会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Bottom-gate thin-film transistor having a multilayered channel and method for manufacturing same
    • 具有多层通道的底栅薄膜晶体管及其制造方法
    • US08471255B2
    • 2013-06-25
    • US13391427
    • 2010-04-14
    • Tohru Okabe
    • Tohru Okabe
    • H01L29/04H01L29/10H01L31/036H01L31/0376H01L31/20H01L29/76H01L31/112H01L21/00H01L21/84
    • H01L29/04H01L29/66765H01L29/78696
    • Provided is a thin film transistor, wherein the on-off ratio thereof is increased by decreasing the OFF current thereof. A bottom-gate TFT (10) is provided with a channel layer (40) obtained by forming a second silicon layer (35) on a first silicon layer (30). Since amorphous silicon regions (32), which surround multiple grains (31) contained in the first silicon layer (30), contain hydrogen in an amount sufficient to enable termination of dangling bonds, most of dangling bonds in the amorphous silicon region (32) are terminated by hydrogen. For this reason, it becomes less likely to have defect levels formed in the amorphous silicon regions (32), and an OFF current that flows through defect levels is therefore decreased. A high number of the grains (31) are retained in the first silicon layer (30), and cause a large ON current to flow. Consequently, the on-off ratio of the TFT (10) is increased.
    • 提供一种薄膜晶体管,其中通过减小其截止电流来增加其开关比。 底栅TFT(10)设置有通过在第一硅层(30)上形成第二硅层(35)而获得的沟道层(40)。 由于包含在第一硅层(30)中的包围多个晶粒(31)的非晶硅区域(32)含有足以能够终止悬挂键的氢,所以非晶硅区域(32)中的大多数悬挂键 被氢气终止。 因此,在非晶硅区域(32)中形成的缺陷水平变得不太可能,因此流过缺陷水平的OFF电流因此降低。 大量的晶粒(31)保留在第一硅层(30)中,并导致大的导通电流流动。 因此,TFT(10)的开关比增加。
    • 4. 发明申请
    • METHOD FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE
    • 制造薄膜晶体管基板的方法
    • US20120108018A1
    • 2012-05-03
    • US13383220
    • 2010-03-16
    • Tohru OkabeHirohiko NishikiYoshimasa ChikamaTakeshi Hara
    • Tohru OkabeHirohiko NishikiYoshimasa ChikamaTakeshi Hara
    • H01L21/336
    • H01L29/7869G02F1/1368H01L27/1225H01L27/124H01L27/1248H01L29/42384
    • A method for manufacturing a thin film transistor substrate includes a step of forming a gate electrode (11a) and a first interconnect on a substrate (10), a step of forming a gate insulating film (12a) having a contact hole at a position overlapping the first interconnect, a step of forming a source electrode (13a) and a drain electrode (13b) overlapping the gate electrode (11a) and separated apart from each other, and a second interconnect connected via the contact hole to the first interconnect, a step of successively forming an oxide semiconductor film (14) and a second insulating film (15), and thereafter, patterning the second insulating film (15) to form an interlayer insulating film (15a), and a step of reducing the resistance of the oxide semiconductor film (14) exposed through the interlayer insulating film (15a) to form a pixel electrode (14b).
    • 制造薄膜晶体管基板的方法包括在基板(10)上形成栅极(11a)和第一布线的步骤,在重叠的位置形成具有接触孔的栅极绝缘膜(12a)的步骤 所述第一互连,形成与所述栅电极(11a)重叠并分离的源电极(13a)和漏电极(13b)的步骤,以及经由所述接触孔与所述第一互连件连接的第二互连件, 连续地形成氧化物半导体膜(14)和第二绝缘膜(15)的步骤,然后对第二绝缘膜(15)进行图案化以形成层间绝缘膜(15a),并且降低 氧化物半导体膜(14)通过层间绝缘膜(15a)露出以形成像素电极(14b)。