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1. 发明申请

US20050208420A1 Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS) 有权
标题翻译：无全氟辛基磺酸盐（PFOS）的环保光酸产生剂（PAG）
公开(公告)号：US20050208420A1
公开(公告)日：2005-09-22
申请号：US11080658
申请日：2005-03-16
申请人： Christopher Ober , Ramakrishnan Ayothi , Kyung-Min Kim , Xiang-Qian Liu
发明人： Christopher Ober , Ramakrishnan Ayothi , Kyung-Min Kim , Xiang-Qian Liu
IPC分类号： C07C309/10 , G03C1/492 , G03F7/004 , G03F7/038 , G03F7/039
CPC分类号： C07C309/10 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/122 , Y10S430/126
摘要： Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition that comprise such compounds. The new PAGs produce a photoacid having a short or no perfluoro alkyl chain (ie., no-PFOS) attached to a variety of functional groups. The PAGs of the invention are useful as photoactive component in the chemically amplified resist compositions used for microfabrication.
摘要翻译：提供具有不具有全氟辛基磺酸盐（无PFOS）的具有相对环境友好的阴离子的离子型光酸产生剂（PAG）化合物的新类别和包含这些化合物的光致抗蚀剂组合物。新的PAG产生具有连接到各种官能团的短或不全氟烷基链（即，不含PFOS）的光酸。本发明的PAG可用作用于微细加工的化学放大抗蚀剂组合物中的光活性组分。

2. 发明申请

US20110008732A1 PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS 有权
标题翻译：光电发生器化合物和组合物
公开(公告)号：US20110008732A1
公开(公告)日：2011-01-13
申请号：US12878211
申请日：2010-09-09
申请人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
发明人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
IPC分类号： G03F7/004 , C07C305/18 , G03F7/20
CPC分类号： C07D307/33 , C07C309/06 , C07C309/10 , C07C381/12 , C07C2602/42 , Y10S430/106 , Y10S430/114
摘要： The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
摘要翻译：本发明提供各种离子和非离子光致酸发生剂化合物。还提供了包含新型离子和非离子光酸产生剂化合物的光致抗蚀剂组合物。本发明还提供了制备和使用本文公开的光致酸产生剂化合物和光致抗蚀剂组合物的方法。化合物和组合物可用作用于各种微细加工应用的化学放大抗蚀剂组合物中的光活性组分。

3. 发明申请

US20090136868A1 PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS 有权
标题翻译：光电发生器化合物和组合物
公开(公告)号：US20090136868A1
公开(公告)日：2009-05-28
申请号：US12255266
申请日：2008-10-21
申请人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
发明人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
IPC分类号： G03F7/004 , C07D307/12 , G03F7/20 , C07C309/32
CPC分类号： C07D307/33 , C07C309/06 , C07C309/10 , C07C381/12 , C07C2602/42 , Y10S430/106 , Y10S430/114
摘要： The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
摘要翻译：本发明提供各种离子和非离子光致酸发生剂化合物。还提供了包含新型离子和非离子光酸产生剂化合物的光致抗蚀剂组合物。本发明还提供了制备和使用本文公开的光致酸产生剂化合物和光致抗蚀剂组合物的方法。化合物和组合物可用作用于各种微细加工应用的化学放大抗蚀剂组合物中的光活性组分。

4. 发明授权

US08614047B2 Photodecomposable bases and photoresist compositions 有权
标题翻译：光可分解碱和光致抗蚀剂组合物
公开(公告)号：US08614047B2
公开(公告)日：2013-12-24
申请号：US13219599
申请日：2011-08-26
申请人： Ramakrishnan Ayothi , William D. Hinsberg , Sally A. Swanson , Gregory M. Wallraff
发明人： Ramakrishnan Ayothi , William D. Hinsberg , Sally A. Swanson , Gregory M. Wallraff
IPC分类号： C07C55/02 , G03F7/004 , G03F7/26
CPC分类号： C07C55/08 , C07C55/12 , C07C55/14 , C07C55/32 , C07C59/21 , C07C59/245 , C07C59/295 , C07C59/315 , C07C59/347 , C07C229/24 , C07D241/04 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.
摘要翻译：提供了具有显示增加的成像性能的具有二羧酸阴离子基团的新颖的对称和不对称双功能可光分解碱（PDB）。还提供了使用双功能二羧酸化PDB制备的光致抗蚀剂组合物和使用本发明的光致抗蚀剂组合物的光刻方法。

5. 发明申请

US20090098490A1 Radiation-Sensitive, Wet Developable Bottom Antireflective Coating Compositions and Their Applications in Semiconductor Manufacturing 审中-公开
标题翻译：辐射敏感，湿发展底部抗反射涂层组合物及其在半导体制造中的应用
公开(公告)号：US20090098490A1
公开(公告)日：2009-04-16
申请号：US11974946
申请日：2007-10-16
申请人： Victor Pham , Ramakrishnan Ayothi , Mark Slezak
发明人： Victor Pham , Ramakrishnan Ayothi , Mark Slezak
IPC分类号： G03C5/56
CPC分类号： G03F7/091 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/095
摘要： The present invention is directed to novel radiation-sensitive, wet developable bottom antireflective coating (DBARC) compositions and their use in semiconductor device manufacturing. The DBARC compositions contain a photoacid generator that produces a photoacid upon exposure to activating radiation. In a photolithographic imaging process, the relatively strong photoacid reduces or eliminates scumming. Further, the relatively large size of the photoacid limits its diffusion through the DBARC, thus minimizing or preventing undercut. The inventive method also limits diffusion of the photoacid by controlling the temperature of the post-exposure baking step. Use of the DBARC compositions with a photoresist in photolithography results in highly resolved features having essentially vertical profiles and no scumming and no undercut, which is critical as microelectronics and semiconductor components become increasingly miniaturized.
摘要翻译：本发明涉及新型的辐射敏感性，湿显影性底部抗反射涂层（DBARC）组合物及其在半导体器件制造中的应用。 DBARC组合物含有在暴露于活化辐射时产生光致酸的光致酸产生剂。在光刻成像过程中，相对较强的光致酸降低或消除浮渣。此外，较大尺寸的光致酸酸限制其通过DBARC的扩散，从而最小化或防止底切。本发明的方法还通过控制曝光后烘烤步骤的温度来限制光致酸的扩散。在光刻中使用具有光致抗蚀剂的DBARC组合物导致高度分辨的特征，其具有基本上垂直的轮廓并且没有浮渣和无底切，这在微电子学和半导体组件变得越来越小型化时是至关重要的。

6. 发明授权

US07393627B2 Environmentally friendly photoacid generators (PAGs) with no perfluorooctyl sulfonates (PFOS) 有权
标题翻译：无全氟辛基磺酸盐（PFOS）的环保光酸产生剂（PAG）
公开(公告)号：US07393627B2
公开(公告)日：2008-07-01
申请号：US11080658
申请日：2005-03-16
申请人： Christopher K. Ober , Ramakrishnan Ayothi , Kyung-Min Kim , Xiang-Qian Liu
发明人： Christopher K. Ober , Ramakrishnan Ayothi , Kyung-Min Kim , Xiang-Qian Liu
IPC分类号： G03F7/029 , G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C07C309/10 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/122 , Y10S430/126
摘要： Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition that comprise such compounds. The new PAGs produce a photoacid having a short or no perfluoro alkyl chain (ie., no-PFOS) attached to a variety of functional groups. The PAGs of the invention are useful as photoactive component in the chemically amplified resist compositions used for microfabrication.
摘要翻译：提供具有不具有全氟辛基磺酸盐（无PFOS）的具有相对环境友好的阴离子的离子型光酸产生剂（PAG）化合物的新类别和包含这些化合物的光致抗蚀剂组合物。新的PAG产生具有连接到各种官能团的短或不全氟烷基链（即，不含PFOS）的光酸。本发明的PAG可用作用于微细加工的化学放大抗蚀剂组合物中的光活性组分。

7. 发明申请

US20130052585A1 PHOTODECOMPOSABLE BASES AND PHOTORESIST COMPOSITIONS 有权
标题翻译：光电复合基和光电组合物
公开(公告)号：US20130052585A1
公开(公告)日：2013-02-28
申请号：US13219599
申请日：2011-08-26
申请人： Ramakrishnan Ayothi , William D. Hinsberg , Sally A. Swanson , Gregory M. Wallraff
发明人： Ramakrishnan Ayothi , William D. Hinsberg , Sally A. Swanson , Gregory M. Wallraff
IPC分类号： G03F7/20 , G03F7/027 , C07C59/315 , C07C59/21 , C07C55/32 , C07C55/14 , C07C59/295 , C07C59/347 , C07C229/24 , C07C55/08 , C07C55/12 , G03F7/004 , C07D241/04
CPC分类号： C07C55/08 , C07C55/12 , C07C55/14 , C07C55/32 , C07C59/21 , C07C59/245 , C07C59/295 , C07C59/315 , C07C59/347 , C07C229/24 , C07D241/04 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： Provided are novel symmetrical and asymmetrical bifunctional photodecomposable bases (PDBs) with dicarboxylate anion groups that show increased imaging performance. Also provided are photoresist compositions prepared with the bifunctional dicarboxylated PDBs and lithography methods that use the photoresist compositions of the present invention.
摘要翻译：提供了具有显示增加的成像性能的具有二羧酸阴离子基团的新颖的对称和不对称双功能可光分解碱（PDB）。还提供了使用双功能二羧酸化PDB制备的光致抗蚀剂组合物和使用本发明的光致抗蚀剂组合物的光刻方法。

8. 发明授权

US08268531B2 Photoacid generator compounds and compositions 有权
标题翻译：光酸发生剂化合物和组合物
公开(公告)号：US08268531B2
公开(公告)日：2012-09-18
申请号：US12878211
申请日：2010-09-09
申请人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
发明人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028 , G03F7/40
CPC分类号： C07D307/33 , C07C309/06 , C07C309/10 , C07C381/12 , C07C2602/42 , Y10S430/106 , Y10S430/114
摘要： The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
摘要翻译：本发明提供各种离子和非离子光致酸发生剂化合物。还提供了包含新型离子和非离子光酸产生剂化合物的光致抗蚀剂组合物。本发明还提供了制备和使用本文公开的光致酸产生剂化合物和光致抗蚀剂组合物的方法。化合物和组合物可用作用于各种微细加工应用的化学放大抗蚀剂组合物中的光活性组分。

9. 发明授权

US07824839B2 Photoacid generator compounds and compositions 有权
标题翻译：光酸发生剂化合物和组合物
公开(公告)号：US07824839B2
公开(公告)日：2010-11-02
申请号：US12255266
申请日：2008-10-21
申请人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
发明人： Christopher K. Ober , Yi Yi , Ramakrishnan Ayothi
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029 , C07C303/00 , C07D307/00
CPC分类号： C07D307/33 , C07C309/06 , C07C309/10 , C07C381/12 , C07C2602/42 , Y10S430/106 , Y10S430/114
摘要： The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
摘要翻译：本发明提供各种离子和非离子光致酸发生剂化合物。还提供了包含新型离子和非离子光酸产生剂化合物的光致抗蚀剂组合物。本发明还提供了制备和使用本文公开的光致酸产生剂化合物和光致抗蚀剂组合物的方法。化合物和组合物可用作用于各种微细加工应用的化学放大抗蚀剂组合物中的光活性组分。

10. 发明申请

US20080227032A1 ENVIRONMENTAL FRIENDLY PHOTOACID GENERATORS (PAGs) WITH NO PERFLUOROOCTYL SULFONATES 审中-公开
标题翻译：环保友情光电发生器（PAG），无全氟磺酸盐
公开(公告)号：US20080227032A1
公开(公告)日：2008-09-18
申请号：US12129507
申请日：2008-05-29
申请人： Christopher K. Ober , Ramakrishnan Ayothi , Kyung-Min Kim , Xiang-Qian Liu
发明人： Christopher K. Ober , Ramakrishnan Ayothi , Kyung-Min Kim , Xiang-Qian Liu
IPC分类号： G03F7/004 , G03F7/20 , C07C309/24 , C07C309/02 , C07C309/29
CPC分类号： C07C309/10 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/122 , Y10S430/126
摘要： Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition that comprise such compounds. The new PAGs produce a photoacid having a short or no perfluoro alkyl chain (i.e., no-PFOS) attached to a variety of functional groups. The PAGs of the invention are useful as photoactive component in the chemically amplified resist compositions used for microfabrication.
摘要翻译：提供具有不具有全氟辛基磺酸盐（无PFOS）的具有相对环境友好的阴离子的离子型光酸产生剂（PAG）化合物的新类别和包含这些化合物的光致抗蚀剂组合物。新的PAG产生具有连接到各种官能团的短或不全氟烷基链（即，无PFOS）的光酸。本发明的PAG可用作用于微细加工的化学放大抗蚀剂组合物中的光活性组分。

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