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    • 3. 发明授权
    • Process for oxidation of an article
    • 制品氧化过程
    • US5510158A
    • 1996-04-23
    • US348259
    • 1994-11-28
    • Tatsumi HiramotoTatsushi IgarashiHiromitsu MatsunoTakeo MatsushimaShinichi Iso
    • Tatsumi HiramotoTatsushi IgarashiHiromitsu MatsunoTakeo MatsushimaShinichi Iso
    • B08B7/00C03C23/00C23G5/00H01L21/311C23C16/48B05D3/00
    • H01L21/31138B08B7/0057C03C23/0075C23G5/00
    • An oxidation process for an article to be treated in which, by generating ozone with a high concentration, a high treatment rate is achieved. In particular, an oxygen-containing fluid is irradiated with a vacuum ultraviolet rays emitted from a dielectric barrier discharge lamp in which xenon gas is encapsulated, producing a photochemical reaction from which ozone and an activated oxygen result. By causing this ozone and activated oxygen to contact the surface of the article to be treated, the surface of the article is oxidized. An even higher treatment rate can be achieved by generating the activated oxygen with the simultaneous use of a far ultraviolet ray source, thereby increasing the activity of the activated oxygen. Advantageously, the oxidation of the article to be treated with the vacuum ultraviolet rays and far ultraviolet rays is performed in accordance with the relationship:(p.times.d)/(1+I.sup.1/2)=0.33where I is a radiation density (mW/cm.sup.2) of the far ultraviolet rays on a surface of the article to be treated in which there is no light absorption between the far ultraviolet ray source and the surface of the article to be treated, d is a shortest distance (cm) of passage of the vacuum ultraviolet rays emitted from the dielectric barrier discharge lamp to the surface of the article to be treated, and p is an oxygen partial pressure (atm) of the oxygen-containing gas, which is present between the dielectric barrier discharge lamp and the article to be treated.
    • 通过产生高浓度臭氧,处理率高的待处理物品的氧化处理。 特别地,从包封有氙气的电介质阻挡放电灯发出的真空紫外线照射含氧流体,产生产生臭氧和活性氧的光化学反应。 通过使该臭氧和活性氧与被处理物的表面接触,制品的表面被氧化。 通过同时使用远紫外线源产生活性氧,从而提高活性氧的活性,可以实现更高的治疗率。 有利地,根据以下关系进行用真空紫外线和远紫外线处理的制品的氧化:(pxd)/(1 + I1 / 2)= 0.33其中I是辐射密度(mW / cm2 )在远紫外线源和被处理物的表面之间不存在光吸收的待处理物品的表面上的远紫外线的距离d为通过的最短距离(cm) 从介电阻挡放电灯发射到待处理物体的表面的真空紫外线,p是存在于电介质阻挡放电灯与制品之间的含氧气体的氧分压(atm), 被处理。