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    • 2. 发明授权
    • Magnetic random access memory and method of manufacturing the same
    • 磁性随机存取存储器及其制造方法
    • US08592928B2
    • 2013-11-26
    • US13237586
    • 2011-09-20
    • Keiji HosotaniHiroyuki KanayaTakeshi Kajiyama
    • Keiji HosotaniHiroyuki KanayaTakeshi Kajiyama
    • H01L29/82
    • H01L27/228H01L43/08H01L43/12
    • According to one embodiment, a magnetic random access memory includes a selection element formed on a semiconductor substrate, an interlayer dielectric film formed above the selection element, a contact layer formed in the interlayer dielectric film, and electrically connected to the selection element, a lower electrode layer made of a metal material, and electrically connected to the contact layer, a metal oxide insulating film made of an oxide of the metal material, and surrounding a side surface of the lower electrode layer, a magnetoresistive element formed on the lower electrode layer, an upper electrode layer formed on the magnetoresistive element, a sidewall insulating film formed on a side surface of the magnetoresistive element and a side surface of the upper electrode layer, and a bit line electrically connected to the upper electrode layer.
    • 根据一个实施例,磁性随机存取存储器包括形成在半导体衬底上的选择元件,形成在选择元件上方的层间电介质膜,形成于层间电介质膜中的电连接到选择元件的接触层, 电极层,与金属材料电连接,由金属材料的氧化物构成的金属氧化物绝缘膜,围绕下部电极层的侧面,形成在下部电极层上的磁阻元件 形成在磁阻元件上的上电极层,形成在磁阻元件的侧面上的侧壁绝缘膜和上电极层的侧面,以及与上电极层电连接的位线。
    • 3. 发明申请
    • MAGNETIC RANDOM ACCESS MEMORY AND METHOD OF MANUFACTURING THE SAME
    • 磁性随机存取存储器及其制造方法
    • US20120068286A1
    • 2012-03-22
    • US13237586
    • 2011-09-20
    • Keiji HosotaniHiroyuki KanayaTakeshi Kajiyama
    • Keiji HosotaniHiroyuki KanayaTakeshi Kajiyama
    • H01L29/82H01L21/20
    • H01L27/228H01L43/08H01L43/12
    • According to one embodiment, a magnetic random access memory includes a selection element formed on a semiconductor substrate, an interlayer dielectric film formed above the selection element, a contact layer formed in the interlayer dielectric film, and electrically connected to the selection element, a lower electrode layer made of a metal material, and electrically connected to the contact layer, a metal oxide insulating film made of an oxide of the metal material, and surrounding a side surface of the lower electrode layer, a magnetoresistive element formed on the lower electrode layer, an upper electrode layer formed on the magnetoresistive element, a sidewall insulating film formed on a side surface of the magnetoresistive element and a side surface of the upper electrode layer, and a bit line electrically connected to the upper electrode layer.
    • 根据一个实施例,磁性随机存取存储器包括形成在半导体衬底上的选择元件,形成在选择元件上方的层间电介质膜,形成于层间电介质膜中的电连接到选择元件的接触层, 电极层,与金属材料电连接,由金属材料的氧化物构成的金属氧化物绝缘膜,围绕下部电极层的侧面,形成在下部电极层上的磁阻元件 形成在磁阻元件上的上电极层,形成在磁阻元件的侧面上的侧壁绝缘膜和上电极层的侧面,以及与上电极层电连接的位线。
    • 5. 发明申请
    • SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体器件及其制造方法
    • US20110068404A1
    • 2011-03-24
    • US12726300
    • 2010-03-17
    • Kuniaki SUGIURATakeshi KAJIYAMAYoshiaki ASAO
    • Kuniaki SUGIURATakeshi KAJIYAMAYoshiaki ASAO
    • H01L29/78H01L21/336
    • H01L29/41791H01L29/66795H01L29/785H01L2029/7858
    • A semiconductor device includes a first semiconductor layer and a second semiconductor layer that have a form of fins and are arranged a predetermined distance apart from each other, in which a center portion of each serves as a channel region, and side portions sandwiching the center portion serve as source/drain regions, a gate electrode formed on two side surfaces of each of the channel regions of the first semiconductor layer and the second semiconductor layer, with a gate insulating film interposed therebetween, an insulating film formed to fill a gap between the source/drain regions of the first semiconductor layer and the source/drain regions of the second semiconductor layer, and silicide layers formed on side surfaces of the source/drain regions of the first semiconductor layer and the source/drain regions of the second semiconductor layer that are not covered by the insulating film.
    • 半导体器件包括第一半导体层和第二半导体层,该第一半导体层和第二半导体层具有散热片的形式并且彼此隔开预定距离,其中每个半导体层的中心部分用作沟道区域;以及侧部分夹着中心部分 作为源极/漏极区域,形成在第一半导体层和第二半导体层的每个沟道区域的两个侧面上的栅电极,隔着栅极绝缘膜,形成为填充第二半导体层之间的间隙的绝缘膜 第一半导体层的源极/漏极区域和第二半导体层的源极/漏极区域以及形成在第一半导体层的源极/漏极区域和第二半导体层的源极/漏极区域的侧表面上的硅化物层 不被绝缘膜覆盖。
    • 6. 发明申请
    • MAGNETORESISTIVE RANDOM ACCESS MEMORY DEVICE
    • 磁性随机访问存储器件
    • US20110012179A1
    • 2011-01-20
    • US12719729
    • 2010-03-08
    • Takeshi KAJIYAMA
    • Takeshi KAJIYAMA
    • H01L27/115
    • H01L27/228G11C11/1657G11C11/1659H01L27/0207H01L43/08
    • An aspect of the present disclosure, there is provided a magnetoresistive random access memory device, including, an active area formed on a semiconductor substrate in a first direction, a magnetoresistive effect element formed on the active area and storing data by a change in resistance value, a gate electrode of a cell transistor formed on each side of the magnetoresistive effect element on the active area in a second direction, a bit line contact formed on the active area and arranged alternately with the magnetoresistive effect element, a first bit line connected to the magnetoresistive effect, and a second bit line connected to the bit line contact.
    • 本发明的一个方面提供了一种磁阻随机存取存储器件,包括:在第一方向上形成在半导体衬底上的有源区,形成在有源区上的磁阻效应元件,并通过电阻值的变化存储数据 形成在有源区域的第二方向上的磁阻效应元件的每一侧上的单元晶体管的栅电极,形成在有源区上并与磁阻效应元件交替布置的位线接触,第一位线连接到 磁阻效应,以及与位线接触连接的第二位线。
    • 8. 发明申请
    • MAGNETORESISTIVE EFFECT ELEMENT
    • 磁感应效应元件
    • US20090206426A1
    • 2009-08-20
    • US12369555
    • 2009-02-11
    • Takeshi KAJIYAMA
    • Takeshi KAJIYAMA
    • H01L43/08
    • H01L43/08H01L27/222
    • A magnetoresistive element includes first, second, and third fixed layers, first, second, and third spacer layers, and a free layer. The first fixed layer is made of a ferromagnetic material and having an invariable magnetization direction. The first spacer layer is formed on the first fixed layer and made of an insulator. The free layer is formed on the first spacer layer, made of a ferromagnetic material, and having a variable magnetization direction. The second spacer layer is formed on the free layer and made of a nonmagnetic material. The second fixed layer is formed on the second spacer layer, made of a ferromagnetic material, and having an invariable magnetization direction. The third spacer layer is formed below the first fixed layer and made of a nonmagnetic material. The third fixed layer is formed below the third spacer layer, made of a ferromagnetic material, and having an invariable magnetization direction.
    • 磁阻元件包括第一,第二和第三固定层,第一,第二和第三间隔层,以及自由层。 第一固定层由铁磁材料制成并且具有不变的磁化方向。 第一间隔层形成在第一固定层上并由绝缘体制成。 自由层形成在第一间隔层上,由铁磁材料制成,具有可变的磁化方向。 第二间隔层形成在自由层上并由非磁性材料制成。 第二固定层形成在第二间隔层上,由铁磁材料制成,具有不变的磁化方向。 第三间隔层形成在第一固定层下方并由非磁性材料制成。 第三固定层形成在第三间隔层的下方,由铁磁材料制成,具有不变的磁化方向。