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1. 发明授权

US08841636B2 Modulation device and charged particle multi-beamlet lithography system using the same 有权
标题翻译：调制装置和带电粒子的多光束光刻系统使用相同
公开(公告)号：US08841636B2
公开(公告)日：2014-09-23
申请号：US12911859
申请日：2010-10-26
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
IPC分类号： H01J37/317 , H01J37/04 , B82Y40/00 , B82Y10/00 , H01J37/07
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.
摘要翻译：本发明涉及一种用于将图案转印到目标表面上的带电粒子多子束光刻系统。该系统包括光束发生器，子束遮挡器阵列，屏蔽结构和投影系统。束发生器被布置用于产生多个带电粒子子束。子束消隐器阵列被布置成用于图形化子束。子束遮蔽器阵列包括多个调制器和多个光敏元件。光敏元件布置成接收携带光束的图案数据，并且电连接到一个或多个调制器。屏蔽结构是导电材料，用于基本上屏蔽在光敏元件附近从调制器产生的电场。屏蔽结构被设置为预定电位。投影系统布置成将图案化的子束投影到目标表面上。

2. 发明申请

US20120293780A1 CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER 有权
标题翻译：具有中间室的充电颗粒层析系统
公开(公告)号：US20120293780A1
公开(公告)日：2012-11-22
申请号：US13295249
申请日：2011-11-14
申请人： Laura DINU-GÜRTLER , Willem Henk URBANUS , Marco Jan-Jaco WIELAND , Stijn Willem Herman Karel STEENBRINK
发明人： Laura DINU-GÜRTLER , Willem Henk URBANUS , Marco Jan-Jaco WIELAND , Stijn Willem Herman Karel STEENBRINK
IPC分类号： G03B27/52
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/16 , H01J37/18 , H01J37/301 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/188
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a main vacuum chamber, a source chamber and an intermediate chamber, both located in the main vacuum chamber, a beam generator for generating a charged particle beam, the beam generator located in the source chamber, and a first aperture array element for generating a plurality of charged particle beamlets from the beam, the first aperture array element located in the intermediate chamber. The system is adapted for maintaining a first pressure in the main vacuum chamber, a second pressure in the intermediate chamber, and a third pressure in the source chamber, and wherein the first pressure is lower than an ambient pressure, the second pressure is lower than the first pressure, and the third pressure is lower than the second pressure.
摘要翻译：一种用于将图案转印到目标表面上的带电粒子光刻系统，包括位于主真空室中的主真空室，源室和中间室，用于产生带电粒子束的束发生器，位于源室中的发生器，以及用于从所述梁产生多个带电粒子子束的第一孔阵列元件，位于中间室中的第一孔阵列元件。该系统适于维持主真空室中的第一压力，中间室中的第二压力和源室中的第三压力，并且其中第一压力低于环境压力，第二压力低于第一压力和第三压力低于第二压力。

3. 发明申请

US20120292491A1 CHARGED PARTICLE BEAM MODULATOR 有权
标题翻译：充电颗粒光束调制器
公开(公告)号：US20120292491A1
公开(公告)日：2012-11-22
申请号：US13295252
申请日：2011-11-14
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis Van De Peut , Henk Derks
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink , Teunis Van De Peut , Henk Derks
IPC分类号： G21K5/04
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/241 , H01J37/3177 , H01J2237/0437 , H01J2237/2482
摘要： The invention relates to a charged particle lithography system comprising a beam generator for generating a plurality of charged particle beamlets, a beam stop array and a modulation device. The beam stop array has a surface for blocking beamlets from reaching a target surface and an aperture array in the surface for allowing beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for powering elements within the modulation device. The power interface area is located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.
摘要翻译：本发明涉及一种带电粒子光刻系统，其包括用于产生多个带电粒子子束的束发生器，束阻止阵列和调制装置。光束停止阵列具有用于阻挡子束到达目标表面的表面和表面中的孔径阵列，以允许子束到达目标表面。调制装置被布置用于通过偏转或不偏转子束来调制子束，使得子束被阻挡或不被阻挡阵列阻挡。调制装置的表面区域包括细长的波束区域，其包括孔阵列和相关联的调制器，以及用于容纳为调制装置内的元件供电的功率装置的电源接口区域。电源接口区域位于细长波束区域的长边旁边并沿与其大致平行的方向延伸。

4. 发明申请

US20120211677A1 MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
标题翻译：多束光束粒子光学系统
公开(公告)号：US20120211677A1
公开(公告)日：2012-08-23
申请号：US13461594
申请日：2012-05-01
申请人： Pieter Kruit , Yanxia Zhang , Matijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
发明人： Pieter Kruit , Yanxia Zhang , Matijn J. Van Bruggen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G21K5/10
CPC分类号： H01J37/12 , H01J37/153 , H01J2237/04924 , H01J2237/1205 , H01J2237/121 , H01J2237/317
摘要： The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.
摘要翻译：本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。该系统可以包括发散的带电粒子束部分，其中包括透镜结构。透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

5. 发明申请

US20110261344A1 EXPOSURE METHOD 审中-公开
标题翻译：曝光方法
公开(公告)号：US20110261344A1
公开(公告)日：2011-10-27
申请号：US12977346
申请日：2010-12-23
申请人： Guido DE BOER , Johnny Joannes Jacobus Van Baar , Kaustubh Prabodh Padhye , Robert Mossel , Niels Vergeer , Stijn Willem Herman Karel Steenbrink , Johan Joost Koning
发明人： Guido DE BOER , Johnny Joannes Jacobus Van Baar , Kaustubh Prabodh Padhye , Robert Mossel , Niels Vergeer , Stijn Willem Herman Karel Steenbrink , Johan Joost Koning
IPC分类号： G03B27/58 , G01B21/20 , B01J19/08
CPC分类号： G01B7/023 , G01D3/036 , G01D5/2417 , G03F9/7026 , G03F9/7053
摘要： A method for exposing a surface of a target in a system comprising a set of sensors (30) for measuring distance to the target. The method comprises clamping the target to a moveable table (134), moving the target to a plurality of positions in which one or more of the sensors are positioned above the target, receiving signals from one or more of the sensors positioned above the target, calculating one or more tilt correction values (Rx, Ry) based on the signals received from the sensors, adjusting the tilt of the table based on the one or more tilt correction values, and exposing the target.
摘要翻译：一种用于暴露系统中的目标表面的方法，包括用于测量到目标距离的一组传感器（30）。该方法包括将目标夹持到可移动台（134），将目标移动到多个位置，其中一个或多个传感器位于目标上方，从位于目标上方的一个或多个传感器接收信号，基于从所述传感器接收的信号计算一个或多个倾斜校正值（Rx，Ry），基于所述一个或多个倾斜校正值调整所述表的倾斜度，并且暴露所述目标。

6. 发明申请

US20110260040A1 Charged particle multi-beamlet lithography system with modulation device 有权
标题翻译：带调制装置的带电粒子多光束光刻系统
公开(公告)号：US20110260040A1
公开(公告)日：2011-10-27
申请号：US12911911
申请日：2010-10-26
申请人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
发明人： Marco Jan-Jaco Wieland , Remco Jager , Alexander Hendrik Vincent Van Veen , Stijn Willem Herman Karel Steenbrink
IPC分类号： G01J1/42
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/07 , H01J37/3174 , H01J2237/0262 , H01J2237/0435 , H01J2237/0437 , H01J2237/31774
摘要： A charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column, a beam stop array having a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface, and a modulation device for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. The modulation device comprises a plurality of apertures arranged in arrays for letting the beamlets pass through the modulation device, a plurality of modulators arranged in arrays, each modulator provided with electrodes extending on opposing sides of an aperture for generating a voltage difference across the aperture, and a plurality of light sensitive elements arranged in arrays, for receiving modulated light beams and converting the light beams into electric signals for actuating the modulators, wherein the light sensitive elements are located within the column, wherein the modulation device is subdivided into a plurality of alternating beam areas and non-beam areas, the arrays of modulators are located in the beam areas, and the arrays of light sensitive elements are located in the non-beam areas and are in communication with the modulators in an adjacent beam area.
摘要翻译：一种用于将图案转印到目标表面上的带电粒子光刻系统。该系统包括用于产生多个带电粒子子束的束发生器，多个子束限定列，具有用于阻挡子束到达目标表面的表面的光束停止阵列和该表面中的孔阵列，用于允许子束到达目标表面，以及调制装置，用于调制子束以防止一个或多个子束到达目标表面或允许一个或多个子束到达目标表面，通过偏转或不偏转子束，使得子束被阻挡或不被阻挡束阻挡。调制装置包括排列成阵列的多个孔，用于使子束通过调制装置，多个以阵列排列的调制器，每个调制器设置有在孔的相对侧延伸的电极，用于产生穿过孔的电压差，以及多个以阵列排列的感光元件，用于接收调制光束并将光束转换成用于致动调制器的电信号，其中光敏元件位于列内，其中调制装置被细分为多个交替光束区域和非光束区域，调制器阵列位于光束区域中，并且光敏元件阵列位于非光束区域中，并且与相邻光束区域中的调制器连通。

7. 发明授权

US07710009B2 System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission 有权
标题翻译：用于多光束光刻的系统，方法和装置，包括用于均匀电子发射的分配器阴极
公开(公告)号：US07710009B2
公开(公告)日：2010-05-04
申请号：US11650310
申请日：2007-01-05
申请人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
发明人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
IPC分类号： H01J19/14 , H01J1/20 , H01J1/14 , H01J1/28
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J1/28 , H01J37/3177 , H01J2237/3175 , H01J2237/31754 , H01J2237/31774
摘要： A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
摘要翻译：分配器阴极，其包括排放表面，用于材料释放的储存器，当被加热时，功能降低颗粒和至少一个通道，用于允许功能降低颗粒从所述储存器扩散到所述发射表面，所述发射表面包括至少一个发射区域和至少一个覆盖有发射抑制材料并且围绕每个发射区域的非发射区域，所述非发射区域包括将所述储层与所述非发射区域连接的至少一个通道，并在从放射区域的扩散长度距离，用于允许功能降低颗粒从所述储存器扩散到所述发射区域。

8. 发明申请

US20090212229A1 PROJECTION LENS ARRANGEMENT 有权
标题翻译：投影镜头布置
公开(公告)号：US20090212229A1
公开(公告)日：2009-08-27
申请号：US12393049
申请日：2009-02-26
申请人： Marco Jan Jaco WIELAND , Bert Jan KAMPHERBEEK , Alexander Hendrik VAN VEEN , Pieter KRUIT , Stijn Willem Herman Karel STEENBRINK
发明人： Marco Jan Jaco WIELAND , Bert Jan KAMPHERBEEK , Alexander Hendrik VAN VEEN , Pieter KRUIT , Stijn Willem Herman Karel STEENBRINK
IPC分类号： H01J3/14 , G01J1/00 , A61N5/00
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/1205 , H01J2237/121 , H01J2237/151
摘要： A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.
摘要翻译：一种用于使用多个子束曝光目标的带电粒子多子束系统。该系统包括在其中形成有多个孔的第一板，形成在每个孔的位置处的多个静电投影透镜系统，使得每个电子束通过相应的投影透镜系统。这些孔具有足够均匀的放置和尺寸以使得能够使用公共控制电压将子束聚焦到靶的表面上。优选地，静电投影透镜系统由公共电信号控制，以将电子束聚焦在表面上，而无需校正各个电子束的聚焦或路径。

9. 发明授权

US07215070B2 System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission 失效
标题翻译：用于多光束光刻的系统，方法和装置，包括用于均匀电子发射的分配器阴极
公开(公告)号：US07215070B2
公开(公告)日：2007-05-08
申请号：US10778787
申请日：2004-02-13
申请人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
发明人： Stijn Willem Herman Karel Steenbrink , Pieter Kruit
IPC分类号： H01J19/14 , H01J1/20 , H01J1/14 , H01J1/28
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J1/28 , H01J37/3177 , H01J2237/3175 , H01J2237/31754 , H01J2237/31774
摘要： A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.
摘要翻译：分配器阴极，其包括排放表面，用于材料释放的储存器，当被加热时，功能降低颗粒和至少一个通道，用于允许功能降低颗粒从所述储存器扩散到所述发射表面，所述发射表面包括至少一个发射区域和至少一个覆盖有发射抑制材料并且围绕每个发射区域的非发射区域，所述非发射区域包括将所述储层与所述非发射区域连接的至少一个通道，并在从放射区域的扩散长度距离，用于允许功能降低颗粒从所述储存器扩散到所述发射区域。

10. 发明授权

US08921758B2 Modulation device and charged particle multi-beamlet lithography system using the same 有权
标题翻译：调制装置和带电粒子的多光束光刻系统使用相同
公开(公告)号：US08921758B2
公开(公告)日：2014-12-30
申请号：US13281559
申请日：2011-10-26
申请人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
发明人： Marco Jan-Jaco Wieland , Teunis Van De Peut , Alexander Hendrik Vincent Van Veen , Remco Jager , Stijn Willem Herman Karel Steenbrink , Ralph Van Melle , Henk Derks
IPC分类号： H01J3/14 , H01J5/16 , H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/317
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/22 , H01J37/3174 , H01J37/3177 , H01J2237/0437
摘要： The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.
摘要翻译：本发明涉及带电粒子多子束光刻系统。该系统包括用于产生多个子束的光束发生器，用于对多个子束进行图案化的子束遮蔽器阵列，光纤布置和投影系统。子束消除器阵列包括设置有包括一个或多个调制器的第一区域和不含调制器的第二区域的衬底。子束消隐器阵列包括电连接到一个或多个调制器的一个或多个光敏元件，并被布置成接收携带图案数据的光束。光纤布置包括多个光纤，用于将携带图案数据的光束引向一个或多个光敏元件。光束布置在垂直于表面的方向上投射到子束消除器阵列的表面上完全落在第二区域内。

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