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    • 3. 发明授权
    • Single-electron semiconductor device
    • 单电子半导体器件
    • US5844279A
    • 1998-12-01
    • US713365
    • 1996-09-13
    • Tetsufumi TanamotoRiichi Katoh
    • Tetsufumi TanamotoRiichi Katoh
    • H01L21/84H01L27/12H01L29/76H01L27/01
    • B82Y10/00H01L21/84H01L27/1203H01L29/7613Y10S977/937
    • A semiconductor device which includes, a substrate, an insulating layer formed on the substrate, a silicon layer having an exposed surface constituted by a Si (100) face, the silicon layer being provided with a tapered recess having a bottom at which a part of the silicon layer is remained without exposing the insulating layer, a first conductive region constituted by the silicon layer remaining at the bottom of the tapered recess, a second and a third conductive regions formed on both sides of the tapered recess respectively, a first insulating film formed on an inner surface of the tapered recess, and an electrode formed in the tapered recess. A flow of electron resulting from the tunneling effect from the second conductive region via the first insulating film to the third conductive region is controlled by controlling a voltage to be impressed onto the electrode.
    • 一种半导体器件,包括:衬底,形成在所述衬底上的绝缘层,具有由Si(100)面构成的暴露表面的硅层,所述硅层设置有具有底部的锥形凹部, 在不暴露绝缘层的情况下保留硅层,由保留在锥形凹部的底部的硅层构成的第一导电区域,分别形成在锥形凹槽两侧的第二和第三导电区域,第一绝缘膜 形成在锥形凹部的内表面上,以及形成在锥形凹部中的电极。 通过控制施加到电极上的电压来控制从第二导电区域经由第一绝缘膜到第三导电区域的隧穿效应所产生的电子流。
    • 4. 发明授权
    • Heterojunction bipolar transistor having double hetero structure
    • 具有双异质结构的异质结双极晶体管
    • US5010382A
    • 1991-04-23
    • US445984
    • 1989-12-04
    • Riichi Katoh
    • Riichi Katoh
    • H01L29/73H01L21/331H01L29/10H01L29/205H01L29/737
    • H01L29/7371H01L29/1004
    • A double heterojunction bipolar transistor which comprises a first conductivity type emitter layer, a second conductivity type base layer which is in contact with the emitter layer and forms a first heterojunction in conjunction with the emitter layer, and a collector layer which is in contact with the base layer and is made up of a first conductivity type semiconductor layer and a second conductivity type semiconductor layer. The collector layer includes a low-impurity concentration layer which is in contact with the base layer. The low-impurity concentration layer has the same conductivity type as the base layer and has an impurity concentration lower than that of the base layer. The collector layer forms a second heterojunction in conjunction with the base layer. The emitter layer and the collector layer are formed of a semiconductor material having a band gap wider than that of the base layer.
    • 一种双异质结双极晶体管,包括第一导电型发射极层,与发射极层接触并与发射极层结合形成第一异质结的第二导电型基极层和与该发射极层接触的集电极层 并且由第一导电类型半导体层和第二导电类型半导体层构成。 集电极层包括与基极层接触的低杂质浓度层。 低杂质浓度层具有与基底层相同的导电类型,并且其杂质浓度低于基底层的杂质浓度。 集电极层与基极层结合形成第二异质结。 发射极层和集电极层由具有比基极层宽的带隙的半导体材料形成。
    • 6. 发明授权
    • Heterojunction bipolar transistor
    • 异相双极晶体管
    • US5177583A
    • 1993-01-05
    • US639264
    • 1991-01-10
    • Takahiko EndoRiichi Katoh
    • Takahiko EndoRiichi Katoh
    • H01L29/737
    • H01L29/7378
    • In a first heterojunction bipolar transistor (HBT) of the present invention, base layers and collector layers are respectively divided into a plurality of layers and one of the base layers provided closer to the collector layer reiogn is set lower in impurity concentration than the other thereof provided closer to an emitter layer, thus solving a problem that thermal histories during epitaxial growth or during processes cause a set impurity distribution to be destroyed due to diffusion and thus a heterojunction is shifted from a p-n junction. Since minority carriers in the base can smoothly flow toward the collector, there can be realized an excellent HBT having a very high current gain and a very high cut-off frequency. In a second HBT of the invention, a base region comprises a first base layer of a low concentration having the same energy band gap as an emitter region and to be changed to a complete depletion layer in a thermally balanced state and a graded second base layer of a high concentration, and the first and second base layers form a heterojunction, thereby realizing an excellent HBT having a high speed performance which can exhibit a sufficient grading effect while preventing deterioration of an emitter-base voltage withstanding characteristic.
    • 10. 发明授权
    • Bipolar transistor with an improved collector structure
    • 具有改进的集电极结构的双极晶体管
    • US5336909A
    • 1994-08-09
    • US929524
    • 1992-08-14
    • Riichi KatohKunio Tsuda
    • Riichi KatohKunio Tsuda
    • H01L29/205H01L21/331H01L29/08H01L29/73H01L29/737H01L31/072H01L27/082H01L27/102H01L31/109
    • H01L29/0826H01L29/7371
    • In a very high speed bipolar transistor, an n.sup.+ -type GaAs collector layer and an n-type GaAs collector layer are stacked in an intrinsic transistor region, and an i-type GaAs collector layer is formed around the n.sup.+ -type GaAs collector layer and the n-type GaAs collector layer. An n-type GaAs collector layer is formed on the n.sup.+ -type GaAs collector layer such that a part of the n-type GaAs collector layer extends on the i-type GaAs collector layer. A p-type GaAs external base layer is formed outside the n-type GaAs collector layer. A p.sup.+ -type Al.sub.x Ga.sub.l-x As base layer is formed on the n-type GaAs collector layer. An emitter layer is formed such that it is arranged only in the intrinsic transistor region on the p.sup.+ -type Al.sub.x Ga.sub.l-x As base layer and constitutes a heterojunction together with the base layer. Design trade-off between the cutoff frequency and maximum oscillation frequency of the transistor is eliminated.
    • 在非常高速的双极型晶体管中,在本征晶体管区域堆叠n +型GaAs集电极层和n型GaAs集电极层,在n +型GaAs集电极层周围形成i型GaAs集电极层, n型GaAs集电极层。 在n +型GaAs集电极层上形成n型GaAs集电极层,使得n型GaAs集电极层的一部分在i型GaAs集电极层上延伸。 p型GaAs外部基极层形成在n型GaAs集电体层的外部。 在n型GaAs集电极层上形成p +型Al x Ga 1-x As基层。 形成发射极层,使得其仅布置在p +型Al x Ga 1-x As基层上的本征晶体管区域中,并与基极层一起构成异质结。 消除晶体管的截止频率和最大振荡频率之间的设计折衷。