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1. 发明申请

WO2010008455A2 LOW- INERTIA MULTI -AXIS MULTI -DIRECTIONAL MECHANICALLY SCANNED ION IMPLANTATION SYSTEM 审中-公开
标题翻译：低精度多相多机器人机械扫描离子植入系统
公开(公告)号：WO2010008455A2
公开(公告)日：2010-01-21
申请号：PCT/US2009003718
申请日：2009-06-23
申请人： AXCELIS TECH INC , SMICK THEODORE , EIDE PAUL , RYDING GEOFFREY , FARLEY MARVIN , HORNER RONALD , OTA KAN
发明人： SMICK THEODORE , EIDE PAUL , RYDING GEOFFREY , FARLEY MARVIN , HORNER RONALD , OTA KAN
IPC分类号： H01J37/20 , F16M11/18 , H01J37/317
CPC分类号： H01J37/3171 , F16M11/123 , F16M11/18 , H01J37/20 , H01J2237/20 , H01J2237/2007 , H01J2237/202 , H01J2237/20278
摘要： An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.
摘要翻译：提供了一种配置成产生离子束的离子注入系统，其中端站具有至少四个自由度的机器人结构。可操作地耦合到机器人架构的末端执行器选择性地夹持和平移工件通过离子束。机器人结构具有可操作地联接到终端站的多个电动机，每个电动机具有旋转轴。每个旋转轴的至少一部分通常位于终端站内，并且多个电动机中的每一个具有分别与其相关联的联动组件，其中每个连杆组件分别具有曲柄臂和支柱。每个连杆组件的曲柄臂固定地联接到相应的旋转轴，并且每个连杆组件的支柱在第一关节处枢转地联接到相应的曲柄臂，并且在第二关节处可枢转地联接到末端执行器。

2. 发明申请

WO2012078421A3 A D.C. CHARGED PARTICLE ACCELERATOR, A METHOD OF ACCELERATING CHARGED PARTICLES USING D.C. VOLTAGES AND A HIGH VOLTAGE POWER SUPPLY APPARATUS FOR USE THEREWITH 审中-公开
标题翻译：一种直流带电粒子加速器，一种利用直流电压加速带电粒子的方法和一种用于使用该方法的高压电源装置
公开(公告)号：WO2012078421A3
公开(公告)日：2012-09-07
申请号：PCT/US2011062531
申请日：2011-11-30
申请人： TWIN CREEKS TECHNOLOGIES INC , SMICK THEODORE H , RYDING GEOFFREY , PARK WILLIAM H , HORNER RONALD
发明人： SMICK THEODORE H , RYDING GEOFFREY , PARK WILLIAM H , HORNER RONALD
IPC分类号： H05H13/04 , H05H7/00
CPC分类号： H05H5/04 , H02K11/0094 , H02K16/00 , H02K21/14 , H02M7/106
摘要： A d. c. charged particle accelerator comprises accelerator electrodes separated by insulating spacers defining acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In embodiments, the individually regulated gap voltages are generated by electrically isolated alternators mounted on a common rotor shaft driven by an electric motor. Alternating power outputs from the alternators provide inputs to individual regulated d. c. power supplies to generate the gap voltages. The power supplies are electrically isolated and have outputs connected in series across successive pairs of accelerator electrodes. The described embodiment enables an ion beam to be accelerated to high energies and high beam currents, with good accelerator stability.
摘要翻译：广告。 C。带电粒子加速器包括由限定相邻电极对之间的加速间隙的绝缘间隔物分开的加速电极。单独调节的间隙电压施加在每对相邻的加速器电极上。在实施例中，单独调节的间隙电压由安装在由电动机驱动的公共转子轴上的电隔离交流发电机产生。来自交流发电机的交流电输出为各个调节的d提供输入。 C。电源来产生间隙电压。电源是电隔离的，并且具有串联连接在连续的加速器电极对之间的输出。所描述的实施例使得离子束能够被加速到高能量和高射束电流，并具有良好的加速器稳定性。

3. 发明申请

WO0113410A9 WAFER HOLDER ASSEMBLY 审中-公开
标题翻译：晶片夹持器组件
公开(公告)号：WO0113410A9
公开(公告)日：2001-08-16
申请号：PCT/US0022677
申请日：2000-08-17
申请人： IBIS TECHNOLOGY INC , BLAKE JULIAN G , SMICK THEODORE H , ANDREWS ROBERT S , CORDTS BERNHARD F III , RYDING GEOFFREY
发明人： BLAKE JULIAN G , SMICK THEODORE H , ANDREWS ROBERT S , CORDTS BERNHARD F III , RYDING GEOFFREY
IPC分类号： H01J37/317 , H01L21/265 , H01L21/683 , H01L21/687 , H01L21/00
CPC分类号： H01L21/687
摘要： A wafer holder assembly for use in an ion implantation system includes at least one base structural member attachable to an end-station within the implantation system. At least a wafer-holding member, formed of an electrically conductive refractive material, is coupled to the base member and is adapted to hold a wafer in the path of an ion beam within the ion implantation system. The wafer holder assembly can include first and second main structural members from which first and second wafer-holding arms extend. The first arm is secured to the main structural members by a graphite retaining member. The second arm is pivotally biased to a wafer-hold position by a graphite bias member. This arrangement provides a conductive path from the wafer to the assembly for inhibiting electrical discharges form the wafer during the ion implantation process. The wafer-contacting pins at the distal end of the arms can be formed form silicon or graphite. The pins can be coated, for example, with titanium nitride to enhance electrical contact with the wafer and to provide an abrasion resistant surface. The pins can have a limited profile to minimize the amount of pin material proximate the wafer for reducing the likelihood of electrical arcing from the wafer to the pin.
摘要翻译：用于离子注入系统的晶片保持器组件包括至少一个可连接到植入系统内的终端站的基座结构构件。由导电折射材料形成的至少一个晶片保持构件联接到基座构件并且适于将晶片保持在离子注入系统内的离子束的路径中。晶片保持器组件可以包括第一和第二主要结构部件，第一和第二晶片保持臂从该主要结构部件延伸。第一臂通过石墨保持构件固定到主要结构构件。第二臂通过石墨偏置构件枢转地偏置到晶片保持位置。该布置提供从晶片到组件的导电路径，用于在离子注入过程期间抑制从晶片的放电。臂的远端处的晶片接触销可以由硅或石墨形成。例如，可以用氮化钛涂覆引脚以增强与晶片的电接触并提供耐磨表面。这些引脚可以具有有限的轮廓以最小化邻近晶片的引脚材料的量，以降低从晶片到引脚的电弧的可能性。

4. 发明申请

WO2006132878A3 SUBSTRATE SUPPORT 审中-公开
标题翻译：基板支持
公开(公告)号：WO2006132878A3
公开(公告)日：2007-11-29
申请号：PCT/US2006021077
申请日：2006-05-31
申请人： APPLIED MATERIALS INC , SMITH JACOB , TAM ALEXANDER , IYER R SURYANARAYANAN , SEUTTER SEAN , TRAN BINH , MERRY NIR , BRAILOVE ADAM , SHYDO JR ROBERT , ANDREWS ROBERT , ROBERTS FRANK , SMICK THEODORE , RYDING GEOFFREY
发明人： SMITH JACOB , TAM ALEXANDER , IYER R SURYANARAYANAN , SEUTTER SEAN , TRAN BINH , MERRY NIR , BRAILOVE ADAM , SHYDO JR ROBERT , ANDREWS ROBERT , ROBERTS FRANK , SMICK THEODORE , RYDING GEOFFREY
IPC分类号： C23C16/458 , H01L21/00
CPC分类号： H01L21/68792 , C23C16/4584 , H01L21/67126 , H01L21/68742
摘要： A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
摘要翻译：本文公开了一种利用旋转衬底支撑件来处理衬底的方法和装置。在一个实施例中，用于处理衬底的装置包括具有设置在腔室内的衬底支撑组件的室。衬底支撑组件包括具有支撑表面的衬底支撑件和设置在支撑表面下方的加热器。轴连接到基板支撑件，并且电机通过转子联接到轴，以向基板支撑件提供旋转运动。密封块设置在转子周围并与其形成密封。密封块具有至少一个密封件和沿密封块和轴之间的界面设置的至少一个通道。端口连接到每个通道以连接到泵。升降机构联接到轴上以升高和降低基板支撑。

5. 发明申请

WO2008053139A3 SHAPED APERTURES IN AN ION IMPLANTER 审中-公开
标题翻译：在离子植入物中形成的形状
公开(公告)号：WO2008053139A3
公开(公告)日：2008-10-02
申请号：PCT/GB2007003672
申请日：2007-09-26
申请人： APPLIED MATERIALS INC , RYDING GEOFFREY , SAKASE TAKAO , FARLEY MARVIN , HAYS STEPHEN
发明人： RYDING GEOFFREY , SAKASE TAKAO , FARLEY MARVIN , HAYS STEPHEN
IPC分类号： H01J37/09 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/09 , H01J2237/0451
摘要： This invention relates to shaped apertures (54a-h) in an ion implanter that may act to clip an ion beam (34,34) and so adversely affect uniformity of an implant. In particular, the present invention finds application in ion implanters that employ scanning of a substrate to be implanted relative to the ion beam such that the ion beam traces a raster pattern over the substrate. An ion implanter is provided comprising: a substrate scanner arranged to scan a substrate repeatedly through an ion beam in a scanning direction substantially transverse to the ion beam path, thereby forming a series of scan lines across the substrate; and an aperture pl-ate (52a-h)] having provided therein an aperture positioned on the ion beam path upstream of the substrate scanner, and wherein the aperture is defined in part by an inwardly- facing projection (57a, 57b, 59a, 59b).
摘要翻译：本发明涉及离子注入机中的成形孔（54a-h），其可以用于夹住离子束（34,34），并且因此不利地影响植入物的均匀性。特别地，本发明应用于使用相对于离子束进行植入的衬底的扫描的离子注入器，使得离子束在衬底上追踪光栅图案。提供了一种离子注入机，包括：衬底扫描器，其布置成在基本上横向于离子束路径的扫描方向上反复扫描基板通过离子束，从而在衬底上形成一系列扫描线; 和一个开口（52a-h）]，其中设置有位于基板扫描器上游的离子束路径上的孔，并且其中孔径部分地由向内的突起（57a，57b，59a， 59B）。

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