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    • 2. 发明申请
    • FET DEVICE
    • FET器件
    • WO2006114747A3
    • 2007-04-05
    • PCT/IB2006051249
    • 2006-04-21
    • KONINKL PHILIPS ELECTRONICS NVTUINHOUT HANS P
    • TUINHOUT HANS P
    • H01L29/10H01L27/02H01L27/088H01L29/423
    • H01L29/4238H01L29/1033
    • The invention provides a FET device (1) with a channel region (2) with a trapezoidal shape in which the linear drain edge (7) is larger than the linear source edge (8). In this way the equality or matching of the DC parameters of two or more FET devices (1) may be improved with respect to rectangular shaped FET devices (100) while simultaneously maintaining a comparable current capability. Alternatively, the total device area of the FET device (1) may be reduced with respect to the rectangular shaped FET device (100), thereby reducing the capacitive loading while maintaining a similar equality or matching of the DC parameters of two or more FET devices (1).
    • 本发明提供了具有梯形形状的沟道区域(2)的FET器件(1),其中线性漏极边缘(7)大于线性源极边缘(8)。 以这种方式,可以相对于矩形FET器件(100)改善两个或多个FET器件(1)的DC参数的相等或匹配,同时保持可比的电流能力。 或者,可以相对于矩形FET器件(100)减小FET器件(1)的总器件面积,从而降低电容负载,同时保持两个或更多个FET器件的DC参数的类似等同或匹配 (1)。
    • 3. 发明申请
    • FET DEVICE
    • FET器件
    • WO2006114747A2
    • 2006-11-02
    • PCT/IB2006/051249
    • 2006-04-21
    • KONINKLIJKE PHILIPS ELECTRONICS N.V.TUINHOUT, Hans, P.
    • TUINHOUT, Hans, P.
    • H01L29/4238H01L29/1033
    • The invention provides a FET device (1) with a channel region (2) with a trapezoidal shape in which the linear drain edge (7) is larger than the linear source edge (8). In this way the equality or matching of the DC parameters of two or more FET devices (1) may be improved with respect to rectangular shaped FET devices (100) while simultaneously maintaining a comparable current capability. Alternatively, the total device area of the FET device (1) may be reduced with respect to the rectangular shaped FET device (100), thereby reducing the capacitive loading while maintaining a similar equality or matching of the DC parameters of two or more FET devices (1).
    • 本发明提供了具有梯形形状的沟道区域(2)的FET器件(1),其中线性漏极边缘(7)大于线性源极边缘(8)。 以这种方式,可以相对于矩形FET器件(100)改善两个或多个FET器件(1)的DC参数的相等或匹配,同时保持可比的电流能力。 或者,可以相对于矩形FET器件(100)减小FET器件(1)的总器件面积,从而降低电容负载,同时保持两个或更多个FET器件的DC参数的类似等同或匹配 (1)。
    • 5. 发明申请
    • RESISTOR NETWORK SUCH AS A RESISTOR LADDER NETWORK AND A METHOD FOR MANUFACTURING SUCH A RESISTOR NETWORK
    • 作为电阻器网络的电阻网络和用于制造这种电阻网络的方法
    • WO03105229A2
    • 2003-12-18
    • PCT/IB0302192
    • 2003-05-21
    • KONINKL PHILIPS ELECTRONICS NVTUINHOUT HANS PHOOGZAAD GIANVERTREGT MAARTEN
    • TUINHOUT HANS PHOOGZAAD GIANVERTREGT MAARTEN
    • H01L27/04H01L21/822H01L27/08H03M1/06
    • H01L27/0802
    • The invention relates to a resistor network (2) such as a resistor ladder network, comprising at least a resistor body (4) which is provided with at least a column (6) of taps (8) situated between a first tap and a second tap, wherein, in use, at least two taps can be connected with respective first and second sources of reference input potentials, and wherein each tap of the at least one column of taps can be used for outputting an output potential via a contact area which is connected with the concerning tap, wherein the resistor body (4) comprises a multiple of resistor sub-bodies (5), wherein each resistor sub-body (5) is connected with a column (6) of taps (8), and wherein the only electrical connections between the resistor sub-bodies (5) are established by electrical connections via taps (8) connected with the resistor sub-bodies (5). Furthermore the invention relates to a method for manufacturing a resistor network (2) such as a resistor ladder network.
    • 本发明涉及一种电阻网络(2),例如电阻梯形网络,至少包括一个电阻体(4),该电阻器体(4)至少设置有位于第一抽头和第二抽头之间的抽头(6)的至少一列 抽头,其中在使用中,至少两个抽头可以与相应的第一和第二参考输入电位源连接,并且其中所述至少一列抽头的每个抽头可以用于经由接触区域输出输出电位,所述接触区域 与所述有关抽头连接,其中所述电阻体(4)包括多个电阻子体(5),其中每个电阻子体(5)与抽头(8)的列(6)连接,以及 其中通过与电阻子体(5)连接的抽头(8)的电连接来建立电阻子体(5)之间的唯一电连接。 此外,本发明涉及一种用于制造诸如电阻梯形网络的电阻网络(2)的方法。