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    • 2. 发明授权
    • Processing solution tank
    • 加工溶液罐
    • US07824525B2
    • 2010-11-02
    • US11693018
    • 2007-03-29
    • Hideaki HaraToshinori Watanabe
    • Hideaki HaraToshinori Watanabe
    • C25D17/00
    • C25D13/22
    • A processing solution tank of forming an agitating flow by flowing and circulating a processing solution in directions opposite to each other between the side of a liquid surface and the side of a tank bottom, in which a guide plate substantially of an arcuate shape is formed to an end of the tank situated at least to the downstream on the side of the liquid surface or the downstream on the side of the tank bottom in the agitating flow for reversing the flow downward to the tank bottom or upward to the liquid surface, and a swirl chamber having a swirl generating portion of a substantially arcuate face for capturing dusts is provided at the bottom of the tank, whereby high quality surface treatment, for example, electrodeposition coating can be conducted by uniformly stirring the processing solution so as not to cause backflow or turbulence in the processing solution tank while dipping a work on a conveyor in the processing solution.
    • 1.一种处理液槽,其特征在于,在液面的侧面与罐底的侧面之间流动并循环处理液的方向形成搅拌流体,其中形成大致弓形的导向板, 罐的端部至少位于搅拌流中的液面或罐底侧的下游侧的下游,用于将流向下方向下移动到罐底或向上流到液面, 在罐的底部设置有具有用于捕获灰尘的大致弧形面的旋涡产生部的涡流室,由此可以通过均匀搅拌处理溶液来进行高质量的表面处理,例如电沉积涂覆,从而不会引起回流 或处理溶液槽中的湍流,同时将工件浸入处理溶液中的传送带上。
    • 5. 发明申请
    • PROCESSING SOLUTION TANK
    • 加工溶液罐
    • US20070163886A1
    • 2007-07-19
    • US11693018
    • 2007-03-29
    • Hideaki HARAToshinori WATANABE
    • Hideaki HARAToshinori WATANABE
    • C25D1/12
    • C25D13/22
    • A processing solution tank of forming an agitating flow by flowing and circulating a processing solution in directions opposite to each other between the side of a liquid surface and the side of a tank bottom, in which a guide plate substantially of an arcuate shape is formed to an end of the tank situated at least to the downstream on the side of the liquid surface or the downstream on the side of the tank bottom in the agitating flow for reversing the flow downward to the tank bottom or upward to the liquid surface, and a swirl chamber having a swirl generating portion of a substantially arcuate face for capturing dusts is provided at the bottom of the tank, whereby high quality surface treatment, for example, electrodeposition coating can be conducted by uniformly stirring the processing solution so as not to cause backflow or turbulence in the processing solution tank while dipping a work on a conveyor in the processing solution.
    • 1.一种处理液槽,其特征在于,在液面的侧面与罐底的侧面之间流动并循环处理液的方向形成搅拌流体,其中形成大致弓形的导向板, 罐的端部至少位于搅拌流中的液面或罐底侧的下游侧的下游,用于将流向下方向下移动到罐底或向上流到液面, 在罐的底部设置有具有用于捕获灰尘的大致弧形面的旋涡产生部的涡流室,由此可以通过均匀搅拌处理溶液来进行高质量的表面处理,例如电沉积涂覆,从而不会引起回流 或处理溶液槽中的湍流,同时将工件浸入处理溶液中的输送机上。
    • 6. 发明授权
    • Processing solution tank
    • 加工溶液罐
    • US07229541B2
    • 2007-06-12
    • US10896932
    • 2004-07-23
    • Hideaki HaraToshinori Watanabe
    • Hideaki HaraToshinori Watanabe
    • B01D57/02
    • C25D13/22
    • A processing solution tank of forming an agitating flow by flowing and circulating a processing solution in directions opposite to each other between the side of a liquid surface and the side of a tank bottom, in which a guide plate substantially of an arcuate shape is formed to an end of the tank situated at least to the downstream on the side of the liquid surface or the downstream on the side of the tank bottom in the agitating flow for reversing the flow downward to the tank bottom or upward to the liquid surface, and a swirl chamber having a swirl generating portion of a substantially arcuate face for capturing dusts is provided at the bottom of the tank, whereby high quality surface treatment, for example, electrodeposition coating can be conducted by uniformly stirring the processing solution so as not to cause backflow or turbulence in the processing solution tank while dipping a work on a conveyor in the processing solution.
    • 1.一种处理液槽,其特征在于,在液面的侧面与罐底的侧面之间流动并循环处理液的方向形成搅拌流体,其中形成大致弓形的导向板, 罐的端部至少位于搅拌流中的液面或罐底侧的下游侧的下游,用于将流向下方向下移动到罐底或向上流到液面, 在罐的底部设置有具有用于捕获灰尘的大致弧形面的旋涡产生部的涡流室,由此可以通过均匀搅拌处理溶液来进行高质量的表面处理,例如电沉积涂覆,从而不会引起回流 或处理溶液槽中的湍流,同时将工件浸入处理溶液中的输送机上。
    • 8. 发明授权
    • Thin-film magnetic head designed for narrower tracks
    • 专为较窄轨道设计的薄膜磁头
    • US06898055B2
    • 2005-05-24
    • US10277528
    • 2002-10-22
    • Kiyoshi SatoToshinori Watanabe
    • Kiyoshi SatoToshinori Watanabe
    • G11B5/31G11B5/147
    • G11B5/3116G11B5/313
    • A thin-film magnetic head has a second lower core layer sandwiched between a magnetic pole laminate, which is formed of a lower magnetic pole layer, a gap layer, and an upper magnetic pole layer laminated in this order from bottom to top, and a first lower core layer. Unlike a conventional thin-film magnetic head, this thin-film magnetic head does not include a gap depth defining layer. This arrangement makes it possible to easily form the magnetic pole laminate into a substantially rectangular shape, and solves the problems with the conventional thin-film magnetic head attributable to the presence of the gap depth defining layer, the problems being typically represented by a curved gap layer or a reduced volume of the upper magnetic pole layer. Thus, the intensity of a recording magnetic field in the vicinity of a gap can be stabilized and increased, allowing the manufacture of thin-film magnetic heads capable of successfully achieving narrower tracks.
    • 薄膜磁头具有夹在由从下到上依次层叠的下磁极层,间隙层和上磁极层的磁极层叠体之间的第二下芯层, 第一下核心层。 与传统的薄膜磁头不同,该薄膜磁头不包括间隙深度限定层。 这种布置使得可以容易地将磁极层压体形成为大致矩形形状,并且解决了归因于间隙深度限定层的存在的常规薄膜磁头的问题,问题通常由弯曲间隙 层或减小的上磁极层的体积。 因此,能够使间隙附近的记录磁场的强度稳定化,能够制造能够成功实现窄轨道的薄膜磁头。