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1. 发明申请

US20120060924A1 METHODS AND SYSTEMS FOR FORMING FUNCTIONALLY GRADED FILMS BY SPRAY PYROLYSIS 审中-公开
标题翻译：通过喷雾热解形成功能级膜的方法和系统
公开(公告)号：US20120060924A1
公开(公告)日：2012-03-15
申请号：US13226200
申请日：2011-09-06
申请人： Yuriy B. Matus , Roman Mostovoy
发明人： Yuriy B. Matus , Roman Mostovoy
IPC分类号： H01L31/0272 , B05B1/00 , B05B15/00 , H01L31/18
CPC分类号： H01L21/02562 , H01L21/02474 , H01L21/02502 , H01L21/0251 , H01L21/02557 , H01L21/02628 , H01L31/0296 , H01L31/03925 , H01L31/1828 , Y02E10/543
摘要： Method and system for forming a plurality of cadmium-sulfide layers. The method includes preparing a first solution and a second solution. The method further includes loading at least the first solution and the second solution into a pyrolysis-deposition system and placing a target structure into the pyrolysis-depositions system. The method further includes spraying the first solution through one or more first nozzles towards the target structure, forming, from the sprayed first solution, the first cadmium-sulfide layer, directly or indirectly, on the target structure, spraying the second solution through one or more second nozzles towards the target structure with at least the first cadmium-sulfide layer, and forming, from the sprayed second solution, the second cadmium-sulfide layer directly or indirectly, on the target structure. The first cadmium-sulfide layer includes a first cadmium-sulfide material the second cadmium-sulfide layer includes a second cadmium-sulfide material that are different in at least one material property.
摘要翻译：用于形成多个硫化镉层的方法和系统。该方法包括制备第一溶液和第二溶液。所述方法还包括将至少第一溶液和第二溶液装载到热解沉积系统中并将目标结构置于热解沉积系统中。该方法还包括将第一溶液通过一个或多个第一喷嘴喷射到目标结构，从喷射的第一溶液中直接或间接地在目标结构上形成第一硫化镉层，将第二溶液通过一个或多个更多的第二喷嘴朝向目标结构至少具有第一硫化镉层，并且从喷射的第二溶液直接或间接地在目标结构上形成第二硫化镉层。第一硫化镉层包括第一硫化镉材料，第二硫化镉层包括在至少一种材料性质上不同的第二硫化镉材料。

2. 发明授权

US06428663B1 Preventing defect generation from targets through applying metal spray coatings on sidewalls 有权
标题翻译：通过在侧壁上施加金属喷涂来防止目标产生缺陷
公开(公告)号：US06428663B1
公开(公告)日：2002-08-06
申请号：US09609127
申请日：2000-07-03
申请人： Roman Mostovoy , Glen T. Mori
发明人： Roman Mostovoy , Glen T. Mori
IPC分类号： C23C1434
CPC分类号： C23C4/00 , C23C14/3414 , C23C14/564
摘要： A coating layer is applied to a semiconductor device fabrication equipment, specifically, to a sidesurface of an inventive target. Characteristics of the coating layer promote adhesion of sputtered particles which may accumulate on the deposition equipment surface. The coating layer therefore reduces the probability that sputtered particles will flake or crumble from the equipment and contaminate a substrate being processed therein.
摘要翻译：将涂层施加到半导体器件制造设备，具体地，应用于本发明目标的侧面。涂层的特征促进了可能积聚在沉积设备表面上的溅射颗粒的粘附。因此，涂层减少了溅射的颗粒将从设备中剥落或破碎并污染正在处理的基板的可能性。

3. 发明授权

US06416634B1 Method and apparatus for reducing target arcing during sputter deposition 有权
标题翻译：用于在溅射沉积期间减少靶电弧的方法和装置
公开(公告)号：US06416634B1
公开(公告)日：2002-07-09
申请号：US09543770
申请日：2000-04-05
申请人： Roman Mostovoy , Glen T. Mori
发明人： Roman Mostovoy , Glen T. Mori
IPC分类号： C23C1434
CPC分类号： F16J15/062 , C23C14/34
摘要： A sealing surface of a sputter deposition chamber is provided with a groove adapted to receive a sealing member. The groove comprises an inner wall having a plurality of restrictive openings configured to restrict the flow of gas from the groove through the plurality of restrictive openings so as to reduce target arcing during a plasma process within the sputter deposition chamber. A method also is provided for reducing defect formation during plasma processing. The method comprises providing a sputter deposition chamber having at least one sealing surface; and restricting the flow of gas from the at least one sealing surface into the sputter deposition chamber so as to reduce target arcing during sputter deposition within the sputter deposition chamber.
摘要翻译：溅射沉积室的密封表面设置有适于容纳密封构件的凹槽。凹槽包括具有多个限制开口的内壁，所述多个限制开口被构造成限制来自槽的气体流通过多个限制开口，以便在溅射沉积室内的等离子体处理期间减少目标电弧。还提供了一种用于减少等离子体处理期间的缺陷形成的方法。该方法包括提供具有至少一个密封表面的溅射沉积室; 并且限制气体从至少一个密封表面流入溅射沉积室，以便在溅射沉积室内的溅射沉积期间减少目标电弧。

4. 发明授权

US06379428B1 Method for reducing particle concentration within a semiconductor device fabrication tool 失效
标题翻译：降低半导体器件制造工具内的粒子浓度的方法
公开(公告)号：US06379428B1
公开(公告)日：2002-04-30
申请号：US09501697
申请日：2000-02-10
申请人： Roman Mostovoy , Glen T. Mori
发明人： Roman Mostovoy , Glen T. Mori
IPC分类号： B03C382
CPC分类号： H01L21/67167 , B08B15/02 , H01L21/67017 , Y10S55/18
摘要： A method is provided for reducing the number of particles within a chamber of a fabrication tool located within a gray area of a clean room. A portable clean room station is provided that is capable of producing a white environment having fewer particles than the gray environment. The portable clean room station is positioned so that the chamber is exposed to the white environment of the portable clean room station rather than to the gray environment when the chamber is opened within the gray area. The white environment, which has fewer particles than the gray environment, is produced by employing the portable clean room station, and the chamber is then opened. Thereafter maintenance is performed on the opened chamber. Preferably the white environment is selected so as to have at least two orders of magnitude fewer particles per cubic foot than the gray environment.
摘要翻译：提供了一种用于减少位于洁净室的灰色区域内的制造工具的腔室内的颗粒数量的方法。提供了能够产生比灰色环境更少的颗粒的白色环境的便携式洁净室站。便携式洁净室站被定位成使得当室在灰色区域内打开时，室暴露于便携式洁净室站的白色环境而不是灰色环境。通过使用便携式洁净室站产生比灰色环境更少的颗粒的白色环境，然后打开室。此后，在打开的室上进行维护。优选地，白色环境被选择为与灰色环境相比，每立方英尺具有至少两个数量级的颗粒。

5. 发明申请

US20120064699A1 METHODS AND SYSTEMS FOR SPRAY PYROLYSIS WITH ADDITION OF VOLATILE NON-POLAR MATERIALS 审中-公开
标题翻译：用于挥发性非极性材料的喷雾热解的方法和系统
公开(公告)号：US20120064699A1
公开(公告)日：2012-03-15
申请号：US13226190
申请日：2011-09-06
申请人： Yuriy B. Matus , Roman Mostovoy
发明人： Yuriy B. Matus , Roman Mostovoy
IPC分类号： H01L21/20 , B05B15/00 , B05B1/00
CPC分类号： H01L21/02557 , C23C16/306 , C23C16/4486 , H01L21/02628
摘要： Method and system for forming a cadmium-sulfide layer on a substrate. The method includes preparing a solution and loading the solution into a pyrolysis-deposition system. The solution uses at least one cadmium-containing solute, at least one sulfur-containing solute, water, and at least one selected material. The pyrolysis-deposition system includes one or more nozzles and one or more heating devices. The method further includes placing a substrate into the pyrolysis-deposition system, adjusting a distance between the substrate and the one or more nozzles, heating the substrate with the one or more heating devices, and spraying the solution including the selected material towards the substrate. The selected material satisfies at least one property selected from a group consisting of the selected material being non-polar, the selected material having at least higher volatility than water, and the selected material having at least lower heat capacity than water.
摘要翻译：在基板上形成硫化镉层的方法和系统。该方法包括制备溶液并将溶液加载到热解沉积系统中。该溶液使用至少一种含镉溶质，至少一种含硫溶质，水和至少一种选择的材料。热解沉积系统包括一个或多个喷嘴和一个或多个加热装置。该方法还包括将基底放置到热解沉积系统中，调节基底和一个或多个喷嘴之间的距离，用一个或多个加热装置加热基底，并将包括所选材料的溶液喷射到基底。所选择的材料满足选自由非极性选择的材料组成的组中的至少一种性质，所选择的材料具有至少比水更高的挥发性，所选择的材料具有至少比水低的热容量。

6. 发明申请

US20050218000A1 Conditioning of contact leads for metal plating systems 审中-公开
标题翻译：金属电镀系统接触导线的调节
公开(公告)号：US20050218000A1
公开(公告)日：2005-10-06
申请号：US11100344
申请日：2005-04-06
申请人： Hooman Hafezi , Joseph Yahalom , Roman Mostovoy , Bo Zheng , Aron Rosenfeld , You Wang , Nicolay Kovarsky
发明人： Hooman Hafezi , Joseph Yahalom , Roman Mostovoy , Bo Zheng , Aron Rosenfeld , You Wang , Nicolay Kovarsky
IPC分类号： C25D5/54 , C25D21/12
CPC分类号： C25D21/12 , C25D5/54
摘要： Embodiments of the invention provide a method for conditioning contacts of an electrochemical metal plating system. The method includes deplating the contacts by supplying a reversed biased energy and monitoring electrical measurements of the plating system in real-time such that the endpoint of a deplating process can be determined. In different embodiments, the method includes the use of a constant current or voltage, variable current or voltage, or combinations thereof for conditioning the contacts.
摘要翻译：本发明的实施例提供一种用于调节电化学金属电镀系统的触点的方法。该方法包括通过提供反向偏置的能量并实时监测电镀系统的电测量来使触点脱锌，从而可以确定脱镀工艺的端点。在不同的实施例中，该方法包括使用恒定电流或电压，可变电流或电压或其组合来调节触点。

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