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    • 2. 发明授权
    • Method for inspecting semiconductor device
    • 半导体器件检查方法
    • US07015051B2
    • 2006-03-21
    • US10879060
    • 2004-06-30
    • Shigemitsu Shiba
    • Shigemitsu Shiba
    • H01L31/26H01L21/66
    • G01R31/311
    • A wafer is irradiated with laser light having a wavelength which is transmitted through an inside of a crystal of the wafer and does not generate an electromotive force due to photo-excitation while the laser light is scanned. When a temperature of the wafer is increased by the irradiation, a thermo-electromotive force is generated in a crystalline abnormal part of the wafer by a Seebeck effect. A defect inside the crystal is detected such that the thermo-electromotive force is detected by a change in voltage or current which appears between an anode and a cathode of the wafer and the thermo-electromotive force is displayed on a CRT.
    • 用透射通过晶片内部的波长的激光照射晶片,并且在扫描激光时不产生由于光激发产生的电动势。 当通过照射增加晶片的温度时,通过塞贝克效应在晶片的晶体异常部分中产生热电动势。 检测晶体内部的缺陷,使得通过出现在晶片的阳极和阴极之间的电压或电流的变化来检测热电动势,并且热电动势显示在CRT上。
    • 4. 发明授权
    • System for providing information on quality and reliability of optical semiconductor device by using communication network
    • 通过使用通信网络提供光半导体器件的质量和可靠性信息的系统
    • US06662142B2
    • 2003-12-09
    • US09994734
    • 2001-11-28
    • Shigemitsu Shiba
    • Shigemitsu Shiba
    • G01R3126
    • H01L22/20G01R31/01Y02P90/04Y02P90/22
    • The system for providing information on quality and reliability according to the present invention includes: a first information communication terminal for outputting, as information on a side of a maker producing an optical semiconductor device, information gathered at a first time regarding a characteristic of the device; a second information communication terminal for outputting, as information on a side of a user using the device, information gathered at a second time regarding the characteristic of the device; and an information processing apparatus that (1) computes a rate of change in the characteristic of the device from the first time to the second time on the basis of the information outputted from the first and second information terminals, and (2) outputs a signal representing an abnormality to at least one of the first and second information terminals when the computed rate of change is out of a predetermined numerical range.
    • 根据本发明的用于提供关于质量和可靠性的信息的系统包括:第一信息通信终端,用于输出作为制造光学半导体装置的制造商的一方的信息,第一时间收集关于装置的特性的信息 ; 第二信息通信终端,用于作为关于使用所述设备的用户侧的信息输出关于所述设备的特性的第二时间收集的信息; 以及信息处理装置,其(1)根据从第一和第二信息终端输出的信息,计算从第一时间到第二时间的设备特性的变化率,以及(2)输出信号 当所计算的变化率在预定的数值范围之外时,对第一和第二信息终端中的至少一个信号表示异常。
    • 7. 发明授权
    • Method for inspecting semiconductor device
    • 半导体器件检查方法
    • US07332362B2
    • 2008-02-19
    • US11287458
    • 2005-11-28
    • Shigemitsu Shiba
    • Shigemitsu Shiba
    • H01L21/66H01L35/24
    • G01R31/311
    • A wafer is irradiated with laser light having a wavelength which is transmitted through an inside of a crystal of the wafer and does not generate an electromotive force due to photo-excitation while the laser light is scanned. When a temperature of the wafer is increased by the irradiation, a thermo-electromotive force is generated in a crystalline abnormal part of the wafer by a Seebeck effect. A defect inside the crystal is detected such that the thermo-electromotive force is detected by a change in voltage or current which appears between an anode and a cathode of the wafer and the thermo-electromotive force is displayed on a CRT.
    • 用透射通过晶片内部的波长的激光照射晶片,并且在扫描激光时不产生由于光激发产生的电动势。 当通过照射增加晶片的温度时,通过塞贝克效应在晶片的晶体异常部分中产生热电动势。 检测晶体内部的缺陷,使得通过出现在晶片的阳极和阴极之间的电压或电流的变化来检测热电动势,并且热电动势显示在CRT上。
    • 8. 发明授权
    • Semiconductor laser apparatus and method of observing semiconductor laser apparatus
    • 半导体激光装置及观察半导体激光装置的方法
    • US06870869B2
    • 2005-03-22
    • US09794355
    • 2001-02-28
    • Shigemitsu Shiba
    • Shigemitsu Shiba
    • H01S5/00H01S5/02H01S5/042
    • H01S5/0425H01S5/0014H01S5/02
    • A semiconductor laser apparatus comprises a semiconductor laser chip disposed on a base through an electrode area, wherein the electrode area comprises at least a first electrode layer having no opening and a second electrode layer having an opening from the semiconductor laser chip side, the second electrode layer is formed of materials different from those of the first electrode layer and the opening of the second electrode layer is shaped in such a manner as to allow observation of a light emitting portion of the semiconductor laser chip by etching the first electrode layer using the second electrode layer as a mask. Another semiconductor laser apparatus comprises first and second electrode areas on the upper surface and the lower surface of the semiconductor laser chip, wherein both the first and the second electrode areas comprise at least the first electrode layer having no opening and the second electrode layer having the opening from the semiconductor laser chip side.
    • 半导体激光装置包括通过电极区域设置在基底上的半导体激光器芯片,其中电极区域至少包括不具有开口的第一电极层和具有来自半导体激光器芯片侧的开口的第二电极层,第二电极 层由与第一电极层不同的材料形成,并且第二电极层的开口被成形为允许通过使用第二电极层蚀刻第一电极层来观察半导体激光器芯片的发光部分 电极层作为掩模。 另一半导体激光装置包括在半导体激光芯片的上表面和下表面上的第一和第二电极区域,其中第一和第二电极区域至少包括没有开口的第一电极层,而第二电极层具有 从半导体激光芯片侧开口。
    • 9. 发明申请
    • Method for inspecting semiconductor device
    • 半导体器件检查方法
    • US20050012923A1
    • 2005-01-20
    • US10879060
    • 2004-06-30
    • Shigemitsu Shiba
    • Shigemitsu Shiba
    • H01L21/66G01R31/311G01N21/00
    • G01R31/311
    • A wafer is irradiated with laser light having a wavelength which is transmitted through an inside of a crystal of the wafer and does not generate electromotive force due to photo-excitation while the laser light is scanned. When a temperature of the wafer is increased by the irradiation, thermo-electromotive force is generated in a crystalline abnormal part of the wafer by Seebeck effect. A defect inside the crystal is detected such that the thermo-electromotive force is detected by a change in voltage or current which appears between an anode and a cathode of the wafer and the thermo-electromotive force is displayed on CRT.
    • 用透射通过晶片内部的波长的激光照射晶片,并且在扫描激光时不产生由于光激发产生的电动势。 当通过照射增加晶片的温度时,通过塞贝克效应在晶片的晶体异常部分中产生热电动势。 检测晶体内部的缺陷,使得通过出现在晶片的阳极和阴极之间的电压或电流的变化来检测热电动势,并且将热电动势显示在CRT上。