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1. 发明授权

US07965547B2 Arrangement and method for controlling a micromechanical element 有权
标题翻译：用于控制微机械元件的布置和方法
公开(公告)号：US07965547B2
公开(公告)日：2011-06-21
申请号：US12576267
申请日：2009-10-09
申请人： Robert Kazinczi
发明人： Robert Kazinczi
IPC分类号： G11C11/50
CPC分类号： H01H59/0009 , G11C23/00 , H01H2001/0042
摘要： The invention concerns an arrangement for controlling a non-volatile memory arrangement for a circuit comprising: a micromechanical element coupled to a substrate; the micromechanical element being responsive to deflection means arranged on the substrate to control the movement of the micromechanical element between one or more stable states. In addition, the invention concerns a method for controlling a non-volatile memory device arrangement comprising: applying one or more signals to a deflection means for moving a micromechanical element between one or more stable states. To enhance the efficacy of the invention there is further provided a shorting circuit for use in the non-volatile memory arrangement.
摘要翻译：本发明涉及一种用于控制用于电路的非易失性存储器装置的装置，包括：耦合到衬底的微机械元件; 所述微机械元件响应于设置在所述基板上的偏转装置，以控制所述微机械元件在一个或多个稳定状态之间的移动。此外，本发明涉及一种用于控制非易失性存储器件装置的方法，包括：将一个或多个信号施加到用于在一个或多个稳定状态之间移动微机械元件的偏转装置。为了提高本发明的功效，还提供了一种用于非易失性存储装置的短路电路。

2. 发明授权

US09696635B2 Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process 有权
公开(公告)号：US09696635B2
公开(公告)日：2017-07-04
申请号：US13416387
申请日：2012-03-09
申请人： Adrianus Fransiscus Petrus Engelen , Henricus Johannes Lambertus Megens , Johannes Catharinus Hubertus Mulkens , Robert Kazinczi , Jen-Shiang Wang
发明人： Adrianus Fransiscus Petrus Engelen , Henricus Johannes Lambertus Megens , Johannes Catharinus Hubertus Mulkens , Robert Kazinczi , Jen-Shiang Wang
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/705 , G03F7/70091 , G03F7/70616
摘要： A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.

3. 发明申请

US20070223267A1 Arrangement and Method for Controlling a Micromechanical Element 有权
标题翻译：用于控制微机械元件的布置和方法
公开(公告)号：US20070223267A1
公开(公告)日：2007-09-27
申请号：US11579239
申请日：2005-05-20
申请人： Robert Kazinczi
发明人： Robert Kazinczi
IPC分类号： G11C11/00
CPC分类号： H01H59/0009 , G11C23/00 , H01H2001/0042
摘要： The invention concerns an arrangement for controlling a non-volatile memory arrangement for a circuit comprising: a micromechanical element coupled to a substrate; the micromechanical element being responsive to deflection means arranged on the substrate to control the movement of the micromechanical element between one or more stable states. In addition, the invention concerns a method for controlling a nonvolatile memory device arrangement comprising: applying one or more signals to a deflection means for moving a micromechanical element between one or more stable states. To enhance the efficacy of the invention there is further provided a shorting circuit for use in the non-volatile memory arrangement.
摘要翻译：本发明涉及一种用于控制用于电路的非易失性存储器装置的装置，包括：耦合到衬底的微机械元件; 所述微机械元件响应于设置在所述基板上的偏转装置，以控制所述微机械元件在一个或多个稳定状态之间的移动。此外，本发明涉及一种用于控制非易失性存储器件装置的方法，包括：将一个或多个信号施加到用于在一个或多个稳定状态之间移动微机械元件的偏转装置。为了提高本发明的功效，还提供了一种用于非易失性存储装置的短路电路。

4. 发明申请

US20100038731A1 NON-VOLATILE MEMORY DEVICE 审中-公开
标题翻译：非易失性存储器件
公开(公告)号：US20100038731A1
公开(公告)日：2010-02-18
申请号：US12441254
申请日：2006-11-02
申请人： Robertus P. Van Kampen , Robert Kazinczi
发明人： Robertus P. Van Kampen , Robert Kazinczi
IPC分类号： H01L29/84 , H01L21/3205
CPC分类号： H01H59/0009 , B81C1/0015 , B81C2201/014 , B81C2201/0176 , G11C23/00 , H01H51/12
摘要： A non-volatile memory device and method of manufacturing a non-volatile micro-electromechanical memory cell. The method comprises the first step of depositing a first layer of sacrificial material on a substrate by use of Atomic Layer Deposition The second step of the method is providing a cantilever (101) over at least a portion of the first layer of sacrificial material. The third step is depositing, by use of Atomic Layer Deposition, a second layer of sacrificial material over the first layer of sacrificial material and over a portion of the cantilever such that a portion of the cantilever is surrounded by sacrificial material. The fourth step is providing a further layer material (107) which covers at least a portion of the second layer of sacrificial material. Finally, the last step is etching away the sacrificial material surrounding the cantilever, thereby defining a cavity (102) in which the cantilever is suspended.
摘要翻译：一种非易失性存储器件和制造非易失性微机电存储单元的方法。该方法包括通过使用原子层沉积在衬底上沉积第一层牺牲材料的第一步骤。该方法的第二步是在第一层牺牲材料的至少一部分上提供悬臂（101）。第三步骤是通过使用原子层沉积在第一层牺牲材料上并在悬臂的一部分上沉积第二层牺牲材料，使得悬臂的一部分被牺牲材料包围。第四步是提供覆盖牺牲材料的第二层的至少一部分的另外的层材料（107）。最后，最后一步是蚀刻掉围绕悬臂的牺牲材料，由此限定悬臂悬挂在其中的空腔（102）。

5. 发明申请

US20080291412A1 Lithographic apparatus and method 失效
标题翻译：平版印刷设备和方法
公开(公告)号：US20080291412A1
公开(公告)日：2008-11-27
申请号：US12081814
申请日：2008-04-22
申请人： Robert KAZINCZI , Wim Tjibbo TEL , Laurentius Cornelius DE WINTER
发明人： Robert KAZINCZI , Wim Tjibbo TEL , Laurentius Cornelius DE WINTER
IPC分类号： G03B27/68
CPC分类号： G03F7/70891
摘要： A lithographic method is provided that includes using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a substrate. The illumination mode is adjusted after the radiation beam has been projected onto the substrate. The adjustment is arranged to reduce the effect of optical aberrations due to lens heating on the projected pattern during projection of the pattern onto a subsequent substrate.
摘要翻译：提供了一种光刻方法，其包括使用照明系统来提供具有照明模式的辐射束，使用图案形成装置将辐射束赋予其横截面中的图案，并将图案化的辐射束投影到衬底上。在辐射束投射到基板上之后调整照明模式。该调整被布置为在将图案投影到随后的基板上时，减少由于透镜加热引起的光学像差对投影图案的影响。

6. 发明申请

US20080278698A1 Lithographic apparatus and method 审中-公开
标题翻译：平版印刷设备和方法
公开(公告)号：US20080278698A1
公开(公告)日：2008-11-13
申请号：US11797902
申请日：2007-05-08
申请人： Robert Kazinczi , Wim Tjibbo Tel
发明人： Robert Kazinczi , Wim Tjibbo Tel
IPC分类号： G03B27/42
CPC分类号： G03F7/70891
摘要： A lithographic method is provided and comprises using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a plurality of substrates. The illumination mode is adjusted after the radiation beam has been projected onto one or more substrates. The adjustment is arranged to reduce the effect of aberrations due to lens heating on the projected pattern during projection of the pattern onto one or more subsequent substrates.
摘要翻译：提供了光刻方法，并且包括使用照明系统来提供具有照明模式的辐射束，使用图案形成装置将辐射束赋予其横截面中的图案，并将图案化的辐射束投影到多个底物。在辐射束已经投影到一个或多个基板上之后调整照明模式。该调整被布置为在将图案投影到一个或多个后续基底上时，减少由于透镜加热引起的像差对投射图案的影响。

7. 发明申请

US20080186468A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20080186468A1
公开(公告)日：2008-08-07
申请号：US12000092
申请日：2007-12-07
申请人： Steven George Hansen , Heine Melle Mulder , Robert Kazinczi
发明人： Steven George Hansen , Heine Melle Mulder , Robert Kazinczi
IPC分类号： G03B27/54
CPC分类号： H01L21/0274 , G03F7/70091 , G03F7/705
摘要： A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.
摘要翻译：提出了一种用于配置光刻设备的照明源的方法。该方法包括将照明源分为像素组，每个像素组包括一个或多个照明源点; 选择照射形状以露出图案，所述照明形状由至少一个像素组形成; 作为照明源中的像素组的状态变化的结果，创建修改的照明形状的像素组的状态的变化，迭代地计算光刻度量; 并根据迭代计算结果调整照明形状。

8. 发明授权

US08576377B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08576377B2
公开(公告)日：2013-11-05
申请号：US12000092
申请日：2007-12-07
申请人： Steven George Hansen , Heine Melle Mulder , Robert Kazinczi
发明人： Steven George Hansen , Heine Melle Mulder , Robert Kazinczi
IPC分类号： G03B27/54 , G03B27/68 , G03B27/32 , G03B27/42 , G03B27/52
CPC分类号： H01L21/0274 , G03F7/70091 , G03F7/705
摘要： A method for configuring an illumination source of a lithographic apparatus is presented. The method includes dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; iteratively calculating a lithographic metric as a result of a change of state of a pixel group in the illumination source, the change of the state of the pixel group creating a modified illumination shape; and adjusting the illumination shape based on the iterative results of calculations.
摘要翻译：提出了一种用于配置光刻设备的照明源的方法。该方法包括将照明源分为像素组，每个像素组包括一个或多个照明源点; 选择照射形状以露出图案，所述照明形状由至少一个像素组形成; 作为照明源中的像素组的状态变化的结果，创建修改的照明形状的像素组的状态的变化，迭代地计算光刻度量; 并根据迭代计算结果调整照明形状。

9. 发明申请

US20120229786A1 METHOD OF CONTROLLING A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND METHOD OF IMPROVING A MATHEMATICAL MODEL OF A LITHOGRAPHIC PROCESS 有权
标题翻译：控制图形设备的方法，设备制造方法，平面设备，计算机程序产品和改进算术过程的数学模型的方法
公开(公告)号：US20120229786A1
公开(公告)日：2012-09-13
申请号：US13416387
申请日：2012-03-09
申请人： Adrianus Franciscus Petrus ENGELEN , Henricus Johannes Lambertus MEGENS , Johannes Catharinus Hubertus MULKENS , Robert KAZINCZI , Jen-Shiang WANG
发明人： Adrianus Franciscus Petrus ENGELEN , Henricus Johannes Lambertus MEGENS , Johannes Catharinus Hubertus MULKENS , Robert KAZINCZI , Jen-Shiang WANG
IPC分类号： G03B27/54
CPC分类号： G03F7/705 , G03F7/70091 , G03F7/70616
摘要： A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.
摘要翻译：一种控制光刻设备的方法，所述方法包括设置光刻设备的照明系统以实现选择的照明模式，测量光刻设备的第一参数的值，计算投影图像的第二参数的值使用光刻设备的模型和第一参数的测量值具有多个特征的测试图案的特征，以及参考所计算的第二参数的值来控制光刻设备。

10. 发明授权

US08237913B2 Lithographic apparatus and method 失效
标题翻译：平版印刷设备和方法
公开(公告)号：US08237913B2
公开(公告)日：2012-08-07
申请号：US12081814
申请日：2008-04-22
申请人： Robert Kazinczi , Wim Tjibbo Tel , Laurentius Cornelius De Winter
发明人： Robert Kazinczi , Wim Tjibbo Tel , Laurentius Cornelius De Winter
IPC分类号： G03B27/68 , G03B27/42 , G03B27/54 , G03B27/32 , G03B27/52
CPC分类号： G03F7/70891
摘要： A lithographic method is provided that includes using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a substrate. The illumination mode is adjusted after the radiation beam has been projected onto the substrate. The adjustment is arranged to reduce the effect of optical aberrations due to lens heating on the projected pattern during projection of the pattern onto a subsequent substrate.
摘要翻译：提供了一种光刻方法，其包括使用照明系统来提供具有照明模式的辐射束，使用图案形成装置将辐射束赋予其横截面中的图案，并将图案化的辐射束投影到衬底上。在辐射束投射到基板上之后调整照明模式。该调整被布置为在将图案投影到随后的基板上时，减少由于透镜加热引起的光学像差对投影图案的影响。

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