专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08492483B2 ABA triblock copolymer and process for producing the same 有权
标题翻译： ABA三嵌段共聚物及其制备方法
公开(公告)号：US08492483B2
公开(公告)日：2013-07-23
申请号：US12667785
申请日：2008-06-19
申请人： Norihiro Yoshida , Hijiri Aoki , Takahito Mita , Ami Yamaguchi , Kazuhiko Haba , Goro Sawada
发明人： Norihiro Yoshida , Hijiri Aoki , Takahito Mita , Ami Yamaguchi , Kazuhiko Haba , Goro Sawada
IPC分类号： C08F4/32 , C08F12/24
CPC分类号： C08F297/00 , C08F212/14 , C08F216/14
摘要： To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.
摘要翻译：提供一种乙烯基醚系列的新型ABA型三嵌段共聚物，包括聚乙烯基醚和氧苯乙烯系单体，以及一系列步骤制备该ABA型共聚物的方法。本发明涉及一种新型的ABA型三嵌段共聚物，其包括含有氧化苯乙烯系列重复单元（a）的段A和包含乙烯基醚系列重复单元（b）的段B，其中段A和段B键合连同一个单一的债券，以及一个简单的生产过程。三嵌段共聚物可以以简单的方式在一系列步骤中制备，包括在双功能引发剂和路易斯酸的存在下乙烯基醚系单体如乙基乙烯基醚的阳离子聚合，随后加入氧苯乙烯 - 用于活性阳离子聚合的对羟基苯乙烯等系列单体。

2. 发明申请

US20100013122A1 Resin for Thermal Imprint 有权
标题翻译：树脂热压贴
公开(公告)号：US20100013122A1
公开(公告)日：2010-01-21
申请号：US11992625
申请日：2006-08-25
申请人： Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Iizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
发明人： Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Iizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
IPC分类号： B29C59/02 , C08F32/08 , C08L55/00
CPC分类号： B29C59/005 , B29C59/026 , B29K2045/00 , C08F232/08 , C08G61/06 , C08G61/08 , H05K1/032 , H05K3/0014 , H05K3/107 , H05K2201/0158 , H05K2203/0108
摘要： A resin for thermal imprint comprises a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260 ° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg (° C.)
摘要翻译：用于热压印的树脂包括在主链中含有由以下化学式1或以下化学式2表示的至少一种骨架的环状烯烃类热塑性树脂。玻璃化转变温度Tg（℃）和MFR在260℃下的值（[M]）满足下列等式1，[M]> 10。热压印特性（转印性，脱模特性等）优异，生产率（生产率）提高。 Tg（℃）<219×log [M] -104 [等式1]

3. 发明申请

US20100019410A1 Resin for Thermal Imprinting 审中-公开
标题翻译：树脂热压印
公开(公告)号：US20100019410A1
公开(公告)日：2010-01-28
申请号：US12086165
申请日：2006-07-12
申请人： Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Lizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
发明人： Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Lizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
IPC分类号： B29C59/02 , C08F32/08 , C08L55/00
CPC分类号： B29C59/005 , B29C59/026 , B29K2045/00 , C08F232/08 , H05K1/032 , H05K3/0014 , H05K3/107 , H05K2201/0158 , H05K2203/0108
摘要： A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M] 219×log[M]−160 [Equation 1]
摘要翻译：一种用于热压印的环烯烃类热塑性树脂，用于制造在主链中包含由以下化学式1或以下化学式2表示的至少一种骨架的片材或膜。玻璃化转变温度Tg（℃）和MFR在260℃下的值（[M]）满足下列等式1，[M] <30。热压印特性（转印性，脱模特性等）优异，生产率（生产率）提高。 Tg（℃）> 219×log [M] -160 [式1]

4. 发明授权

US07411097B2 Thiol compound, copolymer and method for producing the copolymer 有权
标题翻译：硫醇化合物，共聚物和共聚物的制造方法
公开(公告)号：US07411097B2
公开(公告)日：2008-08-12
申请号：US11713580
申请日：2007-03-01
申请人： Takanori Yamagishi , Takahito Mita
发明人： Takanori Yamagishi , Takahito Mita
IPC分类号： C07C319/02
CPC分类号： C08F2/38 , C07C323/12 , C07C323/17 , C07C2602/42 , G03F7/0046 , G03F7/0397 , G03F7/085
摘要： By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.
摘要翻译：通过解决现有技术中的异议，提供了适合作为与基材的粘合性优异的涂料聚合物的新型共聚物，并且可以适当地用作具有耐磨性的涂膜的聚合物，以在更精细的图案形成中具有耐图案塌陷光刻技术和共聚物的制造方法，以及在共聚物的制造中可用作链转移剂的新型硫醇化合物。本发明的新型硫醇化合物具有式（1）所示的结构。其中R 1是选自具有1至15个碳原子的直链，支链或环状饱和烃的二价取代基。

5. 发明申请

US20060068324A1 Positive photosensitive resin and novel dithiol compound 审中-公开
标题翻译：正光敏树脂和新型二硫醇化合物
公开(公告)号：US20060068324A1
公开(公告)日：2006-03-30
申请号：US11235045
申请日：2005-09-26
申请人： Takahito Mita
发明人： Takahito Mita
IPC分类号： G03C1/76
CPC分类号： G03F7/0392 , G03F7/0397
摘要： A positive photosensitive resin having, in the high-molecular main chain, a structure represented by the following general formula (1): and a dithiol compound represented by the following general formula (2): The positive photosensitive resin can alleviate the problems of conventional technique and, when used for formation of a fine patter in semiconductor production, can show a higher resist sensitivity than conventional products and can bring about effects such as reduction in impurities after development. The dithiol compound is novel and extremely suitable for use in production of the positive photosensitive resin.
摘要翻译：在高分子量主链中具有由以下通式（1）表示的结构的正性感光性树脂：

6. 发明申请

US20100286351A1 ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME 有权
标题翻译： ABA三嵌段共聚物及其制备方法
公开(公告)号：US20100286351A1
公开(公告)日：2010-11-11
申请号：US12667785
申请日：2008-06-19
申请人： Norihiro Yoshida , Hijiri Aoki , Takahito Mita , Ami Yamaguchi , Kazuhiko Haba , Goro Sawada
发明人： Norihiro Yoshida , Hijiri Aoki , Takahito Mita , Ami Yamaguchi , Kazuhiko Haba , Goro Sawada
IPC分类号： C08F4/32 , C08F12/24
CPC分类号： C08F297/00 , C08F212/14 , C08F216/14
摘要： To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.
摘要翻译：提供一种乙烯基醚系列的新型ABA型三嵌段共聚物，包括聚乙烯基醚和氧苯乙烯系单体，以及一系列步骤制备该ABA型共聚物的方法。本发明涉及一种新型的ABA型三嵌段共聚物，其包括含有氧化苯乙烯系列重复单元（a）的段A和包含乙烯基醚系列重复单元（b）的段B，其中段A和段B键合连同一个单一的债券，以及一个简单的生产过程。三嵌段共聚物可以以简单的方式在一系列步骤中制备，包括在双功能引发剂和路易斯酸的存在下乙烯基醚系单体如乙基乙烯基醚的阳离子聚合，随后加入氧苯乙烯 - 用于活性阳离子聚合的对羟基苯乙烯等系列单体。

7. 发明申请

US20070161764A1 Novel thiol compound, copolymer and method for producing the copolymer 有权
标题翻译：新型硫醇化合物，共聚物和共聚物的制造方法
公开(公告)号：US20070161764A1
公开(公告)日：2007-07-12
申请号：US11713580
申请日：2007-03-01
申请人： Takanori Yamagishi , Takahito Mita
发明人： Takanori Yamagishi , Takahito Mita
IPC分类号： C08F2/00
CPC分类号： C08F2/38 , C07C323/12 , C07C323/17 , C07C2602/42 , G03F7/0046 , G03F7/0397 , G03F7/085
摘要： By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.
摘要翻译：通过解决现有技术中的异议，提供了适合作为与基材的粘合性优异的涂料聚合物的新型共聚物，并且可以适当地用作具有耐磨性的涂膜的聚合物，以在更精细的图案形成中具有耐图案塌陷光刻技术和共聚物的制造方法，以及在共聚物的制造中可用作链转移剂的新型硫醇化合物。本发明的新型硫醇化合物具有式（1）所示的结构。其中R 1是选自具有1至15个碳原子的直链，支链或环状饱和烃的二价取代基。

8. 发明授权

US07220808B2 Thiol compound, copolymer and method for producing the copolymer 有权
标题翻译：硫醇化合物，共聚物和共聚物的制造方法
公开(公告)号：US07220808B2
公开(公告)日：2007-05-22
申请号：US10784435
申请日：2004-02-23
申请人： Takanori Yamagishi , Takahito Mita
发明人： Takanori Yamagishi , Takahito Mita
IPC分类号： C08F2/38
CPC分类号： C08F2/38 , C07C323/12 , C07C323/17 , C07C2602/42 , G03F7/0046 , G03F7/0397 , G03F7/085
摘要： By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.
摘要翻译：通过解决现有技术中的异议，提供了适合作为与基材的粘合性优异的涂料聚合物的新型共聚物，并且可以适当地用作具有耐磨性的涂膜的聚合物，以在更精细的图案形成中具有耐图案塌陷光刻技术和共聚物的制造方法，以及在共聚物的制造中可用作链转移剂的新型硫醇化合物。本发明的新型硫醇化合物具有式（1）所示的结构。其中R 1是选自具有1至15个碳原子的直链，支链或环状饱和烃的二价取代基。

9. 发明授权

US08324332B2 Resin for thermal imprint 有权
标题翻译：用于热压印的树脂
公开(公告)号：US08324332B2
公开(公告)日：2012-12-04
申请号：US11992625
申请日：2006-08-25
申请人： Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Iizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
发明人： Takemori Toshifumi , Yoshiaki Takaya , Takahito Mita , Tetsuya Iizuka , Yuji Hashima , Takahisa Kusuura , Mitsuru Fujii , Takuji Taguchi , Anupam Mitra
IPC分类号： C08G61/08 , C08F8/04 , C08F32/08
CPC分类号： B29C59/005 , B29C59/026 , B29K2045/00 , C08F232/08 , C08G61/06 , C08G61/08 , H05K1/032 , H05K3/0014 , H05K3/107 , H05K2201/0158 , H05K2203/0108
摘要： A resin for thermal imprint including a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg (° C.)
摘要翻译：一种用于热压印的树脂，其包含在主链中包含由以下化学方程式1或以下化学式2表示的骨架中的至少一种的环状烯烃类热塑性树脂。玻璃化转变温度Tg（℃）和MFR在260℃下的值（[M]）满足下列等式1，[M]> 10。热压印特性（转印性，脱模特性等）优异，生产率（生产率）提高。 Tg（℃）<219×log [M] -104 [等式1]

10. 发明授权

US07521171B2 Positive photosensitive resin, process for production thereof, and resist composition containing positive photosensitive resin 失效
标题翻译：正性感光性树脂，其制造方法和含有正性感光性树脂的抗蚀剂组合物
公开(公告)号：US07521171B2
公开(公告)日：2009-04-21
申请号：US11369431
申请日：2006-03-07
申请人： Hijiri Aoki , Takahito Mita
发明人： Hijiri Aoki , Takahito Mita
IPC分类号： G03F7/039 , C08F2/38
CPC分类号： G03F7/0392 , G03F7/0397
摘要： The positive photosensitive resin of the present invention has an acid-labile protecting group and the structure represented by the following general formula (1): (wherein X1 and X2 may be the sake or different and each independently a straight or branched chain hydrocarbon group, having 1 to 30 carbon atoms, an alicyclic hydrocarbon group or a heterocyclic group, which may substituted with straight or branched chain hydrocarbon of 1 to 6 carbon atoms or —O— hydrocarbon; Y1 and Y2 may be the same or different and are each independently a hydrogen atom, a straight or branched chain hydrocarbon group having 1 to 6 carbon atoms, a sulfur-containing hydrocarbon group, or an aromatic hydrocarbon group which may have a substituent; and two Zs may be the same or different and each independently an oxygen atom or a sulfur atom).
摘要翻译：本发明的正型感光性树脂具有酸不稳定保护基和由以下通式（1）表示的结构：（其中X1和X2可以是不同的且各自独立地为直链或支链烃基，具有1至30个碳原子的脂环族烃基或杂环基，其可以被1至6个碳原子的直链或支链烃取代或-O-烃; Y1和Y2可以相同或不同，并且各自独立地氢原子，具有1〜6个碳原子的直链或支链烃基，含硫烃基或可具有取代基的芳族烃基;两个Z可以相同或不同，并且各自独立地为氧原子或硫原子）。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式