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    • 6. 发明申请
    • Temperature control device and method using peltier element
    • 温度控制装置及方法采用珀耳帖元件
    • US20060005550A1
    • 2006-01-12
    • US11179023
    • 2005-07-11
    • Shigenao MaruyamaKatsumi FujimaChoiku YoshikawaShuji Fukano
    • Shigenao MaruyamaKatsumi FujimaChoiku YoshikawaShuji Fukano
    • F25B21/02
    • A61B18/02A61B2018/0237
    • There are provided an device for controlling temperature by Peltier element and a method for controlling temperature by the same, wherein the structure of the device can be simplified, the cost making the device can be reduced and an accuracy of the temperature control of a contact plane based on the detected temperature value with a temperature sensor can be improved by capacitating insulation for a Peltier element and related elements without providing a vacuum case and related elements for encapsulating a Peltier element and related elements. In an device for controlling temperature by Peltier element, wherein a temperature-controlled body is rapidly cooled or heated by Peltier effect generated by contacting the temperature-controlled body with the contact plane connected to a conductive body and by applying a direct current voltage between the Peltier element and the electrode-cum-heat-sink, an device for controlling temperature by Peltier element is characterized in that there are provided an end cover which covers the conductive body, the Peltier element and a whole of the electrode-cum-heat-sink or a part of the conductive body side and which forms a contact plane; a gas layer sealed in a space formed inside the cover; and an insulating layer comprising insulating material in the space formed inside the cover between the conductive body and the gas layer.
    • 提供了一种用于通过珀耳帖元件控制温度的装置和用于控制温度的方法,其中可以简化装置的结构,可以降低装置的成本和接触平面的温度控制的精度 基于用温度传感器检测到的温度值可以通过对珀尔帖元件和相关元件的电容绝缘而提供,而不需要提供真空壳体和用于封装珀耳帖元件和相关元件的相关元件。 在用于通过珀尔帖元件控制温度的装置中,其中温度受控体被珀尔帖效应快速冷却或加热,所述效应是通过使温度受控体与连接到导电体的接触平面接触而产生的,并且通过在 珀耳帖元件和电极暨散热器,用于通过珀耳帖元件控制温度的装置的特征在于,提供一种端盖,其覆盖导电体,珀耳帖元件和整个电极 - 热 - 沉没或导电体侧的一部分,并形成接触面; 密封在形成在所述盖内的空间中的气体层; 以及在导电体和气体层之间的盖内形成的空间中包含绝缘材料的绝缘层。
    • 9. 发明申请
    • APPARATUS AND METHOD FOR CONTROLLING TEMPERATURE OF SEMICONDUCTOR WAFERS
    • 用于控制半导体波导温度的装置和方法
    • US20110066294A1
    • 2011-03-17
    • US12992971
    • 2009-11-09
    • Hiroaki TakechiNorio TakahashiWataru KiyosawaShigenao MaruyamaAtsuki Komiya
    • Hiroaki TakechiNorio TakahashiWataru KiyosawaShigenao MaruyamaAtsuki Komiya
    • G05D23/00G05D7/00
    • H01L21/67248H01L21/67005H01L21/67109
    • A manufacturing time of a semiconductor device is shortened by raising and dropping a base temperature of a semiconductor wafer such as silicon wafer to a target temperature at a high speed, a semiconductor device is manufactured with high qualities by making an in-plane temperature distribution of the semiconductor wafer a desired temperature distribution with high accuracy (by uniformizing an in-plane temperature and varying the in-plane temperature distribution for each region), and furthermore, an apparatus with excellent energy efficiency can be simply configured. When the temperature of the semiconductor wafer is controlled to be the target temperature by raising the temperature of the semiconductor wafer, control means performs switching so as to supply a high-temperature circulating liquid at a temperature higher than the target temperature in a high-temperature tank to a channel in a stage, and controls the thermoelectric element in plural zones so that the temperature of the semiconductor wafer coincides with the target temperature and the in-plane temperature distribution of the semiconductor wafer becomes the desired temperature distribution.
    • 半导体器件的制造时间通过将诸如硅晶片的半导体晶片的基底温度高速地提高到目标温度而缩短,通过使半导体器件的面内温度分布 半导体晶片具有高精度的期望的温度分布(通过均匀化面内温度并改变各区域的面内温度分布),此外,可以简单地构造具有优异的能量效率的装置。 当通过提高半导体晶片的温度将半导体晶片的温度控制为目标温度时,控制装置执行切换,以便在高温下提供高于目标温度的高温循环液体 并且控制多个区域中的热电元件,使得半导体晶片的温度与目标温度一致,并且半导体晶片的面内温度分布变为期望的温度分布。