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1. 发明申请

WO2005040918A2 LOW-ACTIVATION ENERGY SILICON-CONTAINING RESIST SYSTEM 审中-公开
标题翻译：低活性能含硅电阻系统
公开(公告)号：WO2005040918A2
公开(公告)日：2005-05-06
申请号：PCT/US2004/035253
申请日：2004-10-22
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , HUANG, Wu-Song , ALLEN, Robert, D. , ANGELOPOULOS, Marie , KWONG, Ranee, W. , SOORIYAKUMARAN, Ratnam
发明人： HUANG, Wu-Song , ALLEN, Robert, D. , ANGELOPOULOS, Marie , KWONG, Ranee, W. , SOORIYAKUMARAN, Ratnam
IPC分类号： G03F
CPC分类号： G03F7/0757 , G03F7/0045 , G03F7/0046
摘要： Inventive silsesquioxane polymers are provided, and resist compositions that contain such silsesquioxane polymers are provided in which at least a portion of the silsesquioxane polymer contains fluorinated moieties, and at least a portion of the silisesquioxane polymer contains pendant solubility inhibiting acid-labile moieties that have low activation energy for acid-catalyzed cleaving, and the presence of high optical density moieties are minimized or avoided. The inventive polymer also contains pendant polar moieties that promote alkaline solubility of the resist in aqueous alkaline solutions. The inventive polymers are particularly useful in positive resist compositions. The invention encompasses methods of using such resist compositions in forming a patterned structure on a substrate, and particularly multilayer (e.g. bilayer) photolithographic methods, which methods are capable of producing high resolution images at wavelengths such as 193nm and 157nm.
摘要翻译：提供了本发明的倍半硅氧烷聚合物，并且提供了含有这种倍半硅氧烷聚合物的抗蚀剂组合物，其中至少一部分倍半硅氧烷聚合物含有氟化部分，并且至少一部分硅烷倍半硅氧烷聚合物含有侧链溶解性抑制酸不稳定部分，用于酸催化裂解的活化能和高光密度部分的存在被最小化或避免。本发明的聚合物还含有侧链极性部分，其促进抗蚀剂在碱性水溶液中的碱溶性。本发明的聚合物在正性抗蚀剂组合物中特别有用。本发明包括使用这种抗蚀剂组合物在基底上形成图案化结构的方法，特别是多层（例如双层）光刻方法，该方法能够在诸如193nm和157nm的波长下产生高分辨率图像。

2. 发明申请

WO2012079919A1 FLUOROALCOHOL CONTAINING MOLECULAR PHOTORESIST MATERIALS AND PROCESSES OF USE 审中-公开
标题翻译：含有分子光催化材料的氟代醇及其使用方法
公开(公告)号：WO2012079919A1
公开(公告)日：2012-06-21
申请号：PCT/EP2011/070579
申请日：2011-11-21
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , DE SILVA, Ekmini, Anuja , SUNDBERG, Linda, Karin , SOORIYAKUMARAN, Ratnam , BREYTA, Gregory , BOZANO, Luisa, Dominica , HINSBERG, William
发明人： DE SILVA, Ekmini, Anuja , SUNDBERG, Linda, Karin , SOORIYAKUMARAN, Ratnam , BREYTA, Gregory , BOZANO, Luisa, Dominica , HINSBERG, William
IPC分类号： C07C39/367 , G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0046 , C07C39/42 , C07C69/96 , C07C2603/92 , G03F7/0382 , G03F7/0392
摘要： Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
摘要翻译：酚醛分子杯如杯芳烃包括至少一种含氟代醇单元。含氟代醇的分子玻璃可用于光致抗蚀剂组合物中。还公开了使用光致抗蚀剂组合物在基板上产生抗蚀剂图像的方法。

3. 发明申请

WO2005040918A3 LOW-ACTIVATION ENERGY SILICON-CONTAINING RESIST SYSTEM 审中-公开
标题翻译：低活化能含硅抗蚀剂体系
公开(公告)号：WO2005040918A3
公开(公告)日：2005-12-15
申请号：PCT/US2004035253
申请日：2004-10-22
申请人： IBM , HUANG WU-SONG , ALLEN ROBERT D , ANGELOPOULOS MARIE , KWONG RANEE W , SOORIYAKUMARAN RATNAM
发明人： HUANG WU-SONG , ALLEN ROBERT D , ANGELOPOULOS MARIE , KWONG RANEE W , SOORIYAKUMARAN RATNAM
IPC分类号： G03C1/76 , G03F20060101 , G03F7/004 , G03F7/075
CPC分类号： G03F7/0757 , G03F7/0045 , G03F7/0046
摘要： Inventive silsesquioxane polymers are provided, and resist compositions that contain such silsesquioxane polymers are provided in which at least a portion of the silsesquioxane polymer contains fluorinated moieties, and at least a portion of the silisesquioxane polymer contains pendant solubility inhibiting acid-labile moieties that have low activation energy for acid-catalyzed cleaving, and the presence of high optical density moieties are minimized or avoided. The inventive polymer also contains pendant polar moieties that promote alkaline solubility of the resist in aqueous alkaline solutions. The inventive polymers are particularly useful in positive resist compositions. The invention encompasses methods of using such resist compositions in forming a patterned structure on a substrate, and particularly multilayer (e.g. bilayer) photolithographic methods, which methods are capable of producing high resolution images at wavelengths such as 193nm and 157nm.
摘要翻译：提供了本发明的倍半硅氧烷聚合物，并且提供了包含这种倍半硅氧烷聚合物的抗蚀剂组合物，其中所述倍半硅氧烷聚合物的至少一部分含有氟化部分，并且所述倍半硅氧烷聚合物的至少一部分含有悬挂溶解度抑制酸不稳定部分，用于酸催化裂解的活化能以及高光密度部分的存在被最小化或避免。本发明的聚合物还含有促进抗蚀剂在碱性水溶液中的碱溶性的侧链极性部分。本发明的聚合物在正型抗蚀剂组合物中特别有用。本发明包括使用这种抗蚀剂组合物在基底上形成图案化结构的方法，特别是多层（例如双层）光刻方法，该方法能够在诸如193nm和157nm的波长产生高分辨率图像。

4. 发明申请

WO2013006288A1 THIN FILM COMPOSITE MEMBRANES EMBEDDED WITH MOLECULAR CAGE COMPOUNDS 审中-公开
标题翻译：薄膜复合膜嵌入分子笼化合物
公开(公告)号：WO2013006288A1
公开(公告)日：2013-01-10
申请号：PCT/US2012/043739
申请日：2012-06-22
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , NA, Young-Hye , SOORIYAKUMARAN, Ratnam , VORA, Ankit , DIEP, Jacquana T.
发明人： NA, Young-Hye , SOORIYAKUMARAN, Ratnam , VORA, Ankit , DIEP, Jacquana T.
IPC分类号： B01D29/00
CPC分类号： B01D71/76 , B01D61/08 , B01D67/0006 , B01D69/125 , B01D69/141 , B01D71/56 , B01D71/70 , B01D71/82 , B01D2323/30 , B01D2323/40 , B05D5/00 , C08G77/045 , C08G77/26 , C08G77/455 , C08J9/36 , C08L81/06 , C08L83/10
摘要： A polymeric membrane on a support, wherein the polymeric membrane includes a crosslinked polymer covalently bound to a molecular cage compound. An interfacial polymerization method for making the polymeric membrane is also disclosed.
摘要翻译：载体上的聚合物膜，其中聚合物膜包括与分子笼化合物共价结合的交联聚合物。还公开了制备聚合物膜的界面聚合方法。

5. 发明申请

WO2011054572A1 SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE 审中-公开
标题翻译：含硅的涂料组合物和使用方法
公开(公告)号：WO2011054572A1
公开(公告)日：2011-05-12
申请号：PCT/EP2010/063420
申请日：2010-09-14
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , SOORIYAKUMARAN, Ratnam , ALLEN, Robert, David , BROCK, Phillip, Joe , SWANSON, Sally, Ann , TRUONG, Hoa , CHEN, Kuang-Jung , HUANG, Wu-Song , FRIZ, Alexander
发明人： SOORIYAKUMARAN, Ratnam , ALLEN, Robert, David , BROCK, Phillip, Joe , SWANSON, Sally, Ann , TRUONG, Hoa , CHEN, Kuang-Jung , HUANG, Wu-Song , FRIZ, Alexander
IPC分类号： C09D143/04 , G03F7/075 , G03F7/00
CPC分类号： C09D143/04 , G03F7/0392 , G03F7/0397 , G03F7/0758 , G03F7/094 , G03F7/11 , G03F7/2041 , G03F7/40
摘要： Coating compositions include a polymer including (I) wherein R 1 is a silicon containing moiety, R 2 is an acid stable lactone functionality, and R 3 is an acid labile lactone functionality; X 1 , X 2 , X 3 are independently H or CH 3 ; and m and o are non-zero positive integers and n is zero or a positive integer representing the number of repeat units; a photoacid generator; and a solvent. Also disclosed are methods for forming a pattern in the coating composition containing the same.
摘要翻译：涂料组合物包括包含（I）的聚合物，其中R1是含硅部分，R2是酸稳定的内酯官能团，R3是酸不稳定的内酯官能团; X 1，X 2，X 3独立地为H或CH 3; 并且m和o是非零正整数，n是0或表示重复单元数的正整数; 光致酸发生器; 和溶剂。还公开了在含有该图案的涂料组合物中形成图案的方法。

6. 发明申请

WO2009039268A1 SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELECTRIC MATERIALS AND INTERCONNECT STRUCTURES 审中-公开
标题翻译：用于整合电介质材料和互连结构的旋转抗反射涂层（SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELECTRIC MATERIALS AND INTERCONNECT STRUCTURES
公开(公告)号：WO2009039268A1
公开(公告)日：2009-03-26
申请号：PCT/US2008/076844
申请日：2008-09-18
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , ALLEN, Robert, D. , BROCK, Phillip, J. , DAVIS, Blake, W. , HUANG, Wu-song, S. , LIN, Qinghuang , NELSON, Alshakim , PURUSHOTHAMAN, Sampath , SOORIYAKUMARAN, Ratnam
发明人： ALLEN, Robert, D. , BROCK, Phillip, J. , DAVIS, Blake, W. , HUANG, Wu-song, S. , LIN, Qinghuang , NELSON, Alshakim , PURUSHOTHAMAN, Sampath , SOORIYAKUMARAN, Ratnam
IPC分类号： G03F1/14
CPC分类号： H01L21/76808 , H01L21/02137 , H01L21/02282 , H01L21/02304 , H01L21/02348 , H01L21/0276 , H01L21/3122 , H01L21/76802 , H01L21/76835 , H01L23/5329 , H01L23/53295 , H01L2924/0002 , H01L2924/12044 , Y10T428/24802 , H01L2924/00
摘要： The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single- damascene and dual-damascene low-k interconnect structures with at least one patternable low-k dielectric and at least one inorganic antireflective coating. In general terms, a method is provided that includes providing at least one patternable low-k material on a surface of an inorganic antireflective coating that is located atop a substrate. The inorganic ARC is liquid deposited and comprises a polymer that has at least one monomer unit comprising the formula M-R 1 wherein M is at least one of Si, Ge, B, Sn, Fe, Ta, Ti, Ni, Hf and La and R 1 is a chromophore. At least one interconnect pattern is formed within the at least one patternable low- k material and thereafter the at least one patternable low-k material is cured. The inventive method can be used to form dual-damascene interconnect structures as well as single-damascene interconnect structures.
摘要翻译：本发明提供一种制造互连结构的方法，其中可图案化的低k材料替代了使用单独的光致抗蚀剂和电介质材料的需要。具体而言，本发明涉及一种制备具有至少一个可图案化的低k电介质和至少一种无机抗反射涂层的单镶嵌和双镶嵌低k互连结构的简化方法。通常，提供了一种方法，其包括在位于基底顶部的无机抗反射涂层的表面上提供至少一种可图案化的低k材料。无机ARC是液体沉积的，并且包含具有至少一个单体单元的聚合物，该单体单元包括式M-R1，其中M是Si，Ge，B，Sn，Fe，Ta，Ti，Ni，Hf和La中的至少一种， R1是发色团。至少一个互连图案形成在所述至少一个可编码低k材料内，此后所述至少一个可编码的低k材料被固化。本发明的方法可用于形成双镶嵌互连结构以及单镶嵌互连结构。

7. 发明申请

WO2011057832A1 PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE 审中-公开
标题翻译：光电导电材料及其制备方法和使用方法
公开(公告)号：WO2011057832A1
公开(公告)日：2011-05-19
申请号：PCT/EP2010/062243
申请日：2010-08-23
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , NELSON, Alshakim , BROCK, Phillip, Joe , SOORIYAKUMARAN, Ratnam , DAVIS, Blake , MILLER, Robert, Dennis , ALLEN, Robert, David , LIN, Qinghuang
发明人： NELSON, Alshakim , BROCK, Phillip, Joe , SOORIYAKUMARAN, Ratnam , DAVIS, Blake , MILLER, Robert, Dennis , ALLEN, Robert, David , LIN, Qinghuang
IPC分类号： C09D183/04 , C09D183/14 , H01L21/312
CPC分类号： H05K1/0326 , C09D183/04 , C09D183/14 , H01B3/307 , H01L21/02126 , H01L21/02216 , H01L21/3122 , H01L21/76802 , H01L21/76808 , H01L21/76814 , H05K2201/0162
摘要： Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.
摘要翻译：倍半硅氧烷聚合物，负色调可光图案化电介质配方中的倍半硅氧烷聚合物，使用含有倍半硅氧烷聚合物的负色调可光图案化电介质配方形成结构的方法，以及由倍半硅氧烷聚合物制成的结构。

8. 发明申请

WO2010096565A1 INTERFACIAL POLYMERIZATION METHODS FOR MAKING FLUOROALCOHOL-CONTAINING POLYAMIDES 审中-公开
标题翻译：用于制备含氟聚醇的界面聚合方法
公开(公告)号：WO2010096565A1
公开(公告)日：2010-08-26
申请号：PCT/US2010/024595
申请日：2010-02-18
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , CENTRAL GLASS CO., LTD. , ALLEN, Robert, David , NA, Young-hye , SOORIYAKUMARAN, Ratnam , FUJIWARA, Masaki , YAMANAKA, Kazuhiro
发明人： ALLEN, Robert, David , NA, Young-hye , SOORIYAKUMARAN, Ratnam , FUJIWARA, Masaki , YAMANAKA, Kazuhiro
IPC分类号： C08G69/28 , B01D71/56
CPC分类号： C08G69/28 , B01D61/025 , B01D67/0006 , B01D69/125 , B01D71/56 , B01D2323/40
摘要： A method including reacting a chemical mixture (A) and a chemical mixture (B) to form a polymeric compound, wherein where (A) and (B) are immiscible with each other, and wherein: (A) is an aqueous base comprising a monomeric polyamine reactant having one or more hexafluoroalcohol groups represented by Formula 1 : CF 3 HO- -R 0-(-NH2 ) m CF3Z n n Formula 1 wherein R0 represents an organic group selected from the group consisting of aliphatic, alicyclic, aromatic, heterocyclic groups and combinations thereof, m is an integer of 2 or more, and n is an integer of 1 or more, and (B) is organic and comprises a monomeric polyfunctional acyl halide reactant represented by Formula 2: R1-(-COx) P Formula 2 wherein R1 represents an organic group selected from the group containing aliphatic alicyclic, aromatic, heterocyclic groups and combinations thereof, X is selected from the group consisting of fluorine, chlorine, bromine and iodine, and p represents an integer of 2 or more.
摘要翻译：一种方法，包括使化学混合物（A）和化学混合物（B）反应以形成聚合化合物，其中（A）和（B）彼此不混溶，其中：（A）是包含具有一个或多个由式1表示的六氟醇基团的单体多胺反应物：CF 3 HO-R 0 - （ - NH 2）m CF 3 Z n n式1其中R 0表示选自脂族，脂环族，芳族，杂环的有机基团基团及其组合，m为2以上的整数，n为1以上的整数，（B）为有机物，由式2表示的单体多官能酰卤反应物：R1 - （ - COx）P 式2其中R1表示选自脂族脂环族，芳族，杂环基及其组合的有机基团，X选自氟，氯，溴和碘，p表示2以上的整数。

9. 发明申请

WO2010096563A1 POLYAMIDE MEMBRANES WITH FLUOROALCOHOL FUNCTIONALITY 审中-公开
标题翻译：具有氟代醇功能的聚酰胺膜
公开(公告)号：WO2010096563A1
公开(公告)日：2010-08-26
申请号：PCT/US2010/024593
申请日：2010-02-18
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , CENTRAL GLASS CO., LTD. , ALLEN, Robert, David , NA, Young-hye , SOORIYAKUMARAN, Ratnam , FUJIWARA, Masaki , YAMANAKA, Kazuhiro
发明人： ALLEN, Robert, David , NA, Young-hye , SOORIYAKUMARAN, Ratnam , FUJIWARA, Masaki , YAMANAKA, Kazuhiro
IPC分类号： C08G69/28 , B01D69/12 , B01D71/56 , B01D67/00
CPC分类号： C08G69/28 , B01D61/025 , B01D61/027 , B01D67/0006 , B01D69/02 , B01D69/125 , B01D71/56 , B01D2323/40 , B01D2325/30 , C08G69/26 , C08G69/42 , Y02A20/131
摘要： A polymeric membrane includes an active layer on a support. The active layer includes a polymer with a backbone, and the backbone has attached thereto at least one fluoroalcohol moiety.
摘要翻译：聚合物膜包括载体上的活性层。活性层包括具有主链的聚合物，并且主链已连接至少一个氟代醇部分。

10. 发明申请

WO2010025983A1 LOW OUTGASSING PHOTORESIST COMPOSITIONS 审中-公开
标题翻译：低出口光电组成
公开(公告)号：WO2010025983A1
公开(公告)日：2010-03-11
申请号：PCT/EP2009/059160
申请日：2009-07-16
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM UNITED KINGDOM LIMITED , SOORIYAKUMARAN, Ratnam , TRUONG, Hoa , DIPIETRO, Richard, Anthony , SWANSON, Sally, Ann
发明人： SOORIYAKUMARAN, Ratnam , TRUONG, Hoa , DIPIETRO, Richard, Anthony , SWANSON, Sally, Ann
IPC分类号： C08F36/20 , G03F7/09
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/22 , C08F12/24 , C08F12/32 , C08F212/14 , C08F212/32 , C08F220/28 , C09D125/18 , G03F7/0046 , G03F7/0382 , Y10S430/106 , Y10S430/114
摘要： Polymers for use in photoresist compositions include a repeat unit having a formula of (II) wherein Z represents a repeat unit of a polymer backbone; X is a linking group selected from the group consisting of alkylene, arylene, araalkylene, carbonyl, carboxyl, carboxyalkylene, oxy, oxyalkylene, and combinations thereof, and R is selected from the group consisting of hydrogen, alkyl, aryl, and cycloalkyl groups with the proviso that X and R are not part of the same ring system. Also disclosed are processes for patterning a relief image of the photoresist composition, wherein the photoresist composition has an outgassing rate of less than 6.5E+14 molecules/cm 2 /s.
摘要翻译：用于光致抗蚀剂组合物的聚合物包括具有式（II）的重复单元，其中Z表示聚合物主链的重复单元; X是选自亚烷基，亚芳基，亚芳基，羰基，羧基，羧基亚烷基，氧基，氧化烯及其组合的连接基团，R选自氢，烷基，芳基和环烷基，条件是X和R不是相同环系的一部分。还公开了用于图案化光致抗蚀剂组合物的浮雕图像的方法，其中光致抗蚀剂组合物具有小于6.5E + 14分子/ cm 2 / s的除气速率。

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