第一导电层与所述第二导电层电连接。 在该方法中,当形成绝缘层时,施加功能液体,使得与疏液区域接触的功能液体的一部分的角度大于功能液体的向前接触角,从而允许 功能液体与疏液区域接触的部分在疏液区域内移动以形成具有小于疏液区域的开口尺寸的开口部分。
    • 8. 发明授权
    • Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus
    • 多层结构形成方法,布线基板的制造方法以及电子设备的制造方法
    • US07250377B2
    • 2007-07-31
    • US11201100
    • 2005-08-11
    • Tsuyoshi ShintateToshiaki MikoshibaKenji WadaKazuaki SakuradaJun Yamada
    • Tsuyoshi ShintateToshiaki MikoshibaKenji WadaKazuaki SakuradaJun Yamada
    • H01L21/31
    • H05K3/4664H05K3/125H05K2203/013Y10S257/921
    • There is provided a multi-layered structure forming method comprising: (A) forming a first insulating material layer containing a first photo-curing material on a substrate; (B) semi-hardening the first insulating material layer by radiating light having a first wavelength to the first insulating material layer; (C) forming a conductive material layer on the semi-hardened first insulating material layer by ejecting droplets of a conductive material to the semi-hardened first insulating material layer from a nozzle of a liquid droplet ejecting apparatus; (D) forming a second insulating material layer containing a second photo-curing material so as to cover the semi-hardened first insulating material layer and the conductive material layer; and (E) forming a first insulating layer, a conductive layer positioned on the first insulating material, and a second insulating layer covering the first insulating layer and the conductive layer by simultaneously heating the first insulating material layer, the conductive material layer, and the second insulating material layer.
    • 提供一种多层结构形成方法,包括:(A)在基板上形成含有第一光固化材料的第一绝缘材料层; (B)通过向第一绝缘材料层照射具有第一波长的光而使第一绝缘材料层半硬化; (C)通过从液滴喷射装置的喷嘴向半硬化的第一绝缘材料层喷射导电材料的液滴,在半硬化的第一绝缘材料层上形成导电材料层; (D)形成包含第二光固化材料的第二绝缘材料层以覆盖半硬化的第一绝缘材料层和导电材料层; 和(E)形成第一绝缘层,位于第一绝缘材料上的导电层和通过同时加热第一绝缘材料层,导电材料层和覆盖第一绝缘层和导电层的第二绝缘层 第二绝缘材料层。
    • 10. 发明申请
    • Multilayer structure forming method, method of manufacturing wiring board, and method manufacturing of electronic apparatus
    • 多层结构形成方法,制造布线板的方法和电子设备的方法制造
    • US20060068573A1
    • 2006-03-30
    • US11222851
    • 2005-09-12
    • Tsuyoshi ShintateKazuaki SakuradaJun Yamada
    • Tsuyoshi ShintateKazuaki SakuradaJun Yamada
    • H01L21/20
    • H05K3/4664H01L51/0004H05K3/125H05K2201/09581H05K2201/09909H05K2203/013H05K2203/1173H05K2203/1476
    • A droplet discharge apparatus is used in a multilayer structure forming method of the invention. The multilayer structure forming method includes: discharging droplets of a first conductive material to form a first conductive material pattern on a surface of an object; baking the first conductive material pattern to form a wiring pattern; discharging droplets of a first insulating material including a first photo-curable material to form a first insulating material pattern bordering via holes on the wiring pattern; curing the first insulating material pattern to form a first insulating pattern bordering the via holes; making the surface of the object lyophilic; discharging droplets of a second insulating material including a second photo-curable material to form a second insulating material pattern that covers the wiring pattern and the surface of the object which has been made lyophilic, and surrounds the first insulating pattern; and curing the second insulating material pattern to form a second insulating pattern that surrounds the first insulating pattern. In addition, preferably, the first conductive material includes silver (Ag) nanoparticles.
    • 液滴喷射装置用于本发明的多层结构形成方法中。 多层结构形成方法包括:排出第一导电材料的液滴以在物体的表面上形成第一导电材料图案; 烘烤第一导电材料图案以形成布线图案; 排出包括第一可光固化材料的第一绝缘材料的液滴,以形成与布线图案上的通孔邻接的第一绝缘材料图案; 固化第一绝缘材料图案以形成与通孔相邻的第一绝缘图案; 使物体的表面亲液; 排出包含第二可光固化材料的第二绝缘材料的液滴,以形成覆盖所述布线图形和所述物体表面的第二绝缘材料图案,所述第二绝缘材料图案已经被制成亲液性,并围绕所述第一绝缘图案; 以及固化所述第二绝缘材料图案以形成围绕所述第一绝缘图案的第二绝缘图案。 此外,优选地,第一导电材料包括银(Ag)纳米颗粒。