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    • 6. 发明授权
    • Method for manufacturing heat sink of semiconductor device
    • 制造半导体器件散热片的方法
    • US07387915B2
    • 2008-06-17
    • US11470273
    • 2006-09-06
    • Yan-Kuin SuKuan-Chun ChenChun-Liang LinJin-Quan HuangShu-Kai Hu
    • Yan-Kuin SuKuan-Chun ChenChun-Liang LinJin-Quan HuangShu-Kai Hu
    • H01L21/00
    • H01L33/0079H01L33/641H01S5/02256H01S5/02272H01S5/024H01S5/02476H01S5/4093
    • A method for manufacturing a heat sink of a semiconductor device is described. In the method, an adhesive tape is provided, wherein the adhesive tape includes a first surface and a second surface on opposite sides, and the first surface of the adhesive tape adheres to a surface of a temporary substrate. At least one semiconductor device is provided, wherein the semiconductor device includes a first side and a second side opposite to the first side, and the first side of the one semiconductor device is pressed and set into a portion of the second surface of the adhesive tape, and the second side of the one semiconductor device is exposed. A thin metal layer is formed on the second side of the semiconductor device and the exposed portion of the second surface of the adhesive tape. A metal heat sink is formed on the thin metal layer. Then, the adhesive tape and the temporary substrate are removed.
    • 描述了制造半导体器件的散热器的方法。 在该方法中,提供了一种粘合带,其中胶带包括第一表面和相对侧上的第二表面,并且粘合带的第一表面粘附到临时基底的表面。 提供至少一个半导体器件,其中半导体器件包括与第一侧相对的第一侧和第二侧,并且一个半导体器件的第一侧被压入并设置在粘合带的第二表面的一部分中 并且暴露一个半导体器件的第二面。 在半导体器件的第二侧和胶带的第二表面的暴露部分上形成薄金属层。 在薄金属层上形成金属散热器。 然后,去除胶带和临时基板。