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1. 发明申请

US20120058311A1 VEHICLE GLASS AND METHOD FOR MANUFACTURING SAME 审中-公开
标题翻译：车辆玻璃及其制造方法
公开(公告)号：US20120058311A1
公开(公告)日：2012-03-08
申请号：US13138999
申请日：2010-05-06
申请人： Takahiro Shimomura , Tomoyuki Kubo
发明人： Takahiro Shimomura , Tomoyuki Kubo
IPC分类号： C03C17/36 , B32B17/06 , B60J1/00 , C03B11/00 , C03B29/00
CPC分类号： B32B17/10036 , B32B17/10348 , C03C17/36 , C03C17/3607 , C03C17/3644 , C03C17/3657 , C03C17/3681 , Y10T428/24628
摘要： A vehicle glass (10) comprises an outer glass plate (31) adjacent to the exterior of the vehicle, an inner glass plate (32) adjacent to the interior of the vehicle, and an intermediate film (33) that joins these glass plates. The outer glass plate is a bent glass plate formed by printing a black ceramic layer (14) on a face of a glass plate (13) adjacent to the interior of the vehicle, covering the black ceramic layer with a printed silver layer (12), and bending using a press-bending device. When a reflection color tone is obtained by measuring a portion at which the printed silver layer is printed from a side of the layer on which the glass palate lies, the chromatic coordinate b* in the CIE 1976 color system defined in JIS Z 8729 does not exceed six.
摘要翻译：车辆玻璃（10）包括与车辆外部相邻的外玻璃板（31），与车辆内部相邻的内玻璃板（32）和连接这些玻璃板的中间膜（33）。外玻璃板是通过在与车辆内部相邻的玻璃板（13）的表面上印刷黑色陶瓷层（14）而形成的弯曲玻璃板，用印刷的银层（12）覆盖黑色陶瓷层，，并使用压弯装置进行弯曲。当从玻璃腭所在的一侧测量印刷银层的部分获得反射色调时，JIS Z 8729中定义的CIE 1976色系中的色坐标b *不超过六。

2. 发明申请

US20070138824A1 Bent glass sheet shaping method and bent glass sheet 有权
标题翻译：弯曲玻璃板成型方法和弯曲玻璃板
公开(公告)号：US20070138824A1
公开(公告)日：2007-06-21
申请号：US11643126
申请日：2006-12-21
申请人： Kazuo Yamada , Takahiro Shimomura , Komei Kato , Shinichi Nishimoto
发明人： Kazuo Yamada , Takahiro Shimomura , Komei Kato , Shinichi Nishimoto
IPC分类号： B60J1/00 , C03B31/00 , C03B21/00
CPC分类号： B32B17/10036 , B32B17/10889 , C03B23/0256 , C03B23/03 , C03B23/0357 , C03B40/005
摘要： A bent glass sheet shaping method which is capable of reducing occurrence of visibility distortions and a bent glass sheet with reduced visibility distortions. A glass sheet is heated to a shapeable temperature, a cover material is mounted onto a press die such that a direction of waves in the cover material is diagonal to a direction of distortions in the glass sheet, and the heated glass sheet with the press die is pressed.
摘要翻译：能够减少可见度变形的弯曲的玻璃板成形方法和具有降低的可见度变形的弯曲的玻璃板。将玻璃板加热到可塑的温度，将覆盖材料安装在压模上，使得覆盖材料中的波浪方向与玻璃板中的变形方向对角，并且具有压模的加热的玻璃板被按下。

3. 发明申请

US20140044502A1 VACUUM PROCESSING APPARATUS AND METHOD OF OPERATING THE SAME 审中-公开
标题翻译：真空加工装置及其操作方法
公开(公告)号：US20140044502A1
公开(公告)日：2014-02-13
申请号：US13606109
申请日：2012-09-07
申请人： Takashi UEMURA , Hideaki Kondo , Masakazu Isozaki , Takahiro Shimomura
发明人： Takashi UEMURA , Hideaki Kondo , Masakazu Isozaki , Takahiro Shimomura
IPC分类号： H01L21/677
CPC分类号： H01L21/67745
摘要： In a vacuum processing apparatus including a plurality of vacuum transfer vessels arranged back and forth at the back of a lock chamber, an intermediate chamber arranged between them and capable of accommodating wafers, and processing units connected to respective vacuum transfer vessels, a wafer processed in a pre-processing vessel out of the processing units connected to the respective vacuum transfer vessels is transferred to a post-processing vessel connected to the same vacuum transfer vessel and post-processing is performed.
摘要翻译：在包括在锁室后部布置的多个真空传送容器的真空处理设备中，布置在它们之间并能够容纳晶片的中间室以及连接到各个真空传送容器的处理单元，连接到相应的真空转移容器的处理单元中的预处理容器被转移到连接到相同的真空转移容器的后处理容器中，并进行后处理。

4. 发明申请

US20070298266A1 Curved Laminated Glass and Vehicle Fixed with the Curved Laminated Glass 审中-公开
标题翻译：弯曲的层压玻璃和车辆用弯曲的层压玻璃固定
公开(公告)号：US20070298266A1
公开(公告)日：2007-12-27
申请号：US11667395
申请日：2005-11-10
申请人： Jun Kawaguchi , Takahiro Shimomura
发明人： Jun Kawaguchi , Takahiro Shimomura
IPC分类号： B32B17/06
CPC分类号： B32B17/10761 , B32B17/10036 , B32B2250/03 , B60J1/02 , Y10T428/3163
摘要： A curved laminated glass having no natural vibration in the low frequency region of 500 Hz or lower is fitted to a vehicle body, so that the curved laminated glass is prevented from resonating with the vehicle body. A resin interlayer film that bonds two curved glass sheets to each other to allow a curved laminated glass to be obtained is, for instance, a film with a three-layer structure (sound insulation film) including polyvinyl butyral films and a polyvinyl n-octylal film interposed therebetween. The resin interlayer film to be used is a soft film having a Shore hardness of 75 degrees or less at 20° C.
摘要翻译：在500Hz以下的低频区域中没有固有振动的弯曲夹层玻璃装配到车体上，从而防止弯曲的夹层玻璃与车体共振。将两个弯曲玻璃板彼此粘合以允许获得弯曲夹层玻璃的树脂中间膜例如是具有三层结构的膜（隔音膜），包括聚乙烯醇缩丁醛膜和聚乙烯醇正辛基胶片介于其间。使用的树脂中间膜是在20℃下肖氏硬度为75度以下的软膜。

5. 发明申请

US20130142595A1 VACUUM PROCESSING APPARATUS AND OPERATING METHOD OF THE SAME 有权
标题翻译：真空加工装置及其操作方法
公开(公告)号：US20130142595A1
公开(公告)日：2013-06-06
申请号：US13592408
申请日：2012-08-23
申请人： Takahiro SHIMOMURA , Yoshifumi OGAWA , Susumu TAUCHI
发明人： Takahiro SHIMOMURA , Yoshifumi OGAWA , Susumu TAUCHI
IPC分类号： H01L21/677
CPC分类号： H01L21/67161 , H01L21/67184
摘要： A vacuum processing apparatus includes a row of containers of vacuum transfer chambers connected to each other behind a lock chamber, a wafer being transferred through depressurized inside of the row of the containers of the vacuum transfer containers, an intermediate chamber disposed between the containers of the vacuum transfer chambers, a plurality of processing units including processing containers respectively connected to left or right side walls of the containers of the vacuum transfer chambers and the wafer is processed therein, and a bypass chamber which constitutes a bypass path connecting the processing units, where only either the wafer which is being transferred from the lock chamber toward one of the processing units or the wafer which was processed in one of the processing units and is being transferred toward the lock chamber is transferred through the containers of the vacuum transfer chambers.
摘要翻译：真空处理装置包括一排在锁室后面彼此连接的真空传送室的容器，通过减压的真空传送容器的排的内部被转移的晶片，设置在真空传送容器的容器之间的中间室在真空传送室中处理多个处理单元，包括分别连接到真空传送室的容器的左侧壁或右侧壁的处理容器和晶片，以及构成连接处理单元的旁路的旁路室，其中，只有从锁定室转移到处理单元之一的晶片或在一个处理单元中被处理并且被转移到锁定室的晶片被传送通过真空传送室的容器。

6. 发明申请

US20120067522A1 VACUUM PROCESSING APPARATUS 审中-公开
标题翻译：真空加工设备
公开(公告)号：US20120067522A1
公开(公告)日：2012-03-22
申请号：US13022232
申请日：2011-02-07
申请人： Takahiro Shimomura , Yutaka Kudou , Masakazu Isozaki , Takashi Uemura
发明人： Takahiro Shimomura , Yutaka Kudou , Masakazu Isozaki , Takashi Uemura
IPC分类号： C23F1/08 , B05C13/00 , B05C11/00
CPC分类号： H01L21/67167 , H01L21/67109
摘要： A vacuum processing apparatus having an atmospheric-pressure transport chamber for conveying samples, lock chambers that accommodate the samples conveyed in and have an ambient capable of being switched between an atmospheric ambient and a vacuum ambient, a vacuum transport chamber coupled to the lock chambers, and at least one vacuum chamber for processing the samples. The apparatus further includes cooling portions operable to cool the high-temperature samples processed by the vacuum chamber. Each cooling portion has: a sample stage over which the high-temperature samples are placed and which has a coolant channel; gas-blowing tubes disposed closer to the inlet/exit port and acting to blow gas toward the sample stage; and an exhaust port disposed on the opposite side of the sample stage with regard to the inlet/exit port and acting to discharge the gas blown from the gas-blowing tubes.
摘要翻译：一种真空处理装置，具有用于输送样品的大气压输送室，容纳输送的样品的锁定室，以及能够在大气环境和真空环境之间切换的环境，耦合到锁定室的真空输送室，以及用于处理样品的至少一个真空室。该装置还包括可操作以冷却由真空室处理的高温样品的冷却部分。每个冷却部分具有：样品台，高温样品放置在该样品台上，并具有冷却剂通道; 设置在入口/出口附近并用于向样品台吹气的气体吹送管; 以及排气口，其相对于入口/出口设置在样品台的相对侧上，并用于排出从气体吹送管吹出的气体。

7. 发明授权

US07713631B2 Method of manufacturing laminated glass for vehicle and laminated glass for vehicle 有权
标题翻译：制造车辆用夹层玻璃和车辆用夹层玻璃的方法
公开(公告)号：US07713631B2
公开(公告)日：2010-05-11
申请号：US11904083
申请日：2007-09-26
申请人： Kazuo Yamada , Shinichi Nishimoto , Takahiro Shimomura
发明人： Kazuo Yamada , Shinichi Nishimoto , Takahiro Shimomura
IPC分类号： B32B17/06 , B32B37/14
CPC分类号： B32B17/10036 , B32B17/10761 , B32B17/10889 , C03B23/025 , C03B23/0302 , C03C17/04 , C03C2218/34 , Y02P40/57 , Y10S428/913 , Y10T156/10 , Y10T156/1028 , Y10T428/24802 , Y10T428/24926
摘要： A ceramic paste is applied to a first glass sheet 11, and a ceramic paste is applied to a second glass sheet 13 with a lower solar absorptivity than that of the first glass sheet 11. In this case, the amount per unit area of the ceramic paste to be applied to the first glass sheet 11 is allowed to be smaller than that of the ceramic paste to be applied to the second glass sheet 13. Alternatively, a first ceramic paste and a second ceramic paste are allowed to have different compositions from each other. The first glass sheet 11 and the second glass sheet 13 are bent so that the surfaces onto which the ceramic pastes have been applied are shaped as concave surfaces. The applied ceramic paste is fired using the heating used for bending. Thus maskings 12 and 14 are formed. The first glass sheet 11 and the second glass sheet 13 are bonded to each other, with a resin interlayer film 15 being interposed therebetween.
摘要翻译：将陶瓷膏施加到第一玻璃板11上，并且将陶瓷浆料施加到具有比第一玻璃板11更低的太阳能吸收率的第二玻璃板13上。在这种情况下，陶瓷的每单位面积的量允许施加到第一玻璃板11上的糊料小于要施加到第二玻璃板13的陶瓷浆料的糊料。或者，允许第一陶瓷浆料和第二陶瓷糊料具有与每个玻璃板材不同的组成其他。第一玻璃板11和第二玻璃板13被弯曲，使得已经涂覆有陶瓷浆料的表面被成形为凹面。使用用于弯曲的加热来烧制所施加的陶瓷膏。因此形成掩模12和14。第一玻璃板11和第二玻璃板13彼此接合，树脂夹层膜15插入其间。

8. 发明授权

US06617255B2 Plasma processing method for working the surface of semiconductor devices 失效
标题翻译：用于加工半导体器件表面的等离子体处理方法
公开(公告)号：US06617255B2
公开(公告)日：2003-09-09
申请号：US09799485
申请日：2001-03-07
申请人： Takao Arase , Motohiko Yoshigai , Go Saito , Masamichi Sakaguchi , Hiroaki Ishimura , Takahiro Shimomura
发明人： Takao Arase , Motohiko Yoshigai , Go Saito , Masamichi Sakaguchi , Hiroaki Ishimura , Takahiro Shimomura
IPC分类号： H01L21302
CPC分类号： H01J37/32082 , H01J37/32477 , H01J37/32697 , H01J2237/022 , H01J2237/3341 , H01L21/31116 , H01L21/67069 , H01L29/6656
摘要： A plasma processing method is provided of processing a sample having a silicon nitride layer with high accuracy of size in anisotropy and excellent selectivity to a silicon oxide layer as underlayer. A mixed atmosphere of chlorine gas containing no fluorine with aluminum is converted into plasma in a plasma etching processing chamber and the sample having the silicon nitride layer is etched by using the plasma.
摘要翻译：提供了一种等离子体处理方法，其处理具有氮化硅层的样品，其具有各向异性的高精度尺寸和对作为底层的氧化硅层的优异选择性。在等离子体蚀刻处理室中将不含氟的氯气与铝的混合气氛转化为等离子体，并且通过使用等离子体蚀刻具有氮化硅层的样品。

9. 发明授权

US09245780B2 Vacuum processing apparatus and operating method of the same 有权
标题翻译：真空处理装置及其操作方法
公开(公告)号：US09245780B2
公开(公告)日：2016-01-26
申请号：US13592408
申请日：2012-08-23
申请人： Takahiro Shimomura , Yoshifumi Ogawa , Susumu Tauchi
发明人： Takahiro Shimomura , Yoshifumi Ogawa , Susumu Tauchi
IPC分类号： H01L21/677 , H01L21/67
CPC分类号： H01L21/67161 , H01L21/67184
摘要： A vacuum processing apparatus includes a row of containers of vacuum transfer chambers connected to each other behind a lock chamber, a wafer being transferred through depressurized inside of the row of the containers of the vacuum transfer containers, an intermediate chamber disposed between the containers of the vacuum transfer chambers, a plurality of processing units including processing containers respectively connected to left or right side walls of the containers of the vacuum transfer chambers and the wafer is processed therein, and a bypass chamber which constitutes a bypass path connecting the processing units, where only either the wafer which is being transferred from the lock chamber toward one of the processing units or the wafer which was processed in one of the processing units and is being transferred toward the lock chamber is transferred through the containers of the vacuum transfer chambers.
摘要翻译：真空处理装置包括一排在锁室后面彼此连接的真空传送室的容器，通过真空传送容器的容器排中的减压内部传送的晶片，设置在真空传送容器的容器之间的中间室在真空传送室中处理多个处理单元，包括分别连接到真空传送室的容器的左侧壁或右侧壁的处理容器和晶片，以及构成连接处理单元的旁路的旁路室，其中，只有从锁定室转移到处理单元之一的晶片或在一个处理单元中被处理并且被转移到锁定室的晶片被传送通过真空传送室的容器。

10. 发明申请

US20120093617A1 VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD 审中-公开
标题翻译：真空加工设备和真空加工方法
公开(公告)号：US20120093617A1
公开(公告)日：2012-04-19
申请号：US13011041
申请日：2011-01-21
申请人： Yutaka Kudou , Hiroaki Takikawa , Takahiro Shimomura , Masakazu Isozaki , Takashi Uemura
发明人： Yutaka Kudou , Hiroaki Takikawa , Takahiro Shimomura , Masakazu Isozaki , Takashi Uemura
IPC分类号： H01L21/67
CPC分类号： H01L21/67745 , H01L21/67748
摘要： A vacuum processing apparatus including a processing chamber for processing a sample to be processed, a cooling chamber for cooling the high-temperature sample processed in the processing chamber, and a vacuum transfer chamber for establishing a connection between the processing chamber and the cooling chamber, a vacuum transfer robot equipped inside the vacuum transfer chamber, wherein the cooling chamber includes a gas-exhausting unit for reducing pressure inside the cooling chamber, a gas-supplying unit for supplying a gas into the cooling chamber, a pressure-controlling unit for controlling the pressure inside the cooling chamber, a supporting unit for supporting the high-temperature sample, and a mounting stage for proximity-holding the sample supported by the supporting unit, the mounting stage having a temperature-adjusting unit for adjusting the temperature of surface of the mounting stage into a temperature which is capable of cooling the high-temperature sample, the supporting unit having an ascending/descending-speed varying unit.
摘要翻译：一种真空处理设备，包括处理待处理样品的处理室，用于冷却在处理室中处理的高温样品的冷却室和用于建立处理室和冷却室之间的连接的真空传送室，设置在真空传送室内部的真空传送机器人，其中冷却室包括用于减小冷却室内的压力的排气单元，用于将气体供应到冷却室中的气体供应单元，用于控制冷却室内的压力，用于支撑高温试样的支撑单元和用于接近保持由支撑单元支撑的样品的安装台，安装台具有用于调节表面温度的温度调节单元将安装阶段转换成能够冷却高温样品的载体 g单元具有上升/下降速度变化单元。

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