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1. 发明申请

WO2006091405A3 HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION APPARATUS 审中-公开
公开(公告)号：WO2006091405A3
公开(公告)日：2006-08-31
申请号：PCT/US2006/004906
申请日：2006-02-13
申请人： GENERAL ELECTRIC COMPANY , LAKSHMIPATHY, Muralidharan , SARIGIANNIS, Demetrius , HUBBARD, Patricia , SCHAEPKENS, Marc , PANT, Atul
发明人： LAKSHMIPATHY, Muralidharan , SARIGIANNIS, Demetrius , HUBBARD, Patricia , SCHAEPKENS, Marc , PANT, Atul
IPC分类号： C23C16/455
摘要： Embodiments for an apparatus and method for depositing one or more layers onto a substrate (5) or a freestanding shape inside a reaction chamber operating at a temperature of at least 7000C and 100 torr are provided. The apparatus is provided with means for defining a volume space (400) in the reaction chamber for pre-reacting the reactant feeds forming at least a reaction precursor in a gaseous form, separated from a deposition zone (100) for depositing a coating layer of uniform thickness on the substrate from the reacted precursor. In one embodiment, the means for defining the two different zones comprises a distribution medium. In another embodiment, the means comprises a plurality of reactant feed jets or injectors. In another embodiment, the apparatus is provided with a feeding system having injection means spatially spaced apart for tailoring the distribution of a plurality of gas-phase species, yielding a deposit that is substantially uniform in thickness and chemical composition along the substrate surface. In one embodiment, the apparatus further comprises a sacrificial substrate that further helps achieving thickness and chemical uniformity on the substrate.

2. 发明申请

WO2009105376A3 MULTIPLE AMPOULE DELIVERY SYSTEMS 审中-公开
标题翻译：多个安全交付系统
公开(公告)号：WO2009105376A3
公开(公告)日：2010-06-03
申请号：PCT/US2009033865
申请日：2009-02-12
申请人： PRAXAIR TECHNOLOGY INC , SARIGIANNIS DEMETRIUS , HOOVER CYNTHIA A , KRAUSE MICHAEL JOSEPH , PRYOR EDWARD , CHESTERS STEPHEN , SPOHN RONALD
发明人： SARIGIANNIS DEMETRIUS , HOOVER CYNTHIA A , KRAUSE MICHAEL JOSEPH , PRYOR EDWARD , CHESTERS STEPHEN , SPOHN RONALD
IPC分类号： C23C16/448
CPC分类号： C23C16/4481 , C23C16/45561 , Y10T137/0324
摘要： This invention relates to an integrated vapor or liquid phase reagent dispensing apparatus having a plurality of vessels and a plurality of carrier or inert gas feed/vapor or liquid phase reagent delivery manifolds, that may be used for continuously dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
摘要翻译：本发明涉及一种具有多个容器和多个载体或惰性气体进料/蒸气或液相试剂输送歧管的整体蒸气或液相试剂分配装置，其可用于连续分配蒸气或液相试剂，例如用于在半导体材料和器件的制造中沉积材料的前体。

3. 发明申请

WO2010056576A1 REAGENT DISPENSING APPARATUSES AND DELIVERY METHODS 审中-公开
标题翻译：试剂分配装置和输送方法
公开(公告)号：WO2010056576A1
公开(公告)日：2010-05-20
申请号：PCT/US2009/063201
申请日：2009-11-04
申请人： PRAXAIR TECHNOLOGY, INC. , SARIGIANNIS, Demetrius , AHMED, Mushtaq, M.
发明人： SARIGIANNIS, Demetrius , AHMED, Mushtaq, M.
IPC分类号： C23C16/448
CPC分类号： C23C16/4481 , C23C16/4482
摘要： This invention relates to a vapor or liquid phase reagent dispensing apparatus that may be used for dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices. The vapor phase reagent dispensing apparatus has a single port capable of receiving a carrier gas and dispensing a vapor phase reagent. The liquid phase reagent dispensing apparatus has a single port capable of receiving an inert gas and dispensing a liquid phase reagent.
摘要翻译：本发明涉及一种蒸汽或液相试剂分配装置，其可用于分配蒸气或液相试剂，例如用于在半导体材料和装置的制造中沉积材料的前体。气相试剂分配装置具有能够接收载气并分配气相试剂的单一口。液相试剂分注装置具有能够接收惰性气体并分配液相试剂的单一口。

4. 发明申请

WO2006091405A2 HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION APPARATUS 审中-公开
标题翻译：高温化学蒸气沉积装置
公开(公告)号：WO2006091405A2
公开(公告)日：2006-08-31
申请号：PCT/US2006004906
申请日：2006-02-13
申请人： GEN ELECTRIC , LAKSHMIPATHY MURALIDHARAN , SARIGIANNIS DEMETRIUS , HUBBARD PATRICIA , SCHAEPKENS MARC , PANT ATUL
发明人： LAKSHMIPATHY MURALIDHARAN , SARIGIANNIS DEMETRIUS , HUBBARD PATRICIA , SCHAEPKENS MARC , PANT ATUL
IPC分类号： C23C16/455
CPC分类号： C23C16/342 , C23C16/452 , C23C16/45514 , C23C16/45578 , C23C16/4558
摘要： Embodiments for an apparatus and method for depositing one or more layers onto a substrate or a freestanding shape inside a reaction chamber operating at a temperature of at least 7000C and 100 torr are provided. The apparatus is provided with means for defining a volume space in the reaction chamber for pre-reacting the reactant feeds forming at least a reaction precursor in a gaseous form, separated from a deposition zone for depositing a coating layer of uniform thickness on the substrate from the reacted precursor. In one embodiment, the means for defining the two different zones comprises a distribution medium. In another embodiment, the means comprises a plurality of reactant feed jets or injectors. In another embodiment, the apparatus is provided with a feeding system having injection means spatially spaced apart for tailoring the distribution of a plurality of gas-phase species, yielding a deposit that is substantially uniform in thickness and chemical composition along the substrate surface. In one embodiment, the apparatus further comprises a sacrificial substrate that further helps achieving thickness and chemical uniformity on the substrate.
摘要翻译：提供了一种用于在至少700℃和100托的温度下操作的反应室内将一个或多个层沉积到基底或独立形状上的装置和方法的实施例。该装置设置有用于限定反应室中的体积空间的装置，用于使形成至少一种气态形式的反应前体的反应物进料预反应，与沉积区分离，用于在基底上沉积均匀厚度的涂层，反应的前体。在一个实施例中，用于限定两个不同区域的装置包括分布介质。在另一个实施方案中，该装置包括多个反应物进料喷嘴或喷射器。在另一个实施方案中，该设备具有一个进料系统，该进料系统具有空间间隔开的喷射装置，用于调整多个气相物质的分布，产生沿着基底表面的厚度和化学成分基本均匀的沉积物。在一个实施例中，该装置还包括牺牲衬底，其进一步有助于实现衬底上的厚度和化学均匀性。

5. 发明申请

WO2009105376A2 MULTIPLE AMPOULE DELIVERY SYSTEMS 审中-公开
标题翻译：多个安全交付系统
公开(公告)号：WO2009105376A2
公开(公告)日：2009-08-27
申请号：PCT/US2009/033865
申请日：2009-02-12
申请人： PRAXAIR TECHNOLOGY, INC. , SARIGIANNIS, Demetrius , HOOVER, Cynthia, A. , KRAUSE, Michael, Joseph , PRYOR, Edward , CHESTERS, Stephen , SPOHN, Ronald
发明人： SARIGIANNIS, Demetrius , HOOVER, Cynthia, A. , KRAUSE, Michael, Joseph , PRYOR, Edward , CHESTERS, Stephen , SPOHN, Ronald
IPC分类号： C23C16/448
CPC分类号： C23C16/4481 , C23C16/45561 , Y10T137/0324
摘要： This invention relates to an integrated vapor or liquid phase reagent dispensing apparatus having a plurality of vessels and a plurality of carrier or inert gas feed/vapor or liquid phase reagent delivery manifolds, that may be used for continuously dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices.
摘要翻译：本发明涉及一种具有多个容器和多个载体或惰性气体进料/蒸气或液相试剂输送歧管的整体蒸气或液相试剂分配装置，其可用于连续分配蒸气或液相试剂，例如用于在半导体材料和器件的制造中沉积材料的前体。

6. 发明申请

WO2009088471A1 LOW THERMAL CONDUCTIVITY LOW DENSITY PYROLYTIC BORON NITRIDE MATERIAL, METHOD OF MAKING, AND ARTICLES MADE THEREFROM 审中-公开
标题翻译：低热导率低密度磷酸铁材料，制造方法及其制品
公开(公告)号：WO2009088471A1
公开(公告)日：2009-07-16
申请号：PCT/US2008/014113
申请日：2008-12-30
申请人： MOMENTIVE PERFORMANCE MATERIALS INC. , SCHAEPKENS, Marc , SARIGIANNIS, Demetrius , LONGWORTH, Douglas
发明人： SCHAEPKENS, Marc , SARIGIANNIS, Demetrius , LONGWORTH, Douglas
IPC分类号： C04B41/50 , C23C16/34
CPC分类号： C23C16/342 , C23C16/01 , C30B11/002 , C30B25/00 , C30B29/403 , C30B35/002 , Y10T428/131
摘要： A pyrolytic boron nitride material is disclosed having an in-plane thermal conductivity of no more than about 30 W/m-K and a through-plane thermal conductivity of no more than about 2 W/m-K. The density is less than 1.85 g/cc.
摘要翻译：公开了一种热分解氮化硼材料，其面内导热率不超过约30W / m-K，通孔热导率不超过约2W / m-K。密度小于1.85g / cc。

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