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    • 3. 发明授权
    • Metallic threaded composite fastener
    • 金属螺纹复合紧固件
    • US5090857A
    • 1992-02-25
    • US648772
    • 1991-01-31
    • Thomas J. Dunn
    • Thomas J. Dunn
    • F16B33/00F16B35/02
    • F16B35/02F16B33/006Y10S411/901Y10S411/908
    • A metallic threaded composite fastener, particularly suited for high temperature applications, has a body member made of high temperature-resistant composite material with a ceramic coating. The body member has a head portion configured to be installed in a countersunk hole and a shank portion which is non-circular and tapered. One part of the shank may be non-circular and the other part tapered, or the two types of surfaces could be combined into a frustum of a non-circular cone. A split collar member made of high strength, high temperature-tolerant metal alloy is split into two halves and the interior of the halves are configured to engage the shank. The exterior of the collar has external threads and the upper portion of the collar has a circumferential groove which receives a lock ring to secure the collar halves to the shank. In the assembled condition torque may be transmitted from the body to the split collar by the engaged non-circular portions to install and remove the fastener assembly into or from a threaded aperture and shear loads in the collar threads are transferred to the shank tapered portion as a combination of radial compression and axial tension loads. Thus, tension loads may be applied to the fastener shank without damaging the ceramic coating.
    • 特别适用于高温应用的金属螺纹复合紧固件具有由具有陶瓷涂层的耐高温复合材料制成的主体构件。 主体部件具有构造成安装在埋头孔中的头部和非圆形和锥形的柄部。 柄的一部分可以是非圆形的,另一部分是锥形的,或者两种类型的表面可以组合成非圆锥形的截头锥体。 由高强度,高耐温金属合金制成的开口环构件被分成两半,并且半部的内部构造成接合柄。 轴环的外部具有外螺纹,并且轴环的上部具有周向凹槽,其接收锁定环以将轴颈半部固定到柄。 在组装状态下,扭矩可以通过接合的非圆形部分从主体传递到开口套环,以将紧固件组件安装并移除到螺纹孔中,并将套环螺纹中的剪切载荷传递到柄锥形部分,如 径向压缩和轴向张力负载的组合。 因此,张力负载可以施加到紧固件柄而不损坏陶瓷涂层。
    • 5. 发明授权
    • Microlithography system for high-resolution large-area patterning on curved surfaces
    • 用于在曲面上进行高分辨率大面积图案化的微光刻系统
    • US06304316B1
    • 2001-10-16
    • US09176920
    • 1998-10-22
    • Kanti JainNestor O. FramigaThomas J. Dunn
    • Kanti JainNestor O. FramigaThomas J. Dunn
    • G03B2742
    • G03F7/70266G03F7/703G03F7/70358G03F7/70725G03F7/70791
    • A projection microlithography system that can pattern very large, curved substrates at very high exposure speeds and any desired image resolution, the substrates being permitted to have arbitrary curvature in two dimensions. The substrate is held rigidly on a scanning stage, on which is also mounted a mask containing the pattern to be formed on the substrate. The mask is imaged on the substrate by a projection subsystem which is stationary and situated above the scanning stage. The mask is illuminated with a polygonal illumination beam which causes a patterned region of similar shape to be imaged on the substrate. Different regions of the substrate are moved in a direction parallel to the direction of the optical axis at the substrate (z-axis) by suitable amounts to keep the segment being exposed within the depth of focus of the imaging lens. The stage is programmed to scan the mask and substrate simultaneously across the polygonal regions so as to pattern the whole mask. Suitable overlap between the complementary intensity profiles produced by the polygonal illumination configuration ensures seamless joining of the scans. This microlithography system includes opto-mechanical mechanisms for dynamically sensing the substrate height at each point, for moving the substrate in the z-dimension, and/or configuring the focal plane of the projection subsystem so as to always keep the substrate region being exposed within the depth of focus of the projection subsystem.
    • 投影微光刻系统可以以非常高的曝光速度和任何期望的图像分辨率来绘制非常大的弯曲的基板,允许基板在两个维度上具有任意的曲率。 衬底刚性地保持在扫描台上,其上还安装有将要形成在衬底上的图案的掩模。 掩模通过静止并位于扫描台上方的投影子系统在基板上成像。 掩模被多边形照明光束照射,其使得类似形状的图案化区域在基底上成像。 基板的不同区域沿着平行于基板(z轴)处的光轴方向的方向移动适当的量,以将该段暴露在成像透镜的焦深内。 舞台被编程为跨多边形区域同时扫描掩模和衬底,以便对整个掩模进行图案化。 通过多边形照明配置产生的互补强度分布之间的合适重叠确保了扫描的无缝连接。 该微光刻系统包括用于动态地感测每个点处的衬底高度,用于在z维上移动衬底和/或构造投影子系统的焦平面的光机械机构,以便始终将衬底区域暴露在内 投影子系统的焦点深度。
    • 6. 发明授权
    • Apparatus for projection patterning of large substrates using limited-travel precision x-y stage
    • 使用有限行程精度x-y阶段的大型基板的投影图案化装置
    • US06201597B1
    • 2001-03-13
    • US09245700
    • 1999-02-05
    • Thomas J. DunnNestor O. FarmigaKanti Jain
    • Thomas J. DunnNestor O. FarmigaKanti Jain
    • G03B2742
    • G03F7/707G03F7/70358G03F7/70475G03F7/70716G03F7/70791
    • A large-format substrate patterning system, for microelectronics manufacturing, utilizes a substrate docking fixture to enable relative motion between the substrate stage and the substrate. This enables exposure of a large-format substrate which has been partitioned into different modules where each module contains an entire pattern transferred from a mask. This projection system enables patterning of a large multi-module substrate using a stage whose range of travel is smaller than the size of the substrate and using a mask whose area is smaller than the size of the substrate. This is accomplished by repositioning the substrate to expose each module sequentially In order to reposition the substrate, its location is maintained fixed in space by a substrate docking fixture while the movable stage of the lithography system is repositioned to position a different module of the substrate in the image field of the lithography tool. This allows the use of a mask whose size is determined by the size of each substrate module, and the use of a scanning stage whose required range of travel is determined by the size of the substrate module, and not by the size of the entire substrate. This eliminates the size limitation of the substrate from dependence on the range of travel of the stage, and permits the repetitive use of a small mask or series of small masks to produce a composite multi-module pattern on the substrate.
    • 用于微电子制造的大幅面衬底图案化系统利用衬底对接固定器来实现衬底台和衬底之间的相对运动。 这使得能够将已经被划分成不同模块的大格式衬底曝光,其中每个模块包含从掩模转印的整个图案。 该投影系统能够使用其行程范围小于基板的尺寸并使用面积小于基板尺寸的掩模的大型多模块基板的图案化。 这是通过重新定位衬底以顺序地暴露每个模块来实现的。为了重新定位衬底,其位置通过衬底对接固定装置保持固定在空间中,而光刻系统的可移动平台被重新定位以将衬底的不同模块定位在 光刻工具的图像场。 这允许使用尺寸由每个基板模块的尺寸确定的掩模,并且使用其所需行程范围由基板模块的尺寸确定的扫描台,而不是由整个基板的尺寸 。 这消除了基板的尺寸限制依赖于载物台的行进范围,并且允许重复使用小掩模或一系列小掩模以在基底上产生复合多模块图案。
    • 7. 发明授权
    • Very large area patterning system for flexible substrates
    • 用于柔性基板的非常大的面积图案化系统
    • US6018383A
    • 2000-01-25
    • US915130
    • 1997-08-20
    • Thomas J. DunnNestor O. FarmigaMarc ZemelCarl WeisbeckerKanti Jain
    • Thomas J. DunnNestor O. FarmigaMarc ZemelCarl WeisbeckerKanti Jain
    • G02F1/13G03B27/48G03B27/42G03B27/54
    • G03F7/2035G02F1/13G03F1/60G03F7/703G03F7/70791
    • In the manufacturing of flexible, large-area electronic modules such as flat-panel displays (FPDs), the high cost and low yields of currently available patterning equipment represent a significant barrier to cost-effective production. This invention provides a projection imaging system that can pattern very large, flexible substrates at very high exposure speeds with almost any desired image resolution. The master pattern to be imprinted on the substrate is contained on a mask which, similar to the substrate, is made of a flexible material The mask and substrate are scanned by rollers through the object and the image field, respectively, of a 1:1 projection lens. All of the rollers are driven by identical drive systems linked to a common motor; therefore, the scanning of the mask and substrate is perfectly synchronized. Both the mask and the substrate, along with their rollers, are mounted on a linear translation stage. The translation stage scans continuously at a velocity which is chosen such that, for every complete rotation of the mask and substrate, the linear stage will move by the effective scan width. The entire substrate is patterned using one continuous helical scan. Suitable overlap between complementary intensity profiles produced by a hexagonal illumination configuration ensures seamless joining of the scans. The use of rollers significantly enhances the throughput and effectively reduces the payload and footprint of the scanning stage leading to substantial system cost savings.
    • 在制造柔性的大面积电子模块如平板显示器(FPD)时,目前可用的图案设备的高成本和低产量是成本有效的生产的重要障碍。 本发明提供了一种投影成像系统,其可以以非常高的曝光速度以几乎任何所需的图像分辨率对非常大的柔性基板进行图案化。 要印在基板上的主图案被包含在与基板类似的由柔性材料制成的掩模上。掩模和基板分别通过对象和图像场的辊子被扫描1:1 投影镜头 所有的滚筒均由与普通马达相连的驱动系统驱动; 因此,掩模和基底的扫描完全同步。 掩模和基板以及它们的滚子都安装在线性平移台上。 平移阶段以选择的速度连续扫描,使得对于掩模和衬底的每次完全旋转,线性平台将移动有效扫描宽度。 使用一个连续的螺旋扫描对整个基板进行图案化。 通过六边形照明配置产生的互补强度分布之间的合适重叠确保了扫描的无缝连接。 滚筒的使用显着提高了产量,有效地减少了扫描阶段的有效载荷和占地面积,从而节省了大量的系统成本。
    • 8. 发明授权
    • Double-sided patterning system using dual-wavelength output of an
excimer laser
    • 使用准分子激光器的双波长输出的双面图案化系统
    • US5933216A
    • 1999-08-03
    • US951864
    • 1997-10-16
    • Thomas J. Dunn
    • Thomas J. Dunn
    • G03F7/20G03D27/52
    • G03F7/70425
    • A high-performance projection optical system uses the multiple spectral peaks of an excimer laser system by using an optical dispersive system to physically separate the broadband laser output into separate narrowband beams which can be used for imaging different substrate surfaces simultaneously. The separated narrowband beams are directed along different optical paths and used to illuminate the object planes of different, identical projection lenses. The projection lenses are designed for the narrowed bandwidth corresponding to one spectral peak of the excimer laser rather than the broadband, multiple-peak laser output This dramatically simplifies both the design and the construction of the projection lens, leading to substantial cost-savings. The conversion of the single-beam, broadband spectral output into a multiple-beam, narrowband source is accomplished by optical dispersion means consisting of either several prisms in series, one or more prisms followed by a mirror reflecting back through the prisms, or one or more reflective gratings. The separated narrowband beams are useful for imaging top and bottom of a single substrate with exact registration useful for via-hole connections. Other uses include simultaneous imaging of multiple substrates, using one or more stages.
    • 高性能投影光学系统使用准分子激光系统的多个光谱峰值,通过使用光学色散系统将宽带激光器输出物理分离成单独的窄带束,其可以同时用于成像不同的衬底表面。 分离的窄带光束沿着不同的光路被引导,并用于照亮不同的相同投影透镜的物平面。 投影镜头设计用于对应于准分子激光器的一个光谱峰值的窄带宽,而不是宽带多峰激光输出。这极大地简化了投影镜头的设计和构造,从而节省了大量成本。 将单光束宽带光谱输出转换为多光束窄带光源的光学色散装置由串联的多个棱镜组成,一个或多个棱镜随后是通过棱镜反射的镜子,或者一个或多个 更多的反光栅。 分离的窄带束可用于单个基板的顶部和底部成像,具有用于通孔连接的精确配准。 其他用途包括使用一个或多个阶段同时成像多个底物。
    • 10. 发明授权
    • Navigational plotting system
    • US4468743A
    • 1984-08-28
    • US488674
    • 1983-04-26
    • Thomas J. DunnDonald G. Yuniskis, Jr.Gabor L. SzakacsNghia V. Nguyen
    • Thomas J. DunnDonald G. Yuniskis, Jr.Gabor L. SzakacsNghia V. Nguyen
    • G01C21/22G06F15/20
    • G01C21/22
    • An improved navigational plotting system having convenient initialization and the ability to compute and superimpose hyperbolic time difference lines on a chart includes an X-Y plotter for plotting the position and course of a vessel on a navigational chart or a plain piece of paper, dictated by the reception of hyperbolic navigation signals. Ambiguity-free conversion to latitude and longitude is done automatically without the necessity of manually entering the initial latitude and longitude of the vessel. Remote initialization is established by placing the pen of the plotter on a known point or position on the chart and entering the latitude and longitude of this known position or its hyperbolic navigation coordinates, with all subsequent plot locations being referenced to this point on the chart. A set of default pre-stored conditions are utilized in the initialization procedure in which preset scale size and hyperbolic line parameters are assumed, with convenient override sequences being provided. The plotter includes a high accuracy rapid hyperbolic line drawing system utilizing a specialized approximation sequence for those charts which are not provided with hyperbolic navigation TD lines. A base line extension zone where hyperbolic position ambiguity is difficult to resolve (danger zone) is indicated by the preventing of the drawing of hyperbolic lines in this zone, thereby to give the navigator adequate indication that hyperbolic navigation readings may be ambiguous. A system is provided for rapid counter setting for the counters which drive the pen and also indicate vessel location or destination. This system utilizes differing rates for clocking the counters depending on whether the vessel or destination is on-chart or off-chart. As a further feature, velocity filtering prevents wild pen movement as a result of system transients. Additional auxiliary readout functions such as destination, range, velocity, time of arrival, heading, etc. are also provided.