专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09268325B2 Manufacturing process monitoring system and manufacturing process monitoring method 有权
标题翻译：制造过程监控系统和制造过程监控方法
公开(公告)号：US09268325B2
公开(公告)日：2016-02-23
申请号：US13207943
申请日：2011-08-11
申请人： Tomomi Ino
发明人： Tomomi Ino
IPC分类号： G06F19/00 , G05B19/418
CPC分类号： G05B19/4184 , G05B19/4183 , Y02P90/10 , Y02P90/14
摘要： According to one embodiment, a manufacturing process monitoring system for monitoring anomaly in a manufacturing process for products, the system includes an information storage section, a selection information section, a reference space formation section and a monitoring section. The information storage section is configured to store previously collected data. The selection information section is configured to create information used in classifying the data stored in the information storage section. The reference space formation section is configured to form a reference space based on data subjected to anomaly monitoring acquired in the manufacturing process and the data classified by the information from the data stored in the information storage section. The monitoring section is configured to monitor anomaly of the data subjected to anomaly monitoring based on the reference space.
摘要翻译：根据一个实施例，一种用于监视产品制造过程中的异常的制造过程监控系统，该系统包括信息存储部分，选择信息部分，参考空间形成部分和监视部分。信息存储部分被配置为存储先前收集的数据。选择信息部分被配置为创建用于对存储在信息存储部分中的数据进行分类的信息。参考空间形成部分被配置为基于在制造过程中获取的异常监视数据和根据存储在信息存储部分中的数据由信息分类的数据形成参考空间。该监视部分被配置为基于参考空间来监视遭受异常监视的数据的异常。

2. 发明授权

US07324855B2 Process-state management system, management server and control server adapted for the system, method for managing process-states, method for manufacturing a product, and computer program product for the management server 失效
标题翻译：适用于系统的过程状态管理系统，管理服务器和控制服务器，用于管理过程状态的方法，用于制造产品的方法以及用于管理服务器的计算机程序产品
公开(公告)号：US07324855B2
公开(公告)日：2008-01-29
申请号：US11217592
申请日：2005-09-02
申请人： Yukihiro Ushiku , Hidenori Kakinuma , Tsutomu Miki , Junji Sugamoto , Akira Ogawa , Yoshinori Ookawauchi , Giichi Inoue , Tomomi Ino
发明人： Yukihiro Ushiku , Hidenori Kakinuma , Tsutomu Miki , Junji Sugamoto , Akira Ogawa , Yoshinori Ookawauchi , Giichi Inoue , Tomomi Ino
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/31372 , G05B2219/31395 , G05B2219/31455 , G06Q30/0283 , Y02P90/12 , Y02P90/18 , Y02P90/20
摘要： A process-state management system encompasses: a plurality of production machines; a control server configured to collectively control at least part of the production machines; a management server including a data-linking module configured to link operation-management data of the production machines with corresponding management information transmitted from the control server, respectively, the management server analyze the operation-management data linked with the management information with a common analysis application; and a management database configured to store the operation-management data linked with the management information.
摘要翻译：过程状态管理系统包括：多个生产机器; 控制服务器，其被配置为共同控制所述生产机器的至少一部分; 管理服务器，其包括分别将生产机的运行管理数据与从控制服务器发送的相应的管理信息相连接的数据链接模块，所述管理服务器分析与所述管理信息相关联的运行管理数据，应用; 以及管理数据库，被配置为存储与管理信息相关联的操作管理数据。

3. 发明申请

US20060085165A1 Method for determining a failure of a manufacturing condition, system for determining a failure of a manufacuring condition and method for manufacturing an industrial product 审中-公开
标题翻译：用于确定制造条件故障的方法，用于确定制造条件故障的系统和用于制造工业产品的方法
公开(公告)号：US20060085165A1
公开(公告)日：2006-04-20
申请号：US11236719
申请日：2005-09-28
申请人： Yukihiro Ushiku , Tomomi Ino
发明人： Yukihiro Ushiku , Tomomi Ino
IPC分类号： G06F11/30
CPC分类号： G05B23/024
摘要： A method for determining a failure of a manufacturing condition, includes creating waveforms implemented by respective first data strings of first characteristic variables corresponding to operation parameter data of manufacturing apparatuses which execute manufacturing processes of products under respective manufacturing conditions for the products; classifying the first data strings that are analogous to each other into groups based on a correlation of the waveforms; creating a first visualized data table visualizing magnitude correlations between the first characteristic variables for each of the groups; adding second data strings of second characteristic variables to the groups, the second characteristic variables corresponding to workmanship data representing measurement and inspection results of the products; and creating a second visualized data table visualizing magnitude correlations between the second characteristic variables for each of the groups.
摘要翻译：一种用于确定制造条件故障的方法，包括：通过对与产品的相应制造条件下执行产品的制造过程的制造装置的操作参数数据相对应的第一特征变量的各个第一数据串实现的波形; 基于波形的相关性将彼此类似的第一数据串分组成组; 创建第一可视化数据表可视化每个组的第一特征变量之间的幅度相关性; 将第二特征变量的第二数据串添加到组中，对应于表示产品的测量和检查结果的工艺数据的第二特征变量; 以及创建第二可视化数据表，其可视化每个组的第二特征变量之间的幅度相关性。

4. 发明授权

US06780657B2 Temperature measuring method and apparatus, measuring method for the thickness of the formed film, measuring apparatus for the thickness of the formed film thermometer for wafers 失效
标题翻译：温度测量方法和装置，成膜厚度的测量方法，用于晶片的成型薄膜温度计的厚度的测量装置
公开(公告)号：US06780657B2
公开(公告)日：2004-08-24
申请号：US10206186
申请日：2002-07-29
申请人： Tomomi Ino , Akira Soga , Yoshiaki Akama
发明人： Tomomi Ino , Akira Soga , Yoshiaki Akama
IPC分类号： H01L2166
CPC分类号： G01J5/0003
摘要： A temperature measuring apparatus, comprises a light splitting section for splitting the light radiated from a substrate into plural light components having wavelengths over a predetermined wavelength region, a detection section for detecting the intensities of the light components obtained by the light splitting section, an integrated value calculating section for calculating an integrated value of radiation intensity by cumulatively adding the intensities of the light components detected by the detecting section, and a surface temperature calculating section for calculating the surface temperature of the substrate from the integrated value, on the basis of reference data representing the relation between the temperature and the integrated value.
摘要翻译：一种温度测量装置，包括：分光部分，用于将从衬底辐射的光分成具有预定波长区域上的波长的多个光分量;检测部分，用于检测由光分离部分获得的光分量的强度，值计算部分，用于通过累积地加上由检测部分检测的光分量的强度来计算辐射强度的积分值;以及表面温度计算部分，用于根据参考值从积分值计算衬底的表面温度表示温度和积分值之间关系的数据。

5. 发明申请

US20060064188A1 Process-state management system, management server and control server adapted for the system, method for managing process-states, method for manufacturing a product, and computer program product for the management server 失效
标题翻译：适用于系统的过程状态管理系统，管理服务器和控制服务器，用于管理过程状态的方法，用于制造产品的方法以及用于管理服务器的计算机程序产品
公开(公告)号：US20060064188A1
公开(公告)日：2006-03-23
申请号：US11217592
申请日：2005-09-02
申请人： Yukihiro Ushiku , Hidenori Kakinuma , Tsutomu Miki , Junji Sugamoto , Akira Ogawa , Yoshinori Ookawauchi , Giichi Inoue , Tomomi Ino
发明人： Yukihiro Ushiku , Hidenori Kakinuma , Tsutomu Miki , Junji Sugamoto , Akira Ogawa , Yoshinori Ookawauchi , Giichi Inoue , Tomomi Ino
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/31372 , G05B2219/31395 , G05B2219/31455 , G06Q30/0283 , Y02P90/12 , Y02P90/18 , Y02P90/20
摘要： A process-state management system encompasses: a plurality of production machines; a control server configured to collectively control at least part of the production machines; a management server including a data-linking module configured to link operation-management data of the production machines with corresponding management information transmitted from the control server, respectively, the management server analyze the operation-management data linked with the management information with a common analysis application; and a management database configured to store the operation-management data linked with the management information.
摘要翻译：过程状态管理系统包括：多个生产机器; 控制服务器，其被配置为共同控制所述生产机器的至少一部分; 管理服务器，其包括分别将生产机的运行管理数据与从控制服务器发送的相应的管理信息相连接的数据链接模块，所述管理服务器分析与所述管理信息相关联的运行管理数据，应用; 以及管理数据库，被配置为存储与管理信息相关联的操作管理数据。

6. 发明申请

US20120072002A1 MANUFACTURING PROCESS MONITORING SYSTEM AND MANUFACTURING PROCESS MONITORING METHOD 有权
标题翻译：制造过程监控系统和制造过程监控方法
公开(公告)号：US20120072002A1
公开(公告)日：2012-03-22
申请号：US13207943
申请日：2011-08-11
申请人： Tomomi INO
发明人： Tomomi INO
IPC分类号： G06F19/00
CPC分类号： G05B19/4184 , G05B19/4183 , Y02P90/10 , Y02P90/14
摘要： According to one embodiment, a manufacturing process monitoring system for monitoring anomaly in a manufacturing process for products, the system includes an information storage section, a selection information section, a reference space formation section and a monitoring section. The information storage section is configured to store previously collected data. The selection information section is configured to create information used in classifying the data stored in the information storage section. The reference space formation section is configured to form a reference space based on data subjected to anomaly monitoring acquired in the manufacturing process and the data classified by the information from the data stored in the information storage section. The monitoring section is configured to monitor anomaly of the data subjected to anomaly monitoring based on the reference space.
摘要翻译：根据一个实施例，一种用于监视产品制造过程中的异常的制造过程监控系统，该系统包括信息存储部分，选择信息部分，参考空间形成部分和监视部分。信息存储部分被配置为存储先前收集的数据。选择信息部分被配置为创建用于对存储在信息存储部分中的数据进行分类的信息。参考空间形成部分被配置为基于在制造过程中获取的异常监视数据和根据存储在信息存储部分中的数据由信息分类的数据形成参考空间。该监视部分被配置为基于参考空间来监视遭受异常监视的数据的异常。

7. 发明授权

US07463941B2 Quality control system, quality control method, and method of lot-to-lot wafer processing 失效
标题翻译：质量控制体系，质量控制方法，批量批处理方法
公开(公告)号：US07463941B2
公开(公告)日：2008-12-09
申请号：US11395276
申请日：2006-04-03
申请人： Akira Ogawa , Yukihiro Ushiku , Tomomi Ino
发明人： Akira Ogawa , Yukihiro Ushiku , Tomomi Ino
IPC分类号： G06F19/00 , G05B19/418
CPC分类号： G05B19/41875 , G05B2219/32097 , G05B2219/32194 , G05B2219/45031 , H01L21/67253 , Y02P90/20 , Y02P90/22
摘要： A quality control system has: a QC value storage unit, a data acquisition device, a device internal information storage unit, a recipe storage unit, a QC value prediction unit, a wafer determination unit, a recipe selection unit, and a measurement device.
摘要翻译：质量控制系统具有：QC值存储单元，数据获取装置，设备内部信息存储单元，配方存储单元，QC值预测单元，晶片确定单元，配方选择单元和测量装置。

8. 发明申请

US20060235560A1 Quality control system, quality control method, and method of lot-to-lot wafer processing 失效
标题翻译：质量控制体系，质量控制方法，批量批处理方法
公开(公告)号：US20060235560A1
公开(公告)日：2006-10-19
申请号：US11395276
申请日：2006-04-03
申请人： Akira Ogawa , Yukihiro Ushiku , Tomomi Ino
发明人： Akira Ogawa , Yukihiro Ushiku , Tomomi Ino
IPC分类号： G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32097 , G05B2219/32194 , G05B2219/45031 , H01L21/67253 , Y02P90/20 , Y02P90/22
摘要： A quality control system has: a QC value storage unit that stores QC actual measurements of past lots, a data acquisition device that acquires the device internal information of a processing device processing an intended lot, a device internal information storage unit that stores the device internal information, a recipe storage unit that stores a plurality of recipes classified by the distribution of sampling density within a wafer, a QC value prediction unit that predicts a QC prediction value of the intended lot using the device internal information and the QC actual measurements, a wafer determination unit that determines a sample wafer to be measured from among a plurality of wafers constituting the intended lot using the QC prediction value, a recipe selection unit that selects an application recipe to be applied to the sample wafer from among the plurality of recipes using the QC prediction value, and a measurement device that makes a QC measurement on the sample wafer using the application recipe and stores the measurement result in the QC value storage unit.
摘要翻译：质量控制系统具有：存储过去批次的QC实际测量值的QC值存储单元，获取处理预期批次的处理设备的设备内部信息的数据获取设备，存储设备内部的设备内部信息存储单元信息，存储通过晶片内的采样密度分布分类的多个配方的食谱存储单元，使用设备内部信息和QC实际测量来预测预期批次的QC预测值的QC值预测单元，晶片确定单元，其使用QC预测值从构成预期批次的多个晶片中确定待测量的样品晶片;配方选择单元，从多个配方中选择应用于样品晶片的应用配方，所述配方选择单元使用 QC预测值，以及使用该测量装置对样品晶片进行QC测量应用配方，并将测量结果存储在QC值存储单元中。

9. 发明授权

US06541287B2 Temperature measuring method and apparatus, measuring method for the thickness of the formed film, measuring apparatus for the thickness of the formed film thermometer for wafers 失效
公开(公告)号：US06541287B2
公开(公告)日：2003-04-01
申请号：US09261972
申请日：1999-03-03
申请人： Tomomi Ino , Akira Soga , Yoshiaki Akama
发明人： Tomomi Ino , Akira Soga , Yoshiaki Akama
IPC分类号： G01R3226
CPC分类号： G01J5/0003
摘要： A temperature measuring apparatus, comprises a light splitting section for splitting the light radiated from a substrate into plural light components having wavelengths over a predetermined wavelength region, a detection section for detecting the intensities of the light components obtained by the light splitting section, an integrated value calculating section for calculating an integrated value of radiation intensity by cumulatively adding the intensities of the light components detected by the detecting section, and a surface temperature calculating section for calculating the surface temperature of the substrate from the integrated value, on the basis of reference data representing the relation between the temperature and the integrated value.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式