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1. 发明申请

WO2009085866A2 GAS TRANSPORT DELAY RESOLUTION FOR SHORT ETCH RECIPES 审中-公开
标题翻译：用于短时间食谱的气体运输延迟分辨率
公开(公告)号：WO2009085866A2
公开(公告)日：2009-07-09
申请号：PCT/US2008/087270
申请日：2008-12-17
申请人： LAM RESEARCH CORPORATION , SHAREEF, Iqbal , TASKAR, Mark , ZEMLOCK, Tony
发明人： SHAREEF, Iqbal , TASKAR, Mark , ZEMLOCK, Tony
IPC分类号： F17D3/03 , F17D3/00 , H01L21/00
CPC分类号： H01L21/67069 , H01L21/67253 , Y10T137/0318 , Y10T137/877 , Y10T137/87885
摘要： In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.
摘要翻译：在一个实施例中，用于提供多种气体的气体混合物的装置可以具有多个质量流量控制器（MFC），与每个多个MFC流体连接的混合歧管，位于混合歧管上的多个混合歧管出口; 以及与多个混合歧管出口中的每一个流体连接的隔离装置。

2. 发明申请

WO2012174053A1 SYSTEM AND METHOD FOR DECREASING SCRUBBER EXHAUST FROM GAS DELIVERY PANELS 审中-公开
标题翻译：从气体输送面板减少排气的系统和方法
公开(公告)号：WO2012174053A1
公开(公告)日：2012-12-20
申请号：PCT/US2012/042158
申请日：2012-06-13
申请人： LAM RESEARCH CORPORATION , TASKAR, Mark , SHAREEF, Iqbal
发明人： TASKAR, Mark , SHAREEF, Iqbal
IPC分类号： B08B5/02
CPC分类号： F17D1/00 , B08B15/002 , B08B15/04 , F17C1/00 , F17C2221/031 , G01M3/22 , Y10T137/0318 , Y10T137/6851 , Y10T137/7736 , Y10T137/7761 , Y10T137/86107
摘要： A method and apparatus is provided for decreasing the scrubber exhaust from gas panels, lower the cost of operation, lower the facilitation cost and power consumption by increasing the air velocity in areas of high potential risk of ignition. The apparatus includes a supply of compressed dry air (CDA) through the tubing with individual dispersion nozzles. The CDA dispersion nozzles can be installed at various key locations in order to provide additional ventilation turbulence and reduce potential dead zones inside the gas panel. Aspects of the invention help to save the energy and protect the environment by reducing the power consumption. In addition human safety shall be improved by minimizing the potential risk of ignition.
摘要翻译：提供一种方法和装置，用于减少来自气体面板的洗涤器排气，降低操作成本，通过在高潜在的点火风险区域中增加空气速度来降低便利成本和功率消耗。该设备包括通过具有各个分散喷嘴的管道供应压缩干燥空气（CDA）。 CDA分散喷嘴可以安装在各种关键位置，以便提供额外的通风湍流并减少气体面板内的潜在死区。本发明的方面有助于通过降低功耗来节省能源和保护环境。另外，通过最小化潜在的点火风险，可以改善人身安全。

3. 发明申请

WO2009085866A3 GAS TRANSPORT DELAY RESOLUTION FOR SHORT ETCH RECIPES 审中-公开
标题翻译：气体运输延迟解决方案
公开(公告)号：WO2009085866A3
公开(公告)日：2009-10-01
申请号：PCT/US2008087270
申请日：2008-12-17
申请人： LAM RES CORP , SHAREEF IQBAL , TASKAR MARK , ZEMLOCK TONY
发明人： SHAREEF IQBAL , TASKAR MARK , ZEMLOCK TONY
IPC分类号： F17D3/03 , F17D3/00 , H01L21/00
CPC分类号： H01L21/67069 , H01L21/67253 , Y10T137/0318 , Y10T137/877 , Y10T137/87885
摘要： In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.
摘要翻译：在一个实施例中，用于提供多种气体的气体混合物的设备可以具有多个质量流量控制器（MFC），与每个MFC流体连接的混合歧管，多个混合歧管出口定位在混合歧管以及与多个混合歧管出口中的每一个流体连接的隔离装置。

4. 发明申请

WO2012061711A1 METHODS AND APPARATUS FOR DETECTING THE CONFINEMENT STATE OF PLASMA IN A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：用于检测等离子体处理系统中等离子体的限制状态的方法和装置
公开(公告)号：WO2012061711A1
公开(公告)日：2012-05-10
申请号：PCT/US2011/059336
申请日：2011-11-04
申请人： LAM RESEARCH CORPORATION , NIXON, Ronda, K. , SHAREEF, Iqbal, A. , WAGNER, Mark, I. , MCANDREW, Robert , KROEKER, Tony, Ray
发明人： NIXON, Ronda, K. , SHAREEF, Iqbal, A. , WAGNER, Mark, I. , MCANDREW, Robert , KROEKER, Tony, Ray
IPC分类号： H05K3/26
CPC分类号： B08B7/0021 , H01L21/02101 , H01L21/67051 , H01L21/6719
摘要： A processing chamber for post-wet-etch removing of drying fluid (DF) is disclosed. The chamber includes a chamber wall surrounding a processing volume and a plurality of nozzles disposed annularly about the processing volume and arranged into a set of nozzle rows that includes at least one nozzle row. The chamber also includes a plenum and a set of manifolds coupled to the plurality of nozzles to deliver the supercritical CO 2 to the plurality of nozzles. Each nozzle has a nozzle outlet directed toward an interior portion of the processing volume and the nozzles are configured to flow the supercritical CO 2 toward the substrates in a manner that minimizes recirculation loops and vortices.
摘要翻译：公开了一种用于湿法蚀刻去除干燥流体（DF）的处理室。该室包括围绕处理容积的室壁和围绕处理容积环状设置并且布置成包括至少一个喷嘴排的一组喷嘴行的多个喷嘴。该腔室还包括一个气室和一组联接到多个喷嘴的歧管，以将超临界CO 2输送到多个喷嘴。每个喷嘴具有指向处理体积的内部部分的喷嘴出口，并且喷嘴构造成以使循环回路和涡流最小化的方式朝向基板流动超临界CO 2。

5. 发明申请

WO2009155221A3 METHODS FOR CONTROLLING TIME SCALE OF GAS DELIVERY INTO A PROCESSING CHAMBER 审中-公开
标题翻译：用于控制气体输送到加工室的时间尺度的方法
公开(公告)号：WO2009155221A3
公开(公告)日：2010-03-25
申请号：PCT/US2009047279
申请日：2009-06-12
申请人： LAM RES CORP , YUN GUNSU , SHAREEF IQBAL A , JORGENSEN KURT , CHARATAN ROBERT
发明人： YUN GUNSU , SHAREEF IQBAL A , JORGENSEN KURT , CHARATAN ROBERT
IPC分类号： H01L21/00 , H01L21/02
CPC分类号： G05D7/0635 , Y10T137/7761
摘要： A method for establishing a mass flow controller (MFC) control scheme, which is configured for reducing a time scale for gas delivery into a processing chamber, for a recipe is provided. The method includes identifying a set of delayed gas species utilized during execution of the recipe with a set of delivery time slower than a target delivery time scale. The method also includes establishing an initial overshoot strength and an initial overshoot duration for each gas specie of the set of delayed gas species. The method further includes establishing MFC control scheme by adjusting an MFC hardware for each gas specie during the execution of the recipe. Adjusting the MFC hardware includes applying the initial overshoot strength for the initial overshoot duration to determine if the MFC control scheme provides for each gas specie a pressure profile within a target accuracy of an equilibrium pressure for the processing chamber.
摘要翻译：提供了一种用于建立质量流量控制器（MFC）控制方案，其被配置为用于减少用于配方的气体输送到处理室中的时间标度。该方法包括在具有比目标递送时间标度慢的一组递送时间的情况下识别在执行配方期间使用的一组延迟气体种类。该方法还包括为该组延迟气体种类的每种气体物质建立初始过冲强度和初始过冲持续时间。该方法还包括在执行配方期间通过调整每种气体样品的MFC硬件来建立MFC控制方案。调整MFC硬件包括对初始过冲持续时间应用初始过冲强度，以确定MFC控制方案是否为每种气体提供在处理室的平衡压力的目标精度内的压力分布。

6. 发明申请

WO2009155221A2 METHODS FOR CONTROLLING TIME SCALE OF GAS DELIVERY INTO A PROCESSING CHAMBER 审中-公开
标题翻译：用于控制气体输送到加工室的时间尺度的方法
公开(公告)号：WO2009155221A2
公开(公告)日：2009-12-23
申请号：PCT/US2009/047279
申请日：2009-06-12
申请人： LAM RESEARCH CORPORATION , YUN, Gunsu , SHAREEF, Iqbal, A. , JORGENSEN, Kurt , CHARATAN, Robert
发明人： YUN, Gunsu , SHAREEF, Iqbal, A. , JORGENSEN, Kurt , CHARATAN, Robert
IPC分类号： H01L21/00 , H01L21/02
CPC分类号： G05D7/0635 , Y10T137/7761
摘要： A method for establishing a mass flow controller (MFC) control scheme, which is configured for reducing a time scale for gas delivery into a processing chamber, for a recipe is provided. The method includes identifying a set of delayed gas species utilized during execution of the recipe with a set of delivery time slower than a target delivery time scale. The method also includes establishing an initial overshoot strength and an initial overshoot duration for each gas specie of the set of delayed gas species. The method further includes establishing MFC control scheme by adjusting an MFC hardware for each gas specie during the execution of the recipe. Adjusting the MFC hardware includes applying the initial overshoot strength for the initial overshoot duration to determine if the MFC control scheme provides for each gas specie a pressure profile within a target accuracy of an equilibrium pressure for the processing chamber.
摘要翻译：提供了一种用于建立质量流量控制器（MFC）控制方案，其被配置为用于减少用于配方的气体输送到处理室中的时间标度。该方法包括在具有比目标递送时间标度慢的一组递送时间的情况下识别在执行配方期间使用的一组延迟气体种类。该方法还包括为该组延迟气体种类的每种气体物质建立初始过冲强度和初始过冲持续时间。该方法还包括在执行配方期间通过调整每种气体样品的MFC硬件来建立MFC控制方案。调整MFC硬件包括对初始过冲持续时间应用初始过冲强度，以确定MFC控制方案是否为每种气体提供在处理室的平衡压力的目标精度内的压力分布。

7. 发明申请

WO2009085866A4 GAS TRANSPORT DELAY RESOLUTION FOR SHORT ETCH RECIPES 审中-公开
标题翻译：用于短时间食谱的气体运输延迟分辨率
公开(公告)号：WO2009085866A4
公开(公告)日：2009-11-19
申请号：PCT/US2008087270
申请日：2008-12-17
申请人： LAM RES CORP , SHAREEF IQBAL , TASKAR MARK , ZEMLOCK TONY
发明人： SHAREEF IQBAL , TASKAR MARK , ZEMLOCK TONY
IPC分类号： F17D3/03 , F17D3/00 , H01L21/00
CPC分类号： H01L21/67069 , H01L21/67253 , Y10T137/0318 , Y10T137/877 , Y10T137/87885
摘要： In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.
摘要翻译：在一个实施例中，用于提供多种气体的气体混合物的设备可以具有多个质量流量控制器（MFC），与每个多个MFC流体连接的混合歧管，位于所述多个混合歧管中的多个混合歧管出口混合歧管; 以及与多个混合歧管出口中的每一个流体连接的隔离装置。

8. 发明申请

WO2009046032A1 METHOD AND APPARATUS FOR SHAPING GAS PROFILE NEAR BEVEL EDGE 审中-公开
标题翻译：用于形成近似气体剖面的方法和装置
公开(公告)号：WO2009046032A1
公开(公告)日：2009-04-09
申请号：PCT/US2008/078338
申请日：2008-09-30
申请人： LAM RESEARCH CORPORATION , CHEN, Jack , BAILEY, Andrew, D., III , SHAREEF, Iqbal
发明人： CHEN, Jack , BAILEY, Andrew, D., III , SHAREEF, Iqbal
IPC分类号： H01L21/3065
CPC分类号： H01L21/02087 , C23C16/455 , H01L21/31116 , H01L21/31138 , H01L21/32136 , H01L21/67051 , H01L21/67069 , H01L21/6708
摘要： A method for etching a bevel edge of a substrate in a processing chamber is provided. The method includes flowing an inert gas into a center region of the processing chamber defined above a center region of the substrate and flowing a mixture of an inert gas and a processing gas over an edge region of the substrate. The method farther includes striking a plasma in the edge region, wherein the flow of the inert gas and the flow of the mixture maintain a mass fraction of the processing gas substantially constant. A processing chamber configured to clean a bevel edge of a substrate is also provided.
摘要翻译：提供了一种用于在处理室中蚀刻衬底的斜边缘的方法。该方法包括将惰性气体流入位于衬底的中心区域上方的处理室的中心区域，并使惰性气体和处理气体的混合物流过衬底的边缘区域。该方法进一步包括在边缘区域中冲击等离子体，其中惰性气体的流动和混合物的流动保持处理气体的质量分数基本上恒定。还提供了一种构造成清洁基板的斜边缘的处理室。

9. 发明申请

WO2008064044A1 METHODS FOR PERFORMING ACTUAL FLOW VERIFICATION 审中-公开
标题翻译：执行实际流程验证的方法
公开(公告)号：WO2008064044A1
公开(公告)日：2008-05-29
申请号：PCT/US2007/084724
申请日：2007-11-14
申请人： LAM RESEARCH CORPORATION , SHAREEF, Iqbal A. , TIETZ, Jim , WONG, Vernon , MEINECKE, Rich
发明人： SHAREEF, Iqbal A. , TIETZ, Jim , WONG, Vernon , MEINECKE, Rich
IPC分类号： H01L21/3065
CPC分类号： G01F25/0053 , Y10T137/7722
摘要： A method for determining an actual gas flow rate in a reaction chamber of a plasma processing system is provided. The method includes delivering gas by a gas flow delivery system controlled by a mass flow controller (MFC) to an orifice, which is located upstream from the reaction chamber. The method also includes pressurizing the gas to create a choked flow condition within the orifice. The method further includes measuring a set of upstream pressure values of the gas via a set of pressure sensors. The method yet also includes applying a calibration factor of a set of calibration factors to determine the actual flow rate. The calibration factor is a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values, which is associated with an indicated flow rate for an MFC.
摘要翻译：提供了一种用于确定等离子体处理系统的反应室中的实际气体流量的方法。该方法包括通过由质量流量控制器（MFC）控制的气体输送系统将气体输送到位于反应室上游的孔口。该方法还包括对气体进行加压以在孔口内产生阻塞流动状态。该方法还包括经由一组压力传感器测量气体的一组上游压力值。该方法还包括应用一组校准因子的校准因子来确定实际流量。校准因子是一组上游压力值的平均值与一组金黄上游压力值的平均值的比值，其与MFC的指示流速相关联。

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