会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明授权
    • Gassing-free exposure mask
    • 无气味的面膜
    • US07344807B2
    • 2008-03-18
    • US10843669
    • 2004-05-12
    • Stefan Geyer
    • Stefan Geyer
    • G03F1/00
    • G03F1/64
    • The present invention relates to an exposure mask for structuring a photoresist layer on a substrate wafer, in which an inorganic adhesive is used as an adhesive device for connecting a reticle having a lithographic structure, a frame and a pellicle. For chemical reasons, an adhesive of this type has no tendency or a considerably lower tendency to gassing out than an organic adhesive used in conventional exposure masks, so that the risk of particles which are deposited on the lithographic structure and which can cause projection errors during an exposure process is largely ruled out. The invention relates further to a method of producing such an inorganic adhesive and also a method of producing an exposure mask with the aid of such an inorganic adhesive.
    • 本发明涉及用于在基板晶片上构造光致抗蚀剂层的曝光掩模,其中使用无机粘合剂作为用于连接具有光刻结构的掩模版,框架和防护薄膜的粘合装置。 由于化学原因,这种粘合剂与常规曝光掩模中使用的有机粘合剂相比,没有趋向或显着降低倾向的倾向,因此沉积在光刻结构上并且可能导致投影误差的颗粒的风险 很大程度上排除了曝光过程。 本发明还涉及生产这种无机粘合剂的方法,以及借助于这种无机粘合剂制备曝光掩模的方法。