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    • 3. 发明申请
    • Laminate for forming substrate with wires, such substrate with wires, and method for forming it
    • 用于用电线形成衬底的层压板,这种具有导线的衬底及其形成方法
    • US20050200274A1
    • 2005-09-15
    • US11070198
    • 2005-03-03
    • Takehiko Hiruma
    • Takehiko Hiruma
    • H05B33/06H05B33/10H05B33/12
    • H05B33/12H05B33/10
    • To provide a laminate for forming a substrate with wires, which has a low resistance, is free from hillocks, has a small surface roughness and is excellent in alkali resistance and corrosion resistance, particularly a laminate suitable for a flat panel display such as an organic EL display, a method for forming a substrate with wires by etching the laminate, and the substrate with wires thereby obtained. A laminate for forming a substrate with wires, which comprises a substrate, a conductive layer containing an Al—Nd alloy as the major component and having a content of Nd of from 0.1 to 6 atomic % based on all components, formed on the substrate, and a capping layer containing a Ni—Mo alloy as the major component, formed on the conductive layer; a method for forming the laminate by sputtering, and a substrate with wires, comprising the laminate which is patterned in a flat form.
    • 为了提供具有低电阻的电线形成用基板的层叠体,不具有小丘,具有小的表面粗糙度,耐碱性和耐腐蚀性优异,特别是适用于平板显示器如有机物的层压板 EL显示器,通过蚀刻层压体形成具有导线的基板的方法,以及由此获得的布线。 一种用于形成具有导线的基板的层压体,其包括基板,以基于所有部件的基于所有部件的包含Al-Nd合金作为主要成分并具有0.1至6原子%的含量的导电层, 和形成在导电层上的含有Ni-Mo合金作为主要成分的覆盖层; 通过溅射形成层压体的方法和具有导线的基板,其包括以平坦形式图案化的层压体。
    • 5. 发明申请
    • LAMINATE FOR REFLECTION FILM
    • 反射膜层压板
    • US20080131693A1
    • 2008-06-05
    • US12021621
    • 2008-01-29
    • Takehiko HIRUMANaoko SHIN
    • Takehiko HIRUMANaoko SHIN
    • B32B15/04B32B19/00
    • G02B5/0858G02B1/105G02B1/14Y10T428/265Y10T428/31678
    • To provide a laminate having a high reflectance in the entire visible region and having excellent durability such as moisture resistance and salt water resistance.A laminate comprising a substrate, and a silver film, an adhesion-improving film, a low refractive index film and a high refractive index film formed in this order on the substrate, wherein at least a layer on the adhesion-improving film side in the low refractive index film is formed by a radio frequency sputtering method by means of an oxide target using a sputtering gas containing nitrogen, the adhesion improving film has an extinction coefficient of at most 0.1 and has a thickness of from 0.5 to 4 nm, the low refractive index film has an extinction coefficient of at most 0.01, and the high refractive index film has an extinction coefficient of at most 0.01.
    • 提供在整个可见光区域具有高反射率且具有优异耐久性,例如耐湿性和耐盐水性的层压体。 一种层叠体,其特征在于,在所述基板上依次形成有基板,银膜,粘合改善膜,低折射率膜和高折射率膜,其中,所述粘合改善膜侧的至少一层 通过使用含氮的溅射气体的氧化物靶通过射频溅射法形成低折射率膜,粘附改善膜的消光系数为0.1以下,厚度为0.5〜4nm,低 折射率膜的消光系数为0.01以下,高折射率膜的消光系数为0.01以下。