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    • 3. 发明申请
    • REAGENT DISPENSING APPARATUS AND DELIVERY METHOD
    • 试剂分配装置和递送方法
    • WO2008094854A3
    • 2008-09-25
    • PCT/US2008052175
    • 2008-01-28
    • PRAXAIR TECHNOLOGY INCSPOHN RONALD FPETERS DAVID W
    • SPOHN RONALD FPETERS DAVID W
    • F17C9/00B67D7/00B67D99/00F16J15/02
    • C23C16/4409C23C16/4482F16J15/0887F16J15/128Y10T428/13
    • This invention relates to a vapor or liquid phase reagent dispensing apparatus comprising a vessel (40) which comprises a removable top wall member (20), a sidewall member (22) and a bottom wall member (26) configured to form an internal vessel compartment; said sidewall member (22) having a protuberance (24) that extends into the internal vessel compartment adjacent to the top wall member (20); said top wall member (20) and said protuberance (24) having opposing flat surfaces, wherein the opposing flat surfaces are not in contact with one another and at least a portion of the opposing flat surfaces are hardened (30); and a metal seal (10) aligned and in contact with the hardened opposing flat surfaces (30) of said top wall member (20) and said protuberance (24). The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    • 本发明涉及一种蒸气相或液相反应物分配装置,其包括容器(40),该容器包括可移除的顶壁构件(20),侧壁构件(22)和底壁构件(26),其构造成形成内部容器隔室 ; 所述侧壁构件具有突出部分,所述突出部分延伸到邻近所述顶壁构件的所述内部容器隔室中; 所述顶壁部件(20)和所述凸起(24)具有相对的平坦表面,其中所述相对的平坦表面不彼此接触,并且所述相对的平坦表面的至少一部分被硬化(30)。 以及与所述顶壁构件(20)和所述突起(24)的硬化的相对平坦表面(30)对准并接触的金属密封件(10)。 分配设备可以用于分配试剂,例如用于在制造半导体材料和装置中沉积材料的前体。
    • 4. 发明申请
    • REAGENT DISPENSING APPARATUS AND DELIVERY METHOD
    • 试剂分配装置和输送方法
    • WO2008094857A2
    • 2008-08-07
    • PCT/US2008/052184
    • 2008-01-28
    • PRAXAIR TECHNOLOGY, INC.SPOHN, Ronald, F.PETERS, David, W.
    • SPOHN, Ronald, F.PETERS, David, W.
    • F17C9/00F16J15/02
    • C23C16/4409C23C16/4482F16J15/0887F16J15/128Y10T428/13
    • This invention relates to a vapor or liquid phase reagent dispensing apparatus comprising a vessel (40) which comprises a removable top wall member (20), a sidewall member (22) and a bottom wall member (26) having a sump cavity therein, configured to form an internal vessel compartment; said sidewall member (22) having a protuberance (24) that extends into the internal vessel compartment adjacent to the top wall member (20); said top wall member (20) and said protuberance (24) having opposing flat surfaces, wherein at least a portion of the opposing flat surfaces are hardened (30); a metal seal (10) aligned and in contact with the hardened opposing flat surfaces (30); a temperature sensor (75) (i.e., thermocouple) and (76) (i.e., thermowell) and a source chemical level sensor (78). The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    • 本发明涉及一种蒸汽或液相试剂分配装置,其包括容器(40),该容器(40)包括可移除的顶壁构件(20),侧壁构件(22)和其中具有凹槽腔的底壁构件(26),构造 形成内部血管隔室; 所述侧壁件(22)具有与所述顶壁件(20)相邻延伸到所述内部容器隔室中的突起(24); 所述顶壁构件(20)和所述突起(24)具有相对的平坦表面,其中相对的平坦表面的至少一部分被硬化(30); 与硬化的相对的平坦表面(30)对准并接触的金属密封件(10); 温度传感器(75)(即热电偶)和(76)(即热电偶套管)和源化学液位传感器(78)。 分配装置可以用于分配诸如用于在半导体材料和器件的制造中沉积材料的前体的试剂。
    • 5. 发明申请
    • REAGENT DISPENSING APPARATUS AND DELIVERY METHOD
    • 试剂分配装置和输送方法
    • WO2008094854A2
    • 2008-08-07
    • PCT/US2008/052175
    • 2008-01-28
    • PRAXAIR TECHNOLOGY, INC.SPOHN, Ronald, F.PETERS, David, W.
    • SPOHN, Ronald, F.PETERS, David, W.
    • F17C9/00F16J15/02
    • C23C16/4409C23C16/4482F16J15/0887F16J15/128Y10T428/13
    • This invention relates to a vapor or liquid phase reagent dispensing apparatus comprising a vessel (40) which comprises a removable top wall member (20), a sidewall member (22) and a bottom wall member (26) configured to form an internal vessel compartment; said sidewall member (22) having a protuberance (24) that extends into the internal vessel compartment adjacent to the top wall member (20); said top wall member (20) and said protuberance (24) having opposing flat surfaces, wherein the opposing flat surfaces are not in contact with one another and at least a portion of the opposing flat surfaces are hardened (30); and a metal seal (10) aligned and in contact with the hardened opposing flat surfaces (30) of said top wall member (20) and said protuberance (24). The dispensing apparatus may be used for dispensing of reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
    • 本发明涉及一种蒸汽或液相试剂分配装置,其包括容器(40),容器(40)包括可移除的顶壁构件(20),侧壁构件(22)和底壁构件(26),构造成形成内部容器隔室 ; 所述侧壁构件(22)具有与所述顶壁构件(20)相邻延伸到所述内部容器隔室中的突起(24); 所述顶壁构件(20)和所述突起(24)具有相对的平坦表面,其中所述相对的平坦表面彼此不接触,并且所述相对的平坦表面的至少一部分被硬化(30)。 以及与所述顶壁构件(20)和所述突起(24)的硬化的相对的平坦表面(30)对准并接触的金属密封件(10)。 分配装置可用于分配诸如用于在半导体材料和装置的制造中沉积材料的前体的试剂。
    • 7. 发明申请
    • HETEROLEPTIC ORGANOMETALLIC COMPOUNDS
    • 异种有机化合物
    • WO2008039960A1
    • 2008-04-03
    • PCT/US2007/079804
    • 2007-09-28
    • PRAXAIR TECHNOLOGY, INC.MEIERE, Scott, HoustonPECK, JohnSPOHN, Ronald, F.THOMPSON, David, M.
    • MEIERE, Scott, HoustonPECK, JohnSPOHN, Ronald, F.THOMPSON, David, M.
    • C07F7/10C07F7/00C07F19/00C23C16/00
    • C07F7/10
    • This invention relates to organometallic compounds represented by the formula (L 1 ) X M(L 2 ) y wherein M is a metal or metalloid, L 1 and L 2 are different and are each a hydrocarbon group or a heteroatom-containing group; x is a value of at least 1; y is a value of at least 1; x + y is equal to the oxidation state of M; and wherein (i) L 1 has a steric bulk sufficiently large such that, due to steric hinderance, x cannot be a value equal to the oxidation state of M, (ii) L 2 has a steric bulk sufficiently small such that, due to lack of steric hinderance, y can be a value equal to the oxidation state of M only in the event that x is not a value of at least 1, and (iii) L 1 and L 2 have a steric bulk sufficient to maintain a heteroleptic structure in which x + y is equal to the oxidation state of M; a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.
    • 本发明涉及由下式(L 1/2)X M(L 2)n Y表示的有机金属化合物,其中 M是金属或准金属,L 1和L 2不同,并且各自是烃基或含杂原子的基团; x是至少为1的值; y值至少为1; x + y等于M的氧化态; 并且其中(i)L 1具有足够大的空间体积,使得由于空间阻力,x不能是等于M的氧化态的值,(ii)L 2 < / SUB>具有足够小的空间体积,使得由于缺乏空间阻碍,在x不是至少为1的值的情况下,y可以是等于M的氧化态的值,以及(iii) L 1和L 2具有足够的空间体积以保持其中x + y等于M的氧化态的杂光结构; 一种生产有机金属化合物的方法,以及一种由有机金属前体化合物制备薄膜或涂层的方法。