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1. 发明专利

IL240860D0 Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL240860D0
公开(公告)日：2015-10-29
申请号：IL24086015
申请日：2015-08-26
申请人： NIKON CORP , NIKON ENGINEERING CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03F20060101 , G03F7/20 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

2. 发明专利

IL240860A Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL240860A
公开(公告)日：2018-04-30
申请号：IL24086015
申请日：2015-08-26
申请人： NIKON CORP , NIKON ENG CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
发明人： HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03B20060101 , G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

3. 发明专利

IL240857D0 Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL240857D0
公开(公告)日：2015-10-29
申请号：IL24085715
申请日：2015-08-26
申请人： NIKON CORP , NIKON ENGINEERING CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03F20060101 , G03F7/20 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

4. 发明专利

IL258838D0 Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL258838D0
公开(公告)日：2018-06-28
申请号：IL25883818
申请日：2018-04-22
申请人： NIKON CORP , NIKON ENG CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
发明人： HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03F20060101 , G03F7/20 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

5. 发明专利

IL179787D0 EXPOSURE EQUIPMENT, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：IL179787D0
公开(公告)日：2007-05-15
申请号：IL17978706
申请日：2006-12-03
申请人： NIKON CORP , NIKON ENGINEERING CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03F7/20 , H01L20100101 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

6. 发明专利

IL240857A Exposure equipment, exposure method and device manufacturing method 未知
公开(公告)号：IL240857A
公开(公告)日：2018-05-31
申请号：IL24085715
申请日：2015-08-26
申请人： NIKON CORP , NIKON ENG CO LTD , HIROYUKI NAGASAKA , TAKESHI OKUYAMA
发明人： HIROYUKI NAGASAKA , TAKESHI OKUYAMA
IPC分类号： G03B20060101 , G03F20060101 , G03F7/20 , H01L20060101 , H01L21/027
摘要： Exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) via a projection optical system (PL) and a liquid (LQ). The exposure apparatus (EX) is provided with a liquid immersion mechanism (1) for supplying the liquid (LQ) and recovering the liquid (LQ). The liquid immersion mechanism (1) has an inclined surface (2), which is opposite to a surface of the substrate (P) and is inclined with respect to the surface of the substrate (P), and a liquid recovering port (22) of the liquid immersion mechanism (1) is formed in the inclined surface (2). A flat portion (72D) is provided between the substrate (P) and the projection optical system (PL). A liquid immersion area (AR2) can be maintained to be small.

7. 发明申请

US20120200836A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20120200836A1
公开(公告)日：2012-08-09
申请号：US13449041
申请日：2012-04-17
申请人： Hiroyuki NAGASAKA , Takeshi Okuyama
发明人： Hiroyuki NAGASAKA , Takeshi Okuyama
IPC分类号： G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341
摘要： An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical elements, by which a pattern image is projected onto a substrate via a liquid to expose the substrate and a liquid recovery system that recovers the liquid along with a gas and has a separator that separates the recovered liquid and the recovered gas.
摘要翻译：曝光装置通过在基板上形成液浸区域来露出基板，并通过投影光学系统和形成液浸区域的液体将图案图像投影到基板上。曝光装置包括具有多个光学元件的投影光学系统，通过该投影光学系统，通过液体将图案图像投影到基板上以露出基板，以及与气体一起回收液体的液体回收系统，并且具有分离器分离回收的液体和回收的气体。

8. 发明申请

US20110250799A1 CONNECTOR HAVING A PLUG ARRANGED ABOVE A PLATE-LIKE TERMINAL 有权
标题翻译：具有安装在板状端子上的插头的连接器
公开(公告)号：US20110250799A1
公开(公告)日：2011-10-13
申请号：US13083679
申请日：2011-04-11
申请人： TAKESHI OKUYAMA , TADASHI KUMAMOTO , KAZUHIRO MIZUKAMI , TOSHIHIRO KUSAGAYA
发明人： TAKESHI OKUYAMA , TADASHI KUMAMOTO , KAZUHIRO MIZUKAMI , TOSHIHIRO KUSAGAYA
IPC分类号： H01R24/00
CPC分类号： H01R13/112
摘要： A connector includes first and second connector parts to be connected to each other. A plate-like terminal provided in the first connector part is maintained at a power supply voltage or a ground potential. A plug connected to a signal line is supported by a first insulation part provided on the plate like terminal. The plug includes a protrusion part protruding from the first insulation part. A first terminal is configured by a plate spring supported by a second insulation part provided in the second connector part. The first terminal has an extreme end part to be engaged with a side surface of the protrusion part when the first and second connector parts are connected to each other. A second terminal for power supply or ground is supported by the second insulation part to contact with the plate-like terminal when the first and second connector parts are connected to each other.
摘要翻译：连接器包括彼此连接的第一和第二连接器部件。设置在第一连接器部分中的板状端子保持在电源电压或接地电位。连接到信号线的插头由设置在板状端子上的第一绝缘部分支撑。插头包括从第一绝缘部突出的突出部。第一端子由设置在第二连接器部分中的由第二绝缘部支撑的板簧构成。当第一和第二连接器部分彼此连接时，第一端子具有与突出部分的侧表面接合的极端部分。当第一和第二连接器部件彼此连接时，第二绝缘部件支撑用于电源或接地的第二端子与板状端子接触。

9. 发明授权

US07508490B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07508490B2
公开(公告)日：2009-03-24
申请号：US11325474
申请日：2006-01-05
申请人： Hiroyuki Nagasaka , Takeshi Okuyama
发明人： Hiroyuki Nagasaka , Takeshi Okuyama
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341
摘要： An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes: a liquid supply mechanism that has a supply port arranged to oppose a surface of the substrate; and a buffer space formed in a channel of the liquid supply mechanism; wherein the liquid is supplied to the supply port after reserving a prescribed amount or more of liquid in the buffer space.
摘要翻译：曝光装置通过在基板上形成液浸区域来露出基板，并通过投影光学系统和形成液浸区域的液体将图案图像投影到基板上。曝光装置包括：液体供给机构，其具有与基板的表面相对配置的供给口; 以及形成在所述液体供给机构的通道中的缓冲空间; 其中在缓冲空间中保留规定量以上的液体之后将液体供给到供给口。

10. 发明申请

US20070222957A1 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20070222957A1
公开(公告)日：2007-09-27
申请号：US11802060
申请日：2007-05-18
申请人： Hiroyuki Nagasaka , Takeshi Okuyama
发明人： Hiroyuki Nagasaka , Takeshi Okuyama
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70341
摘要： A lithographic projection projects a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent the substrate. The space is smaller in plan than the substrate. The apparatus includes a plate substantially parallel to the substrate to divide the space into two parts, the plate having an aperture to allow transmission of the pattern onto the substrate.
摘要翻译：光刻投影通过限制在与衬底相邻的空间的液体将图案从图案形成装置投影到衬底上。平面上的空间比底物小。该装置包括基本上平行于基板的板，以将空间分成两部分，该板具有孔，以允许将图案传输到基板上。

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