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1. 发明专利

JP2011012433A Manhole lift preventing structure 有权
标题翻译：手推车预防结构
公开(公告)号：JP2011012433A
公开(公告)日：2011-01-20
申请号：JP2009156810
申请日：2009-07-01
申请人： Hanahara Tomohiro , Satoshi Kawakami , Nishiwaki Masaaki , Toshiki Takahashi , Hiroo Yamaguchi , 裕央山口 , 智河上 , 花原朋廣 , 西脇正明 , 俊樹高橋
发明人： YAMAGUCHI HIROO , KAWAKAMI SATOSHI , TAKAHASHI TOSHIKI
IPC分类号： E02D29/12
摘要： PROBLEM TO BE SOLVED: To provide a manhole lift preventing structure which suppresses a lift of a manhole caused by a liquefaction phenomenon or the like of the ground caused in case of an earthquake or the like, requires only low-cost and short-time construction work dispensing with large-scale construction because of its simple structure and easily applicable to an existing manhole.SOLUTION: The lift preventing structure of the manhole 1 is constituted by installing a ring-like load body 6 around the upper part of a buried manhole body 3, arranging a joint member 9 between the manhole body 3 and a receiving frame 8 with a manhole cover 7 installed, and joining the receiving frame 8 to the manhole body 3 through the joint member 9 to integrate the load body 6 with the manhole body 3 so that the tare of the load body 6 is always applied to the manhole body 3. An additional load of nonshrinkage concrete 12 placed at the top of and around the receiving frame 8, joint member 9 and load body 6 is further applied to prevent the lift of the manhole 1.
摘要翻译：要解决的问题：提供一种能够抑制地震等引起的地面液化现象等引起的人孔升降的人孔防止结构，仅需要低成本和短时间的施工由于其结构简单，易于适用于现有的人孔，工作点胶大型施工。解决方案：井眼1的防风结构通过在埋地井体的上部周围安装环状载荷体6 3，在安装有人孔盖7的人孔体3和接收框架8之间配置接合构件9，并且通过接头构件9将接收框架8接合到人孔体3，以将负载体6与人孔体 3，使得负载体6的皮重总是应用于人孔体3.放置在接收框架8，接头构件9和负载bo的顶部和周围的非破坏性混凝土12的附加载荷 dy 6进一步用于防止人孔1的升降。

2. 发明专利

JP2010070935A Structure for preventing projection and lift of manhole 有权
标题翻译：防止投影和提升管理的结构
公开(公告)号：JP2010070935A
公开(公告)日：2010-04-02
申请号：JP2008237510
申请日：2008-09-17
申请人： Satoshi Kawakami , Toshiki Takahashi , Hiroo Yamaguchi , 裕央山口 , 智河上 , 俊樹高橋
发明人： YAMAGUCHI HIROO , KAWAKAMI SATOSHI , TAKAHASHI TOSHIKI
IPC分类号： E02D29/12 , E02D31/12
摘要： PROBLEM TO BE SOLVED: To provide a structure for preventing the projection and lift of a manhole capable of suppressing the projection and lift of the manhole which are caused by the liquefaction of a ground occurring in an earthquake within an allowable limits, eliminating the need of a large-scaled construction by an extremely simple structure, enabling the construction to be performed at low cost in a short time, and easily applicable even to existing manholes.
SOLUTION: In this structure for preventing the projection and lift of the manhole 1, ring-like support frames 7 are arranged at intervals around the upper part of a buried manhole body 3, a support frame 10 on which a manhole cover 9 is installed is mounted on the support frame 7, and a sealing material 12 is attached to the gap S between the manhole body 3 and the support frame 7. The water W in the ground 2 which is produced during the liquefaction flows out into the manhole body 3 through the sealing material 12. The projection and lift of the manhole are prevented from occurring by the weight of the ring-like support frame 7 and a load placed on a nonshrinkage concrete 13.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于防止能够抑制由地震发生的地面液化引起的人孔的突出和升高的人孔的投影和提升在允许限度内的结构，消除需要通过非常简单的结构进行大规模建设，能够在短时间内以低成本进行施工，并且即使对现有的人孔也容易适用。解决方案：在这种用于防止人孔1的突出和升高的结构中，环状支撑框架7围绕埋藏的人孔体3的上部分布置，支撑框架10在其上具有人孔盖9 被安装在支撑框架7上，并且密封材料12附接到人孔体3和支撑框架7之间的间隙S.在液化过程中产生的地面2中的水W流入人孔主体3通过密封材料12。通过环状支撑框架7的重量和放置在非破坏性混凝土13上的载荷来防止人孔的突出和升力。（C）2010， JPO＆INPIT

3. 发明申请

US20140301000A1 Battery System and Ground Fault Detecting Device 审中-公开
标题翻译：电池系统和接地故障检测装置
公开(公告)号：US20140301000A1
公开(公告)日：2014-10-09
申请号：US13817661
申请日：2011-12-27
申请人： Toshiki Takahashi , Shin Yamauchi
发明人： Toshiki Takahashi , Shin Yamauchi
IPC分类号： H02H3/26
CPC分类号： H02H3/26 , G01R31/025 , H01M10/482
摘要： A first battery pack (252-1) comprises a battery module (314) which includes a plurality of battery cells (310) connected in series between a positive terminal (352) and a negative terminal (353), ground-fault resistances (45) each of which appears between a grounding point (23) and an inter-battery connection point (311) between adjoining ones of the battery cells (310), a booster unit (11) which is provided to the positive terminal (352) and outputs boosted electric potential acquired by boosting high electric potential of the battery module (314), a protective resistance (25) and a ground fault detecting resistance (27) which are provided in series between a third connection point (19) (on the output side of the booster unit (11)) and the grounding point (23), and a ground fault detecting unit (41) which detects the presence/absence of a ground fault in the battery module (314) based on the result of comparison between preset threshold electric potential (Vref) and electric potential of an inter-resistance connection point (29) between the protective resistance (25) and the ground fault detecting resistance (27).
摘要翻译：第一电池组（252-1）包括电池模块（314），其包括串联连接在正极端子（352）和负极端子（353）之间的多个电池单元（310），接地故障电阻（45 ）分别出现在相邻的电池单元（310）之间的接地点（23）和电池间连接点（311）之间，提供给正极端子（352）的升压单元（11）和输出通过提高电池模块（314）的高电位而获得的升压电位，串联地设置在第三连接点（19）（输出端）上的保护电阻（25）和接地故障检测电阻（27）（11））和接地点（23），以及接地故障检测单元（41），其基于电池模块（314）中的接地故障的结果来检测电池模块（314）中是否存在接地故障预设阈值电位（Vref）和电势 1的保护电阻（25）和接地故障检测电阻（27）之间的电阻间连接点（29）。

4. 发明申请

US20120299548A1 Battery System 审中-公开
标题翻译：电池系统
公开(公告)号：US20120299548A1
公开(公告)日：2012-11-29
申请号：US13415201
申请日：2012-03-08
申请人： Toshiki TAKAHASHI , Shin Yamauchi
发明人： Toshiki TAKAHASHI , Shin Yamauchi
IPC分类号： H02J7/00
CPC分类号： H01M2/204 , H01M2/1077 , H02J2007/0067
摘要： There is provided a battery system having a plurality of storage batteries capable of charging and discharging, and at least two or more of the storage batteries are connected in series. The battery system includes a connecting terminal capable of connecting a storage battery in parallel with any one of the other storage batteries. The battery system is capable of replacing the storage battery without restricting the configuration to be serial connection or parallel connection, while avoiding decline of the output power.
摘要翻译：提供一种电池系统，其具有能够充放电的多个蓄电池，并且至少两个以上的蓄电池串联连接。电池系统包括能够与任何一个其他蓄电池并联连接蓄电池的连接端子。电池系统能够更换蓄电池，而不会将配置限制为串行连接或并联，同时避免输出功率的下降。

5. 发明授权

US08267041B2 Plasma treating apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US08267041B2
公开(公告)日：2012-09-18
申请号：US11661135
申请日：2005-08-30
申请人： Toshiji Abe , Toshiki Takahashi , Hiroyuki Matsuura
发明人： Toshiji Abe , Toshiki Takahashi , Hiroyuki Matsuura
IPC分类号： C23C16/50 , C23C16/503 , C23C16/505 , C23C16/507 , C23C16/509 , C23C16/52 , C23F1/00 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32183 , H01J37/32091
摘要： A plasma treating apparatus adapted to provide a predetermined plasma treatment to an object W to be treated comprises a processing chamber 12 configured to be capable of being vacuumed, an object holding means 20 adapted to hold the object to be treated, a high frequency power source 58 adapted to generate high frequency voltage, a plasma gas supplying means 38 adapted to supply a plasma generating gas to be treated to generate plasma to the processing chamber, a pair of plasma electrodes 56, 56B connected to the output side of the high frequency power source via wirings 60 to generate plasma in the processing chamber, the pair of plasma electrodes being brought into an excited electrode state. In addition, a high frequency matching means 72 is provided in the middle of the wirings. In this case, each of the plasma electrodes 56A, 56B is not grounded. Thus, the plasma density can be increased, and the efficiency of generating plasma can be enhanced.
摘要翻译：一种等离子体处理装置，适用于对被处理物体W进行预定的等离子体处理，包括能够被抽真空的处理室12，适于保持待处理物体的物体保持装置20，高频电源适于产生高频电压的等离子体气体供给装置38，其适于将待处理的等离子体产生气体提供给处理室产生等离子体;一对等离子体电极56,56B，其连接到高频功率的输出侧源极通过布线60在处理室中产生等离子体，一对等离子体电极进入激发电极状态。此外，在布线的中间设有高频匹配装置72。在这种情况下，每个等离子体电极56A，56B都不接地。因此，可以提高等离子体密度，并且可以提高产生等离子体的效率。

6. 发明申请

US20100186898A1 PLASMA PROCESSING APPARATUS 有权
标题翻译：等离子体加工设备
公开(公告)号：US20100186898A1
公开(公告)日：2010-07-29
申请号：US12686060
申请日：2010-01-12
申请人： Kohei FUKUSHIMA , Toshiki Takahashi , Hiroyuki Matsuura , Yutaka Motoyama , Kazuya Yamamoto
发明人： Kohei FUKUSHIMA , Toshiki Takahashi , Hiroyuki Matsuura , Yutaka Motoyama , Kazuya Yamamoto
IPC分类号： C23F1/08 , C23C16/505
CPC分类号： C23C16/345 , C23C16/4401 , C23C16/452 , H01J37/321 , H01J37/3244
摘要： A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field and confining a plasma generation area airtightly communicating with the process field, an ICP electrode disposed outside the plasma generation box and extending in a longitudinal direction of the plasma generation box, and an RF power supply connected to the ICP electrode. The ICP electrode includes a separated portion separated from a wall surface of the plasma generation box by a predetermined distance.
摘要翻译：一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。激活机构包括垂直延长的等离子体生成箱，其在对应于处理场的位置处附接到处理容器，并限制与过程场气密地通信的等离子体产生区域; ICP电极，设置在等离子体生成箱的外部并且沿纵向延伸等离子体生成箱的方向，以及与ICP电极连接的RF电源。 ICP电极包括与等离子体发生箱的壁面隔开预定距离的分离部分。

7. 发明授权

US07758920B2 Method and apparatus for forming silicon-containing insulating film 有权
标题翻译：用于形成含硅绝缘膜的方法和装置
公开(公告)号：US07758920B2
公开(公告)日：2010-07-20
申请号：US11496436
申请日：2006-08-01
申请人： Kazuhide Hasebe , Mitsuhiro Okada , Pao-Hwa Chou , Jun Ogawa , Chaeho Kim , Kohei Fukushima , Toshiki Takahashi , Jun Sato
发明人： Kazuhide Hasebe , Mitsuhiro Okada , Pao-Hwa Chou , Jun Ogawa , Chaeho Kim , Kohei Fukushima , Toshiki Takahashi , Jun Sato
IPC分类号： C23C16/00 , H01L21/00
CPC分类号： C23C16/4412 , C23C16/345 , C23C16/452 , C23C16/45527 , C23C16/45546 , C23C16/45578 , H01L21/0217 , H01L21/0228 , H01L21/3141 , H01L21/3185
摘要： A silicon-containing insulating film is formed on a target substrate by CVD, in a process field to be selectively supplied with a purge gas, a first process gas containing a silane family gas, and a second process gas containing a gas selected from the group consisting of nitriding, oxynitriding, and oxidizing gases. This method alternately includes first to fourth steps. The first, second, third, and fourth steps perform supply of the first process gas, purge gas, second process gas, and purge gas, respectively, while stopping supply of the other two gases. The process field is continuously vacuum-exhausted over the first to fourth steps through an exhaust passage provided with an opening degree adjustment valve. An opening degree of the valve in the first step is set to be 5 to 95% of that used in the second and fourth steps.
摘要翻译：通过CVD在目标基板上形成含硅绝缘膜，在选择性地供给吹扫气体的工艺领域中，含有硅烷族气体的第一工艺气体和含有选自下组的气体的第二工艺气体由氮化，氮氧化和氧化气体组成。该方法交替地包括第一至第四步骤。第一，第二，第三和第四步骤分别在停止供应其他两种气体的同时分别供应第一处理气体，吹扫气体，第二处理气体和吹扫气体。通过设置有开度调节阀的排气通道，在第一至第四步骤中连续抽真空排气。第一步骤中的阀的开度设定为第二和第四步骤中使用的阀门的开启度的5至95％。

8. 发明申请

US20090285998A1 PLASMA PROCESSING APPARATUS, ELECTRODE PLATE FOR PLASMA PROCESSING APPARATUS, AND ELECTRODE PLATE MANUFACTURING METHOD 有权
标题翻译：等离子体处理装置，等离子体处理装置的电极板和电极板的制造方法
公开(公告)号：US20090285998A1
公开(公告)日：2009-11-19
申请号：US12505940
申请日：2009-07-20
申请人： Katsuya Okumura , Shinji Himori , Kazuya Nagaseki , Hiroki Matsumaru , Shoichiro Matsuyama , Toshiki Takahashi
发明人： Katsuya Okumura , Shinji Himori , Kazuya Nagaseki , Hiroki Matsumaru , Shoichiro Matsuyama , Toshiki Takahashi
IPC分类号： C23C16/513 , C23C14/24 , C23C16/04 , B05D1/32
CPC分类号： H01L21/3065 , H01J37/32009 , H01J37/32082 , H01J37/32541
摘要： A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A first electrode is disposed within the process container. A supply system is configured to supply a process gas into the process container. An electric field formation system is configured to form an RF electric field within the process container so as to generate plasma of the process gas. A number of protrusions are discretely disposed on a main surface of the first electrode and protrude toward a space where the plasma is generated.
摘要翻译：用于在目标衬底上执行等离子体处理的等离子体处理装置包括：配置成容纳目标衬底并减少其中的压力的处理容器。第一电极设置在处理容器内。供应系统被配置为将处理气体供应到处理容器中。电场形成系统被配置为在处理容器内形成RF电场，以产生处理气体的等离子体。多个突起离散地设置在第一电极的主表面上，朝向产生等离子体的空间突出。

9. 发明申请

US20090181548A1 VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR PROCESS 有权
标题翻译：垂直等离子体处理装置和半导体工艺方法
公开(公告)号：US20090181548A1
公开(公告)日：2009-07-16
申请号：US12411123
申请日：2009-03-25
申请人： Toshiki Takahashi , Kohei Fukushima , Koichi Orito , Jun Sato
发明人： Toshiki Takahashi , Kohei Fukushima , Koichi Orito , Jun Sato
IPC分类号： H01L21/31
CPC分类号： C23C16/45578 , C23C16/345 , C23C16/452 , C23C16/45536 , C23C16/45546 , C23C16/45574
摘要： A vertical plasma processing apparatus for a semiconductor process includes a process container having a process field configured to accommodate a plurality of target substrates at intervals in a vertical direction, and a marginal space out of the process field. In processing the target substrates, a control section simultaneously performs supply of a process gas to the process field from a process gas supply circuit and supply of a blocking gas to the marginal space from a blocking gas supply circuit to inhibit the process gas from flowing into the marginal space.
摘要翻译：用于半导体工艺的垂直等离子体处理装置包括处理容器，其具有被配置为在垂直方向上间隔地容纳多个目标基板的处理区域和处理区域外的边缘空间。在处理目标基板时，控制部分同时执行从处理气体供应电路向处理场供应处理气体，并将阻塞气体从封闭气体供应回路供给到边际空间，以阻止处理气体流入边际空间。

10. 发明申请

US20050276928A1 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method 有权
标题翻译：等离子体处理装置，等离子体处理装置用电极板及电极板的制造方法
公开(公告)号：US20050276928A1
公开(公告)日：2005-12-15
申请号：US11195803
申请日：2005-08-03
申请人： Katsuya Okumura , Shinji Himori , Kazuya Nagaseki , Hiroki Matsumaru , Shoichiro Matsuyama , Toshiki Takahashi
发明人： Katsuya Okumura , Shinji Himori , Kazuya Nagaseki , Hiroki Matsumaru , Shoichiro Matsuyama , Toshiki Takahashi
IPC分类号： H05H1/46 , B01J19/08 , C23C14/00 , C23F4/00 , C25D17/10 , H01J37/32 , H01L21/205 , H01L21/3065
CPC分类号： H01L21/3065 , H01J37/32009 , H01J37/32082 , H01J37/32541
摘要： A plasma processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate and to reduce pressure therein. A first electrode is disposed within the process container. A supply system is configured to supply a process gas into the process container. An electric field formation system is configured to form an RF electric field within the process container so as to generate plasma of the process gas. A number of protrusions are discretely disposed on a main surface of the first electrode and protrude toward a space where the plasma is generated.
摘要翻译：用于在目标衬底上执行等离子体处理的等离子体处理装置包括：配置成容纳目标衬底并减少其中的压力的处理容器。第一电极设置在处理容器内。供应系统被配置为将处理气体供应到处理容器中。电场形成系统被配置为在处理容器内形成RF电场，以产生处理气体的等离子体。多个突起离散地设置在第一电极的主表面上，朝向产生等离子体的空间突出。

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