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    • 3. 发明申请
    • VERTICAL CAVITY SURFACE EMITTING LASER
    • 垂直孔表面发射激光
    • WO02075868A3
    • 2002-12-12
    • PCT/IB0200683
    • 2002-03-08
    • ECOLE POLYTECHKAPON ELYAHOUIAKOVLEV VLADIMIRSIRBU ALEXEIRUDRA ALOK
    • KAPON ELYAHOUIAKOVLEV VLADIMIRSIRBU ALEXEIRUDRA ALOK
    • H01S5/187H01S5/00H01S5/04H01S5/10H01S5/14H01S5/183
    • H01S5/18366B82Y20/00H01S5/041H01S5/0614H01S5/18308H01S5/18358H01S5/1838H01S5/34306
    • An electrically pumped VCSEL (10) and a method of its fabrication are presented. The VCSEL (10) comprises an active cavity material (14) sandwiched between top and bottom DBR stacks (12a, 12b), the top DBR (12b) having at least one n-semiconductor layer. The device defines an aperture region (25) between the structured surface (14b) of the active cavity material (14) and the n-semiconductor layer of the top DBR stack (12b). The structured surface (14b) is formed by a top surface of a mesa (22) that includes at least the upper n layer of a p /n tunnel junction and the surface of a p-type layer outside the mesa (22). The structured surface (14b) is fused to the surface of the n-semiconductor layer of the DBR stack (12b) due to the deformation of these surfaces, thereby creating an air gap (24) in the vicinity of the mesa (22) between the fused surfaces. The active region is defined by the current aperture (25) which includes the mesa (22) surrounded by the air gap (24), thereby allowing for restricting an electrical current flow to the active region, while the air gap (24) provides for the lateral variation of the index of refraction in the VCSEL (10).
    • 提出一种电泵浦VCSEL(10)及其制造方法。 VCSEL(10)包括夹在顶部和底部DBR堆叠(12a,12b)之间的有源腔体材料(14),顶部DBR(12b)具有至少一个n半导体层。 器件在有源腔材料(14)的结构化表面(14b)和顶部DBR叠层(12b)的n半导体层之间限定开口区域(25)。 结构化表面(14b)由台面(22)的顶表面形成,所述台面(22)的顶表面至少包括顶部p ++层/ n ++层隧道结和p 型层(22)外。 结构化表面(14b)由于这些表面的变形而与DBR堆叠(12b)的n半导体层的表面熔合,从而在台面(22)附近在 融合表面。 有源区域由包括由空气间隙(24)包围的台面(22)的电流孔(25)限定,从而允许限制电流流向有源区,同时气隙(24)提供 VCSEL(10)中折射率的横向变化。
    • 4. 发明申请
    • VERTICAL CAVITY SURFACE EMITTING LASER
    • 垂直腔表面发射激光器
    • WO2002075868A2
    • 2002-09-26
    • PCT/IB2002/000683
    • 2002-03-08
    • ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNEKAPON, ElyahouIAKOVLEV, VladimirSIRBU, AlexeiRUDRA, Alok
    • KAPON, ElyahouIAKOVLEV, VladimirSIRBU, AlexeiRUDRA, Alok
    • H01S3/00
    • H01S5/18366B82Y20/00H01S5/041H01S5/0614H01S5/18308H01S5/18358H01S5/1838H01S5/34306
    • An electrically pumped VCSEL and a method of its fabrication are presented. He VCSEL comprises an active cavity material sandwiched between top and bottom DBR stacks, the top DBR having at least one n-semiconductor layer. The device defines an aperture region between the structured surface of the active cavity material and the n-semiconductor layer of the top DBR stack. The structured surface is formed by a top surface of a mesa that includes at least the upper n ++ layer of a p ++ /n ++ tunnel junction and the surface of a p-type layer outside the mesa. The structured surface is fused to the surface of the n-semiconductor layer of the DBR stack due to the deformation of these surfaces, thereby creating an air gap in the vicinity of the mesa between the fused surfaces. The active region is defined by the current aperture which includes the mesa surrounded by the air gap, thereby allowing for restricting an electrical current flow to the active region, while the air gap provides for the lateral variation of the index of refraction in the VCSEL.
    • 介绍了一种电泵浦VCSEL及其制造方法。 He VCSEL包括夹在顶部和底部DBR叠层之间的有源腔体材料,顶部DBR具有至少一个n型半导体层。 该器件在有源腔体材料的结构化表面和顶部DBR堆叠的n型半导体层之间限定开口区域。 结构化表面由台面的顶部表面形成,台面的顶部表面至少包括ap ++ / n ++ 的上层n ++层 >隧道结和台面外的p型层的表面。 由于这些表面的变形,结构化表面熔合到DBR叠层的n-半导体层的表面,从而在熔合表面之间的台面附近产生气隙。 有源区由包括由气隙围绕的台面的电流孔限定,由此允许限制流到有源区的电流,而气隙提供VCSEL中的折射率的横向变化。