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    • 3. 发明申请
    • DUAL FREQUENCY EXCITATION OF PLASMA FOR FILM DEPOSITION
    • 用于电影沉积的等离子体的双频激发
    • WO9919537A9
    • 1999-07-29
    • PCT/US9820996
    • 1998-10-06
    • APPLIED KOMATSU TECHNOLOGY INCLAW KAM SROBERTSON ROBERT MSHANG QUANYUANOLSEN JEFFSORENSEN CARL
    • LAW KAM SROBERTSON ROBERT MSHANG QUANYUANOLSEN JEFFSORENSEN CARL
    • C23C16/505C23C16/509C23C16/517H01J37/32H01L21/205C23C16/50
    • H01J37/32165C23C16/5096C23C16/517
    • An apparatus deposits a high quality film onto a transparent substrate in a reactor. The transparent substrate may be made of glass, quartz or a polymer such as plastic. The transparent substrate is heated in a process chamber and a process gas stream is introduced into the process chamber. The apparatus generates a high frequency power output and a low frequency power output from a high frequency power supply and a low frequency power supply, respectively. The high frequency power output is generated at a frequency of about thirteen megahertz or more, and at a power from about one to five kilowatts, while the low frequency power output is generated at a frequency of about two megahertz or less, and at a power from about 300 to two kilowatts. The high frequency power output and the low frequency power output are superimposed and used to excite a plasma from the process gas stream at a pressure between about 0.4 Torr and 3 Torr, and at a temperature between about 250 DEG C and 450 DEG C to deposit a smooth thin film onto the transparent substrate.
    • 一种装置将高质量的膜沉积在反应器中的透明基板上。 透明基材可以由玻璃,石英或聚合物如塑料制成。 将透明基板在处理室中加热并将工艺气体流引入处理室。 该装置分别从高频电源和低频电源产生高频功率输出和低频功率输出。 高频功率输出以大约十三兆赫或更高的频率和大约一到五千瓦的功率产生,而低频功率输出是以大约2兆赫或更小的频率产生的 约300至2千瓦。 高频功率输出和低频功率输出被叠加并用于在约0.4Torr至3Torr之间的压力下和在约250℃至450℃的温度下从工艺气体流中激发等离子体以沉积 在透明基板上的平滑薄膜。